Patents for C23F 1 - Etching metallic material by chemical means (16,062)
06/2010
06/01/2010US7727412 Dry etching method
06/01/2010US7727354 Structure for preventing gap formation and plasma processing equipment having the same
05/2010
05/27/2010US20100132080 Method of making and assembling capsulated nanostructures
05/27/2010US20100129697 Stainless stell separator for fuel cell and the manufacturing method thereof
05/27/2010US20100129623 Active Sensor Surface and a Method for Manufacture Thereof
05/27/2010US20100129610 Prismatic silicon and method of producing same
05/27/2010US20100127206 Method for Forming a Nanostructure, a Nanostructure, and a Device Using the Same
05/27/2010US20100126964 High voltage isolation and cooling for an inductively coupled plasma ion source
05/27/2010US20100126963 Pulsed-continuous etching
05/27/2010US20100126962 Spin head and method of chucking substrate using the same
05/27/2010US20100126961 Polysilicon Planarization Solution for Planarizing Low Temperature Poly-Silicon Thin Film Panels
05/27/2010US20100126960 Serpentine Microcircuit Vortex Turbulators for Blade Cooling
05/27/2010US20100126958 Transfer film and method for fabricating a circuit
05/27/2010US20100126765 Multi-layer printed circuit board and manufacturing method thereof
05/27/2010US20100126758 Multilayer printed wiring board and method for manufacturing multilayer printed wiring board
05/27/2010US20100126668 Plasma processing apparatus and method
05/27/2010US20100126667 Capacitive cvd reactor and methods for plasma cvd process
05/27/2010US20100126220 Method for manufacturing lower mold, method for manufacturing glass gob, and method for manufacturing molded glass article
05/26/2010CN201491393U Device applied to plasma
05/26/2010CN101714592A Manufacturing method of low-purity monocrystal silicon solar cell
05/26/2010CN101713073A Surface treating method for aluminum vehicle wheels and alkali etching liquid
05/26/2010CN101414558B Method for reducing wet method etching particle pollution
05/26/2010CN101024882B Cleaning solution for silicon surface and methods of fabricating semiconductor device using the same
05/25/2010US7722925 Showerhead mounting to accommodate thermal expansion
05/25/2010US7722738 Semiconductor device manufacturing unit and semiconductor device manufacturing method
05/25/2010US7722719 Gas baffle and distributor for semiconductor processing chamber
05/25/2010US7721673 Hollow cathode discharging apparatus
05/20/2010US20100125254 Monocyclic high aspect ratio titanium inductively coupled plasma deep etching processes and products so produced
05/20/2010US20100124822 Apparatuses for adjusting electrode gap in capacitively-coupled rf plasma reactor
05/20/2010US20100124619 Solar cell metallization using inline electroless plating
05/20/2010US20100122773 Apparatus for processing substrate and method of maintaining the apparatus
05/19/2010CN201473591U Etch cleaning tank
05/19/2010CN201473590U Open door type etching tank
05/19/2010CN101709471A Chemical milling method for titanium alloy blades
05/19/2010CN101199043B Etching composition and semiconductor device using same
05/19/2010CN101122025B Titanium alloying milling solution and milling technique used for the same
05/18/2010US7718081 etching includes transferring pattern into substrate using double patterned amorphous carbon layer on substrate as hardmask; photoresists; vapor deposition; semiconductors; integrated circuits
05/18/2010US7718032 Dry non-plasma treatment system and method of using
05/18/2010US7718031 Mask frame and method of fixing mask on the mask frame
05/18/2010US7718007 Substrate supporting member and substrate processing apparatus
05/18/2010US7717061 Gas switching mechanism for plasma processing apparatus
05/14/2010WO2010052051A1 Process for removing a coating from surfaces of components using only hydrochloric acid
05/14/2010WO2010051579A1 Surface structure modification
05/14/2010CA2742470A1 Surface structure modification
05/13/2010US20100120194 Method of manufacturing image sensor
05/13/2010US20100118465 Method of Manufacturing Silicon Topological Capacitors
05/13/2010US20100116791 Novel plasma system for improved process capability
05/13/2010US20100116790 Device and method for locally producing microwave plasma
05/13/2010US20100116788 Substrate temperature control by using liquid controlled multizone substrate support
05/13/2010US20100116787 Etching method and apparatus
05/13/2010US20100116786 Etching method and apparatus
05/13/2010US20100116785 Method of making a variable surface area stent
