Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
02/1992
02/25/1992US5091286 Laser-formed electrical component and method for making same
02/25/1992US5091285 Method of forming pattern by using an electroconductive composition
02/25/1992US5091283 Photocurable diallyl phthalate resin composition and printed circuit board using the same
02/25/1992US5091282 Alkali soluble phenol polymer photosensitive composition
02/25/1992US5091280 Photothermography; microencapsulated leuco dyes, polymerizable vinyl monomer, photoinitiator electron acceptive developer
02/25/1992US5091103 Removing hard, baked photoresist from a substrate using solutions of n-alkyl-a-pyrrolidone,, 1,2-propanediol and tetraalkylammonium hydroxide
02/25/1992CA1296215C Photosensitive image receiving sheet material
02/22/1992CA2048830A1 Alkali metal ethyl benzene sulfonate containing developer composition
02/20/1992WO1992002949A1 Substrate whirling plate
02/20/1992WO1992002859A1 Printing member
02/20/1992WO1992002858A1 Process for producing microstructures with locally different structural heights
02/20/1992WO1992002855A1 Single layer dry processible photosensitive composition and toning process
02/20/1992WO1992002572A1 Associative reactive blend-containing compositions
02/20/1992WO1992002331A1 Yag laser working machine for precision working of thin film
02/20/1992WO1991015333A3 Ultrafast electro-dynamic x, y and theta positioning stage
02/20/1992DE4025959A1 Negatively-working aq. alkali-developable radiation-sensitive mixt. - contains water-insol. binder sol. in aq. alkali, cpd. forming strong acid on irradiation, and gp. condensing in presence of acid
02/20/1992DE4024908A1 Prodn. of resist patterns on substrates, esp. drilled substrates - by laminating substrate with a solid resist, removing the protective film, applying a liq. resist, exposing with a mask, and developing
02/19/1992EP0471650A1 Copolyimides, process for their preparation and their use
02/19/1992EP0471628A1 Thin film transistor circuit and its manufacturing
02/19/1992EP0471589A2 Curable silicon rubber compositions and cured products
02/19/1992EP0471483A1 Surface reforming method, process for production of printing plate, printing plate and printing process
02/19/1992EP0471326A1 Positive type photoresist composition
02/19/1992EP0471151A2 Radiation-curable binder mixtures
02/19/1992EP0462204A4 Free-radical curable compositions
02/19/1992CN1058851A Solid imaging system using differential tension elastomeric film
02/18/1992US5089913 High resolution reduction catadioptric relay lens
02/18/1992US5089844 Image recording device
02/18/1992US5089839 Method of processing pre-sensitized lithographic printing plate and apparatus therefor
02/18/1992US5089838 Pressure developing device
02/18/1992US5089711 Laser plasma X-ray source
02/18/1992US5089691 Image recording apparatus having bar code reader for reading bar code attached to leading end of microcapsule sheet
02/18/1992US5089376 Photoimagable solder mask coating
02/18/1992US5089374 Novel bis-onium salts and the use thereof as photoinitiators
02/18/1992US5089373 High resolving power, sensitivity
02/18/1992US5089370 Light-sensitive material comprising light-sensitive layer provided on support
02/18/1992US5089361 Mask making process
02/18/1992US5089310 Image transferring sheet and a method for fabricating the same
02/18/1992US5089305 Coating apparatus and method for applying a liquid to a semiconductor wafer including selecting a nozzle on a stand by state
02/18/1992CA2049266A1 Concentration or separation method, copolyamides and copolyimids-amides and the use thereof
02/18/1992CA2049265A1 Copolyimides, their preparation and the use thereof
02/13/1992DE4025193A1 Etching precision contour in glass plate surface - using coating of water soluble glass lacquer to provide adhesive surface for photoresist layer
02/12/1992EP0470834A2 Photosensitive flexographic printing plate composition
02/12/1992EP0470707A2 Method of patterning a layer
02/12/1992EP0470636A1 A photosensitive resin composition
02/12/1992EP0470581A2 Aromatic diazo compounds, production method thereof and photosensitive compositions using the same
02/12/1992EP0470541A1 Optical projection system
02/12/1992EP0248021B1 Electron beam sensitive positive resist
02/11/1992US5088047 Automated manufacturing system using thin sections
02/11/1992US5087938 Image recording apparatus
