| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 01/27/1988 | EP0254550A1 Treatment of photoresist materials containing waste solution |
| 01/27/1988 | EP0254230A2 Heat-resistant photoresist film |
| 01/27/1988 | EP0254221A2 Contrast enhancement layer compositions, alkylnitrones, and use |
| 01/27/1988 | EP0254181A2 Image-forming method employing light-sensitive material containing silver halide, reducing agent and polymerizable compound |
| 01/27/1988 | EP0254103A1 Inorganic, especially metallic microfiltration membrane, and process for its manufacture |
| 01/27/1988 | CN87104516A Raised relief circuit board with soldered connections having nomenclature applied thereto |
| 01/27/1988 | CN86105392A Method for mfg. printed circuit boards |
| 01/26/1988 | US4721980 Transfer type each-side exposure apparatus |
| 01/26/1988 | US4721734 Photosensitive hydroxylalkylphenones |
| 01/26/1988 | US4721665 Method for neutralizing acidic novolak resin in a lithographic coating composition |
| 01/26/1988 | CA1232085A1 Electrically conductive materials for devices |
| 01/21/1988 | DE3722749A1 Verfahren zur herstellung einer gedruckten leiterplatte A process for producing a printed circuit board |
| 01/21/1988 | DE3634609A1 Verfahren und vorrichtung zur fein-fokussierung eines bildes auf eine projektionsflaeche Method and device for fine-focusing of an image on a projection |
| 01/21/1988 | DE3624097A1 Method for producing a raster fluorescent screen for colour cathode ray tubes |
| 01/20/1988 | EP0253765A1 Diamino-9,10-dihydroanthracenes and polyamide-acid (esters) and polyimides thereof |
| 01/20/1988 | EP0253675A1 Stabilized choline base solutions |
| 01/20/1988 | EP0253553A1 Photolytically crosslinkable thermally stable composition |
| 01/20/1988 | EP0253349A2 Device for precise relative adjustment of a mask and a semiconductor wafer in a lithography apparatus and method for its use |
| 01/20/1988 | EP0253283A2 Semiconductor wafer exposure device with synchrotron radiation in a lithography apparatus |
| 01/20/1988 | EP0253237A2 Process of photoetching of superficial coatings based on polymeric materials |
| 01/20/1988 | EP0253219A2 Photoresist compositions containing quinone sensitizer |
| 01/20/1988 | EP0253129A2 Photoplotting method and photoplotter for film exposure |
| 01/19/1988 | US4720732 Pattern transfer apparatus |
| 01/19/1988 | US4720448 Method of manufacturing photorelief printing plate using a liquid photopolymer |
| 01/19/1988 | US4720445 Copolymers from maleimide and aliphatic vinyl ethers and esters used in positive photoresist |
| 01/19/1988 | US4719705 Reticle transporter |
| 01/14/1988 | WO1988000362A1 Improved registration method in photolithography and equipment for carrying out this method |
| 01/14/1988 | WO1988000108A1 Laser beam forming apparatus |
| 01/14/1988 | WO1988000097A1 Radiation curable temporary solder mask |
| 01/13/1988 | EP0252883A1 Coated material containing a radiation-sensitive polyimide layer with special diaminodiphenyl methane units |
| 01/13/1988 | EP0252734A2 X-ray reduction projection exposure system of reflection type |
| 01/13/1988 | EP0252498A2 Light-sensitive material containing silver halide, reducing agent and polymerizable compound |
| 01/13/1988 | EP0252439A2 Method and apparatus for surface treating of substrates |
| 01/13/1988 | EP0252233A1 Process for improving the adhesion of non-polar photoresists to polar substrates |
| 01/13/1988 | EP0252152A1 Photosensitive emulsion for coating plastic film |
| 01/13/1988 | EP0252151A1 Photosensitive material for screen process |
| 01/13/1988 | EP0252150A1 Photosensitive resin composition for screen process |
| 01/13/1988 | EP0161256B1 Graft polymerized sio 2? lithographic masks |
| 01/12/1988 | US4719495 Exposure development device for long base member |
| 01/12/1988 | US4719297 Acylphosphine compounds and their use as photoinitiators |
| 01/12/1988 | US4719273 Unsaturated polysilanes |
| 01/12/1988 | US4719169 Applying antiblocking layer to release surface, then thermoplastic adhesive then peeling away temporary support |
| 01/12/1988 | US4719167 Positive photoresist composition with 1,2 naphthoquinone diazide and novolak resin condensed from mixture of m-cresol, p-cresol, and 2,5-xylenol with formaldehyde |
| 01/12/1988 | US4719166 Positive-working photoresist elements containing anti-reflective butadienyl dyes which are thermally stable at temperatures of at least 200° C. |
| 01/12/1988 | US4718974 Photoresist stripping apparatus using microwave pumped ultraviolet lamp |
