Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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02/09/1994 | EP0582387A1 A metallic wiring board and a method for producing the same |
02/09/1994 | EP0582228A1 Process for forming amorphous silicon hydride film |
02/09/1994 | EP0581902A1 Method and apparatus for linear magnetron sputtering |
02/09/1994 | EP0581833A1 A method for manufacturing solar cells. |
02/09/1994 | EP0581772A1 Matrix-coated reinforcement for production of metal matrix composites |
02/08/1994 | US5284824 Method for manufacturing an oxide superconductor thin film |
02/08/1994 | US5284679 Method for making bright trim articles |
02/08/1994 | US5284564 Magnetron sputtering cathode for vacuum coating apparatus |
02/08/1994 | US5284561 Method and apparatus for sputter coating employing machine readable indicia carried by target assembly |
02/08/1994 | US5284539 Method of making segmented pyrolytic graphite sputtering targets |
02/08/1994 | US5284521 Vacuum film forming apparatus |
02/07/1994 | CA2101624A1 Pyrotechnic sheet material |
02/05/1994 | CA2101621A1 Pyrotechnic sheet material |
02/04/1994 | CA2101827A1 Adhesion of metal coatings to polypyromellitimides |
02/03/1994 | WO1994002659A1 Improvements in the method and apparatus of vacuum deposition |
02/03/1994 | WO1994002260A1 Corrosion prevention of honeycomb core panel construction using ion beam enhanced deposition |
02/03/1994 | DE4325950A1 Spinning ring installation and removal - utilises appliance with interchangeable press blocks and rail supports for each function |
02/03/1994 | DE4225531A1 Lever device for easy replacement of cathodic sputtering device target - tightens the target unit to the cathode body and releases it to enable rapid target change |
02/03/1994 | DE4225385A1 Continuous cpd. semiconductor layer prodn. process - comprises vapour depositing a 1st discrete layer of one metallic component of semiconductor, etc., esp. for mass prodn. of inexpensive solar cells |
02/03/1994 | DE4225169A1 Generating agglomerate jets - with the nozzle divergence angle between 3 and 30 degrees and vapour pressure in nozzle chamber at least 200 hecto pascals |
02/02/1994 | EP0581496A2 Molecular beam epitaxy (MBE) effusion source utilizing heaters to achieve temperature gradients |
02/02/1994 | EP0581440A1 Ion beam scanning system |
02/02/1994 | EP0581303A2 Magnetic head having a chromium nitride protective film for use in a magnetic recording and/or reproducing apparatus and a method of manufacturing the same |
02/02/1994 | EP0581295A1 Magnetoresistance film and method of manufacturing same |
02/02/1994 | EP0580855A1 Advance multilayer molded plastic package using mesic technology |
02/02/1994 | EP0580837A1 Process for producing thin films by means of reactive cathode sputtering and device for implementing it |
02/02/1994 | CN1023653C Adjustable opposite magnetically-controlled sputtering source |
02/01/1994 | US5283435 Apparatus for determining the concentration of a gas in a vacuum chamber |
02/01/1994 | US5283233 Method for producing a superconductor layer of YBa2 Cu3 O7 on a sapphire substrate |
02/01/1994 | US5283118 Metallized wrapping film |
02/01/1994 | US5283095 Optical recording medium comprising (1,1,1) aluminum |
02/01/1994 | US5283030 Coated cemented carbides and processes for the production of same |
02/01/1994 | US5282985 Lubricant coatings |
02/01/1994 | US5282947 Magnet assembly for enhanced sputter target erosion |
02/01/1994 | US5282946 Hot and cold plastic working, vacuum casting, annealing, cooling, rolling, hot isostatic pressing; ingots |
02/01/1994 | US5282944 Ionizing metal vapors used in coating |
02/01/1994 | US5282943 Sputtering thin coating of aluminum onto target; heating; soldering |
02/01/1994 | US5282607 Stripping apparatus of metal film from metallized plastic film |
02/01/1994 | CA1326615C Al-cr alloy vapor-deposited material |
01/27/1994 | DE4224686A1 Method for implantation of ions into a solid body - comprises passing ions through an energy absorbent layer before implantation |
01/26/1994 | EP0580112A1 Manufacturing method of glass optical elements having a fine concave and convex pattern and press-molding die therefor |
01/26/1994 | EP0580050A1 Process for making a polymer/metal or a polymer/semi-conductor band |
01/26/1994 | EP0580019A1 Oriented polycrystalline thin films of transition metal chalcogenides |
01/26/1994 | EP0579983A1 Impurity-containing hard carbon film |
01/26/1994 | EP0579756A1 Coated cutting tool |
01/26/1994 | EP0579712A1 Light transmissive electrically conductive oxide |
01/25/1994 | US5281575 Laser ablation method for forming oxide superconducting films |
01/25/1994 | US5281557 Controlling plasma power density, silicon dioxide with high wet etch rate |
01/25/1994 | US5281485 Structure and method of making Alpha-Ta in thin films |
01/25/1994 | US5281483 Metallized films |
01/25/1994 | US5281320 Wafer coating system |
01/25/1994 | CA2044976C Vacuum vapor deposition apparatus |
01/25/1994 | CA1326411C Diffusion barrier coating material |
01/20/1994 | WO1994001792A1 Gallium oxide thin film and process for producing the same |
01/20/1994 | WO1994001600A1 Protective coating for titanium components and process for producing it |
