Patents for C23F 1 - Etching metallic material by chemical means (16,062)
04/2010
04/29/2010WO2009124180A3 In situ plating and soldering of materials covered with a surface film
04/29/2010US20100105179 Method for manufacturing flash memory device
04/29/2010US20100102033 Method for preparing nanotubes of piezoelectric material and nanotubes of piezoelectric material obtained thereby
04/29/2010US20100102032 Process and installation for the hot marking of translucent or transparent objects
04/29/2010US20100102030 Substrate processing apparatus, substrate processing method, and computer readable storage medium
04/29/2010US20100102025 Method and apparatus for marking coated ophthalmic substrates or lens blanks having one or more electrically conductive layers
04/29/2010US20100101940 Method for removing foreign matter from glass substrate surface and method for processing glass substrate surface
04/29/2010US20100101726 Process control method in spin etching and spin etching apparatus
04/29/2010US20100101725 Apparatus for Making Epitaxial Film
04/29/2010DE102007061687B4 Verfahren zum Mattierungsätzen von Siliziumsubstraten und Ätzmischung zur Durchführung des Verfahrens A method for Mattierungsätzen of silicon substrates and etching mixture for performing the process
04/28/2010EP2178466A1 Nanosurface
04/28/2010CN1681091B Controllable corrosion for preparing nanometer ultra-thin covariant substrates
04/27/2010US7704327 High temperature anneal with improved substrate support
04/27/2010US7703413 Expanded thermal plasma apparatus
04/22/2010WO2010045174A1 Enhanced metal wicking surface
04/22/2010WO2010043291A1 Method for improving the adhesion between silver surfaces and resin materials
04/22/2010US20100099266 Etch reactor suitable for etching high aspect ratio features
04/22/2010US20100099256 Semiconductor device manufacturing method and semiconductor device manufacturing apparatus
04/22/2010US20100097058 Strain-based carbon nanotube magnetometer
04/22/2010US20100096362 Plasma processing apparatus, power supply apparatus and method for operating plasma processing apparatus
04/22/2010US20100096361 Methods and apparatus for sensing unconfinement in a plasma processing chamber
04/22/2010US20100096360 Compositions and methods for barrier layer polishing
04/22/2010US20100096358 Ladder type filter
04/22/2010US20100096256 Patterning of magnetic thin film using energized ions and thermal excitation
04/22/2010US20100096088 Plasma etching apparatus
04/22/2010US20100096085 Plasma reactor with a ceiling electrode supply conduit having a succession of voltage drop elements
04/22/2010US20100096084 Apparatus for supporting substrate and plasma etching apparatus having the same
04/22/2010US20100096083 Shower head structure and treating device
04/22/2010CA2738057A1 Enhanced metal wicking surface
04/21/2010EP2176447A1 A microporous layer for lowering friction in metal-forming processes
04/21/2010CN201439542U Plasma etching machine exhaust system
04/21/2010CN101696501A Precision-forging chemical-milling solution for high-temperature alloy blades and chemical milling method
04/20/2010US7699957 Plasma processing apparatus
04/20/2010US7699023 Gas delivery apparatus for atomic layer deposition
04/20/2010US7699022 Device for the zonal surface treatment of an article by dielectric barrier discharge
04/20/2010CA2394686C Pickling agent containing urea and method of producing it
04/15/2010WO2010040917A1 Method for cleaning surfaces using a protic ionic liquid
04/15/2010US20100093128 Method for manufacturing image sensor
04/15/2010US20100092888 Process for Structuring Silicon
04/15/2010US20100092802 Multi-step etch process for granular media
04/15/2010US20100091413 Magnetic Recording Head, Method of Manufacturing the Same, and Magnetic Recording/Reproducing Device
04/15/2010US20100089871 Plasma processing apparatus, plasma processing method and storage medium
04/15/2010US20100089870 Plasma processing apparatus and plasma processing method
04/15/2010US20100089869 Nanomanufacturing devices and methods
04/15/2010US20100089866 Method for producing tapered metallic nanowire tips on atomic force microscope cantilevers
04/15/2010US20100089761 Method of surface treatment for metal glass part, and metal glass part with its surface treated by the method
04/15/2010US20100089633 Arrangement for Hermetically Sealing Components, and Method for the production thereof
04/15/2010US20100089534 Planar Controlled Zone Microwave Plasma System
04/15/2010US20100089531 Vacuum processing apparatus
04/14/2010EP2175049A1 Method for improving the adhesion between silver surfaces and resin materials
04/14/2010EP2174766A1 Composite of metal with resin and process for producing the same
04/14/2010CN1873054B Etch combination
04/14/2010CN101694013A Corrosion method for increasing strength of solar sige substrate sheets
04/14/2010CN101693997A Method for processing acidic etching waste solution of printed circuit board
