Patents for C23F 1 - Etching metallic material by chemical means (16,062)
02/2010
02/09/2010US7658816 Focus ring and plasma processing apparatus
02/09/2010US7658815 Plasma processing apparatus capable of controlling plasma emission intensity
02/09/2010US7658800 Gas distribution assembly for use in a semiconductor work piece processing reactor
02/09/2010CA2467320C Surface treatment process for implants made of titanium alloy
02/09/2010CA2450259C Method and device for locally removing coatings from components
02/04/2010US20100029087 Apparatus and method for etching semiconductor wafer
02/04/2010US20100028652 Metal structure with anti-erosion wear-proof and manufactured method thereof
02/04/2010US20100028602 Composite of metal and resin and method for manufacturing the same
02/04/2010US20100025372 Plasma processing method and apparatus
02/04/2010US20100025370 Reactive gas distributor, reactive gas treatment system, and reactive gas treatment method
02/04/2010US20100025368 High throughput thermal treatment system and method of operating
02/04/2010US20100025366 Method of producing mold
02/04/2010US20100025363 Substrate processing apparatus, and magnetic recording medium manufacturing method
02/04/2010US20100025362 Method of Forming Capacitors
02/04/2010US20100025361 Reflective planar lightwave circuit waveguide
02/04/2010US20100024982 High throughput processing system for chemical treatment and thermal treatment and method of operating
02/04/2010US20100024981 Substrate support for high throughput chemical treatment system
02/04/2010US20100024980 Laser produced plasma euv light source
02/04/2010US20100024979 Method of manufacturing image sensor
02/04/2010US20100024978 Stress engineering for cap layer induced stress
02/04/2010US20100024723 Substrate alignment apparatus and substrate processing apparatus
02/03/2010CN101641461A Multilayer printed wiring boards with copper filled through-holes
02/03/2010CN101638781A Method for directly heating metal membrane to grow oxide nanowires in array-type arranged microcavity structure, and application thereof
02/02/2010US7655152 Etching
02/02/2010US7655111 Plasma processing apparatus and plasma processing method
02/02/2010US7655110 Plasma processing apparatus
02/02/2010US7655093 Wafer support system
01/2010
01/28/2010WO2010010860A1 Method for manufacturing mold and mold
01/28/2010US20100022416 Assay plates, methods and systems having one or more etched features
01/28/2010US20100022030 Dry etch stop process for eliminating electrical shorting in mram device structures
01/28/2010US20100021714 High capacity hydrogen storage material and method of making the same
01/28/2010US20100021523 Medical Devices Having Inorganic Barrier Coatings
01/28/2010US20100019662 Organic light emitting diode display and method of manufacturing the same
01/28/2010US20100018952 Process for removing a coating from a substrate
01/28/2010US20100018951 Process for removing material from substrates
01/28/2010US20100018950 Movable body apparatus, pattern forming apparatus and pattern forming method, device manufacturing method, manufacturing method of movable body apparatus, and movable body drive method
01/28/2010US20100018949 Printhead and method of forming same
01/28/2010US20100018948 Manufacturing method of nozzle for inkjet head
01/27/2010CN101634027A Method for preparing monocrystal silicon textured surface
01/27/2010CN101634026A Corrosive liquid for preparing monocrystal silicon textured surface and method thereof
01/27/2010CN101634025A Open-celled metal implants with roughened surfaces
01/26/2010US7651944 Methods of positioning and/or orienting nanostructures
01/26/2010US7651586 Particle removal apparatus and method and plasma processing apparatus
01/26/2010US7651585 Apparatus for the removal of an edge polymer from a substrate and methods therefor
01/26/2010US7651584 Processing apparatus
01/26/2010US7651583 Processing system and method for treating a substrate
01/26/2010US7650853 Device for applying electromagnetic microwave radiation in a plasma cavity
01/21/2010US20100015812 Method and apparatus for processing workpiece
01/21/2010US20100015809 Organic line width roughness with h2 plasma treatment
01/21/2010US20100015756 Hybrid heterojunction solar cell fabrication using a doping layer mask
01/21/2010US20100015457 Water-based polyurethane floor coating composition
01/21/2010US20100015440 Planar laminate substrate and method for fabricating organic laminate substrate PCBS, semiconductors, semiconductor wafers and semiconductor devices having miniaturized electrical pathways
