Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/1987
12/16/1987EP0249468A2 Photopolymerizable composition
12/16/1987EP0249457A2 Method for formation of patterns
12/16/1987EP0249365A2 Photocatalysts for vinyl compounds activated by an electron donating hetero atom
12/16/1987EP0249306A2 Polymeric materials containing unsaturated groups
12/16/1987EP0249139A2 Resist compositions and use
12/15/1987US4713675 Exposure apparatus
12/15/1987US4713422 Radiation-sensitive polymers which form a metal complex, process for the polymerization of acetylene, and coated material
12/15/1987US4713401 Photoinitiators ortho-cf2z group
12/15/1987US4713315 Coating with a photoresist; lithography
12/15/1987US4713312 Imaging system employing photosensitive microcapsules containing 3-substituted coumarins and other photobleachable sensitizers
12/15/1987US4713258 Method of forming ultrafine patterns
12/15/1987US4712910 Exposure method and apparatus for semiconductor fabrication equipment
12/15/1987CA1230444A1 Polysilane positive photoresist materials and methods for their use
12/09/1987EP0248779A1 Process for producing positive patterns in a photoresist layer
12/09/1987EP0248631A1 Photochromic gamma butyrolactones
12/09/1987EP0248424A2 Photosensitive registration element
12/09/1987EP0248395A2 Photosensitive registration element
12/09/1987EP0248299A2 Photosensitive registration element
12/08/1987US4712013 Method of forming a fine pattern with a charged particle beam
12/08/1987US4711836 Development of positive-working photoresist compositions
12/08/1987US4711835 Process for photolithographing a thick layer of paste deposited on a substrate
12/08/1987US4711800 Needlecraft with metallic substrate
12/08/1987US4711568 Exposure apparatus
12/08/1987US4711567 For producing semiconductor devices
12/08/1987US4711535 Ring field projection system
12/08/1987CA1230129A1 Diacetylenes having liquid crystal phases
12/08/1987CA1230004A1 Photopolymerizable composition
12/03/1987DE3616714A1 Apparatus for applying developer liquid to semiconductor wafers
12/02/1987EP0247835A2 Method of processing presensitized lithographic printing plate and apparatus therefor
12/02/1987EP0247665A1 Device for detecting a magnification error in an optical imaging system
12/02/1987EP0247603A2 A method for stripping a photo resist on an aluminium alloy
12/02/1987EP0247549A2 Photopolymerizable composition containing carboxy benzotriazole
12/02/1987EP0247461A2 Photosensitive composition and photosensitive registration material prepared therefrom
12/02/1987EP0247396A2 Light-sensitive material containing silver halide, reducing agent and polymerizable compound
12/02/1987EP0247363A1 Triphenylimidazole compounds
12/02/1987EP0247331A2 Removal of excess material from a semiconductor wafer
12/02/1987EP0247153A1 Thermally stabilized photoresist images
12/02/1987CN87103644A 旋转干燥设备 Rotary drying equipment
12/01/1987US4710640 Electron beam lithography
12/01/1987US4710523 Discoloration, wear resistant surface coating, finishes, and printing ink
12/01/1987US4710449 High contrast low metal ion positive photoresist developing method using aqueous base solutions with surfactants
12/01/1987US4710448 Method of fabricating ultra-thin flex cables
12/01/1987US4710446 Photosensitive recording materials
12/01/1987US4710445 Resist imageable photopolymerizable compositions
12/01/1987US4710444 Process for the formation of linework or halftone multicolor colloid patterns
12/01/1987US4710440 Test mask for determining alignment of an automatic IC mask testing apparatus
12/01/1987US4710262 Photopolymerizable composition containing carboxy benzotriazole
12/01/1987US4710026 Position detection apparatus
12/01/1987US4709716 Rinse tank
11/1987
11/25/1987EP0246918A1 Curable prepolymers
11/25/1987EP0246885A2 A contrast-enhancing agent for photolithography
11/25/1987EP0246743A2 Blockout materials for printing screens
11/25/1987EP0246467A2 Photosensitive resin composition and use thereof
11/25/1987EP0246447A2 Organic solder dam for a semiconductor device
11/25/1987EP0152475B1 Photopolymerizable compositions
11/25/1987CN86108826A Photosensitive materials containing ionic dye compounds as initiators
11/24/1987US4708927 Photographic elements with development inhibitor precursor
11/24/1987US4708925 Photosolubilizable compositions containing novolac phenolic resin
11/24/1987US4708465 Position detecting device for transferring an image
11/24/1987US4708452 Decoating device
11/19/1987WO1987007002A1 Spin drying apparatus
11/19/1987WO1987006865A2 Intense laser irradiation using reflective optics
11/19/1987EP0246169A1 Use of a cross-linkable polysiloxane composition as a negative resist in microlithography, and process for applying it
11/19/1987EP0245559A2 Two component curable epoxy resin composition having a long pot life
11/19/1987EP0245434A1 Device for aligning a photomask onto a printed wiring board.
11/19/1987EP0245431A1 Photoimaging processes and compositions.
11/17/1987US4707773 Parallel light moving type exposure apparatus
11/17/1987US4707609 Exposure apparatus and method
11/17/1987US4707586 Electro conductive film system for aircraft windows
11/17/1987US4707437 Radiation-polymerizable composition and element containing a photopolymer composition
11/17/1987US4707433 Water-soluble photosensitive material with dichromate and low molecular weight gelatin
11/17/1987US4707432 Ferrocenium/alpha-cleavage photoinitiator systems for free radical polymerizable compositions
11/17/1987US4707431 Multilayer, light curable acrylate monomer
11/17/1987US4707426 Reciprocity-failing photoresist containing a bisazide having a linking stilbene group
11/17/1987US4707218 Masking, etching
11/17/1987US4707125 Vacuum blanket apparatus
11/17/1987US4707124 Apparatus for exposing photosensitive media
11/17/1987US4707116 For the contact print of circuit patterns on printed circuit boards
11/17/1987CA1229257A1 Photopolymerizable compositions
11/12/1987DE3614681A1 Flat-brush washer
11/11/1987EP0244817A2 Laminator
11/11/1987EP0244763A2 Positive-working photosensitive composition and photosensitive recording material prepared therefrom
11/11/1987EP0244762A2 Photosensitive positive composition and photosensitive registration material prepared therefrom
11/11/1987EP0244749A2 Photosensitive composition and photosensitive registration material prepared therefrom
11/11/1987EP0244748A2 Photosensitive composition and photosensitive registration material prepared therefrom
11/11/1987EP0244572A2 Capped two-layer resist process
11/11/1987EP0244567A2 Bilayer photoresist development
11/11/1987EP0244504A2 X-ray source
11/11/1987EP0244496A1 Lithographic mask for ions, electrons or X-rays, and process for its production
11/11/1987EP0244462A1 Method for forming vertical interconnects in polyimide insulating layers
11/11/1987EP0130214B1 Method and apparatus for exposing photosensitive material
11/10/1987US4705940 Focus detection in a projection optical system
11/10/1987US4705742 Processless multicolor imaging
11/10/1987US4705740 Radiation-polymerizable mixture, copolymer contained therein, and a process for the preparation of the copolymer
11/10/1987US4705729 Method for photochemically enhancing resolution in photolithography processes
11/10/1987US4705608 Process for making screen printing fabrics for screen printing cylinders
11/10/1987US4705597 Photoresist tapering process
11/10/1987CA1229011A1 System and method for projecting multiple images directly onto printing plates
11/10/1987CA1229006A1 Reflective diffractive authenticating device
11/05/1987WO1987006725A2 Method and apparatus for spreading resin by centrifugation