Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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11/18/1993 | EP0569642A1 Automated device for applying evaporator beads to a conductive wire |
11/18/1993 | EP0569467A1 Target for cathode sputtering. |
11/18/1993 | DE4225352C1 Installation and method for reactive deposition of metal cpd. coatings - with cathode heated to temp. of plasma ignition, allowing high-strength corrosion- resistant coatings to be produced |
11/18/1993 | DE4223568C1 Aluminium@-zinc@ coating of foil esp. for capacitor - by vapour deposition while introducing oxygen@ |
11/17/1993 | CN2146493Y Vacuum coating machine for organic glass |
11/17/1993 | CN2146492Y 金属表面改性装置 Metal surface improving apparatus |
11/16/1993 | US5262611 Apparatus for ion-plasma machining workpiece surfaces including improved decelerating system |
11/16/1993 | US5262245 Advanced thermal barrier coated superalloy components |
11/16/1993 | US5262194 Quartz crystal sensors |
11/16/1993 | US5262032 Sputtering apparatus with rotating target and target cooling |
11/16/1993 | US5262030 Magnetron sputtering cathode with electrically variable source size and location for coating multiple substrates |
11/16/1993 | US5262028 Glow discharge sputtering and magnetism |
11/16/1993 | US5261964 Evaporator boat for an apparatus for coating substrates |
11/16/1993 | CA2096274A1 Device for holding substrates |
11/11/1993 | WO1993022779A1 Ultra-thin low moisture content polyester film and its applications |
11/11/1993 | DE4307435A1 Vacuum coating installation incorporating a substrate carrier with rotary drive - with a quasi-hydrostatic bearing system entry for the drive |
11/10/1993 | EP0512062B1 Iron-rich metallic glasses having high saturation induction and superior soft ferromagnetic properties at high magnetization rates |
11/10/1993 | CN1078272A Method and equipment for explosion coating |
11/10/1993 | CN1078219A High performance, durable, low-e glass and method of making same |
11/09/1993 | US5260251 Sputtering an oxide film on a dielectric substrate from the target compounds and heating in oxygen atmosphere in deposited film in presence of thalium and lead oxide source |
11/09/1993 | US5259965 Or space; cleaning titanium /alloy/ substrate, heating at 700 degrees C. for ten hours to form titanium oxide coating, applying solid lubricating film to coating |
11/09/1993 | US5259942 Device for transferring a workpiece into and out from a vacuum chamber |
11/09/1993 | US5259941 Vaporizer for vacuum coating apparatus |
11/09/1993 | US5259735 Evacuation system and method therefor |
11/09/1993 | US5259603 Device for mounting and transporting substrates in vacuum apparatus |
11/09/1993 | CA1324055C Artificial hair for hair-implantation and preparation process and preparation apparatus thereof |
11/04/1993 | DE4223505C1 Reactive magnetron sputtering device for application of insulating or low conductivity layer - uses anode potential for relative isolation of all parts in contact with plasma on outside of cathode target |
11/03/1993 | EP0568446A1 Process for depositing a compound oxide superconducting thin film |
11/03/1993 | EP0568064A2 Pb/Bi-containing high-dielectric constant oxides using a non-Pb/Bi-containing perovskite as a buffer layer |
11/03/1993 | EP0567954A1 Method of forming thin film on substrate by reactive DC sputtering |
11/03/1993 | EP0567735A1 High performance, durable, low-E glass and method of making same |
11/03/1993 | EP0567501A1 Ion vapour deposition apparatus and method |
11/03/1993 | CN1077995A Ion plating apparatus |
11/03/1993 | CN1022609C Binder enriched CVD and PVD coated cutting tool |
11/02/1993 | US5258366 Laser evaporation method for forming high Tc superconducting films |
11/02/1993 | US5258074 Evaporation apparatus comprising film substrate voltage applying means and current measurement means |
11/02/1993 | CA1323856C Magnetron sputtering targets |
10/28/1993 | WO1993021685A1 Stabilizer for switch-mode powered rf plasma processing |
10/28/1993 | WO1993020953A1 Process for making thin polymer film by pulsed laser evaporation |
10/28/1993 | DE4210125A1 Installation for reactive gas flow sputtering - with the inner surfaces of the cathode parallel to a divergent gas stream |
10/28/1993 | CA2118213A1 Process for making thin polymer film by pulsed laser evaporation |
10/28/1993 | CA2094791A1 Process for depositing a compound oxide superconducting thin film |
10/27/1993 | EP0567252A1 Whisker-anchored thermal barrier coating |
10/27/1993 | EP0566606A1 Device and process for the vaporisation of material. |
10/27/1993 | CN1022580C Sputtered titanium oxynitride film article |
10/26/1993 | US5256594 Masking technique for depositing gallium arsenide on silicon |
10/26/1993 | US5256339 Fabrication technique for silicon microclusters using pulsed electrical power |
