Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/2010
03/09/2010US7674636 Dynamic temperature backside gas control for improved within-substrate process uniformity
03/09/2010US7674635 Method of manufacturing a semiconductor device
03/09/2010US7674634 Method of producing semiconductor device
03/09/2010US7674573 Method for manufacturing layered periodic structures
03/09/2010US7674570 Irradiating the sample of the pattern in an electrically conductive state with an electron beam to detect a secondary electron, a reflected electron and a backscattered electron generated from the surface of the sample; acquiring an image of the sample surface and inspecting the mask pattern image
03/09/2010US7674563 Pattern forming method and phase shift mask manufacturing method
03/09/2010US7674561 Mask blanks and method of producing the same
03/09/2010US7674494 Printing device and method of manufacturing a light emitting device
03/09/2010US7674446 Hafnium silicide target for forming gate oxide film, and method for preparation thereof
03/09/2010US7674394 Plasma process for inductively coupling power through a gas distribution plate while adjusting plasma distribution
03/09/2010US7674393 Etching method and apparatus
03/09/2010US7674390 Zeolite—sol gel nano-composite low k dielectric
03/09/2010US7674389 providing nanodevice and an assist gas, contacting nanodevice with low energy focused electron beam in presence of assist gas and applying force to at least a part of nanodevice during application of low-energy focused electron beam, whereby nanodevice is transformed into a shape-modified nanodevice
03/09/2010US7674353 Apparatus to confine plasma and to enhance flow conductance
03/09/2010US7674352 System and method for depositing a gaseous mixture onto a substrate surface using a showerhead apparatus
03/09/2010US7674351 Plasma processing apparatus
03/09/2010US7674350 Feature dimension control in a manufacturing process
03/09/2010US7674336 Processing apparatus
03/09/2010US7674335 Method of producing high quality relaxed silicon germanium layers
03/09/2010US7674104 Mold and molding apparatus using the same
03/09/2010US7674083 Clean device with clean box-opening/closing device
03/09/2010US7674038 Arrangement for temperature monitoring and regulation
03/09/2010US7673856 Vaporizer and various devices using the same and an associated vaporizing method
03/09/2010US7673583 Locally-efficient inductive plasma coupling for plasma processing system
03/09/2010US7673387 Manufacture of a layer including a component
03/09/2010US7673385 Laminated structure method
03/09/2010US7673382 External electrode forming method
03/04/2010WO2010025357A2 Method for reducing tungsten roughness and improving reflectivity
03/04/2010WO2010025334A2 Localized substrate geometry characterization
03/04/2010WO2010025260A1 Salicide structures for heat-influenced semiconductor applications
03/04/2010WO2010025253A2 Load lock chamber for large area substrate processing system
03/04/2010WO2010025231A2 Methods, apparatus and articles of manufacture for testing a plurality of singulated die
03/04/2010WO2010025228A2 Method and apparatus for extended temperature pyrometry
03/04/2010WO2010025218A2 Composite semiconductor substrates for thin-film device layer transfer
03/04/2010WO2010025125A1 Single-sided textured sheet wafer and manufactoring method therefore
03/04/2010WO2010025124A1 Methods of fabricating complex two-dimensional conductive silicides
03/04/2010WO2010025104A2 Process kit shields and methods of use thereof
03/04/2010WO2010025099A2 High density helicon plasma source for wide ribbon ion beam generation
03/04/2010WO2010025083A1 Bulk silicon wafer product useful in the manufacture of three dimensional multigate mosfets
03/04/2010WO2010025081A2 Slit valve control
03/04/2010WO2010025068A2 Cobalt deposition on barrier surfaces
03/04/2010WO2010025061A2 Method for design and manufacture of a reticle using a two-dimensional dosage map and charged particle beam lithography
03/04/2010WO2010025060A2 Method for design and manufacture of a reticle using variable shaped beam lithography
03/04/2010WO2010025047A2 Layered body and method for manufacturing thin substrate using the layered body
03/04/2010WO2010025032A2 Method for optical proximity correction, design and manufacturing of a reticle using variable shaped beam lithography
03/04/2010WO2010025031A2 Method for optical proximity correction, design and manufacturing of a reticle using character projection lithography
03/04/2010WO2010025024A1 Semiconductor device with isolation trench liner, and related fabrication methods
03/04/2010WO2010025005A2 Bulk image modeling for optical proximity correction
03/04/2010WO2010025003A2 Structured abrasive article, method of making the same, and use in wafer planarization
03/04/2010WO2010024988A2 Methods of forming a photoresist-comprising pattern on a substrate
03/04/2010WO2010024987A1 Methods of fabricating semiconductor structures or devices using layers of semiconductor material having selected or controlled lattice parameters
03/04/2010WO2010024943A2 Wafer carrier with varying thermal resistance