04/13/2010US7695983 Independent control of ion density, ion energy distribution and ion dissociation in a plasma reactor
04/13/2010US7695638 adding an alkaline earth hydroxide such as calcium hydroxide to a reaction chamber, then agitation, exhaustion of the liquid through a filter and scraping precipitates adhered to the filter
04/13/2010US7695633 Independent control of ion density, ion energy distribution and ion dissociation in a plasma reactor
04/13/2010US7695598 Coater having substrate cleaning device and coating deposition methods employing such coater
04/13/2010US7695590 Chemical vapor deposition plasma reactor having plural ion shower grids
04/13/2010US7695589 Versatile system for conditioning slurry in CMP process
04/13/2010US7695233 Substrate processing apparatus
04/13/2010US7694651 High velocity method for deposing diamond films from a gaseous phase in SHF discharge plasma and device for carrying out said method
04/08/2010WO2010037572A1 Selective chemical etch method for mram freelayers
04/08/2010US20100086256 Light coupler between an optical fibre and a waveguide made on an soi substrate
04/08/2010US20100084263 Method for producing tight pitched coil with reduced processing steps
04/08/2010US20100084163 Wiring board and method of fabricating the same
04/08/2010DE102008048493A1 Verfahren zur selektiven sauren Entzinkung von Stahlschrotten Process for the selective acidic dezincification of steel scrap
04/07/2010CN201436515U Base board support assembly
04/07/2010CN101691889A Method for producing lamellae for a lamellar seal
04/07/2010CN101691660A Additive for preparing monocrystalline silicon suede
04/07/2010CN101174509B Surface treating method of collecting electrode used in super capacitor
04/06/2010US7693597 Instructions for executing the development of a photoresist by by supplying ozone and a controlled rate of water vapor into the chamber such that dewformation is prevented; improving the peeling rate of, for example, the resist film without plasma ashing
04/01/2010US20100081284 Methods and apparatus for improving flow uniformity in a process chamber
04/01/2010US20100079222 Coplanar waveguide and fabrication method thereof
04/01/2010US20100078746 Semiconductor device and method of manufacturing the same
04/01/2010US20100078407 Liquid drop ejector having self-aligned hole
04/01/2010US20100078213 Method for manufacturing printed wiring board and printed wiring board
04/01/2010US20100078200 Flex circuit assembly with a dummy trace between two signal traces
04/01/2010US20100078130 creping adhesive and modifier comprises polyethylene; for use on cylinder such as a Yankee dryer
04/01/2010DE102008042450A1 Verfahren zum Strukturieren von Siliziumcarbid mittels fluorhaltiger Verbindungen Method for structuring of silicon carbide using fluorine-containing compounds
04/01/2010DE102008042219A1 Chemical deburring of workpieces, e.g. zinc pressure castings, by treatment in aqueous acid containing oxidizing agent then in solution containing surfactant and builder
03/2010
03/31/2010CN101690429A Process for producing printed wiring board and printed wiring board produced by the production process
03/31/2010CN101688315A A method for etching copper and recovery of the spent etching solution
03/31/2010CN101686862A nanosurface
03/31/2010CN101684557A Copper, copper/molybdenum, or copper/molybdenum alloy electrode etching solution for use in liquid crystal display system
03/31/2010CN101684556A Method for processing surface of shell
03/30/2010US7686973 Silicon wafer etching method and apparatus, and impurity analysis method
03/30/2010US7686972 Method for manufacturing magnetic recording medium
03/30/2010US7686926 A tantalum nitride/Ta barrier is first sputter deposited with high target power and wafer bias, argon etching is performed with even higher wafer bias. a flash step is applied with reduced target power and wafer bias; different magnetic field distributions
03/30/2010US7686918 Magnetron plasma processing apparatus
03/30/2010US7686889 Susceptor for semiconductor manufacturing apparatus
03/25/2010US20100073826 Magnetic head having reduced cost electrostatic discharge shunt
03/25/2010US20100072173 Surface profile adjustment using gas cluster ion beam processing
03/25/2010US20100072172 Substrate processing apparatus and substrate processing method
03/25/2010US20100072171 Method Of Fabricating A Printhead IC
03/25/2010US20100072170 Short pitch metal gratings and methods for making the same
03/25/2010US20100071438 Method and apparatus for calibrating mass flow controllers
03/24/2010EP2165007A1 A method for etching copper and recovery of the spent etching solution
03/24/2010CN201427995Y System by using mist chemical agent to carry out single-side continuous chemical wet processing
03/24/2010CN201427994Y Engine impeller milling device
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