Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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12/15/2010 | CN101916769A Antistatic gallium nitride based luminescent device and manufacturing method thereof |
12/15/2010 | CN101916768A Efficient antistatic gallium nitride-based light-emitting device and manufacturing method thereof |
12/15/2010 | CN101916764A Film-like article and method for manufacturing the same |
12/15/2010 | CN101916763A Manufacturing method of semiconductor device |
12/15/2010 | CN101916761A Conductive layer under SOI oxygen buried layer and manufacturing process thereof |
12/15/2010 | CN101916759A Semiconductor device and method of manufacturing the same |
12/15/2010 | CN101916758A Storage device, electronic device and preparing method thereof |
12/15/2010 | CN101916754A Through-hole, through-hole forming method and through-hole filling method |
12/15/2010 | CN101916752A 多层印刷线路板 Multilayer printed circuit boards |
12/15/2010 | CN101916751A Packaging structure and manufacture method thereof |
12/15/2010 | CN101916750A Substrate for mounting device, method for manufacturing the same, semiconductor module, and portable apparatus |
12/15/2010 | CN101916749A Method and apparatus for fabricating a plurality of semiconductor devices |
12/15/2010 | CN101916748A Manufacture method of semiconductor device |
12/15/2010 | CN101916746A Submount and method for manufacturing same |
12/15/2010 | CN101916744A Method for reducing surface electric field in transistor |
12/15/2010 | CN101916743A Method for manufacturing TFT substrate for current control |
12/15/2010 | CN101916742A Active array substrate, liquid crystal display panel and manufacturing method thereof |
12/15/2010 | CN101916741A Method for preparing strained silicon-on-insulator |
12/15/2010 | CN101916740A In-situ dry clean chamber for front end of line fabrication |
12/15/2010 | CN101916739A Wafer carrying device |
12/15/2010 | CN101916738A Electrostatic suction cup structure for easily releasing wafer and method |
12/15/2010 | CN101916737A Substrate supporting device |
12/15/2010 | CN101916736A Method for repairing circuit |
12/15/2010 | CN101916735A Manufacturing method of flip chip encapsulation structure taking carbon nano tube cluster as salient point of chip |
12/15/2010 | CN101916734A Storage device and packaging method |
12/15/2010 | CN101916733A Manufacturing method of display panel |
12/15/2010 | CN101916732A Circuit substrate and making process thereof |
12/15/2010 | CN101916731A Ceramic insulating film heat-conducting substrate and manufacturing method thereof |
12/15/2010 | CN101916730A Method for manufacturing silicon on insulator (SOI) super-junction laterally diffused metal oxide semiconductor (LDMOS) with linear buffer layer |
12/15/2010 | CN101916729A Method for producing SOI (Silicon on Insulator) LDMOS (Laterally Diffused Metal Oxide Semiconductor) device provided with multi-layer super-junction structure |
12/15/2010 | CN101916728A Manufacture technology of superstructure LDMOS structure on SOI capable of completely eliminating substrate-assisted depletion effect |
12/15/2010 | CN101916727A Preparation method of SOI (Silicon on Insulator) high-voltage power device |
12/15/2010 | CN101916726A Method for manufacturing signal operation instruction (SOI) metal oxide semiconductor (MOS) apparatus structure for restraining floating body effect |
12/15/2010 | CN101916725A Method for manufacturing bipolar-junction transistor |
12/15/2010 | CN101916724A Method for manufacturing transistor |
12/15/2010 | CN101916723A Method for preparing schottky diodes |
12/15/2010 | CN101916722A Method for preventing metallic coatings at edges of wafers from peeling |
12/15/2010 | CN101916721A Method for improving change curve of threshold voltages of high-voltage devices under 60nm along channel length |
12/15/2010 | CN101916720A Method for improving threshold voltage variation curve of high-pressure device below 60 nanometers |
12/15/2010 | CN101916719A Method for adjusting Schottky contact barrier height of metal and N-type germanium |
12/15/2010 | CN101916718A Method for preparing silicon crystal D1 line luminous material at room temperature by Si+ self implantation |
12/15/2010 | CN101916717A Method for preparing reinforced heat transfer surface of direct liquid cooling chip |
12/15/2010 | CN101916716A Vacuum treating device |
12/15/2010 | CN101916715A In-situ dry clean chamber for front end of line fabrication |
12/15/2010 | CN101916714A A method of plasma etching and carriers for use in such methods |
12/15/2010 | CN101916591A 半导体集成电路器件 The semiconductor integrated circuit device |
12/15/2010 | CN101916544A Electro-optics apparatus |
12/15/2010 | CN101916097A Time-space coupling dynamic characteristic analysis system |
12/15/2010 | CN101916052A Compositions suitable for removing photoresist, photoresist byproducts and etching residue, and use thereof |
12/15/2010 | CN101915624A Heat characterization method and structure for monitoring temperature of transistor in real time |
