Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/2010
12/14/2010US7851385 Forming a gate stack on a semiconductor substrate, forming a conformal silicon oxide layer on the semiconductor substrate using a low temperature cyclic method involving exposing the semiconductor substrate to a silicon containing precursor to form a seed layer ; forming a spacer layer; memory cells
12/14/2010US7851384 Method to mitigate impact of UV and E-beam exposure on semiconductor device film properties by use of a bilayer film
12/14/2010US7851383 Method and system for forming a controllable gate oxide
12/14/2010US7851382 Method for manufacturing SiC semiconductor device
12/14/2010US7851381 Surface treatment method for nitride crystal, nitride crystal substrate, nitride crystal substrate with epitaxial layer and semiconductor device, and method of manufacturing nitride crystal substrate with epitaxial layer and semiconductor device
12/14/2010US7851380 Process for atomic layer deposition
12/14/2010US7851379 Substrate processing method and substrate processing apparatus
12/14/2010US7851378 Method for growing Ge expitaxial layer on patterned structure with cyclic annealing
12/14/2010US7851377 Chemical vapor deposition process
12/14/2010US7851376 Compressive nitride film and method of manufacturing thereof
12/14/2010US7851375 Alkaline etchant for controlling surface roughness of semiconductor wafer
12/14/2010US7851374 Silicon wafer reclamation process
12/14/2010US7851373 Processing systems and methods for semiconductor devices
12/14/2010US7851372 Composition for removing an insulation material, method of removing an insulation layer and method of recycling a substrate using the same
12/14/2010US7851371 Method for manufacturing semiconductor device
12/14/2010US7851370 Patterning method
12/14/2010US7851369 Hardmask trim method
12/14/2010US7851368 Methods and apparatus for igniting a low pressure plasma
12/14/2010US7851367 Method for plasma processing a substrate
12/14/2010US7851366 Forming a sacrificial layer in order to realise a suspended element
12/14/2010US7851365 Methods for preparing semiconductor substrates and interfacial oxides thereon
12/14/2010US7851364 Method for forming pattern in semiconductor device
12/14/2010US7851363 Pattern forming method and manufacturing method of semiconductor device
12/14/2010US7851362 Method for reducing an unevenness of a surface and method for making a semiconductor device
12/14/2010US7851361 Laser ablation to selectively thin wafers/die to lower device RDSON
12/14/2010US7851360 Organometallic precursors for seed/barrier processes and methods thereof
12/14/2010US7851359 Silicon interposer producing method, silicon interposer and semiconductor device package and semiconductor device incorporating silicon interposer
12/14/2010US7851358 Low temperature method for minimizing copper hillock defects
12/14/2010US7851357 Method of forming electrodeposited contacts
12/14/2010US7851356 Integrated circuit and methods of manufacturing the same
12/14/2010US7851355 Method of manufacturing semiconductor device
12/14/2010US7851354 Semiconductor memory device having local etch stopper and method of manufacturing the same
12/14/2010US7851353 Method of forming a metal silicide layer, devices incorporating metal silicide layers and design structures for the devices
12/14/2010US7851352 Manufacturing method of semiconductor device and electronic device
12/14/2010US7851351 Manufacturing method for semiconductor devices with enhanced adhesivity and barrier properties
12/14/2010US7851350 Semiconductor device and method of forming contact plug of semiconductor device
12/14/2010US7851349 Method for producing a connection electrode for two semiconductor zones arranged one above another
12/14/2010US7851348 Routingless chip architecture
12/14/2010US7851347 Wire bonding method and semiconductor device
12/14/2010US7851346 Bonding metallurgy for three-dimensional interconnect
12/14/2010US7851345 Semiconductor device and method of forming oxide layer on signal traces for electrical isolation in fine pitch bonding
12/14/2010US7851344 Method of producing a substrate having areas of different hydrophilicity and/or oleophilicity on the same surface
12/14/2010US7851343 Methods of forming ohmic layers through ablation capping layers
12/14/2010US7851342 In-situ formation of conductive filling material in through-silicon via
12/14/2010US7851341 Semiconductor device and method for manufacturing the same
12/14/2010US7851340 Semiconductor fin integration using a sacrificial fin
12/14/2010US7851339 Method of repairing deep subsurface defects in a silicon substrate that includes diffusing negatively charged ions into the substrate from a sacrificial oxide layer
12/14/2010US7851337 Method for producing semiconductor substrate
