| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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| 08/25/1993 | EP0557067A1 Broad beam flux density control |
| 08/25/1993 | EP0551360A4 Vaccum metallization of substrates |
| 08/24/1993 | US5239612 Method for resistance heating of metal using a pyrolytic boron nitride coated graphite boat |
| 08/24/1993 | US5239611 For heating a material to an evaporation temperature |
| 08/24/1993 | US5238752 Thermal barrier coating system with intermetallic overlay bond coat |
| 08/24/1993 | US5238741 Protection from attack by a titanium matrix metal |
| 08/24/1993 | US5238546 Method and apparatus for vaporizing materials by plasma arc discharge |
| 08/24/1993 | US5237756 Method and apparatus for reducing particulate contamination |
| 08/24/1993 | US5237745 Method of and apparatus for manufacturing drive plate |
| 08/19/1993 | WO1993016492A1 Advance multilayer molded plastic package using mesic technology |
| 08/19/1993 | WO1993016212A1 Modular ibad apparatus and method for continuous coating, and product |
| 08/19/1993 | WO1993016211A1 Process for producing thin films by means of reactive cathode sputtering and device for implementing it |
| 08/19/1993 | DE4222210C1 Protective coating for titanium@ or titanium@ alloy jet engine component - comprises top layer of titanium@ intermetallic cpd. with vanadium@ chromium@, manganese@, niobium, molybdenum@, tantalum or tungsten@, and interlayer |
| 08/19/1993 | DE4204371A1 Thin film prodn. by reactive sputtering - esp. for homogeneous high temp. oxide superconductor thin film prodn. |
| 08/19/1993 | CA2120464A1 Advance multilayer molded plastic package using mesic technology |
| 08/19/1993 | CA2108542A1 Advance multilayer molded plastic package using mesic technology |
| 08/18/1993 | EP0556136A1 Electrode foil for electrolytic capacitor and process of manufacture |
| 08/18/1993 | EP0556115A1 Device for control of material flow emitted by a vacuum evaporation source |
| 08/18/1993 | EP0555891A2 Vacuum processing system |
| 08/18/1993 | EP0555890A2 Vacuum processing system |
| 08/18/1993 | EP0555764A1 Vacuum-processing apparatus |
| 08/18/1993 | EP0555519A1 Vacuum-coating apparatus |
| 08/18/1993 | EP0555518A1 Apparatus for treating an oxide layer |
| 08/18/1993 | EP0555339A1 Magnetron sputter coating method and apparatus with rotating magnet cathode |
| 08/18/1993 | CN1075341A Vertical metal industrial ion implantation machine of strong current |
| 08/18/1993 | CN1021836C Ion plating technology for titanium carbonitride coatings |
| 08/17/1993 | US5237152 Apparatus for thin-coating processes for treating substrates of great surface area |
| 08/17/1993 | US5236895 Production of oxide superconducting films by laser sputtering using N22 |
| 08/17/1993 | US5236894 Process for producing a superconducting thin film at relatively low temperature |
| 08/17/1993 | US5236850 Sputtering in hydrogen atmosphere, crystallization, heating to form semiconductive path, forming current source region and current drain regions |
| 08/17/1993 | US5236632 Sputtering target for low resistance, transparent electroconductive film |
| 08/17/1993 | US5236510 Method and apparatus for forming a deposited layer on a skirted substrate |
| 08/17/1993 | US5236509 Modular ibad apparatus for continuous coating |
| 08/17/1993 | CA1321397C N-silyl substituted 1-sila-2-azacyclopentanes |
| 08/12/1993 | DE4204193A1 Electrolytic capacitor prodn. - by coating capacitor foil and/or anode body using sputtering process |
| 08/11/1993 | EP0555085A1 Sputtering target |
| 08/11/1993 | EP0554552A1 Process and device for evaporating materials in a vacuum vessel |
| 08/11/1993 | EP0554522A2 Rotary lock for transferring a substrate from one treatment- chamber to a neighbouring one |
| 08/11/1993 | EP0554521A2 Apparatus for heat treating and transporting substrates |
| 08/11/1993 | EP0554360A1 Rotating magnetron incorporating a removable cathode |
| 08/11/1993 | EP0398985B1 Infra-red transparent materials |
| 08/10/1993 | US5234769 Wear resistant transparent dielectric coatings |
| 08/10/1993 | US5234758 Electrical and optical nonlinear response |
| 08/10/1993 | US5234724 Forming ion beam from ionized dopant, impacting on surface of growing diamond |
| 08/10/1993 | US5234561 Evacuating chamber with substrate, coating by cathodic arc plasma deposition and magnetron sputtering without breaking vacuum |
| 08/10/1993 | US5234560 Substrate-holding space bounded by a multipolar magnetic fields lines of force where interaction of the glow discharge form a homogeneous plasma; vacculum deposition; protective titanium nitride metal coatings |
| 08/10/1993 | US5234527 Liquid level detecting device and a processing apparatus |
| 08/10/1993 | US5234487 Method of producing tungsten-titanium sputter targets and targets produced thereby |
| 08/10/1993 | US5234484 Controlled rapid heating in preheated oven while shielding parts of substrate |
| 08/10/1993 | CA1321229C Electron cyclotron resonance ion source |
