Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/2010
03/02/2010US7670907 Isolation regions for semiconductor devices and their formation
03/02/2010US7670906 Flash memory device
03/02/2010US7670904 Nonvolatile memory device and method for fabricating the same
03/02/2010US7670903 Method for fabricating a cylindrical capacitor using amorphous carbon-based layer
03/02/2010US7670902 Method and structure for landing polysilicon contact
03/02/2010US7670901 Method of fabricating a bottle trench and a bottle trench capacitor
03/02/2010US7670900 Method and structure for fabricating capacitor devices for integrated circuits
03/02/2010US7670899 Capacitor of semiconductor device and method of manufacturing the same
03/02/2010US7670898 Methods of forming semiconductor constructions
03/02/2010US7670897 Semiconductor device and method for fabricating the same
03/02/2010US7670896 Method and structure for reducing floating body effects in MOSFET devices
03/02/2010US7670895 Process of forming an electronic device including a semiconductor layer and another layer adjacent to an opening within the semiconductor layer
03/02/2010US7670894 Selective high-k dielectric film deposition for semiconductor device
03/02/2010US7670893 Membrane IC fabrication
03/02/2010US7670892 Nitrogen based implants for defect reduction in strained silicon
03/02/2010US7670891 Method of manufacturing semiconductor device
03/02/2010US7670890 Silicide block isolated junction field effect transistor source, drain and gate
03/02/2010US7670889 Structure and method for fabrication JFET in CMOS
03/02/2010US7670888 Low noise JFET
03/02/2010US7670887 Field-effect transistors with weakly coupled layered inorganic semiconductors
03/02/2010US7670886 Method for fabricating polysilicon film
03/02/2010US7670885 Thin-film semiconductor device and method for manufacturing the same
03/02/2010US7670884 Manufacturing method of substrate having conductive layer and manufacturing method of semiconductor device
03/02/2010US7670883 Method for manufacturing pixel structure
03/02/2010US7670882 Electronic device fabrication
03/02/2010US7670881 Method of manufacturing a semiconductor device
03/02/2010US7670880 Method and structure for forming an integrated spatial light modulator
03/02/2010US7670879 Manufacturing method of semiconductor module including solid-liquid diffusion joining steps
03/02/2010US7670878 Method for manufacturing semiconductor package
03/02/2010US7670877 Reliability enhancement process
03/02/2010US7670876 Integrated circuit device with embedded passive component by flip-chip connection and method for manufacturing the same
03/02/2010US7670875 Method of manufacturing a single chip semiconductor integrated circuit device including a mask ROM in a short time
03/02/2010US7670874 Plated pillar package formation
03/02/2010US7670873 Method of flip-chip mounting
03/02/2010US7670872 Method of manufacturing ceramic LED packages
03/02/2010US7670871 Method of fabricating a phase-change memory
03/02/2010US7670869 Semiconductor device and fabrications thereof
03/02/2010US7670868 Complementary metal oxide silicon image sensor and method of fabricating the same
03/02/2010US7670867 Method for manufacturing CMOS image sensor having microlens therein with high photosensitivity
03/02/2010US7670866 Multi-die molded substrate integrated circuit device
03/02/2010US7670865 Image sensor pixel having photodiode with multi-dopant implantation
03/02/2010US7670863 Method of fabricating complementary metal oxide silicon image sensor
03/02/2010US7670862 Silicon optoelectronic device, manufacturing method thereof, and image input and/or output apparatus using the same
03/02/2010US7670861 Controlling stress in MEMS structures
03/02/2010US7670860 Method of manufacturing semiconductor device and semiconductor device
03/02/2010US7670859 Semiconductor device and method for manufacturing the same
03/02/2010US7670856 attaching a metal to the penetrating pit or the penetrating crack of a free-standing substrate of a nitride semiconductor, the metal being adapted to be nitrided, and nitriding the metal to form a nitride that seals the penetrating pit or the penetrating crack
03/02/2010US7670761 Method of forming a fine pattern of a semiconductor device using a resist reflow measurement key
03/02/2010US7670759 Micro pattern forming method and semiconductor device manufacturing method
03/02/2010US7670756 Pattern forming method, semiconductor device manufacturing method and exposure mask set