12/14/2010US7851336 Method of forming a passivated densified nanoparticle thin film on a substrate
12/14/2010US7851335 Adhesive composition, adhesive sheet and production method of semiconductor device
12/14/2010US7851334 Apparatus and method for producing semiconductor modules
12/14/2010US7851333 Apparatus comprising a device and method for producing it
12/14/2010US7851332 Semiconductor device and method for manufacturing the same
12/14/2010US7851331 Bonding structures and methods of forming bonding structures
12/14/2010US7851330 Methods for fabricating compound material wafers
12/14/2010US7851329 Semiconductor device having EDMOS transistor and method for manufacturing the same
12/14/2010US7851328 STI stress modulation with additional implantation and natural pad sin mask
12/14/2010US7851327 Method of manufacturing a semiconductor device including forming a single-crystalline semiconductor material in a first area and forming a second device isolation pattern on a second area
12/14/2010US7851326 Method for producing deep trench structures
12/14/2010US7851325 Strained semiconductor using elastic edge relaxation, a buried stressor layer and a sacrificial stressor layer
12/14/2010US7851323 Phase change material with filament electrode
12/14/2010US7851322 Fabricating method of packaging structure
12/14/2010US7851321 Semiconductor integrated circuit devices having high-Q wafer back-side capacitors
12/14/2010US7851319 Method for preparing a non-self-aligned heterojunction bipolar transistor with a small emitter-to-base spacing
12/14/2010US7851318 Semiconductor substrate and method for manufacturing the same, and method for manufacturing semiconductor device
12/14/2010US7851317 Method for fabricating high voltage drift in semiconductor device
12/14/2010US7851316 Fabrication method of semiconductor device
12/14/2010US7851315 Method for fabricating a field effect transistor having a dual thickness gate electrode
12/14/2010US7851314 Short channel lateral MOSFET and method
12/14/2010US7851313 Semiconductor device and process for improved etch control of strained silicon alloy trenches
12/14/2010US7851312 Semiconductor component and method of manufacture
12/14/2010US7851311 Method of manufacturing non-volatile memory device
12/14/2010US7851310 Method for forming semiconductor device
12/14/2010US7851309 Selective epitaxy vertical integrated circuit components and methods
12/14/2010US7851308 Method of producing a semiconductor device having a trench-stuffed layer
12/14/2010US7851307 Method of forming complex oxide nanodots for a charge trap
12/14/2010US7851306 Method for forming a flash memory device with straight word lines
12/14/2010US7851303 Semiconductor device and manufacturing method thereof
12/14/2010US7851302 Capacitors and methods of manufacture thereof
12/14/2010US7851301 Semiconductor capacitor structure and method to form same
12/14/2010US7851300 Method of fabricating a trench gate MOSFET for maximizing breakdown voltage
12/14/2010US7851299 Subgroundrule space for improved metal high-k device
12/14/2010US7851298 Method for fabricating transistor in a semiconductor device utilizing an etch stop layer pattern as a dummy pattern for the gate electrode formation
12/14/2010US7851297 Dual workfunction semiconductor device
12/14/2010US7851296 Nonvolatile semiconductor memory device
12/14/2010US7851295 Flash memory device and method of manufacturing the same
12/14/2010US7851294 Nanotube memory cell with floating gate based on passivated nanoparticles and manufacturing process thereof
12/14/2010US7851293 Method for forming vertical channel transistor of semiconductor device
12/14/2010US7851292 Methods of forming and programming floating-gate memory cells having carbon nanotubes
12/14/2010US7851291 Epitaxial silicon germanium for reduced contact resistance in field-effect transistors
12/14/2010US7851290 Method of fabricating semiconductor device
12/14/2010US7851289 Method of forming N-and P- channel field effect transistors on the same silicon layer having a strain effect
12/14/2010US7851288 Field effect transistor using carbon based stress liner
12/14/2010US7851287 Method of fabricating Schottky barrier FinFET device
12/14/2010US7851286 Bottom source LDMOSFET method
12/14/2010US7851285 Non-volatile memory device and method for fabricating the same
12/14/2010US7851284 Method for making GaN-based high electron mobility transistor
12/14/2010US7851283 Field effect transistor with raised source/drain fin straps
12/14/2010US7851282 Method for forming thin film devices for flat panel displays
12/14/2010US7851281 Manufacturing method of flexible semiconductor device and flexible semiconductor device
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