01/20/1994 | WO1994001596A1 Method of soldering a sputtering target to a backing member |
01/20/1994 | WO1994001595A1 Method and apparatus for low temperature deposition of dielectric films on polymers |
01/20/1994 | DE4323437A1 Prodn. of magnet-optical recording medium, e.g. disk - using multi-layer recording film formed from thin films of at least two or more types which are stacked alternatingly several times on substrate in sputter system |
01/20/1994 | DE4322512A1 Increasing adhesion between metal coatings and polymer substrates - by depositing a first metal layer, followed by an interlayer contg. the first metal and a second metal, and then the second metal alone |
01/20/1994 | DE4238784C1 Corrosion susceptibility redn. and increasing wear resistance of components made of low-alloy steels - by cleaning component surface and forming diffusive layer by chrome on bombardment in vacuum on diffusion layer |
01/20/1994 | DE4223590A1 Minor used for outer mirrors of vehicles - comprising transparent substrate, mirror coating on reverse side of substrate and an electric heater |
01/20/1994 | CA2139221A1 Method of soldering a sputtering target to a backing member |
01/19/1994 | EP0579114A1 Sputtering apparatus |
01/19/1994 | EP0579018A1 Process for production of a metal oxide layer, vacuum treatment apparatus for the process and article coated with at least one metal oxide layer |
01/19/1994 | EP0578911A1 Method for fabricating a wear-resistant magnet-containing component and resulting article |
01/18/1994 | US5280510 Microparticle coating on inside of fuel rods and other fuel assembly components |
01/18/1994 | US5279873 Composite material for balloon and balloon made thereof |
01/18/1994 | US5279868 Method of preparing ultrafine particle dispersion material |
01/18/1994 | US5279853 Process for coating, with inorganic films, the surface of bodies fabricated from polymeric materials |
01/18/1994 | US5279723 Removal mcromolecules using solenoid |
01/18/1994 | CA1326174C Alloyed-zinc-plated steel sheet and process for preparing the same |
01/17/1994 | CA2097388A1 Topographical selective patterns |
01/13/1994 | DE4322516A1 Enhancing adhesion of metals, esp. silver@, to polymers - by coating polycarbonate, polyether-imide, etc. with the metal and heating for set time at set temp. |
01/13/1994 | DE4321301A1 Coating method for glass substrates - comprises coating with gallium oxide by reactive vaporisation of gallium in oxygen@ to form anti-reflection layer |
01/13/1994 | DE4222500A1 Metal parts with density reduced metal coatings mfr. in vacuum - by heating metal to vaporisation in sealed furnace and solidification in vacuum or esp. space conditions for lightweight structural components in space station |
01/13/1994 | DE4221864A1 Coating silicate glass surfaces with hard, partially reflective layer - with silicate surface pre-treated to reduce alkali content and increase silicate network forming agents leading to improved wear and corrosion resistance in final coating |
01/13/1994 | DE4220588A1 Arc evaporation device for target - has shield round the periphery of the target to prevent edge contact by the arc |
01/12/1994 | EP0578046A1 Transparent conductive film, and target and material for vapor deposition to be used for its production |
01/12/1994 | EP0578010A1 Multi-zone plasma processing method |
01/12/1994 | EP0577922A1 Apparatus for vacuumcoating of foils |
01/12/1994 | EP0577766A1 Apparatus and method for high throughput sputtering |
01/12/1994 | EP0577667A1 Arc source macroparticle filter |
01/12/1994 | CN2152808Y Apparatus for gas phase synthesis of film and micropowder by laser |
01/11/1994 | US5278861 Method of treating metals by deposition of materials and furnace for implementing said method |
01/11/1994 | US5277996 Fuel cell electrode and method for producing same |
01/11/1994 | US5277938 Controlling the electron beam movement |
01/11/1994 | US5277779 Rectangular cavity magnetron sputtering vapor source |
01/11/1994 | US5277778 Method for coating components or shapes by cathode sputtering |
01/11/1994 | US5277714 Vacuum arc deposition device |
01/11/1994 | CA1325899C Method for making tungsten-titanium sputtering targets |
01/08/1994 | CA2099854A1 Process for enhacing adhesion between a metal and a polymeric substrate |
01/08/1994 | CA2099852A1 Process for utilizing a metallic interlayer to enhance adhesion between a metal and a polymeric substrate |
01/06/1994 | WO1994000695A1 Magnetostrictive transducer |
01/06/1994 | WO1994000618A1 Process for laminating metal for emi-blocking over plastic |
01/05/1994 | EP0577246A1 Method and apparatus for direct deposition of ceramic coatings |
01/05/1994 | EP0577109A1 Method for forming metal thin film by using laser beam |
01/05/1994 | EP0576660A1 Corrosion prevention of honeycomb core panel construction using ion implantation |
01/05/1994 | DE4223592A1 Arc vaporising apparatus - with movable magnetic coil below target to adjust magnetic field and ensure uniform target vaporisation |
01/05/1994 | DE4222021A1 New isonitrile or organo-silyl acetyl-acetonato or ketiminato copper cpds. - used in deposition of film contg. copper@, and opt. other metal or polymer on inorganic or organic substrate, e.g. polymer, at relatively low temp. |
01/05/1994 | CN1080332A Plasma vapor deposition apparatus |