02/11/1992US5087927 On-axis air gage focus system
02/11/1992US5087716 Novel synthesis of difunctional halo organo noncarbon group IV main group element amides
02/11/1992US5087553 Cresosl novolak resin photoresist
02/11/1992US5087552 Photosensitive resin composition
02/11/1992US5087551 Process for preparing of semiconductor device and pattern-forming coating solution used for this process
02/11/1992US5087550 Radiation-sensitive mixture and use thereof
02/11/1992US5087549 Image reproduction process using a peel-apart photosensitive element
02/11/1992US5087548 Positive type radiation-sensitive resin composition
02/11/1992US5087547 Improved resolution, stability
02/11/1992US5087537 Depositing photoresist on a substrate, preferential exposure of photoresist and analyzing for accuracy
02/11/1992CA1295774C Auto-photocrosslinkable copolyimides and polyimide compositions
02/11/1992CA1295761C Photopolymerizable compositions containing inorganic fillers
02/06/1992WO1992002041A1 Process for producing a marker indicating the orientation of the crystal lattice of a wafer
02/06/1992WO1992001973A2 Embossing tool
02/06/1992WO1992001734A1 Composite polyester films and their utilization as protection layer for photopolymer plates and photopolymer plates provided with such films
02/06/1992DE4024642A1 Schleuderteller fuer substrate Spinner plate for substrates
02/06/1992DE4024151A1 Printing cylinder prodn. with seamless photopolymer relief - using water-in-oil emulsion for smoothing and/or development, avoiding swelling and shrinkage
02/05/1992EP0469973A1 Method for forming relief patterns
02/05/1992EP0469957A1 Resin composition for image formation
02/05/1992EP0469880A1 Angle detecting device and optical apparatus, such as exposure apparatus, employing the same
02/05/1992EP0469765A1 Method for monitoring photoresist latent images
02/05/1992EP0469744A1 Wafer cooling device
02/05/1992EP0469735A2 Device for forming flexographic printing plate
02/05/1992EP0469584A1 Resist composition
02/05/1992EP0469537A2 Photoimageable electrodepositable photoresist composition
02/05/1992EP0469375A2 Process for the fabrication of a printing cylinder with seamless photopolymeric relief layer for rotary printing
02/05/1992EP0469307A1 Photopolymerizable printing plate for flexographic printing
02/05/1992EP0469026A1 Manufacture of flat panel displays.
02/05/1992CN1058431A Electrophoretic deposition process for photosensitive polymer composition
02/04/1992USH1019 Method for forming images on plain paper
02/04/1992US5086398 Electron beam exposure method
02/04/1992US5086352 Optical members and blanks or synthetic silica glass and method for their production
02/04/1992US5086307 Liquid jet recording head
02/04/1992US5086209 Hot air apparatus for glossing sheets
02/04/1992US5086192 Photopolymerizable compositions and photoinitiators therefor
02/04/1992US5086013 Method for fine patterning
02/04/1992US5085976 Process for dimensionally stabilizing photopolymer flexographic printing plates
02/04/1992US5085975 Radiation sensitive composition utilizing ethylenically unsaturated perfluoroalkyl group-containing compounds and reproduction layers produced therefrom
02/04/1992US5085974 Photopolymerizable mixture, and a recording material produced therefrom
02/04/1992US5085973 Colored filter element containing layers of polymerizable composition
02/04/1992US5085972 Alkoxyalkyl ester solubility inhibitors for phenolic resins
02/04/1992US5085969 Photopolymerizable image-receiving sheet material and process for the formation of a transferred image
02/04/1992US5085886 Dielectric polymer is formed on substrate from the ether reaction product of dicyclopentadiene and a phenol
02/04/1992US5085729 Uniformity using stagnant silylation
02/04/1992US5085669 Process for stabilizing a leuco-dye solution by means of a piperidine derivative
02/04/1992CA1295205C Methylene chloride compound and its use for removing photoresist films
02/04/1992CA1295169C Adhesion promotion in photoresist lamination and processing
02/04/1992CA1295167C Electron beam recording media
02/04/1992CA1295166C Photopolymerizable composition containing carboxy benzotriazole
02/02/1992CA2047582A1 Aqueous, developable photocurable composition, process of making thereof and flexible photosensitive articles made therefrom
01/1992
01/31/1992WO1992002857A1 Aqueous developable precolored diazo imaging element