Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
03/1994
03/22/1994US5296302 Abrasion-resistant overcoat for coated substrates
03/22/1994US5296297 Reflective articles having improved corrosion resistance
03/22/1994US5296274 Disposing transition metal on surface of graphite, directing electron beam to melt transition metal and evaporate graphite, condensing on support
03/22/1994US5296272 Method of implanting ions from a plasma into an object
03/22/1994US5296122 Sputtering thin films for electrodes of ion detectors by radiation of targets in a vacuum chamber
03/22/1994US5296119 Defect-induced control of the structure of boron nitride
03/22/1994US5296118 Having means for inserting processed disk into cassette, removing plug from central disk aperture on one side only
03/17/1994WO1994005455A2 Modulated-structure of pzt/pt ferroelectric thin films for non-volatile random access memories
03/17/1994DE4230872A1 Multiple substrate holder e.g. for cathodic sputtering unit - provides identical masking and identical motion of substrates
03/17/1994DE4230291A1 Microwave-assisted sputtering appts. - comprises vacuum chamber, target, magnetic appts., microwave, and electromagnet
03/17/1994DE4230290A1 Appts. for producing plasma using cathode sputtering - comprises plasma chamber, target connected to electrode, magnetron, and microwave emitter
03/17/1994CA2131901A1 Modulated-structure of pzt/pt ferroelectric thin films for non-volatile random access memories
03/16/1994EP0587237A1 Display device
03/16/1994EP0587181A1 Highly corrosion-resistant metal, method and apparatus of manufacturing the same, and use thereof
03/16/1994EP0587095A2 Method of making an oxide superconducting thin film
03/16/1994EP0586809A1 Sputter cathode and method for the manufacture of this cathode
03/16/1994EP0586774A1 Process for manufacturing thin films by multilayer deposition
03/16/1994EP0586758A1 Hybrid reinforcements for high temperature composites and composites made therefrom
03/16/1994EP0586702A1 Electric arc evaporator of metals
03/16/1994CN1083870A Unidirectional field generator
03/15/1994US5294476 Patterning process and microparticles of substantially the same geometry and shape
03/15/1994US5294464 Vacuum coating a plastic substrate, generation of a plasma and applying a reflective coating
03/15/1994US5294322 Electric arc coating device having an additional ionization anode
03/15/1994US5294321 An interface of boron, phosphorus, antimony or arsinic between the refractory metal silicide and silicon phase
03/15/1994US5294320 Apparatus for cleaning a shield in a physical vapor deposition chamber
03/15/1994US5294312 Iron oxide
03/15/1994CA1327770C Process for the manufacture of glass with modified radiant energy characteristics and the product so obtained
03/10/1994DE4232373A1 Structural semiconductor layer deposition method - heating applied film using laser beam, to transfer the film material to surface of substrate
03/10/1994DE4229399A1 Prodn. of functional structure of semiconductor element - by forming all layers without lithography, and applying to substrate using physical method
03/10/1994DE4229397A1 Appts. for sputtering material from target - comprises high performance laser, frequency multiplier, and laser beam guide
03/09/1994EP0585883A1 Method of measuring refractive index of thin film and refractive index measuring apparatus therefor
03/09/1994EP0585848A1 Method and apparatus for thin film formation by CVD
03/09/1994EP0585445A1 Sputtering apparatus with a magnet array having a geometry for a specified target erosion profile
03/09/1994EP0306491B1 Arc coating of refractory metal compounds
03/09/1994CN1083544A System and method for multilayer film production on tape substrates
03/09/1994CN1083543A Vapour-deposition material for the production of optical coatings of medium refractive index
03/08/1994US5293508 Ion implanter and controlling method therefor
03/08/1994US5292596 Force-transmitting surfaces of titanium protected from pretting fatigue by a coating of Co-Ni-Fe
03/08/1994US5292419 Sputtering unit
03/08/1994US5292417 Sputtered particle layer has lower conductivity than target
03/03/1994WO1994005019A1 High-temperature superconductor compound thin film and method
03/03/1994WO1994004716A1 Surface preparation and deposition method for titanium nitride onto carbonaceous materials
03/03/1994WO1994004356A1 Antireflection coatings
03/03/1994WO1994004316A1 Titanium-nitride and titanium-carbide coated grinding tools and method therefor
03/03/1994DE4328586A1 Controlling the reaction ratio during coating process - in which the partial pressure of the gas is adjusted by alteration of the evapn. rate of a solid reacting with the gas etc.
