Patents for C25D 7 - Electroplating characterised by the article coated (12,170)
04/2007
04/24/2007US7208069 Device for etching semiconductors with a large surface area
04/24/2007CA2143354C Surface-treated wire for use in composite elements of elastomeric material and manufacturing process of same
04/19/2007WO2006094755A8 Polyvinylammonium compound, method of manufacturing same, acidic solution containing said compound and method of electrolytically depositing a copper deposit
04/19/2007DE19506656B4 Verfahren zur Keramisierung von Leichtmetalloberflächen Method for ceramizing light metal surfaces
04/18/2007CN1311103C Method for electroplating electrode of ceramic wafer electronic component
04/17/2007US7204924 Method and apparatus to deposit layers with uniform properties
04/17/2007US7204917 Workpiece surface influencing device designs for electrochemical mechanical processing and method of using the same
04/17/2007US7204916 Plating apparatus and plating method
04/12/2007WO2007040191A1 Method of surface treatment for the inhibition of wiskers
04/12/2007US20070082216 Copper-tin-oxygen alloy plating
04/12/2007US20070080057 Plating apparatus, plating cup and cathode ring
04/12/2007US20070079727 Electroless copper plating solution, electroless copper plating process and production process of circuit board
04/12/2007DE10124251B4 Vorrichtung zum Halten von Werkstücken A device for holding workpieces
04/11/2007EP1397828A4 Electrolytic processing device and substrate processing apparatus
04/11/2007CN1947220A Single workpiece processing chamber
04/11/2007CN1946879A Copper electrolysis solution containing compound having specific skeleton as additive, and electrolytic copper foil produced therefrom
04/11/2007CN1944716A Non-cyanogen type electrolytic gold plating bath for bump forming
04/11/2007CN1310312C Semiconductor integrated circuit, method and apparatus for mfg. same
04/11/2007CN1310289C Plating method and apparatus that creates a differential between additive disposed on a top surface and a cavity surface of a workpiece using an external influence
04/11/2007CN1309880C Metal strip for epitaxial coating and method for production thereof
04/11/2007CN1309878C Continuous processing device for plate processing element and electric contact method
04/11/2007CN1309874C Tin plating method
04/10/2007US7202677 Socket for mating with electronic component, particularly semiconductor device with spring packaging, for fixturing, testing, burning-in or operating such a component
04/10/2007US7201829 Mask plate design
04/10/2007US7201828 Planar plating apparatus
04/10/2007US7200930 Probe for semiconductor devices
04/05/2007US20070077441 Metal plating using seed film
04/05/2007US20070075715 Contact Carriers (Tiles) For Populating Larger Substrates With Spring Contacts
04/04/2007EP1118413B1 Structure and method for joining metal members
04/04/2007CN1940147A Formation method of gold bump or gold wiring
04/04/2007CN1940144A Production of zirconium hydride surface Cr CO hydrogen penetration barrier layer
04/04/2007CN1940137A Heat resistant film, its manufacturing method, and electrical and electronic parts
04/04/2007CN1308497C Cartridge plating device and design method
04/04/2007CN1308495C Copper electroplating film method
04/04/2007CN1308494C Method for electroplating a cylindrical inside surface of a work-piece-extending substantially over a semi-circle
04/03/2007US7199052 Seed layers for metallic interconnects
04/03/2007US7199036 Under-bump metallization layers and electroplated solder bumping technology for flip-chip
04/03/2007US7198705 Plating-rinse-plating process for fabricating copper interconnects
04/03/2007US7198055 Meniscus, vacuum, IPA vapor, drying manifold
03/2007
03/29/2007WO2007034921A1 Electrical contact and socket for electrical component
03/29/2007US20070071994 Surface-treated a1 sheet having excellent solderability, heat sink using the sheet, and method for manufacturing the surface-treated a1 sheet having excellent solderability
03/29/2007US20070068801 System for plating
03/29/2007CA2622917A1 Electroplating composition for coating a substrate surface with a metal
03/28/2007EP1766106A2 Pulse reverse electrolysis of acidic copper electroplating solutions
03/28/2007CN1938456A Copper foil and its manufacturing method
03/28/2007CN1935392A Method for the passivation of the surface of coated metal bands and device for the application of the passive layer on a metal coated steel band
03/28/2007CN1935391A Method for lowering the coefficient of friction of the surface of metal bands with a coating and device for applying a metallic coating onto a steel band
03/28/2007CN1307327C Electroplating method
03/27/2007US7195796 Composite , rigid sheet; pretreated steel sheet; multilayer polymer coating containing alpha-olefin
03/27/2007US7195696 Anodes; shaping plate; liquid electrolytes; electrical contactors; electroplating
03/22/2007WO2007031276A1 Process for producing tinplate, tinplate produced using said process and packaging produced thereof
03/22/2007WO2006002969A3 Device and method for chemically and electrolytically treating work pieces
03/22/2007US20070063245 Metal plating using seed film