03/02/2010US7670755 Writing pattern; data processing; etching masking film; removal segments of photoresists; generating method comprising correcting a first pattern data in accordance with a difference between first film pattern and second mask pattern and difference between first resist pattern and first mask pattern
03/02/2010US7670754 Exposure apparatus having a processing chamber, a vacuum chamber and first and second load lock chambers
03/02/2010US7670747 Pattern transfer method
03/02/2010US7670731 Method for exposing a substrate and lithographic projection apparatus
03/02/2010US7670729 Measurement method and apparatus, exposure apparatus, and device fabrication method
03/02/2010US7670728 Form phase shift layer pattern of a molybdenum silicon nitride layer; form light shielding layer pattern of a chromium layer; expose defective pattern; remove defect by dry etch; us etching gas having selectively between the resist layer and light shielding layer
03/02/2010US7670725 Optical masks and methods for measuring aberration of a beam
03/02/2010US7670581 Light-emitting nanoparticles and methods of making same
03/02/2010US7670496 Process for producing structural body and etchant for silicon oxide film
03/02/2010US7670473 integrated circuits; semiconductors
03/02/2010US7670469 Methods and apparatus for making integrated-circuit wiring from copper, silver, gold, and other metals
03/02/2010US7670466 Methods and apparatuses for electrochemical-mechanical polishing
03/02/2010US7670465 Anolyte for copper plating
03/02/2010US7670454 Plasma processing apparatus
03/02/2010US7670453 Device for treating a container with microwave plasma
03/02/2010US7670437 Mask and substrate alignment for solder bump process
03/02/2010US7670436 Support ring assembly
03/02/2010US7670435 Apparatus for epitaxially growing semiconductor device structures with sharp layer interfaces utilizing HVPE
03/02/2010US7670434 Vapor phase growth apparatus
03/02/2010US7670432 Exhaust system for a vacuum processing system
03/02/2010US7670209 Pad conditioner, pad conditioning method, and polishing apparatus
03/02/2010US7670206 Substrate polishing apparatus and substrate polishing method
03/02/2010US7670095 Wafer processing apparatus having dust proof function
03/02/2010US7669780 Fluid supply nozzle, substrate processing apparatus and substrate processing method
03/02/2010US7669717 Substrate storage container and positioning method of the same
03/02/2010US7669608 Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle
02/2010
02/25/2010WO2010022309A2 Vertical substrate buffering system
02/25/2010WO2010022215A2 Process gas delivery for semiconductor process chamber
02/25/2010WO2010022214A1 Selective etch of laser scribed solar cell substrate
02/25/2010WO2010022212A2 Surface treated aluminum nitride baffle
02/25/2010WO2010022163A1 3d integrated circuit device fabrication
02/25/2010WO2010022065A2 Memory devices and methods of forming the same
02/25/2010WO2010022064A1 Defect-free group iii - nitride nanostructures and devices using pulsed and non-pulsed growth techniques
02/25/2010WO2010022036A2 Method for forming self-aligned phase-change semiconductor diode memory
02/25/2010WO2010022030A2 Phosphorous-comprising dopants and methods for forming phosphorous-doped regions in semiconductor substrates using phosphorous-comprising dopants
02/25/2010WO2010022009A2 Process for through silicon via filling
02/25/2010WO2010021938A2 Showerhead and shadow frame
02/25/2010WO2010021890A2 Edge rings for electrostatic chucks
02/25/2010WO2010021785A1 Transistor with gain variation compensation
02/25/2010WO2010021776A1 Thin foil semiconductor package
02/25/2010WO2010021685A1 Microelectronic substrate having metal posts joined thereto using bond layer
02/25/2010WO2010021683A1 Method for fabricating a semiconductor device with self-aligned stressor and extension regions
02/25/2010WO2010021623A1 Epitaxial growth of silicon for layer transfer
02/25/2010WO2010021547A1 Conveyor assembly and method for conveying a substrate carrier
02/25/2010WO2010021508A2 Method for cleaning components of semiconductor equipment and apparatus for cleaning components of semiconductor equipment using the same
02/25/2010WO2010021427A1 Apparatus and method of correcting planarity between probe card and chuck plate
02/25/2010WO2010021410A1 Stacked memory chip, semiconductor integrated circuit device using same, and manufacturing method therefor
02/25/2010WO2010021405A1 Ultrasonic cleaning apparatus
02/25/2010WO2010021382A1 Microwave introduction mechanism, microwave plasma source and microwave plasma processing device
02/25/2010WO2010021317A1 Method for determining service limit of electrostatic chuck
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