Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/2010
12/28/2010US7859665 Polarization analyzing system, exposure method, and method for manufacturing semiconductor device
12/28/2010US7859659 Spectroscopic scatterometer system
12/28/2010US7859639 Liquid crystal display device and fabricating method thereof using three mask process
12/28/2010US7859628 IPS LCD having auxiliary common electrode lines
12/28/2010US7859621 Integral-type liquid crystal panel with image sensor function
12/28/2010US7859187 Display device and method for fabricating the same
12/28/2010US7859111 Computer implemented method for designing a semiconductor device, an automated design system and a semiconductor device
12/28/2010US7859110 Solder resist material, wiring board using the solder resist material, and semiconductor package
12/28/2010US7859109 Gallium nitride-based III-V group compound semiconductor device and method of manufacturing the same
12/28/2010US7859106 Multilayer printed circuit board using paste bumps
12/28/2010US7859097 Semiconductor device and method of fabricating semiconductor device
12/28/2010US7859096 Semiconductor device
12/28/2010US7859085 Semiconductor device and method of forming embedded passive circuit elements interconnected to through hole vias
12/28/2010US7859078 Thin film transistor device and method of manufacturing the same
12/28/2010US7859077 Semiconductor device
12/28/2010US7859072 Image sensor and method for manufacturing the same
12/28/2010US7859070 Airtight apparatus having a lid with an optical window for passage of optical signals
12/28/2010US7859067 Microelectromechanical device including an encapsulation layer of which a portion is removed to expose a substantially planar surface having a portion that is disposed outside and above a chamber and including a field region on which integrated circuits are formed and methods for fabricating same
12/28/2010US7859066 Nonvolatile semiconductor memory device and method of manufacturing the same
12/28/2010US7859063 Semiconductor device using SOI-substrate
12/28/2010US7859056 Apparatus and methods for integrated circuit with devices with body contact and devices with electrostatic discharge protection
12/28/2010US7859054 Poly-Si thin film transistor and organic light-emitting display having the same
12/28/2010US7859046 Ballistic direct injection NROM cell on strained silicon structures
12/28/2010US7859031 Light modulating sensing MOSFET transistor and process for manufacturing the same
12/28/2010US7859024 Integrated circuit having efficiently packed decoupling capacitors
12/28/2010US7859018 Semiconductor device having nitride semiconductor layer
12/28/2010US7859016 Thin film semiconductor device, polycrystalline semiconductor thin film production process and production apparatus
12/28/2010US7859013 Metal oxide field effect transistor with a sharp halo
12/28/2010US7858995 Semiconductor light emitting device
12/28/2010US7858987 Semiconductor device and manufacturing method thereof
12/28/2010US7858985 Integrated circuit, semiconductor device comprising the same, electronic device having the same, and driving method of the same
12/28/2010US7858984 Liquid crystal display device having a double layered structure and a single layered structure on the same layer
12/28/2010US7858980 Reduced active area in a phase change memory structure
12/28/2010US7858975 Organic field effect transistor systems and methods
12/28/2010US7858966 Protected qubit based on superconducting current mirror
12/28/2010US7858959 nonvolatile semiconductor memory element, actuator element of micro-machine, sensor element for measuring physical displacement, filter element for communication, and optical switch element; good crystal property
12/28/2010US7858958 Evaluation method and fabrication method of optical element having multilayer film, exposure apparatus having the multilayer film, and device fabrication method
12/28/2010US7858902 Wafer dividing method and laser beam processing machine
12/28/2010US7858901 Focusing an optical beam to two foci
12/28/2010US7858815 Vapor deposition process; semiconductor; high dielectric constants,used for capacitor dielectrics and gate dielectrics; random access memory devices
12/28/2010US7858537 Plasma processing method and apparatus
12/28/2010US7858536 Semiconductor device and method for manufacturing semiconductor device
12/28/2010US7858535 Methods of reducing defect formation on silicon dioxide formed by atomic layer deposition (ALD) processes and methods of fabricating semiconductor structures
12/28/2010US7858534 Semiconductor device manufacturing method and substrate processing apparatus
12/28/2010US7858533 Method for curing a porous low dielectric constant dielectric film
12/28/2010US7858531 Method of forming a semiconductor structure comprising a field effect transistor having a stressed channel region
12/28/2010US7858530 Processing method for wafer and processing apparatus therefor
12/28/2010US7858529 Treatment method of semiconductor, method for manufacturing MOS, and MOS structure
12/28/2010US7858528 Positive tone bi-layer method
