Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
09/2008
09/02/2008US7420279 Carbon containing silicon oxide film having high ashing tolerance and adhesion
09/02/2008US7420277 System for heat dissipation in semiconductor devices
09/02/2008US7420276 Post passivation structure for semiconductor chip or wafer
09/02/2008US7420272 Two-sided wafer escape package
09/02/2008US7420266 Circuit device and manufacturing method thereof
09/02/2008US7420263 DBG system and method with adhesive layer severing
09/02/2008US7420262 Electronic component and semiconductor wafer, and method for producing the same
09/02/2008US7420261 Bulk nitride mono-crystal including substrate for epitaxy
09/02/2008US7420260 Power semiconductor device for suppressing substrate recirculation current and method of fabricating power semiconductor device
09/02/2008US7420259 Semiconductor device having two-layered charge storage electrode
09/02/2008US7420256 Nonvolatile semiconductor memory device having a gate stack and method of manufacturing the same
09/02/2008US7420254 Semiconductor device having a metal gate electrode
09/02/2008US7420249 Semiconductor device formed in semiconductor layer arranged on substrate with one of insulating film and cavity interposed between the substrate and the semiconductor layer
09/02/2008US7420242 Stacked bit line dual word line nonvolatile memory
09/02/2008US7420240 Method to remove an oxide seam along gate stack edge, when nitride space formation begins with an oxide liner surrounding gate stack
09/02/2008US7420239 Dielectric layer forming method and devices formed therewith
09/02/2008US7420238 Semiconductor constructions
09/02/2008US7420237 Capacitor element
09/02/2008US7420233 Photodiode for improved transfer gate leakage
09/02/2008US7420232 Lateral junction field effect transistor and method of manufacturing the same
09/02/2008US7420228 Bipolar transistor comprising carbon-doped semiconductor
09/02/2008US7420215 Transparent conductive film, semiconductor device and active matrix display unit
09/02/2008US7420212 Flat panel display
09/02/2008US7420211 Wiring line and manufacture process thereof, and semiconductor device and manufacturing process thereof
09/02/2008US7420209 Semiconductor device
09/02/2008US7420202 Electronic device including a transistor structure having an active region adjacent to a stressor layer and a process for forming the electronic device
09/02/2008US7420201 Strained-semiconductor-on-insulator device structures with elevated source/drain regions
09/02/2008US7420200 Damascene phase change memory
09/02/2008US7420191 Discharge radiation source, in particular UV radiation
09/02/2008US7420129 Semiconductor package including a semiconductor device, and method of manufacturing the same
09/02/2008US7419946 Chemical solution feeding apparatus and method for preparing slurry
09/02/2008US7419945 Containing hydrogen peroxide, sulfolane, optionally tetramethylammonium hydroxide, and either trans-1,2-cyclohexanediamine tetraacetic acid or ethylenediaminetetrakis(methylene phosphonic acid); cleans copper residues, SiO2,and low- and high- kappa dielectrics
09/02/2008US7419920 Metal thin film and semiconductor comprising a metal thin film
09/02/2008US7419919 Method of manufacturing semiconductor device
09/02/2008US7419918 Methods of forming a thin-film structure, methods of manufacturing non-volatile semiconductor devices using the same, and resulting non-volatile semiconductor devices
09/02/2008US7419917 Ion implanted microscale and nanoscale device method
09/02/2008US7419916 Manufacturing method of semiconductor device
09/02/2008US7419915 Laser assisted chemical etching method for release microscale and nanoscale devices
09/02/2008US7419914 Semiconductor device fabrication method
09/02/2008US7419913 Methods of forming openings into dielectric material
09/02/2008US7419912 Laser patterning of light emitting devices
09/02/2008US7419911 high polishing efficiency, uniformity, and removal rate, and leaves a high quality polish with minimal surface defects; uses an oxidizer, preferably a per-type oxidizer such as a peroxide, periodic acid, and peracetic acid; abrasives
09/02/2008US7419910 Slurry for CMP, polishing method and method of manufacturing semiconductor device
09/02/2008US7419909 Methods of forming a semiconductor device that allow patterns in different regions that have different pitches to be connected
09/02/2008US7419908 Process for making an array of wells
09/02/2008US7419907 Eliminating metal-rich silicides using an amorphous Ni alloy silicide structure
09/02/2008US7419906 Method for manufacturing a through conductor
09/02/2008US7419905 Gate electrodes and the formation thereof
09/02/2008US7419904 Method for forming barrier film and method for forming electrode film
09/02/2008US7419903 Thin films
09/02/2008US7419902 Method of manufacture of semiconductor integrated circuit
09/02/2008US7419901 Semiconductor device and a method of manufacturing the same