| 01/12/1988 | US4718767 Method of inspecting the pattern on a photographic mask |
| 01/12/1988 | US4718748 Curable polysiloxane |
| 01/07/1988 | EP0251681A2 Improvements in the manufacturing of integrated circuits using holographic techniques |
| 01/07/1988 | EP0251447A2 Process for manufacturing a semiconductor device using a mask, and resist material therefor |
| 01/07/1988 | EP0251241A2 Top imaged resists |
| 01/07/1988 | EP0251228A2 Photosensitive flexographic printing plate |
| 01/07/1988 | EP0251203A2 Image-forming method using light-sensitive material and image-receiving material |
| 01/07/1988 | EP0251191A2 Raised relief circuit board with soldered connections having nomenclature applied thereto |
| 01/07/1988 | EP0251187A2 Method for purifying novolak resins useful as material for coating on a semiconductor substrate |
| 01/07/1988 | EP0251059A2 Photosensitive registration material |
| 01/07/1988 | EP0251049A2 Photopolymerisable registration materials, photoresist layers and lithographic printing plates based on these registration materials |
| 01/07/1988 | EP0250975A2 Illumination system |
| 01/07/1988 | EP0250964A2 Reticle transporter |
| 01/07/1988 | EP0250762A2 Formation of permeable polymeric films or layers via leaching techniques |
| 01/07/1988 | EP0250611A1 Process for eliminating a patterned masking layer |
| 01/07/1988 | DE3720728A1 Photosensitive transfer material |
| 01/05/1988 | US4717806 Plasma reactor and methods for use |
| 01/05/1988 | US4717740 Printed circuit board |
| 01/05/1988 | US4717645 Method and apparatus for forming resist pattern |
| 01/05/1988 | US4717644 Improved thruput, reduced proximity effects |
| 01/05/1988 | US4717643 Polymerized mixture of polypropylene glycol monomethacrylate, methacrylic acid, specific (meth) acrylates and isocyanatoethyl methacrylate as the binder; circuit boards |
| 01/05/1988 | US4717640 Light-sensitive mixture, recording material prepared therefrom and process for use thereof |
| 01/05/1988 | US4717639 Process for preparation of a stencil or resist image |
| 01/05/1988 | US4717242 For irridating an object |
| 01/05/1988 | CA1231096A1 Photopolymerizable organic compositions and diaryliodonium salts used therein |
| 12/30/1987 | WO1987006027A3 An etch technique for metal mask definition |
| 12/29/1987 | US4716442 Exposure device and exposure control method |
| 12/29/1987 | US4716441 Light exposure apparatus |
| 12/29/1987 | US4716098 Developer for preparing printing forms and process therefor |
| 12/29/1987 | US4716097 Triarylmethane or xanthene dye |
| 12/29/1987 | US4716095 Pretreatment with acid |
| 12/29/1987 | US4716094 Flexographic printing plates |
| 12/29/1987 | US4716093 Solvent developable photoresist composition and process of use |
| 12/29/1987 | US4715929 Pattern forming method |
| 12/29/1987 | CA1230770A1 Method for reducing degradation of an optical image in an exposure lighthouse |
| 12/23/1987 | EP0250377A1 Composition for negative photoresists and use of the composition |
| 12/23/1987 | EP0250092A1 Method for removing resist |
| 12/23/1987 | EP0250031A1 Opto- lithographic device comprising a displaceable lens system and method of controlling the imaging properties of a lens system in such a device |
| 12/23/1987 | EP0249991A2 Color filter arrays |
| 12/23/1987 | EP0249941A2 Method for producing fine patterns |
| 12/23/1987 | EP0249857A2 Photosensitive registration element |
| 12/23/1987 | EP0249769A2 Patterned image and process for forming a patterned image |
| 12/23/1987 | CN87103854A Photopolymerizable compositon containing carboxy benzotriazole |
| 12/22/1987 | US4714957 Apparatus and method for making a stamp |
| 12/22/1987 | US4714947 Contact printer for photosensitive materials |
| 12/22/1987 | US4714943 Imaging device |
| 12/22/1987 | US4714751 Epoxy-extended oligomers having acryloyl and carboxy groups; aqueous alkaline developers |
| 12/22/1987 | US4714670 Developer including an aliphatic cyclic carbonate in the oil phase emulsion |
| 12/22/1987 | US4714669 Radiation-sensitive polycondensates, their preparation, material coated therewith and the use thereof |
| 12/22/1987 | US4714668 Silica, alumina films; radiation, selective etching, masking |
| 12/22/1987 | US4714504 Advancing through nip of heated application rolls |
| 12/17/1987 | WO1987007735A1 Additive developer |
| 12/17/1987 | WO1987006725A3 Method and apparatus for spreading resin by centrifugation |
| 12/17/1987 | DE3719684A1 Vorsensibilisierte druckplatten-vorstufe Presensitized plates-precursor |
| 12/17/1987 | DE3719355A1 Photosensitive composition |