05/13/2010US20100116784 Mesa etch method and composition for epitaxial lift off
05/13/2010US20100116781 Etchant and array substrate having copper lines etched by the etchant
05/13/2010US20100116437 Plasma processing apparatus and constituent part thereof
05/13/2010US20100116436 Ring-shaped member and method for manufacturing same
05/13/2010US20100116423 Micro-fluid ejection device and method for assembling a micro-fluid ejection device by wafer-to-wafer bonding
05/13/2010US20100116055 Micro-electro-mechanical system device, out-of-plane sensor and method for making micro-electro-mechanical system device
05/12/2010EP2184379A1 Method of removing the surfaces of components using hydrochloric acid
05/12/2010EP2183335A1 Microetching composition and method of using the same
05/12/2010DE102008056086A1 Additiv für alkalische Ätzlösungen, insbesondere für Texturätzlösungen sowie Verfahren zu dessen Herstellung Additive for alkaline etching solutions, in particular for Texturätzlösungen and process for its preparation
05/12/2010DE10151180B4 Verfahren und Lösung zur Entschichtung von metallischen Gegenständen mit Nickel-Korrosionsschutzbeschichtung Process and solution for stripping of metal objects with nickel-corrosion protective coating
05/12/2010CN1847457B Metal selective etching liquid
05/12/2010CN1840738B Refining method for copper chloride etching waste liquid and refined copper chloride solution
05/12/2010CN1822350B Method of manufacturing thin film transistor
05/12/2010CN101705488A Surface processing method of super-hydrophobic ice-covering-proof aluminum and steel with rough surface
05/12/2010CN101704959A Method for recovering waste plastic and etching waste liquid
05/12/2010CN101148765B Silicon chip etching method
05/11/2010US7713919 for removing copper from a surface, comprising polyphosphonic acid, hydroxyl-substituted primary amine, and water; for cleaning gun bores; effective in removing copper and other deposits without flammable solvents or ammonia
05/11/2010US7713757 Method for measuring dopant concentration during plasma ion implantation
05/11/2010US7713430 Using positive DC offset of bias RF to neutralize charge build-up of etch features
05/11/2010US7713380 Method and apparatus for backside polymer reduction in dry-etch process
05/11/2010US7713378 Ozone processing device
05/11/2010US7713377 Apparatus and method for plasma treating a substrate
05/11/2010US7712436 Plasma processing apparatus with filter circuit
05/11/2010US7712435 Plasma processing apparatus with insulated gas inlet pore
05/11/2010US7712434 Apparatus including showerhead electrode and heater for plasma processing
05/11/2010CA2356601C High throughput screening method, array assembly and system
05/06/2010WO2010050266A1 Method for surface treatment of copper and copper
05/06/2010US20100114274 Surface modification of implantable article
05/06/2010US20100112819 Plasma processing method and plasma processing apparatus
05/06/2010US20100112492 Fabrication of a high fill ratio silicon spatial light modulator
05/06/2010US20100112308 Method of producing nanopatterned articles, and articles produced thereby
05/06/2010US20100108973 Image sensor and method for manufacturing the same
05/06/2010US20100108642 Method for removing fine-grain silicon material from ground silicon material and apparatus for carrying out the method
05/06/2010US20100108640 Drawing method, stamper manufacturing method, information recording medium manufacturing method, and drawing apparatus
05/06/2010US20100108636 Integrated Tool for Fabricating an Electronic Component
05/06/2010US20100108500 Encapsulated sputtering target
05/06/2010US20100108262 Apparatus for in-situ substrate processing
05/06/2010US20100108261 Lower electrode assembly of plasma processing chamber
05/05/2010CN1967773B Etching method of ditch road device
05/05/2010CN1914356B Surface-treating agent for metal
05/05/2010CN1726302B Method of cleaning a coated process chamber component
05/05/2010CN101701360A Dislocation etching solution and etching method of (100) germanium monocrystal
05/04/2010US7709277 PAA-based etchant, methods of using same, and resultant structures
05/04/2010US7708926 Capillary imprinting technique
05/04/2010US7708859 Gas distribution system having fast gas switching capabilities
05/04/2010US7708834 Bolt and plasma processing apparatus provided with same
05/04/2010US7707965 Processing apparatus and lid opening/closing mechanism
05/04/2010CA2384889C Temporary bridge for micro machined structures
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