Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/2010
12/22/2010CN101924032A 掩蔽方法 Masking methods
12/22/2010CN101924031A System and method for treating substrate by using nano vaporific chemical agent
12/22/2010CN101924030A Method for improving performance of high-k gate dielectric on high-resistance SOI substrate
12/22/2010CN101924029A Process for remanufacturing photoresist layer in process of manufacturing double grid oxide layer
12/22/2010CN101924028A Oriented and ordered arrangement method of silicon carbide nanowires based on dielectrophoresis technology
12/22/2010CN101924027A Metal gate transistor, integrated circuits, systems, and fabrication methods thereof
12/22/2010CN101924026A Method for reducing interfacial layer thickness
12/22/2010CN101924025A Floating gate manufacturing method
12/22/2010CN101924024A Etching method of polysilicongate and making method of semiconductor device
12/22/2010CN101924023A Vapor phase epitaxy apparatus of group III nitride semiconductor
12/22/2010CN101924022A Method for growing GaN and InGaN by adopting InxGa1-xN buffer layer
12/22/2010CN101924021A Semiconductor device, as well as manufacture method and luminescent device thereof
12/22/2010CN101924020A Semiconductor devices and methods of making thereof
12/22/2010CN101924019A Preparation method of metal capacitor in semiconductor device
12/22/2010CN101924018A Method for improving corner at top of groove into rounded corner
12/22/2010CN101924017A Substrate heating unit and substrate treating apparatus including the same
12/22/2010CN101924016A Heating method, device and substrate processing equipment
12/22/2010CN101924015A Gas input device and semiconductor processing device
12/22/2010CN101924014A Air suction device and technological chamber
12/22/2010CN101924013A Method for increasing photo-etching alignment precision after extension
12/22/2010CN101924012A Method for removing organic matter and moisture on surface of wafer
12/22/2010CN101924011A Etching device and method
12/22/2010CN101924006A Shield usable in a sputtering plasma reactor
12/22/2010CN101924002A Heating device and plasma treatment equipment using same
12/22/2010CN101923296A Making method of photoetching fiducial mark in process of making NVM (Non-Volatile Memory) device
12/22/2010CN101923294A Composition for cleaning microelectronic substrates containing halogen oxygen acids, salts and derivatives thereof
12/22/2010CN101923235A Display panel and manufacturing method thereof
12/22/2010CN101923065A Field effect transistor chiral sensor and manufacture method thereof
12/22/2010CN101922611A Gas delivery device and dry etching device
12/22/2010CN101922045A GaN single-crystal mass and method of its manufacture, and semiconductor device and method of its manufacture
12/22/2010CN101922034A Apparatus and method for plating a substrate
12/22/2010CN101921554A Guide bar viscose locating adhesive tape
12/22/2010CN101921488A Silicone resin composite for die bonding
12/22/2010CN101921165A Stabilization of bicyclo-heptadiene
12/22/2010CN101920477A Methods for producing and processing semiconductor wafers
12/22/2010CN101920476A Chemical mechanical polishing equipment and conveying method of grinding fluid thereof
12/22/2010CN101601123B Method of bonding two substrates
12/22/2010CN101599459B Fabricating method of semiconductor device
12/22/2010CN101593728B Complementary metal oxide semiconductor (CMOS) device with stress membrane and manufacturing method thereof
12/22/2010CN101593702B Manufacturing method of stress metal oxide semiconductor device
12/22/2010CN101593689B Photoetch pattern formation method and double mosaic structure manufacture method
12/22/2010CN101587856B Method for solving enclosure and facet problems in etching technology
12/22/2010CN101587855B Method for manufacturing via hole and metal valley
12/22/2010CN101572249B Method for forming dopant well and method for forming image sensor
12/22/2010CN101568993B Film forming apparatus and method of forming film
12/22/2010CN101567329B Method for producing STI lining oxide layer
12/22/2010CN101567315B Method for producing metallic channel
12/22/2010CN101546769B Integrated circuit and electrostatic charge protection method thereof
12/22/2010CN101546763B Embedded memory device and procedure method thereof
12/22/2010CN101521202B Controlled edge resistivity in a silicon wafer
12/22/2010CN101521148B Substrate processing apparatus
