Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
09/2014
09/09/2014US8829618 ESD protection using diode-isolated gate-grounded NMOS with diode string
09/09/2014US8829617 Uniform finFET gate height
09/09/2014US8829616 Method and structure for body contacted FET with reduced body resistance and source to drain contact leakage
09/09/2014US8829615 MOS device and method of manufacturing the same
09/09/2014US8829606 Ditches near semiconductor fins and methods for forming the same
09/09/2014US8829604 Semiconductor device, method of manufacturing the semiconductor device, and electronic device
09/09/2014US8829602 Integrated circuits and transistor design therefor
09/09/2014US8829601 Semiconductor device
09/09/2014US8829595 3-Dimensional non-volatile memory device, memory system including the same, and method of manufacturing the device
09/09/2014US8829593 Semiconductor memory device having three-dimensionally arranged memory cells, and manufacturing method thereof
09/09/2014US8829592 Non-volatile storage element having dual work-function electrodes
09/09/2014US8829588 NVM bitcell with a replacement control gate and additional floating gate
09/09/2014US8829587 Flash memory device and manufacturing method of the same
09/09/2014US8829586 Semiconductor device and method for manufacturing semiconductor device having oxide semiconductor layer
09/09/2014US8829574 Method and system for a GaN vertical JFET with self-aligned source and gate
09/09/2014US8829572 Structure and layout of a FET prime cell
09/09/2014US8829567 Metal alloy with an abrupt interface to III-V semiconductor
09/09/2014US8829562 Semiconductor device including a dielectric structure in a trench
09/09/2014US8829559 Nitride semiconductor light-emitting device and production method thereof
09/09/2014US8829539 Luminous vehicle glazing and manufacture thereof
09/09/2014US8829536 SiC semiconductor device and manufacturing method thereof
09/09/2014US8829535 Silicon carbide semiconductor device
09/09/2014US8829532 Semiconductor layer structure comprising a cavity layer and method for fabricating the semiconductor layer structure
09/09/2014US8829530 Crystal producing apparatus, crystal producing method, substrate producing method, gallium nitride crystal, and gallium nitride substrate
09/09/2014US8829526 Semiconductor device, method for manufacturing same, and display device
09/09/2014US8829524 Thin film transistor array substrate having sandwich structure gate electrode and manufacturing method thereof
09/09/2014US8829521 TFT board for liquid crystal display device and manufacturing method for liquid crystal display device
09/09/2014US8829491 Semiconductor device
09/09/2014US8829488 Process for preparing a bonding type semiconductor substrate
09/09/2014US8829483 Semiconductor device and manufacturing method thereof
09/09/2014US8829442 Non-contact measurement of the dopant content of semiconductor layers
09/09/2014US8829397 Corrosion-resistant multilayer ceramic member
09/09/2014US8829396 Finger drives for IR wafer processing equipment conveyors and lateral differential temperature profile methods
09/09/2014US8829393 Scanned laser light source
09/09/2014US8829391 Laser processing method
09/09/2014US8829355 Multilayer printed wiring board
09/09/2014US8829324 Anisotropic ambipolar transverse thermoelectrics and methods for manufacturing the same
09/09/2014US8828918 Semiconductor surface treating agent composition and method for treating semiconductor surface using the semiconductor surface treating agent composition
09/09/2014US8828891 Laser processing method
09/09/2014US8828890 Method for depositing cyclic thin film
09/09/2014US8828888 Protection of reactive metal surfaces of semiconductor devices during shipping by providing an additional protection layer
09/09/2014US8828887 Restricted stress regions formed in the contact level of a semiconductor device
09/09/2014US8828886 Low dielectric constant insulating film and method for forming the same
09/09/2014US8828885 Photo resist trimmed line end space
09/09/2014US8828884 Multi-level contact to a 3D memory array and method of making
09/09/2014US8828883 Methods and apparatuses for energetic neutral flux generation for processing a substrate
09/09/2014US8828882 Method for forming a deep trench in a microelectronic component substrate
09/09/2014US8828881 Etch-back method for planarization at the position-near-interface of an interlayer dielectric
09/09/2014US8828880 Method and apparatus for manufacturing semiconductor device
