Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
09/2008
09/02/2008US7419847 Method for forming metal interconnection of semiconductor device
09/02/2008US7419845 Methods of making electromechanical three-trace junction devices
09/02/2008US7419844 Real-time CMOS imager having stacked photodiodes fabricated on SOI wafer
09/02/2008US7419843 Method of manufacturing semiconductor probe having resistive tip
09/02/2008US7419842 Encapsulation of electroluminescent devices with shaped spacers
09/02/2008US7419841 Microelectronic imagers and methods of packaging microelectronic imagers
09/02/2008US7419840 Semiconductor device, method of manufacturing the same, cover for semiconductor device, and electronic equipment
09/02/2008US7419839 Bonding an optical element to a light emitting device
09/02/2008US7419838 Method for one-way coupling an input signal to an integrated circuit
09/02/2008US7419837 Method of manufacturing semiconductor device
09/02/2008US7419772 Impregnating silica with homopolymers, copolymers or block copolymers, then curing the polymers and selectively etching to form poromeric materials; integrated circuits; optics; membranes
09/02/2008US7419768 Methods of fabricating integrated circuitry
09/02/2008US7419767 Photomasks; suppresses optical proximity effect to improve resolution; photolithography; semiconductors
09/02/2008US7419763 Near-field exposure photoresist and fine pattern forming method using the same
09/02/2008US7419749 Halftone phase shift mask blank, halftone phase shift mask and their preparation
09/02/2008US7419701 Low-temperature, low-resistivity heavily doped p-type polysilicon deposition
09/02/2008US7419699 CVD process for forming a thin film
09/02/2008US7419698 Precursors for chemical vapor deposition
09/02/2008US7419613 Method and device for plasma-etching organic material film
09/02/2008US7419611 Layer interface adhesion is improved by including vinyl ether containing a silanetriol group; shelf life is improved by including an anthracene-9-methanol or a phenothiazine
09/02/2008US7419581 Method for producing optically transparent regions in a silicon substrate
09/02/2008US7419579 Hydrolysis and-polycondensation of sol-gel raw materials to form liquid containing particulate gels dispersed therein; forming ferroelectric film by migration electrodeposition
09/02/2008US7419567 Plasma processing apparatus and method
09/02/2008US7419566 Plasma reactor
09/02/2008US7419551 Plasma reactor with apparatus for dynamically adjusting the plasma source power applicator and the workpiece relative to one another
09/02/2008US7419550 Oxidizing method and oxidizing unit of object for object to be processed
09/02/2008US7419549 Nozzle assembly for applying a liquid to a substrate
09/02/2008US7419529 Reoxidization of reduced fine particles is suppressed; reduced fine particles (FeO fine particles) are formed by embedding metal oxide fine particles (Fe2O3 fine particles) fixed on a p type silicon semiconductor substrate into a silicon oxidized film, and carrying out a heat treatment in a reducing gas
09/02/2008US7419420 Substrate holding mechanism, substrate polishing apparatus and substrate polishing method
09/02/2008US7419387 Electric connection member utilizing ansiotropically conductive sheets
09/02/2008US7419346 Integrated system for tool front-end workpiece handling
09/02/2008US7419299 Methods of sensing temperature of an electronic device workpiece
09/02/2008US7418970 Substrate processing apparatus for drying substrate
09/02/2008CA2471987C Plasma surface processing apparatus
09/02/2008CA2359710C Epitaxial thin films
08/2008
08/28/2008WO2008103964A2 Using spectra to determine polishing endpoints
08/28/2008WO2008103898A1 Stitched ic chip layout methods, systems and program product
08/28/2008WO2008103874A1 High frequency switch with low loss, low harmonics and improved linearity performance
08/28/2008WO2008103794A2 Conductive pattern formation method
08/28/2008WO2008103791A1 Formation of a selective carbon-doped epitaxial cap layer on selective epitaxial sige
08/28/2008WO2008103714A2 Transfer mask in micro-ball mounter
08/28/2008WO2008103705A2 Methods of forming transistor contacts and via openings
08/28/2008WO2008103610A1 Specimen inspection stage implemented with processing stage coupling mechanism
08/28/2008WO2008103603A1 Systems and methods for compressing an encapsulant adjacent a semiconductor workpiece
08/28/2008WO2008103517A1 Multi-layer source/drain stressor
08/28/2008WO2008103456A2 Pulsed plasma system with pulsed sample bias for etching semiconductor structures
08/28/2008WO2008103454A2 Pulsed plasma system for etching semiconductor structures
08/28/2008WO2008103453A1 Pulsed plasma system with pulsed reaction gas replenish for etching semiconductor structures