12/22/2010CN101517768B Magnetoresistive element manufacturing method, and multi-chamber apparatus for manufacturing the magnetoresistive element
12/22/2010CN101517715B Method for manufacturing semiconductor epitaxial crystal substrate
12/22/2010CN101503650B Silicon chip cleaning liquid and cleaning method thereof
12/22/2010CN101501825B Method for removing nanoclusters from selected regions
12/22/2010CN101498610B Diaphragm apparatus production method, diaphragm apparatus and diaphragm type pressure meter
12/22/2010CN101494172B Semiconductor device and method for manufacturing the same
12/22/2010CN101490818B Semiconductor device manufacturing method, semiconductor device manufacturing apparatus
12/22/2010CN101484975B Automatically replaceable apparatus for collecting byproducts and the controlling method thereof in equipment producing semiconductor
12/22/2010CN101479840B Wafer platform
12/22/2010CN101477969B Method of manufacturing a thin film transistor substrate and stripping composition
12/22/2010CN101473414B Substrate processing apparatus, display method, recording medium, and program
12/22/2010CN101471305B Method of forming isolation layer of semiconductor
12/22/2010CN101465382B Mesa semiconductor device and method of manufacturing the same
12/22/2010CN101459113B Shallow groove isolation region forming method
12/22/2010CN101459096B Method for wafer back flattening and method for enhancing wire width consistency of photo-etching process
12/22/2010CN101459071B Method for removing silicon oxide layer on surface of silicon substrate and contact hole forming
12/22/2010CN101459055B Method of manufacturing semiconductor device
12/22/2010CN101447510B Semiconductor device and forming method thereof
12/22/2010CN101442058B Thin-film transistor array substrate and patching method thereof
12/22/2010CN101431061B Mounted structural body and method of manufacturing the same
12/22/2010CN101430566B Method for controlling etching deviation
12/22/2010CN101425659B Semiconductor laser and manufacturing method thereof
12/22/2010CN101425539B High-mobility trench mosfets
12/22/2010CN101425534B Transistor and method of fabricating the same
12/22/2010CN101425462B Method for fabricating semiconductor device
12/22/2010CN101423907B Sn-Ge-As alloy as well as preparation method and use thereof
12/22/2010CN101404242B Method and apparatus for cleaning a substrate
12/22/2010CN101401494B Bump forming method and bump forming apparatus
12/22/2010CN101399194B Method for fabricating recess gate and recess channel in semiconductor device
12/22/2010CN101395709B Packaging method of chip or package equipped with bumps
12/22/2010CN101395702B Methods and apparatus for selective pre-coating of a plasma processing chamber
12/22/2010CN101393935B Thin film transistor, liquid crystal display apparatus
12/22/2010CN101385130B Semiconductor device and manufacturing method thereof
12/22/2010CN101379591B Semiconductor device and method of manufacturing thereof
12/22/2010CN101378073B Insulated gate bipolar transistor and method for manufacturing the same
12/22/2010CN101375380B Tunneling transistor with barrier
12/22/2010CN101371331B Magnetic annealing tool heat exchange system and processes
12/22/2010CN101364545B Germanium-silicon and polycrystalline silicon grating construction of strain silicon transistor
12/22/2010CN101345188B Plate, apparatus for adjusting temperature of substrate having the plate and apparatus for processing substrate having the plate
12/22/2010CN101330019B Method for etching through-hole and method for removing passivation layer within the through-hole
12/22/2010CN101325173B Method for fabricating semiconductor device
12/22/2010CN101324721B Semi-penetrate inverse LCD device of multi-field vertical arrangement
12/22/2010CN101322229B Semiconductor soi device
12/22/2010CN101320744B Solid-state imaging device and manufacturing method thereof
12/22/2010CN101320684B Method of manufacturing semiconductor substrate
12/22/2010CN101315501B Method for improving medium layer defect between micro-reflection mirrors and producing silicon based LCD
12/22/2010CN101308786B Ion injection method of semiconductor device
12/22/2010CN101278375B Substrate processing method, photomask manufacturing method, photomask, and device manufacturing method
12/22/2010CN101271835B Method of manufacturing a semiconductor device and a semiconductor manufacturing equipment
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