09/02/2008US7419900 Post passivation interconnection schemes on top of the IC chips
09/02/2008US7419899 Method for manufacturing semiconductor device
09/02/2008US7419898 Method for metal gate structure for MOS devices
09/02/2008US7419897 Method of fabricating circuit board having different electrical connection structures
09/02/2008US7419896 Method for forming landing plug contact in semiconductor device
09/02/2008US7419895 NAND memory arrays
09/02/2008US7419894 Gate electrode and manufacturing method thereof, and semiconductor device and manufacturing method thereof
09/02/2008US7419893 Method of manufacturing semiconductor device having triple-well structure and semiconductor device fabricated
09/02/2008US7419892 Semiconductor devices including implanted regions and protective layers and methods of forming the same
09/02/2008US7419891 Method and system for providing a smaller critical dimension magnetic element utilizing a single layer mask
09/02/2008US7419890 Complementary thin film transistor circuit, electro-optical device, and electronic apparatus
09/02/2008US7419888 First gas, the second gas and the third gas repeatedly provided to alternately form the silicon-rich nanocrystalline structure having a plurality of silicon-rich insulation layers and a plurality of silicon nanocrystalline layers
09/02/2008US7419887 Laser assisted nano deposition
09/02/2008US7419885 Method for cutting a wafer using a protection sheet
09/02/2008US7419884 Method of bonding two wafers of semiconductor materials
09/02/2008US7419883 Method for fabricating a semiconductor structure having selective dopant regions
09/02/2008US7419882 Alignment mark and alignment method for the fabrication of trench-capacitor dram devices
09/02/2008US7419881 Phase changeable memory device and method of formation thereof
09/02/2008US7419880 Transistor having a protruded drain
09/02/2008US7419879 Transistor having gate dielectric layer of partial thickness difference and method of fabricating the same
09/02/2008US7419878 Planarized and silicided trench contact
09/02/2008US7419877 Methods of fabricating silicon carbide devices including multiple floating guard ring edge termination
09/02/2008US7419876 Method for manufacturing non-volatile memory devices integrated in a semiconductor substrate
09/02/2008US7419875 Shallow trench isolation in floating gate devices
09/02/2008US7419874 Method of manufacturing semiconductor device with capacitor and transistor
09/02/2008US7419873 Method and apparatus for providing flexible partially etched capacitor electrode interconnect
09/02/2008US7419872 Method for preparing a trench capacitor structure
09/02/2008US7419871 Methods of forming semiconductor constructions
09/02/2008US7419870 Method of manufacturing a flash memory device
09/02/2008US7419869 Semiconductor device and a method for manufacturing the same
09/02/2008US7419868 Gated diode nonvolatile memory process
09/02/2008US7419867 CMOS gate structure comprising predoped semiconductor gate material with improved uniformity of dopant distribution and method of forming the structure
09/02/2008US7419866 Process of forming an electronic device including a semiconductor island over an insulating layer
09/02/2008US7419865 Methods of forming memory circuitry
09/02/2008US7419864 Semiconductor device and method of manufacturing the same
09/02/2008US7419863 Fabrication of semiconductor structure in which complementary field-effect transistors each have hypoabrupt body dopant distribution below at least one source/drain zone
09/02/2008US7419862 Method of fabricating pseudomorphic high electron mobility transistor
09/02/2008US7419861 Laser irradiation apparatus, laser irradiation method, semiconductor device, and method of manufacturing a semiconductor device
09/02/2008US7419860 Method of fabricating a semiconductor thin film
09/02/2008US7419859 Method of fabricating a semiconductor device having a single gate electrode corresponding to a pair of fin-type channel regions
09/02/2008US7419858 Recessed-gate thin-film transistor with self-aligned lightly doped drain
09/02/2008US7419857 Method for manufacturing field effect transistor having channel consisting of silicon fins and silicon body and transistor structure manufactured thereby
09/02/2008US7419856 Methods of fabricating integrated circuit devices having fuse structures including buffer layers
09/02/2008US7419855 Apparatus and method for miniature semiconductor packages
09/02/2008US7419854 Methods for packaging image sensitive electronic devices
09/02/2008US7419852 Low temperature methods of forming back side redistribution layers in association with through wafer interconnects, semiconductor devices including same, and assemblies
09/02/2008US7419851 Method of making a semiconductor chip assembly with a metal containment wall and a solder terminal
09/02/2008US7419850 Method to manufacture a coreless packaging substrate
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