12/28/2010US7858527 Additive composition, slurry composition including the same, and method of polishing an object using the slurry composition
12/28/2010US7858526 Method of patterning gate electrodes by reducing sidewall angles of a mask layer
12/28/2010US7858525 Fluorine-free precursors and methods for the deposition of conformal conductive films for nanointerconnect seed and fill
12/28/2010US7858524 Method of manufacturing semiconductor device with silicide gate electrodes
12/28/2010US7858523 Group 2a, yttrium or lanthanide complexes of a beta-diketiminate ligand; for example, Strontium bis(N-isopropyl-(4-tert-butylimino)-2-penten-2-aminato); for chemical vapor deposition in semiconductor manufacture; higher vapor pressure, lower melting point, and lower sublimation point
12/28/2010US7858522 Method for reducing carbon monoxide poisoning in a thin film deposition system
12/28/2010US7858521 Fabrication for electroplating thick metal pads
12/28/2010US7858520 Semiconductor package with improved size, reliability, warpage prevention, and heat dissipation and method for manufacturing the same
12/28/2010US7858519 Integrated circuit and manufacturing method of copper germanide and copper silicide as copper capping layer
12/28/2010US7858518 Method for forming a selective contact and local interconnect in situ
12/28/2010US7858517 Method of manufacturing semiconductor device, and semiconductor device
12/28/2010US7858516 Method for forming fine pattern of semiconductor device
12/28/2010US7858515 Method for forming metal line in semiconductor device
12/28/2010US7858514 Integrated circuit, intermediate structure and a method of fabricating a semiconductor structure
12/28/2010US7858513 Fabrication of self-aligned via holes in polymer thin films
12/28/2010US7858512 Semiconductor with bottom-side wrap-around flange contact
12/28/2010US7858510 Protective caps residing at an interface between metal lines and dielectric diffusion barrier (or etch stop) layers; formed by depositing a first layer of aluminum-containing material over an exposed copper line by treating an oxide-free copper surface with an organoaluminum compound; integrated circuit
12/28/2010US7858509 High-dielectric film substrate processing method
12/28/2010US7858508 Semiconductor device and method of manufacturing the same
12/28/2010US7858507 Method and system for creating photosensitive array with integrated backplane
12/28/2010US7858506 Diodes, and methods of forming diodes
12/28/2010US7858505 Method of forming a transistor having multiple types of Schottky junctions
12/28/2010US7858503 Ion implanted substrate having capping layer and method
12/28/2010US7858502 Fabrication method and fabrication apparatus of group III nitride crystal substance
12/28/2010US7858501 Semiconductor wafer for semiconductor components and production method
12/28/2010US7858500 Low threshold voltage semiconductor device with dual threshold voltage control means
12/28/2010US7858499 Dicing tape and die attach adhesive with patterned backing
12/28/2010US7858497 Stacked device manufacturing method
12/28/2010US7858496 Wafer processing method
12/28/2010US7858495 Method for manufacturing SOI substrate
12/28/2010US7858494 Laminated substrate manufacturing method and laminated substrate manufactured by the method
12/28/2010US7858493 Cleaving edge-emitting lasers from a wafer cell
12/28/2010US7858492 Method of filling a trench and method of forming an isolating layer structure using the same
12/28/2010US7858491 Method of fabricating semiconductor device
12/28/2010US7858490 Semiconductor device having dual-STI and manufacturing method thereof
12/28/2010US7858489 Method for manufacturing semiconductor device capable of increasing current drivability of PMOS transistor
12/28/2010US7858488 Method of forming a device isolation film of a semiconductor device
12/28/2010US7858487 Method and apparatus for indicating directionality in integrated circuit manufacturing
12/28/2010US7858486 Methods of forming a plurality of capacitors
12/28/2010US7858485 Structure and method for manufacturing trench capacitance
12/28/2010US7858484 Semiconductor device and method for producing the same
12/28/2010US7858483 Method for fabricating capacitor of semiconductor device
12/28/2010US7858482 Method of forming a semiconductor device using stress memorization
12/28/2010US7858481 Method for fabricating transistor with thinned channel
12/28/2010US7858480 Semiconductor device and method of fabricating the same
12/28/2010US7858479 Method and apparatus of fabricating semiconductor device
12/28/2010US7858478 Method for producing an integrated circuit including a trench transistor and integrated circuit
12/28/2010US7858477 Forming a buried bit line in a bulb-shaped trench
12/28/2010US7858476 Method for fabricating semiconductor device with recess gate
12/28/2010US7858475 Method for manufacturing a vertical transistor that includes a super junction structure
12/28/2010US7858474 Nonvolatile semiconductor memory device and manufacturing method thereof
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