Patents for C25D 17 - Constructional parts, or assemblies thereof, of cells for electrolytic coating (9,411)
08/2004
08/26/2004WO2004072331A2 Apparatus and method for highly controlled electrodeposition
08/26/2004US20040166789 Method of sealing wafer backside for full-face processing
08/26/2004US20040163963 Filter divides internal housing volume; fluid flow to second chamber is higher speed than to first chamber; flows are blended in second chamber; rotates at controlled speed
08/26/2004US20040163950 Planar plating apparatus
08/26/2004US20040163948 Plating apparatus and method of managing plating liquid composition
08/26/2004US20040163946 Pad assembly for electrochemical mechanical processing
08/26/2004DE10310071B3 Process for galvanizing components with metallic coatings comprises moving the component to be coated through process stations using a gripper (20), and immersing in galvanic baths
08/26/2004DE10235020B4 Vorrichtung und Verfahren zum Ätzen großflächiger Halbleiterscheiben Apparatus and method for etching large-surface semiconductor wafers
08/25/2004EP1448812A1 Hydrogen generating cell with cathode subassembly construction
08/19/2004WO2004070808A1 Plasma treating device, and plasma treating device electrode plate, and electrode plate producing method
08/19/2004US20040159553 Semiconductor manufacturing apparatus and method for manufacturing semiconductor devices
08/19/2004US20040159551 dissolving metal particles in a plating system containing a cathode (especially a circuit board) and an insoluble anode and contacting with oxygen in the form of air bubbles, which is automatically or manually controlled; relatively low temperature
08/19/2004US20040159543 Electrochemical cell plate with integral seals
08/19/2004US20040159542 Galvanizing device
08/18/2004EP1447463A1 Metal element for use in a metal basket serving as an anode
08/17/2004US6776885 Integrated plating and planarization apparatus having a variable-diameter counterelectrode
08/12/2004US20040154927 Internal heat spreader plating methods and devices
08/12/2004DE10304533A1 Bead single-crystal with provision for electrical heating, ease of cleaning and electroplating applications, as supply wires
08/11/2004EP1445353A1 Method and device for surface treatment of treated object
08/11/2004EP1444385A1 Anodes for electroplating operations, and methods of forming materials over semiconductor substrates
08/11/2004EP1444064A2 Manufacture of fine-grained electroplating anodes
08/11/2004EP1133589B1 Enhanced membrane electrode devices useful for electrodeposition coating
08/11/2004CN2632100Y Electroplating coating pylons apparatus
08/11/2004CN2632097Y Automatic three dimensional circulating electrolytic devices
08/11/2004CN1520334A Vibratingly stirring appts., and device and method for processing using stirring appts.
08/11/2004CN1519396A Appts. and method of forming zine oxide thin film
08/11/2004CN1161501C Electroplating equipment
08/11/2004CN1161499C Anode electrode structure for mfg. metal foil
08/10/2004US6773576 Anode assembly for plating and planarizing a conductive layer
08/10/2004US6773573 Plating bath and method for depositing a metal layer on a substrate
08/10/2004US6773571 Distributing the current between concentric inner anode and and outer anode (near the wafer edge) to compensate for the variation in electrical resistance and voltage of the seed layer by using focusing elements
08/10/2004US6773560 Dry contact assemblies and plating machines with dry contact assemblies for plating microelectronic workpieces
08/10/2004US6773559 Processing apparatus including a reactor for electrochemically etching a microelectronic workpiece
08/05/2004WO2004065665A1 Method and devices for electrochemical treatment of articles
08/05/2004WO2004065664A1 Plating device and plating method
08/05/2004WO2004065049A1 System and method for holding and releasing a workpiece for electrochemical machining
08/05/2004WO2002097170B1 Mobile zinc cathode stripping system
08/05/2004US20040149588 Electrolytic cooper plating method, phosphorus-containing anode for electrolytic cooper plating, and semiconductor wafer plated using them and having few particles adhering to it
08/05/2004US20040149584 Completely embedding conductive interconnects in high aspect ratio recesses; covering narrow and broad trenches; flatness; rapid chemical mechanical polishing without dishing; growing film while controlling current density
08/05/2004US20040149573 Contact ring with embedded flexible contacts
08/04/2004CN2630264Y Loading-unloading machine for electroplating apparatus
08/04/2004CN1517453A Electroplating device, electroplating cup and cathode ring
07/2004
07/29/2004DE10296936T5 Verfahren zur Herstellung von elektroleitfähigen Teilchen A process for producing electro-conductive particles
07/28/2004EP1441048A2 Plating apparatus, plating cup and cathode ring
07/28/2004CN2628545Y Electroplating bath anode feeding apparatus
07/28/2004CN2628544Y Crystallizer copper plate box type electroplating device for continuous casting machine
07/28/2004CN1516755A Plating apparatus, plasting method and method for mfg. semiconductor device
07/27/2004US6768194 Electrode for electroplating planar structures
07/27/2004US6767437 Electroplating apparatus and electroplating method
07/22/2004WO2004061164A1 Work transfer device for immerse transfer electroplating apparatus