01/21/2010US20100012622 Adaptive Nanotopography Sculpting
01/21/2010US20100012621 Method of treating copper sulphide deposits in an electrical apparatus by the use of oxidising agents
01/21/2010US20100012620 Wet-processing apparatus and method of fabricating display panel
01/21/2010US20100012274 Focus ring, substrate mounting table and plasma processing apparatus having same
01/21/2010US20100012273 Method and System for Supplying a Cleaning Gas Into a Process Chamber
01/20/2010CN201386136Y Concentration control device of flexible circuit board etching liquid
01/20/2010CN101631897A Pulsed plasma system with pulsed sample bias for etching semiconductor structures
01/20/2010CN100583465C Method for preparing silicon solar battery texturing
01/20/2010CN100582306C Stainless steel etching technique
01/20/2010CN100582272C Co-based alloy functional member and process for producing the same
01/19/2010US7647886 Systems for depositing material onto workpieces in reaction chambers and methods for removing byproducts from reaction chambers
01/14/2010WO2010003321A1 A gas injection device and a semiconductor processing apparatus including the gas injection device
01/14/2010US20100009470 Within-sequence metrology based process tuning for adaptive self-aligned double patterning
01/14/2010US20100009142 Method for the production of structured layers of titanium and nickel
01/14/2010US20100007935 Optical scanning device, retinal scanning display and manufacturing method of optical scanning device
01/14/2010US20100006543 Plasma processing apparatus, plasma processing method and storage medium
01/14/2010US20100006542 Method for Structuring the Surface of a Pressed Sheet or an Endless Strip
01/14/2010US20100006427 Reactor for carrying out an etching method for a stack of masked wafers and an etching method
01/14/2010US20100006226 Apparatus for generating hollow cathode plasma and apparatus for treating large area substrate using hollow cathode plasma
01/14/2010US20100006225 Plasma processing apparatus
01/13/2010EP2143823A2 Open-celled metal implants with roughened surfaces
01/13/2010EP2143559A1 Magnesium alloy compound material, and its manufacturing method
01/13/2010EP2143558A1 Titanium alloy compound material, and its jointing method
01/13/2010CN201381362Y Noiseless chemical liquid cold-hot exchanging precision temperature controller
01/13/2010CN101624700A Preparation method of surface texture of polycrystalline silicon solar cell
01/13/2010CN100580886C Gravity liquid state etching method capable of controlling structure size
01/12/2010US7645704 vapor phase; microelectromechanical systems, semiconductors
01/12/2010US7645494 Pre-plating surface treatments for enhanced galvanic-corrosion resistance
01/12/2010US7645357 Plasma reactor apparatus with a VHF capacitively coupled plasma source of variable frequency
01/12/2010US7645356 Method of processing wafers with resonant heating
01/12/2010US7645342 Restricted radiated heating assembly for high temperature processing
01/12/2010US7645341 Showerhead electrode assembly for plasma processing apparatuses
01/12/2010US7644680 Electrode assembly for non-equilibrium plasma treatment
01/12/2010CA2297447C Method for roughening copper surfaces for bonding to substrates
01/07/2010US20100005553 Sidewall tracing nanoprobes, method for making the same, and method for use
01/07/2010US20100003768 System and method for processing substrates with detachable mask
01/07/2010US20100003461 Information recording medium in which information is recorded as irregularities, and method of manufacturing information recording medium
01/07/2010US20100002449 Method for fabricating micro-lens and mold cavity thereof and light emitting device
01/07/2010US20100000970 In-chamber member temperature control method, in-chamber member, substrate mounting table and plasma processing apparatus including same
01/07/2010US20100000969 Patterning method
01/07/2010US20100000964 Method and system for etching a mem device
01/07/2010US20100000681 Phase change based heating element system and method
01/06/2010EP2141014A1 Stainless steel complex and its manufacturing method
01/06/2010CN201376997Y Silicon material acid etching comprehensive treatment device
01/06/2010CN101619458A Mixed solution of carbonate and caustic alkali for preparing monocrystal silicon suede
01/06/2010CN101619457A Corrosive agent and corrosion method of HfSiON high-K gate dielectric material
01/06/2010CN101619456A Base plate wet equipment
01/06/2010CN100577875C Pure aluminium sheet material corrosive agent
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