Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/2010
03/04/2010US20100052114 Cyclic siloxane compound, a material for forming si-containing film, and its use
03/04/2010US20100052113 Epitaxial film, piezoelectric element, ferroelectric element, manufacturing methods of the same, and liquid discharge head
03/04/2010US20100052112 Printable, Flexible and Stretchable Diamond for Thermal Management
03/04/2010US20100052110 Semiconductor device comprising a carbon-based material for through hole vias
03/04/2010US20100052108 Vertical through-silicon via for a semiconductor structure
03/04/2010US20100052107 Vias and method of making
03/04/2010US20100052106 Package device having crack arrest feature and method of forming
03/04/2010US20100052105 Free-standing thickness of single crystal material and method having carrier lifetimes
03/04/2010US20100052104 Method for fabricating a locally passivated germanium-on-insulator substrate
03/04/2010US20100052103 Silicon wafer and method for producing the same
03/04/2010US20100052101 Semiconductor device and manufacturing method thereof
03/04/2010US20100052100 Deep trench electrostatic discharge (esd) protect diode for silicon-on-insulator (soi) devices
03/04/2010US20100052099 Capacitor device and method for manufacturing the same
03/04/2010US20100052098 Semiconductor device having storage electrode and manufacturing method thereof
03/04/2010US20100052097 Capacitor of semiconductor device and method for forming the same
03/04/2010US20100052095 Inductor for semiconductor device and method of fabricating the same
03/04/2010US20100052094 Semiconductor device with isolation trench liner, and related fabrication methods
03/04/2010US20100052093 Semiconductor substrate and method of manufacturing the same
03/04/2010US20100052092 Method for fabricating a semiconductor on insulator substrate with reduced secco defect density
03/04/2010US20100052090 Semiconductor device and method of manufacturing the same
03/04/2010US20100052088 High sensitivity photodetectors, imaging arrays, and high efficiency photovoltaic devices produced using ion implantation and femtosecond laser irradiation
03/04/2010US20100052087 Image Sensor
03/04/2010US20100052086 Electronic device packages and methods of fabricating electronic device packages
03/04/2010US20100052082 Micro-electro-mechanical systems (mems) package and method for forming the mems package
03/04/2010US20100052081 A sealing structure and method of manufacturing the same
03/04/2010US20100052080 Biosensor chip and a method of manufacturing the same
03/04/2010US20100052079 Semiconductor devices and fabrication process thereof
03/04/2010US20100052078 Multi-Layer Gate Dielectric
03/04/2010US20100052077 High-k metal gate structure including buffer layer
03/04/2010US20100052076 Method of fabricating high-k poly gate device
03/04/2010US20100052075 Integrating a first contact structure in a gate last process
03/04/2010US20100052074 Metal gate transistor and method for fabricating the same
03/04/2010US20100052072 Dual gate structure on a same chip for high-k metal gate technology
03/04/2010US20100052071 Engineered oxygen profile in metal gate electrode and nitrided high-k gate dielectrics structure for high performance pmos devices
03/04/2010US20100052070 novel device scheme of hkmg gate-last process
03/04/2010US20100052069 Static ram cell design and multi-contact regime for connecting double channel transistors
03/04/2010US20100052068 Drive current adjustment for transistors formed in the same active region by locally providing embedded strain-inducing semiconductor material in the active region
03/04/2010US20100052067 Method of fabricating dual high-k metal gates for mos devices
03/04/2010US20100052066 structure and method for a cmos device with doped conducting metal oxide as the gate electrode
03/04/2010US20100052064 Method for straining a semiconductor wafer and a wafer substrate unit used therein
03/04/2010US20100052063 Method to improve dielectric quality in high-k metal gate technology
03/04/2010US20100052062 Semiconductor device, and manufacturing method thereof
03/04/2010US20100052061 Semiconductor device and semiconductor device manufacturing method
03/04/2010US20100052060 Dummy gate structure for gate last process
03/04/2010US20100052059 Finfet process compatible native transistor
03/04/2010US20100052058 Downsize polysilicon height for polysilicon resistor integration of replacement gate process
03/04/2010US20100052057 High voltage device with reduced leakage
03/04/2010US20100052054 Method of manufacturing semiconductor device
03/04/2010US20100052053 Soi body contact using e-dram technology
03/04/2010US20100052048 Semiconductor device and method of manufacturing the same
03/04/2010US20100052047 Semiconductor device and method for the production of a semiconductor device
