Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/2010
12/21/2010US7855117 Method of forming a thin layer and method of manufacturing a semiconductor device
12/21/2010US7855116 Nonvolatile semiconductor memory device and manufacturing method thereof
12/21/2010US7855115 Method for forming laterally extending dielectric layer in a trench-gate FET
12/21/2010US7855114 High K stack for non-volatile memory
12/21/2010US7855113 Method for fabricating semiconductor memory device
12/21/2010US7855112 Fabrication method of pixel structure
12/21/2010US7855111 Border region defect reduction in hybrid orientation technology (HOT) direct silicon bonded (DSB) substrates
12/21/2010US7855110 Field effect transistor and method of fabricating same
12/21/2010US7855109 Method for manufacturing a semiconductor device capable of preventing the generation of a bridge between a recess gate and a PLC plug
12/21/2010US7855108 Semiconductor heterojunction devices based on SiC
12/21/2010US7855107 Semiconductor device, electro-optical device, and method for manufacturing semiconductor device
12/21/2010US7855106 Semiconductor device and method for forming the same
12/21/2010US7855105 Planar and non-planar CMOS devices with multiple tuned threshold voltages
12/21/2010US7855104 Structure and method for latchup suppression
12/21/2010US7855103 Wirebond structure and method to connect to a microelectronic die
12/21/2010US7855102 Method, system, and apparatus for a secure bus on a printed circuit board
12/21/2010US7855101 Layer transfer process and functionally enhanced integrated circuits produced thereby
12/21/2010US7855100 Integrated circuit package system with an encapsulant cavity and method of fabrication thereof
12/21/2010US7855099 Manufacturing method for a secure-digital (SD) flash card with slanted asymmetric circuit board
12/21/2010US7855098 Method of forming, modifying, or repairing a semiconductor device using field-controlled diffusion
12/21/2010US7855096 Method for manufacturing semiconductor device
12/21/2010US7855095 Method of fabricating an ultra-small condenser microphone
12/21/2010US7855094 Photo-detector for detecting image signal of infrared laser radar and method of manufacturing the same
12/21/2010US7855093 Semiconductor laser device and method of manufacturing the same
12/21/2010US7855092 Device for emitting white-color light
12/21/2010US7855089 Application specific solar cell and method for manufacture using thin film photovoltaic materials
12/21/2010US7855088 Method for manufacturing integrated circuits by guardbanding die regions
12/21/2010US7855087 Floating sheet production apparatus and method
12/21/2010US7855086 Method for monitoring fabrication parameter
12/21/2010US7855085 System and method for reducing shorting in memory cells
12/21/2010US7855047 multilayer photomasking; circuit patterns; connecting opacity zones; adjustment of pattern using photomasking; improved accuracy
12/21/2010US7855046 positioning patterned surface of form mold in proximity to surface of object on which structure is to be formed, filling space between object and patterned surface with gaseous form of radiation sensitive material, creating radiation interference pattern, exposing material to pattern
12/21/2010US7855038 Mask patterns for semiconductor device fabrication and related methods and structures
12/21/2010US7855036 Sputtering target used for production of reflective mask blank for EUV lithography
12/21/2010US7855035 in the second exposure, an exposure light is incident on a region where the inspection mark is projected in the first exposure
12/21/2010US7855033 photoresists with varying transmissive areas; halftones
12/21/2010US7854991 Single-walled carbon nanotube and aligned single-walled carbon nanotube bulk structure, and their production process, production apparatus and application use
12/21/2010US7854974 Tube formed of bonded silicon staves
12/21/2010US7854963 Method and apparatus for controlling composition profile of copper indium gallium chalcogenide layers
12/21/2010US7854962 Vapor deposition of a metal oxide /nitride, dielectric thin films on semiconductor wafers by supplying the gas produced by evaporation or sublimation of the metal material; providing a heater, a carrier gas, temperature controller and baffle to maintain uniform gas diffusion and coating
12/21/2010US7854821 Substrate processing apparatus
12/21/2010US7854820 Upper electrode backing member with particle reducing features
12/21/2010US7854804 Nitride crystal, nitride crystal substrate, epilayer-containing nitride crystal substrate, semiconductor device and method of manufacturing the same
12/21/2010US7854777 Fine oxide particles, oxidizing agent, benzotriazole derivative, water and solvent; reduced dishing, erosion and scratching; chemical mechanical polishing; high removal rate
12/21/2010US7854646 Substrate polishing apparatus and substrate polishing method