| 08/05/1993 | DE4203080A1 Substrate transport equipment for multistation vacuum coating plants - comprises upright, flat, travelling substrate holders and fixed sliding contacts to apply heat tempering current to film coating |
| 08/04/1993 | EP0554047A1 SiC single crystal growth |
| 08/04/1993 | EP0553691A1 Passive shield for CVD wafer processing which prevents frontside edge and backside deposition |
| 08/04/1993 | EP0553518A1 Elastomers and method for stabilization and lubrification |
| 08/04/1993 | EP0553410A1 Apparatus for coating a substrate, especially with nonconductive layers |
| 08/04/1993 | EP0553295A1 In situ growth of superconducting films |
| 08/04/1993 | EP0413834B1 Diamond-covered member and process for producing the same |
| 08/04/1993 | CN1075027A Method and apparatus for laser deposition of large area superconductive film |
| 08/03/1993 | US5232790 Transparent substrate and recording layer separated by dielectric layer having refractive index varying from lower next to substrate to higher next to recording layer, warp resistance |
| 08/03/1993 | US5232750 Method for fabricating magnetic recording medium |
| 08/03/1993 | US5232572 Device for the releasable fastening of a target or target base on a cathode mounting |
| 08/03/1993 | US5232571 Aluminum nitride deposition using an AlN/Al sputter cycle technique |
| 08/03/1993 | US5232570 Nitrogen-containing materials for wear protection and friction reduction |
| 08/03/1993 | US5232569 Circularly symmetric, large-area, high-deposition-rate sputtering apparatus for the coating of disk substrates |
| 08/03/1993 | US5232567 Alternately arranging first and second metal regions on target; isolating plates to prevent mixing; sputtering on moving substrate |
| 08/03/1993 | US5232318 Coated cutting tools |
| 07/29/1993 | DE4202211A1 Sputter installation - has at least one magnetron cathode and an electrically insulated screen limiting plasma propagation |
| 07/29/1993 | DE4201551A1 Sputtering cathode - includes electrically floating dark-space screen to prevent target contamination |
| 07/29/1993 | DE4143135A1 Cathode for vapour deposition coating of a substrate |
| 07/28/1993 | EP0552648A1 Method of and apparatus for forming a multi-layer film |
| 07/28/1993 | EP0552466A2 Method for joining semiconductor substrates |
| 07/28/1993 | EP0548084A4 A vacuum deposited dark coating on a substrate |
| 07/28/1993 | EP0423384B1 Control arrangement for an elevator system without a speed sensor |
| 07/28/1993 | EP0352308B1 Method of sputtering |
| 07/28/1993 | CN1074765A Multilayer film materials system |
| 07/28/1993 | CN1074715A Arc-sowrce-multi-ion beam material surface modification tecbnique |
| 07/27/1993 | US5231075 Process for preparing superconducting oxide thin films |
| 07/27/1993 | US5230923 Process and apparatus for the substantially continuous manufacture of a silicon oxide deposition film on a flexible plastic film |
| 07/27/1993 | US5230784 Microwave plasma source |
| 07/27/1993 | US5230721 Apparatus for supplying ultrahigh purity gas |
| 07/27/1993 | US5230462 Method of soldering a sputtering target to a backing member |
| 07/27/1993 | US5230459 Method of bonding a sputter target-backing plate assembly assemblies produced thereby |
| 07/22/1993 | WO1993014240A1 Process for ionising thermally generated material vapours and device for implementing it |
| 07/22/1993 | WO1993014239A1 Procedure and apparatus for improving a plasma accelerator plating apparatus used for diamond plating |
| 07/22/1993 | WO1993013888A1 Corrosion prevention of honeycomb core panel construction using ion implantation |
| 07/22/1993 | DE4219692C1 Vapour coating process - in which parameter valves are continually fed to computer where output signals change the speed of vaporisation in response to coating process changes |
| 07/21/1993 | EP0551360A1 Vaccum metallization of substrates |
| 07/21/1993 | EP0524174A4 Method of preparing amorphous fluorocarbon coatings |
| 07/21/1993 | CN2138651Y Surface modifying device for composite plasma material |
| 07/21/1993 | CN1074579A Semiconductor electric-heating thin film and manufacture thereof |
| 07/21/1993 | CN1074424A Improved heat treatable sputter-coated glass systems |
| 07/20/1993 | US5229615 End station for a parallel beam ion implanter |
| 07/20/1993 | US5229570 Method of an apparatus for a centering of an electron beam |
| 07/20/1993 | US5229358 Sputtering, reacting superconductive materials |
| 07/20/1993 | US5229333 Method for improving the interface characteristics of CaF2 on silicon |
| 07/20/1993 | US5229194 Applied before bending and tempering; layer system including metallic layer of nickel or alloy covered by metallic silicon or nickel oxide protected by layer of tin oxide |
| 07/20/1993 | US5228968 Cathode sputtering system with axial gas distribution |
| 07/20/1993 | US5228963 Localized plasma within hollow cylindrical target uniformly sputters material onto filament |
| 07/20/1993 | US5228917 Apparatus to reduce the sagging of the outside walls of vacuum tanks |
| 07/20/1993 | US5228501 Physical vapor deposition clamping mechanism and heater/cooler |