03/04/2010US20100052045 Semiconductor device and manufacturing method of the same
03/04/2010US20100052042 Semiconductor memory device and manufacturing method thereof
03/04/2010US20100052040 Method for forming silicon nitride film, method for manufacturing nonvolatile semiconductor memory device, nonvolatile semiconductor memory device and plasma apparatus
03/04/2010US20100052039 Semiconductor device and method for manufacturing the same
03/04/2010US20100052038 Semiconductor device and method for manufacturing thereof
03/04/2010US20100052036 Memory device and manufacturing method thereof, and semiconductor device
03/04/2010US20100052034 Flash memory gate structure for widened lithography window
03/04/2010US20100052032 Nonvolatile semiconductor memory and method for fabricating the same
03/04/2010US20100052031 Memory device and method for fabricating the same
03/04/2010US20100052030 Nonvolatile semiconductor memory and manufacturing method thereof
03/04/2010US20100052026 Deep trench capacitor for soi cmos devices for soft error immunity
03/04/2010US20100052024 Capacitor insulating film, method of forming the same, capacitor and semiconductor device using the capacitor insulating film
03/04/2010US20100052023 Semiconductor device having a ferroelectric capacitor and method of manufacturing the same
03/04/2010US20100052022 Nonvolatile memory and manufacturing method thereof
03/04/2010US20100052019 Semiconductor device and method for fabricating the same
03/04/2010US20100052018 Continuous metal semiconductor alloy via for interconnects
03/04/2010US20100052017 Semiconductor memory device and manufacturing method thereof
03/04/2010US20100052016 Semiconductor structure and method of manufacture of same
03/04/2010US20100052014 Semiconductor device and fabrication method for the same
03/04/2010US20100052008 Enhancement of optical polarization of nitride light-emitting diodes by wafer off-axis cut
03/04/2010US20100052007 Light-emitting device, manufacturing method thereof, and lamp
03/04/2010US20100051993 Light emitting apparatus and manufacturing method thereof
03/04/2010US20100051992 Organic electroluminescence element and manufacturing method thereof
03/04/2010US20100051991 Organic el device and process of producing the same
03/04/2010US20100051988 Light emitting device and method for manufacturing the same
03/04/2010US20100051987 Semiconductor light-emitting device and method for manufacturing same
03/04/2010US20100051986 Light-emitting diodes using nano-rods and methods of manufacturing a light-emitting diode
03/04/2010US20100051980 Method for manufacturing group iii nitride compound semiconductor light-emitting device, group iii nitride compound semiconductor light-emitting device, and lamp
03/04/2010US20100051971 High efficiency light emitting articles and methods of forming the same
03/04/2010US20100051970 Planarized led with optical extractor
03/04/2010US20100051967 Absorbing film
03/04/2010US20100051964 Method for preparing a semiconductor ultrananocrystalline diamond film and a semiconductor ultrananocrystalline diamond film prepared therefrom
03/04/2010US20100051963 Power transistor
03/04/2010US20100051962 Compound semiconductor device and the fabricating method of the same
03/04/2010US20100051960 Device and process of forming device with pre-patterned trench and graphene-based device structure formed therein
03/04/2010US20100051958 Display device and manufacturing method thereof
03/04/2010US20100051956 Thin film transistor array panel and method for manufacturing the same
03/04/2010US20100051952 Thin film transistor substrate and method of manufacturing the same
03/04/2010US20100051951 Thin film transistor array panel and manufacturing method of the same
03/04/2010US20100051950 Thin film transistor array substrate and method of fabricating thereof
03/04/2010US20100051949 Semiconductor device and method for manufacturing the same
03/04/2010US20100051946 Poly-emitter type bipolar junction transistor, bipolar cmos dmos device, and manufacturing methods of poly-emitter type bipolar junction transistor and bipolar cmos dmos device
03/04/2010US20100051945 Silicon wafer and method for producing the same
03/04/2010US20100051944 Silicon processing method and silicon substrate with etching mask
03/04/2010US20100051943 Method for forming pattern, thin film transistor, display device, method for manufacturing thereof, and television apparatus
03/04/2010US20100051940 Semiconductor device and method for manufacturing the semiconductor device
03/04/2010US20100051939 Nitride based semiconductor device and method of manufacturing the same
03/04/2010US20100051938 Amorphous oxide semiconductor and thin film transistor using the same
03/04/2010US20100051936 Bottom gate type thin film transistor, method of manufacturing the same, and display apparatus
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