12/21/2010US7854213 Modulated gap segmented antenna for inductively-coupled plasma processing system
12/21/2010US7854062 Method for manufacturing circuit device
12/21/2010CA2473766C High-performance non-contact support platforms
12/21/2010CA2406054C Method of forming vias in silicon carbide and resulting devices and circuits
12/16/2010WO2010144867A1 Method of making solar collector assemblies with optical concentrator encapsulant
12/16/2010WO2010144856A2 Techniques to enhance selectivity of electrical breakdown of carbon nanotubes
12/16/2010WO2010144840A1 Microfluidic measuring tool to measure through-silicon via depth
12/16/2010WO2010144823A2 Method for manufacturing tight pitch, flip chip integrated circuit packages
12/16/2010WO2010144555A2 Adjusting current ratios in inductively coupled plasma processing systems
12/16/2010WO2010144541A2 Extreme flow rate and/or high temperature fluid delivery substrates
12/16/2010WO2010144504A1 Diamond apparatus and method of manufacture
12/16/2010WO2010144467A1 Through silicon via with embedded decoupling capacitor
12/16/2010WO2010144460A1 Flexible photovoltaic cells having a polyimide material layer and method of producing same
12/16/2010WO2010144439A2 Fluid processing systems and methods
12/16/2010WO2010144375A2 3d channel architecture for semiconductor devices
12/16/2010WO2010144330A2 Method and apparatus for electroplating
12/16/2010WO2010144303A2 Continuous feed chemical vapor deposition system
12/16/2010WO2010144302A2 Roll-to-roll chemical vapor deposition system
12/16/2010WO2010144290A2 Remote plasma processing of interface surfaces
12/16/2010WO2010144289A1 Finfet structures with stress-inducing source/drain-forming spacers and methods for fabricating same
12/16/2010WO2010144274A1 Nano/microwire solar cell fabricated by nano/microsphere lithography
12/16/2010WO2010144270A1 Thin-film led with p and n contacts electrically isolated from the substrate
12/16/2010WO2010144252A2 Front end scribing of light emitting diode (led) wafers and resulting devices
12/16/2010WO2010144165A1 Cell isolation on photovoltaic modules for hot spot reduction
12/16/2010WO2010143852A2 Wafer prober station in which the mechanical strength of a chuck is enhanced, and method for controlling same
12/16/2010WO2010143778A1 Semiconductor substrate, fabrication method thereof, semiconductor device and fabrication method thereof
12/16/2010WO2010143765A1 Surface treatment method for treating surface of substrate to be highly hydrophobic
12/16/2010WO2010143744A1 Transport apparatus and exposure apparatus
12/16/2010WO2010143652A1 Method and apparatus for exposure and device fabricating method
12/16/2010WO2010143649A1 Aqueous cutting fluid and aqueous cutting agent
12/16/2010WO2010143609A1 Method for producing electronic device, electronic device, semiconductor device, and transistor
12/16/2010WO2010143599A1 Method of producing electronic module, and electronic module
12/16/2010WO2010143597A1 Method for manufacturing circuit board, circuit board manufactured by the method, and base substrate used for the circuit board
12/16/2010WO2010143579A1 Abrasive slurry, abrasive set, and method for grinding substrate
12/16/2010WO2010143571A1 Method for forming ge-sb-te film, and storage medium
12/16/2010WO2010143570A1 Method for forming ge-sb-te film, and storage medium
12/16/2010WO2010143557A1 Semiconductor device
12/16/2010WO2010143544A1 Vapor deposition apparatus
12/16/2010WO2010143538A1 Hermetically-sealed semiconductor recording medium and hermetically-sealed semiconductor recording device
12/16/2010WO2010143525A1 Plasma processing apparatus and plasma processing method
12/16/2010WO2010143510A1 Adhesive composition
12/16/2010WO2010143507A1 Insulating resin film, bonded body using insulating resin film, and method for manufacturing bonded body
12/16/2010WO2010143505A1 Transfer module
12/16/2010WO2010143479A1 Ion beam irradiation apparatus and method for suppressing ion beam spread
12/16/2010WO2010143471A1 High-frequency switch module
12/16/2010WO2010143379A1 Method of producing electronic component mounting structure, and electronic component mounting structure
12/16/2010WO2010143376A1 Semiconductor device and process for manufacture thereof
12/16/2010WO2010143369A1 Semiconductor device and fabricating method therefor
12/16/2010WO2010143355A1 Wiring layer structure and process for manufacture thereof
12/16/2010WO2010143354A1 Cutting method for workpiece
12/16/2010WO2010143336A1 Electronic device
12/16/2010WO2010143332A1 Semiconductor device and process for manufacture thereof
12/16/2010WO2010143327A1 Plasma cvd device
12/16/2010WO2010143326A1 Semiconductor integrated circuit device and method for designing same
12/16/2010WO2010143321A1 Mold for imprinting, and method for manufacturing same
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