03/03/1994DE4326852A1 Determining plasma assisted PVD coatability - esp. of cemented carbide, by measuring surface binder metal content
03/03/1994DE4243463A1 Polyimide with special bonding properties to metal, esp. e.g. gold - prepd. by vapour deposition of pyromellitic dianhydride and di:amino-di:phenyl di:sulphide on a metal substrate, followed by imidisation
03/03/1994DE4229031A1 Thermostable coating system for hexa:cyano-benzene on pure oxide free silicon - used as passivation, insulation, sub-coat, surface modifier, organic semiconductor or signal determn. in silicon substrate
03/03/1994CA2142847A1 Antireflection coatings
03/02/1994EP0584922A2 Pyrotechnic sheet material
03/02/1994EP0584921A2 Pyrotechnic sheet material
03/02/1994EP0584672A1 Method of manufacturing an indium oxide powder useful as material of a high-density ITO sintered body
03/02/1994EP0584562A2 Method of depositing of an oxide superconducting thin film and manufacturing apparatus
03/02/1994EP0584483A1 Method for preparing a shield to reduce particles in a physical vapor deposition chamber
03/02/1994EP0584443A1 Process and apparatus for continuous vacuum coating of non-conductive sheets
03/01/1994US5290993 Microwave plasma processing device
03/01/1994US5290761 Heating target below melting point before and during ablation
03/01/1994US5290758 Plasma-assisted deposition process for producing a thin layer on a substrate
03/01/1994US5290625 Conductive aluminum base, chromate conversion coating compound with aluminum, dielectric urethane resin prime and base coats, vacuum-deposited corrosion-prone nonconductive indium layer with islands and channels, clear resin dielectric topcoat
03/01/1994US5290590 Production of magnetic recording medium
03/01/1994US5290588 Titanium, tungsten alloys
03/01/1994US5290417 Apparatus with axial gas distribution for vacuum coating substrates on a carousel
03/01/1994US5290416 Unidirectional field generator
03/01/1994US5290394 Method of manufacturing a thin Hg1-x Cdx Te film
03/01/1994CA1327294C Durable sputtered films of metal alloy oxides
02/1994
02/24/1994DE4227961A1 Producing thin layers using reactive cathode sputtering
02/24/1994DE4227588A1 Verfahren zum Aufbringen einer dünnen Metallschicht auf ein polymeres Trägermaterial A method for applying a thin metal layer on a polymeric carrier material
02/23/1994EP0584028A1 As-deposited large grain aluminium
02/23/1994EP0583997A1 Topographical selective patterns
02/23/1994EP0583736A1 Plasma-enhanced magnetron-sputtered deposition of materials
02/23/1994EP0583473A1 Method and device for treatment of articles in gas-discharge plasma
02/23/1994EP0583455A1 Modular ibad apparatus and method for continuous coating, and product
02/23/1994CN1082750A A magnetic recording disk for contact recording
02/23/1994CN1082625A Anti-microbial coating for medical devices
02/22/1994US5288543 Multilaye of plasma polymer and diamond life film, used in audio and video tapes
02/22/1994US5288541 Method for metallizing through holes in thin film substrates, and resulting devices
02/22/1994US5288528 Decomposing, repolymerizing additoin polymers; chain transfer agent or initiator present; molecular weight control
02/22/1994US5288515 Vapor deposition method and apparatus for producing an EL thin film of uniform thickness
02/22/1994US5288456 Copper germanide containing gallium and/or gold; oxidation resistant
02/22/1994US5288380 Cosputtering with dopant in a reducing gas
02/22/1994US5288379 Robotic vacuum system; thin film deposition on substrate
02/22/1994US5288328 Apparatus for controlling a material flow emitted by a heated evaporation source and application to a vacuum evaporation coating machine
02/22/1994US5288326 Apparatus for continuous growth of SiC single crystal from SiC synthesized in a vapor phase without using graphite crucible
02/22/1994US5287914 System for substrate cooling in an evacuated environment
02/17/1994WO1994003331A1 Abrasion wear resistant coated substrate product
02/17/1994DE4226914A1 Magnetic recording support with improved recording properties - comprises ferromagnetic layer formed on polymer support treated by ion beam and sputter etching
02/17/1994DE4226911A1 Magnetic recording layer for use at high frequencies - comprises ion etched polymer support and ferromagnetic cobalt-contg. thin layer
02/17/1994DE4226864A1 Substrate deposition chamber - contains a gas at an adjusted partial pressure to apply thin coating of HT superconductive material through a particle stream
02/16/1994EP0439561B1 Process and device for coating substrates
02/16/1994CN1082202A Evaporating material and method of producing optical thin film utilizing the same
02/15/1994US5286550 Process for producing a patterned metal surface
02/15/1994US5286531 Method for treating an oxide coating
02/15/1994US5286361 Magnetically attached sputter targets
02/15/1994US5286360 Apparatus for coating a substrate, especially with electrically nonconductive coatings
02/10/1994DE4325520A1 Component used in combustion engines - has coating on surface towards working zone of a non-stick metal inert to reaction
02/10/1994DE4303312C1 Corrosion protection layer for aluminium@ parts - made of aluminium@-silicon alloy which is vapour coated onto the part
02/10/1994DE4302167C1 Zirconium di:oxide target partly stabilised with yttrium oxide - for vapour deposition of thermal insulation on high temp. metal article, e.g. turbine blade, which melts and vaporises without spattering
02/10/1994DE4228573C1 Process and equipment for thin film deposition by pulsed laser, - with thermal screening of the receptor surface between opening times and reheating of the substrate to the given film growth temperature
02/10/1994DE4226229A1 Surface treatment using high energy material pulse
02/09/1994EP0582425A2 Metal coating of polypyromellitimides