08/28/2008WO2008103331A2 Wide-bandgap semiconductor devices
08/28/2008WO2008103328A1 Test head manipulator
08/28/2008WO2008103223A1 Method of low-k dielectric film repair
08/28/2008WO2008103198A1 Independently-double-gated transistor memory
08/28/2008WO2008103161A1 Ex-situ doped semiconductor transport layer
08/28/2008WO2008102995A1 Optical lithography device and manufacturing method for optical head thereof
08/28/2008WO2008102929A1 Continuous lithography apparatus and method using ultraviolet nanoimprinting
08/28/2008WO2008102890A1 Photosensitive resin composition, cured film, protective film, insulating film and semiconductor device using the same, and display device
08/28/2008WO2008102814A1 Semiconductor device performing signal transmission by using inductor coupling
08/28/2008WO2008102807A1 Etching method and apparatus, and subject to be processed
08/28/2008WO2008102806A1 METHOD FOR MANUFACTURING GaN SEMICONDUCTOR ELEMENT
08/28/2008WO2008102804A1 Injection molding die and injection molding method
08/28/2008WO2008102738A1 Vacuum processing apparatus and film forming method using vacuum processing apparatus
08/28/2008WO2008102689A1 Method of treating substrate and pre-wetting solvent for upper-film-forming material to be applied to surface of resist film
08/28/2008WO2008102679A1 Plasma processing equipment
08/28/2008WO2008102676A1 Electric compressor with integral inverter
08/28/2008WO2008102675A1 Electric compressor with integral inverter
08/28/2008WO2008102674A1 Electric compressor with integral inverter
08/28/2008WO2008102672A1 Polishing slurry, method for manufacturing the polishing slurry, nitride crystalline material and method for polishing surface of the nitride crystalline material
08/28/2008WO2008102651A1 Amorphous insulator film and thin-film transistor
08/28/2008WO2008102650A1 Semiconductor storage device
08/28/2008WO2008102622A1 Vacuum processing method and vacuum processing apparatus
08/28/2008WO2008102619A1 Organic thin film transistor and method for manufacturing organic thin film transistor
08/28/2008WO2008102616A1 Cleaning sheet, conveying member having cleaning function, and method for cleaning of substrate-processing apparatus
08/28/2008WO2008102603A1 Substrate processing apparatus and substrate processing method
08/28/2008WO2008102596A1 Method and apparatus for measuring temperature of semiconductor surface
08/28/2008WO2008102595A1 Semiconductor device and method for manufacturing the same
08/28/2008WO2008102592A1 Apparatus and method for mounting electronic component
08/28/2008WO2008102583A1 Semiconductor device
08/28/2008WO2008102581A1 Device for pressing electronic component and device for testing electronic component
08/28/2008WO2008102521A1 Final polishing process for silicon single crystal wafer and silicon single crystal wafer
08/28/2008WO2008102510A1 Substrate transfer apparatus
08/28/2008WO2008102499A1 Magnetic substance device, and magnetic random access memory
08/28/2008WO2008102498A1 Magnetic device and magnetic storage device
08/28/2008WO2008102484A1 Method and apparatus for evaluating film quality and thin film device manufacturing system
08/28/2008WO2008102451A1 Semiconductor device and process for producing the same
08/28/2008WO2008102448A1 Semiconductor device, and semiconductor device manufacturing method
08/28/2008WO2008102443A1 Semiconductor device and process for producing the same
08/28/2008WO2008102438A1 Semiconductor device and process for producing the same
08/28/2008WO2008102435A1 Electron gun, electron beam exposure apparatus and electron beam exposure method
08/28/2008WO2008102419A1 Method of forming light emitter and metal mold
08/28/2008WO2008102332A1 Optically monitoring an alox (tm) fabrication process
08/28/2008WO2008102281A1 Sensor package
08/28/2008WO2008102259A2 Antireflective coating composition based on a silicon polymer
08/28/2008WO2008102258A2 Substrate preparation for enhanced thin film fabrication from group iv semiconductor nanoparticles
08/28/2008WO2008102256A1 Silicone coating composition
08/28/2008WO2008102179A1 Semiconductor growth control method and apparatus
08/28/2008WO2008101931A2 Low-temperature formation of layers of polycrystalline semiconductor material
08/28/2008WO2008101877A1 Selective growth of polycrystalline silicon-containing semiconductor material on a silicon-containing semiconductor surface
08/28/2008WO2008101813A1 Method for preparing a germanium layer from an silicon-germanium on-insulator substrate
08/28/2008WO2008101738A1 Semiconductor arrangement with trench capacitor and method for production thereof
08/28/2008WO2008101714A2 High throughput sem tool
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