09/09/2014US8828878 Manufacturing method for dual damascene structure
09/09/2014US8828877 Etching solution and trench isolation structure-formation process employing the same
09/09/2014US8828876 Dual mandrel sidewall image transfer processes
09/09/2014US8828875 Method and apparatus for improving CMP planarity
09/09/2014US8828874 Chemical mechanical polishing of group III-nitride surfaces
09/09/2014US8828873 Method for manufacturing semiconductor device
09/09/2014US8828872 Method for etching a material in the presence of solid particles
09/09/2014US8828871 Method for forming pattern and mask pattern, and method for manufacturing semiconductor device
09/09/2014US8828870 Microstructure modification in copper interconnect structures
09/09/2014US8828869 Methods of forming masking layers for use in forming integrated circuit products
09/09/2014US8828868 Method for forming hard mask in semiconductor device fabrication
09/09/2014US8828867 System and method for manufacturing contact
09/09/2014US8828866 Methods for depositing a tantalum silicon nitride film
09/09/2014US8828865 Method of forming metal interconnections of semiconductor device
09/09/2014US8828864 Semiconductor device and method for manufacturing the same
09/09/2014US8828863 Electroless copper deposition with suppressor
09/09/2014US8828862 Air-dielectric for subtractive etch line and via metallization
09/09/2014US8828861 Method for fabricating conductive lines of a semiconductor device
09/09/2014US8828860 Double solder bumps on substrates for low temperature flip chip bonding
09/09/2014US8828859 Method for forming semiconductor film and method for manufacturing semiconductor device
09/09/2014US8828858 Spacer profile engineering using films with continuously increased etch rate from inner to outer surface
09/09/2014US8828857 Approach to integrate Schottky in MOSFET
09/09/2014US8828856 Substrate on which film is formed, and organic EL display device
09/09/2014US8828855 Transistor performance using a two-step damage anneal
09/09/2014US8828854 Method of impurity introduction and controlled surface removal
09/09/2014US8828853 Semiconductor device and method of manufacturing the same
09/09/2014US8828852 Delta-doping at wafer level for high throughput, high yield fabrication of silicon imaging arrays
09/09/2014US8828851 Method to enable the formation of silicon germanium channel of FDSOI devices for PFET threshold voltage engineering
09/09/2014US8828850 Reducing variation by using combination epitaxy growth
09/09/2014US8828849 Production of single-crystal semiconductor material using a nanostructure template
09/09/2014US8828848 Die structure and method of fabrication thereof
09/09/2014US8828847 Laser beam processing method for a wafer
09/09/2014US8828846 Method of computing a width of a scribe region based on a bonding structure that extends into the scribe reigon in a wafer-level chip scale (WLCSP) packaging
09/09/2014US8828845 Method of fabricating oxide thin film device using laser lift-off and oxide thin film device fabricated by the same
09/09/2014US8828844 Manufacturing method of SOI substrate
09/09/2014US8828843 Method of manufacturing isolation structure
09/09/2014US8828842 Crack stop structure and method for forming the same
09/09/2014US8828841 Semiconductor device and method of manufacture
09/09/2014US8828840 Semiconductor device and method for manufacturing the same
09/09/2014US8828839 Methods for fabricating electrically-isolated finFET semiconductor devices
09/09/2014US8828838 Large dimension device and method of manufacturing same in gate last process
09/09/2014US8828837 Metal-insulator-metal (MIM) device and method of formation thereof
09/09/2014US8828836 Method for fabricating a DRAM capacitor
09/09/2014US8828835 Ultrashallow emitter formation using ALD and high temperature short time annealing
09/09/2014US8828834 Methods of tailoring work function of semiconductor devices with high-k/metal layer gate structures by performing a fluorine implant process
09/09/2014US8828833 System for controlling SiGe-to-gate spacing
09/09/2014US8828832 Strained structure of semiconductor device
09/09/2014US8828831 Epitaxial replacement of a raised source/drain
09/09/2014US8828830 Semiconductor device having STI with nitride liner and UV light shielding film
09/09/2014US8828829 Semiconductor device with air gaps and method for fabricating the same
09/09/2014US8828828 MOSFET including asymmetric source and drain regions
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