12/15/2010 | CN101914811A One hundred millimeter high purity semi-insulating single crystal silicon carbide wafer |
12/15/2010 | CN101914752A Film deposition method and film deposition apparatus of metal film |
12/15/2010 | CN101913591A Single-layer carbon nanotube and alinged single-layer carbon nanotube bulk structure, and their production process, production apparatus and use |
12/15/2010 | CN101913046A Welding device for welding diode |
12/15/2010 | CN101912856A Stress control method of lithium niobate crystal after chemically mechanical polishing |
12/15/2010 | CN101661899B Method for producing contact holes in metal gates by adopting Damascus process |
12/15/2010 | CN101661879B Method for preparing tunneling oxide layers in preparation of memory devices with tunneling oxide layers |
12/15/2010 | CN101615562B Novel-structure glue-spreading development equipment |
12/15/2010 | CN101609809B Method for forming porous material |
12/15/2010 | CN101577292B SOI device and method for manufacturing the same |
12/15/2010 | CN101577290B Preparation method of polysilicon gate structure with hard mask layer on the top |
12/15/2010 | CN101556927B Wire bonding method in chip package process |
12/15/2010 | CN101552206B Method for realizing fixation of ZnO nanowire during preparation of ZnO nanowire field effect transistor |
12/15/2010 | CN101552205B Method for realizing positioning of ZnO nanowire to field effect transistor substrate |
12/15/2010 | CN101552204B Method for realizing deposition and positioning of ZnO nanowire to field effect transistor substrate |
12/15/2010 | CN101546739B Chip packaging structure reaching electrical connection without routing and method for manufacturing same |
12/15/2010 | CN101533805B Pixel structure and manufacturing method thereof |
12/15/2010 | CN101529564B Vaporizer and film forming apparatus |
12/15/2010 | CN101527324B Two-way low-voltage punch-through transient voltage suppression diode and manufacturing method thereof |
12/15/2010 | CN101527319B Microcrystalline silicon thin film transistor structure and method for manufacturing same |
12/15/2010 | CN101527304B Integrated low-voltage and low-capacitance TVS device and manufacturing method thereof |
12/15/2010 | CN101496175B Silicon carbide semiconductor device and method for manufacturing the same |
12/15/2010 | CN101488456B Etching amount calculating method and etching amount calculating apparatus |
12/15/2010 | CN101484987B Pick-and-place apparatus |
12/15/2010 | CN101484984B Aftertreatment method for amorphous carbon film |
12/15/2010 | CN101471242B Pattern forming method and semiconductor manufacturing device |
12/15/2010 | CN101452901B Micro link lug structure with stress buffer and its producing method |
12/15/2010 | CN101452822B Wafer cleaning apparatus and correcting method of the same |
12/15/2010 | CN101447481B Calibration technique for measuring gate resistance of power MOS gate device at wafer level |
12/15/2010 | CN101431025B Novel method for producing thin-film transistor channel region and source/drain electrode |
12/15/2010 | CN101430471B Active-matrix device, electro-optical display device, and electronic apparatus |
12/15/2010 | CN101427391B Nitride semiconductor component and method for the production thereof |
12/15/2010 | CN101427346B Adjustable resistor for use in a resistive divider circuit and method for manufacturing |
12/15/2010 | CN101419967B Electrostatic discharge protection circuit, manufacturing method thereof and liquid crystal display device having the same |
12/15/2010 | CN101419933B Protection layer making method capable of avoiding projection generation |
12/15/2010 | CN101418439B Laser processing device and laser processing method |
12/15/2010 | CN101404244B Method for treating process solution and apparatus for treating substrate |
12/15/2010 | CN101393889B Manufacturing method of display apparatus |
12/15/2010 | CN101387004B Plating device |
12/15/2010 | CN101385123B Projection optical system, exposure device, exposure method, mask and display manufacturing method |
12/15/2010 | CN101383317B Substrate lifting assembly and substrate processing device comprising the same |
12/15/2010 | CN101379604B High speed substrate aligner apparatus |
12/15/2010 | CN101373784B Photodiode array, method for manufacturing same, and radiation detector |
12/15/2010 | CN101369542B Wiring board and manufacturing method therefor, and semiconductor device and manufacturing method therefor |
12/15/2010 | CN101359638B Electronic device, method of producing the same, and semiconductor device |
12/15/2010 | CN101345238B Packaging of semiconductor devices for increased reliability |
12/15/2010 | CN101339917B Solid-image capturing device, color filter, manufacturing method thereof and liquid crystal display device |
12/15/2010 | CN101335291B Light emitting display and method of manufacturing the same |
12/15/2010 | CN101335185B Method for forming pattern in semiconductor device |
12/15/2010 | CN101330094B Organic light emitting diode display device and method of fabricating the same |