03/22/2007DE10311575B4 Verfahren zum elektrolytischen Metallisieren von Werkstücken mit Bohrungen mit einem hohen Aspektverhältnis A method of electrolytic plating of workpieces with holes with a high aspect ratio
03/21/2007CN1934293A Surface-treated copper foil having grayed surface, process for producing the same and electromagnetic wave shielding conductive mesh for front panel of plasma display wherein use is made of the surfac
03/21/2007CN1305640C Ultrasonic vibration cutting tools and mfg. method therefor
03/21/2007CN1305624C Wire for high-speed electrical discharge machining and producing method and usage thereof
03/21/2007CA2558572A1 Method for lowering the coefficient of friction of the surface of metal bands with a coating and device for applying a metallic coating onto a steel band
03/20/2007US7192662 Plating alloy using electrolytic cell; magnetic thin film
03/20/2007US7192494 Method and apparatus for annealing copper films
03/15/2007US20070056856 Apparatus and method for electrically contacting wafer in electronic chemical plating cell
03/14/2007EP1761658A2 Device and method for chemically and electrolytically treating work pieces
03/14/2007CN1305132C Lead frame and its electroplating method
03/14/2007CN1305109C Metal element, semiconductor device, electronic device and electronic equipment and its manufacturing method
03/13/2007US7190057 Packaging component and semiconductor package
03/13/2007US7189630 Layer sequence for producing a composite material for electromechanical components
03/13/2007US7189611 Metal plating using seed film
03/13/2007US7189313 Substrate support with fluid retention band
03/13/2007US7189146 Method for reduction of defects in wet processed layers
03/08/2007WO2007026970A1 Threaded joint for steel pipes
03/08/2007WO2007026562A2 Metal film and its production method, and multilayer electronic component production method and multilayer electronic component
03/08/2007WO2002029137A9 Method and associated apparatus for tilting a substrate upon entry for metal deposition
03/08/2007US20070051635 Electrochemical Mechanical Deposition; process involves creating a differential between additives adsorbed on different portions of a workpiece using an external influence and thus either enhancing or retarding plating of a conductive material on these portions
03/08/2007US20070051632 Polishing method, polishing apparatus, plating method, and plating apparatus
03/08/2007DE102005041404A1 Vorrichtung zum Haltern eines Kolbens in einer Anlage zum Beschichten von Kolben Means for supporting a piston in a plant for coating piston
03/06/2007US7186164 Processing pad assembly with zone control
03/01/2007WO2007024331A1 Close loop electrophoretic deposition of phosphors on semiconductor substrates
03/01/2007WO2005081657A3 Laser ablation resistant copper foil
03/01/2007US20070046313 Mounting Spring Elements on Semiconductor Devices, and Wafer-Level Testing Methodology
03/01/2007DE19728183B4 Herstellungsverfahren für leitende Drähte eines Halbleitergehäuses in Chipgrösse Manufacturing method for conductive wires of a semiconductor package in chip size
03/01/2007DE112005000842T5 Verfahren zum Verleihen von Widerstand gegenüber Wasserstoff für Artikel A method of imparting resistance to hydrogen for products
03/01/2007DE10229005B4 Vorrichtung und Verfahren zur elektrochemischen Metallabscheidung Apparatus and method for electro-chemical metal deposition
02/2007
02/28/2007EP1756336A1 Device and method for electrolytically treating flat work-pieces
02/28/2007EP1755813A1 Tool holder with vibration damping means and a method for manufacturing the same
02/28/2007EP1560949A4 Integrated plating and planarization process and apparatus therefor
02/28/2007CN1922344A Apparatus for electroless deposition
02/28/2007CN1920105A Method and apparatus for fluid processing a workpiece
02/28/2007CN1302155C Method and device for electrolytic treatment of electrically conducting surfaces separated plates and film material pieces in addition to uses of said method
02/27/2007US7181842 Method of producing a workpiece forming at least one bearing eye
02/22/2007WO2007021358A1 Method of patterning ultra-small structures
02/22/2007WO2006011922A3 Pulse reverse electrolysis of acidic copper electroplating solutions
02/22/2007US20070042212 Copper foil for high frequency circuit, method of production and apparatus for production of same, and high frequency circuit using copper foil
02/22/2007US20070042155 Reflective or semi-reflective metal alloy coatings
02/21/2007EP1753897A1 Method for electroplating bath chemistry control
02/21/2007EP1753896A1 Method and system for selectively coating or etching surfaces
02/21/2007CN1918328A Improved metal strip electroplating
02/20/2007US7179716 Method of forming a metal-containing layer over selected regions of a semiconductor substrate
02/20/2007US7179541 Achieving optimal embrittlement of grain boundaries; controlled temperature heating
02/20/2007US7179361 Method of forming a mass over a semiconductor substrate
02/20/2007US7179359 Cup-shaped plating apparatus
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