03/04/2010WO2010024932A2 Enhanced wire bond stability on reactive metal surfaces of a semiconductor device by encapsulation of the bond structure
03/04/2010WO2010024888A2 Non-contact manipulating devices and methods
03/04/2010WO2010024799A1 Cmos pixel sensor with depleted photocollectors and a depleted common node
03/04/2010WO2010024681A1 Pick- and-place machine
03/04/2010WO2010024678A1 Chip die clamping device and transfer method
03/04/2010WO2010024674A1 Solder interconnection
03/04/2010WO2010024595A2 Shallow trench isolating structure having an air gap, a cmos image sensor employing the same, and a production method therefor
03/04/2010WO2010024555A2 Apparatus and method for manufacturing polycrystalline silicone thin film
03/04/2010WO2010024512A1 Substrate-processing apparatus and method of transferring substrate in the same
03/04/2010WO2010024511A1 Method of adjusting velocity of transfer member, method of transferring substrate using the method, and substrate-processing apparatus
03/04/2010WO2010024500A1 New compound semiconductor and producing method thereof, and solar cell and thermoelectric conversion element using the same
03/04/2010WO2010024489A1 Leakage detecting method of process chamber
03/04/2010WO2010024488A1 Chemical liquid feeding device
03/04/2010WO2010024433A1 Semiconductor device and manufacturing method thereof
03/04/2010WO2010024411A1 Method for forming compound epitaxial layer, compound epitaxial layer, semiconductor laminate structure, and semiconductor light emitting device
03/04/2010WO2010024404A1 Abrasive composition and method for manufacturing semiconductor integrated circuit device
03/04/2010WO2010024378A1 Process for producing silicon oxide thin film or silicon oxynitride compound thin film and thin film obtained by the process
03/04/2010WO2010024375A1 Semiconductor light emitting element and semiconductor light emitting device
03/04/2010WO2010024354A1 Electrostatic chuck and method for producing same
03/04/2010WO2010024353A1 Corrosion-resistant member and method for manufacture thereof
03/04/2010WO2010024334A1 Plasma processing apparatus, plasma processing method, method for cleaning plasma processing apparatus and pressure control valve for plasma processing apparatus
03/04/2010WO2010024324A1 Semiconductor inspection device and inspection method
03/04/2010WO2010024295A1 Photosensitive adhesive composition, photosensitive film adhesive, adhesive pattern, semiconductor wafer with adhesive, semiconductor device and electronic component
03/04/2010WO2010024285A1 Method for manufacturing nitride substrate, and nitride substrate
03/04/2010WO2010024279A1 Method and device for manufacturing field-effect transistor
03/04/2010WO2010024278A1 Method for manufacturing thin film transistor and thin film transistor
03/04/2010WO2010024243A1 Bipolar semiconductor device and method for manufacturing same
03/04/2010WO2010024240A1 Bipolar silicon carbide semiconductor device and method for manufacturing same
03/04/2010WO2010024239A1 Junction semiconductor device and method for manufacturing same
03/04/2010WO2010024238A1 Resin composition, gate insulating layer and organic thin film transistor
03/04/2010WO2010024237A1 Junction semiconductor device and method for manufacturing same
03/04/2010WO2010024236A1 Double-faced adhesive film and electronic component module using same
03/04/2010WO2010024230A1 METHOD FOR MANUFACTURING AlGaAs SUPPORT SUBSTRATE, METHOD FOR MANUFACTURING EPITAXIAL WAFER, METHOD FOR MANUFACTURING LED, AlGaAs SUPPORT SUBSTRATE, EPITAXIAL WAFER, AND LED
03/04/2010WO2010024201A1 Magnetoresistive element having multi-layered ferry structure, magnetic memory, and magnetic random access memory
03/04/2010WO2010024174A1 Adhesive tape or sheet
03/04/2010WO2010024146A1 Electrostatic chuck and vacuum processing apparatus
03/04/2010WO2010024128A1 Plasma surface processing method and plasma surface processing apparatus
03/04/2010WO2010024121A1 Process for production of dicing/die bondind film
03/04/2010WO2010024117A1 Microfine structure and process for producing same
03/04/2010WO2010024106A1 Illumination optical system, aligner, and process for fabricating device
03/04/2010WO2010024093A1 Solution for removal of residue after semiconductor dry processing and residue removal method using same
03/04/2010WO2010024087A1 Photosensitive adhesive composition, and film adhesive, adhesive sheet, adhesive pattern, semiconductor wafer with adhesive layer and semiconductor device using the photosensitive adhesive composition
03/04/2010WO2010024075A1 Computer generated hologram, exposure apparatus and device fabrication method
03/04/2010WO2010024067A1 Defect inspection method, and defect inspection device
03/04/2010WO2010024066A1 Sheet peeling apparatus and sheet peeling method
03/04/2010WO2010024064A1 Defect check method and device thereof
03/04/2010WO2010024062A1 Method for cleaning substrate and substrate cleaning apparatus
03/04/2010WO2010024037A1 Method for forming amorphous carbon nitride film, amorphous carbon nitride film, multilayer resist film, method for manufacturing semiconductor device, and storage medium in which control program is stored
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