07/22/2004US20040140224 Plenum located within holder has proximal end capable of being removably coupled; piston is configured to move upward in plenum and to lift workpiece off
07/22/2004US20040140203 Liquid isolation of contact rings
07/22/2004US20040140199 Plating apparatus, plating cup and cathode ring
07/22/2004DE10241619B4 Vorrichtung und Verfahren zum elektrolytischen Behandeln von zumindest oberflächlich elektrisch leitfähigem Behandlungsgut Method and apparatus for electrolytic treatment of at least superficially electrically conductive material to be treated
07/21/2004EP1438447A2 Method and conveyorized system for electrolytically processing work pieces
07/21/2004EP1438446A2 System and method for electrolytic plating
07/21/2004CN1158412C Device and method for evening out thickness of metal layers on electrical contact points on items that are to be treated
07/21/2004CN1158411C Electroplating device for circuit board
07/15/2004WO2004059045A2 Anode used for electroplating
07/15/2004US20040134793 for plating conductive material on semiconductor substrate by rotating pad/blade/anode; eliminates dishing and voids; for production of integrated circuits
07/15/2004US20040134774 Processing apparatus including a reactor for electrochemically etching microelectronic workpiece
07/14/2004CN1511977A Electroplating cup with adjustable spacing between cathode, anode and uniform stream plate in wafer level package
07/14/2004CN1157503C Method for producing very small metal ball
07/08/2004WO2004007811A3 Device and method for monitoring an electrolytic process
07/08/2004WO2004001813A3 Substrate holder and plating apparatus
07/08/2004WO2002004712A3 Flow diffuser to be used in electro-chemical plating system
07/08/2004US20040131766 Substrate processing method and apparatus
07/08/2004US20040129576 improves the flatness of a plated film on a substrate even when fine grooves and large grooves are co-present in the surface of the substrate, enabling a later CMP processing to be carried out in a short time while preventing dishing
07/08/2004US20040129575 rotating substrate holding member to remove plating liquid; and sucking liquid remaining on the substrate-contacting portion or in its vicinity, while the holding member is rotated
07/08/2004US20040129569 Electrolytic processing apparatus and electrolytic processing method
07/08/2004US20040129384 Chemical treatment apparatus and chemical treatment method
07/08/2004US20040129209 Phosphate film processing method and phospate film processing device
07/08/2004DE10261493A1 Anode zur Galvanisierung Anode for electroplating
07/08/2004DE10261396A1 Handling station for electroplating of band type substrate carriers, e.g. in solar cells, has a first trough-type container used for galvanizing the strip and a second container which recycles electrolyte flowing from first container
07/08/2004DE10260863A1 Closed reactor for surface electroplating, especially chromium plating of a workpiece, includes a reactor housing and a reactor space containing the workpiece
07/06/2004US6758958 System and a method for plating of a conductive pattern
07/06/2004US6758920 Copper, silver alloy
07/01/2004WO2004055923A2 Direct organic fuel cell proton exchange membrane and method of manufacturing the same
07/01/2004WO2003002784A3 Electrolysis cell for restoring the concentration of metal ions in electroplating processes
07/01/2004US20040124089 Plating method and apparatus for controlling deposition on predetermined portions of a workpiece
06/2004
06/30/2004EP1433880A1 Electroforming system and electroforming method
06/30/2004EP1433537A1 Holding device for hollow articles and its operating method
06/30/2004EP1432523A1 Improvements relating to coating processes and carriers
06/30/2004EP1278899B1 Method and device for the electrolytic coating of a metal strip
06/30/2004CN1509351A Copper electroplating method, phosphorus-copper anode for copper electroplating, and semiconductor wafer with minimal particle adhesion plated by using them
06/30/2004CN1509350A Anodization device and anodization method
06/30/2004CN1509348A Workpiece wet processing
06/30/2004CN1508296A Electroplating device and method thereof
06/29/2004US6755960 Zinc-nickel electroplating
06/29/2004US6755955 Immersing a planar substrate in an electrolyte that contains the catalytically active metallic; applying an electrical voltage; depositing a layer of catalytically active metallic material by electrochemical deposition on the planar substrate
06/29/2004US6755954 Electrochemical treatment of integrated circuit substrates using concentric anodes and variable field shaping elements
06/29/2004US6755946 Clamshell apparatus with dynamic uniformity control
06/24/2004WO2004053204A1 Submicron and nano size particle encapsulation by electrochemical process and apparatus
06/24/2004WO2004052547A2 Coated and magnetic particles and applications thereof
06/24/2004WO2004020320A3 Apparatus for treating strip-shaped parts
06/24/2004US20040118676 Plating apparatus and plating method
06/23/2004EP1431424A2 Plating apparatus and plating method
06/23/2004EP1430167A2 Plating apparatus and method
06/23/2004CN1506502A Method and equipment for controlling local electric current to obtain uniform electroplating thickness
06/22/2004US6752915 Web conveying apparatus, and apparatus and method for electrodeposition using web conveying apparatus
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