10/26/1993 | US5256266 Alumina material useful with thin film heads |
10/25/1993 | WO1993023092A1 Anti-microbial coating for medical devices |
10/20/1993 | EP0566271A2 Wear-resistant transparent dielectric coatings |
10/20/1993 | EP0566053A1 Olefin resin-based articles having gas barrier properties |
10/20/1993 | EP0566040A2 Process for selectively depositing copper aluminum alloy onto a substrate |
10/20/1993 | EP0565901A1 Control and moderation of aluminum in silicon using germanium and germanium with boron |
10/20/1993 | EP0565786A1 Vacuum gate valve |
10/20/1993 | EP0565766A2 Copper film coated substrate and method of forming copper film on substrate |
10/20/1993 | CN1077501A Apparatus for ionically plating |
10/19/1993 | US5254832 Method of manufacturing ultrafine particles and their application |
10/19/1993 | US5254363 Method for producing oxide films |
10/19/1993 | US5254237 Plasma arc apparatus for producing diamond semiconductor devices |
10/19/1993 | US5254236 Sputtering apparatus |
10/19/1993 | US5254169 High-vacuum coating apparatus |
10/19/1993 | US5253584 Oxidizing halogenated polymer and layer of oxidizable metal,or alloy therof,reacting exothermically on ignition |
10/19/1993 | CA1323162C Moisture-resistant, coated thermoplastic film having enhanced adhesion to inks and metallic layers |
10/18/1993 | CA2091472A1 Whisker-anchored thermal barrier coating |
10/14/1993 | WO1993020256A1 Abrasion-resistant overcoat for coated substrates |
10/14/1993 | WO1993019936A1 Improved high transmittance, low emissivity coatings for substrates |
10/14/1993 | DE4303462A1 Multi-chamber coating installation - has adjustable locks between chambers, minimising gas transfer between coating chambers to give improved quality |
10/14/1993 | DE4211798A1 Vacuum vapour deposition equipment for coating substrates - with several magnetron cathode sets, each comprising a magnet pair, a screened target and aperture for a substrate |
10/13/1993 | EP0565455A1 Process for preparing superconducting thin film formed of oxide superconductor material |
10/13/1993 | EP0565089A1 Ion implanting apparatus |
10/13/1993 | EP0564819A2 Process for deposition of adherent metallic, ceramic or carbon layers on temperature-sensitive materials |
10/13/1993 | EP0564789A1 Process for treatment of workpieces in a vacuum processing apparatus |
10/13/1993 | EP0564709A1 Coated transparent substrate, use thereof, method and apparatus of manufacturing such coatings, and hafnium-oxynitride HfOxNy with 1.5 x/y 3 and 2.6 n 2.8 |
10/13/1993 | EP0502950B1 Process for sputtering multilayers for magneto-optical recording |
10/12/1993 | US5253266 MBE effusion source with asymmetrical heaters |
10/12/1993 | US5252553 Preheating a silicon wafer in vacuum to deposite zirconium oxide protective undercoating barriers |
10/12/1993 | US5252547 Vapor depositing a halogen-free protective coatings consisting of an oxides, a carbides or a nitrides |
10/12/1993 | US5252390 Superconductive thin film |
10/12/1993 | US5252365 Depositing metal to form carbide, depositing second metal to lubricate |
10/12/1993 | US5252194 Rotating sputtering apparatus for selected erosion |
10/12/1993 | US5252181 Method for cleaning the surface of a substrate with plasma |
10/12/1993 | US5252178 Multi-zone plasma processing method and apparatus |
10/12/1993 | US5252174 Method for manufacturing substrates for depositing diamond thin films |
10/12/1993 | US5252135 Sealing apparatus for continuous vacuum treating equipment |
10/12/1993 | CA1322987C Process and apparatus for treating a coated, elongated substrate, as well as substrates thus treated and articles of polymeric material reinforced with these substrates |
10/07/1993 | DE4305487A1 Spring-type holding frame for disc-shaped workpieces - which minimises covered areas on workpiece surface |
10/07/1993 | DE4234590C1 Two-sided continuous coating of a substrate - with the substrate preheated to a temp. above the optimum pptn. temp. before placed into the coating position |
10/07/1993 | DE4228499C1 Plasma-aided coating of substrates - with a low-voltage arc discharge between a cathode and an anodic electrode |
10/07/1993 | DE4211363A1 Coating transparent substrate by cathode sputtering - to produce disks of high transmission behaviour in the visible region and giving high reflection to heat radiation |
10/07/1993 | DE4210613A1 Substrate coating appts with metal oxide superconductor - comprises coating chamber contg. heater, and laser ablation appts. to provide stream of superconducting material |
10/06/1993 | EP0564082A1 Plasma processing apparatus for generating uniform strip-shaped plasma |
10/06/1993 | EP0563992A2 Method and apparatus for the manufacture of metallic surface layers on substrates |
10/06/1993 | EP0563113A1 Preventing of via poisoning by glow discharge induced desorption. |
10/05/1993 | US5250780 Apparatus for treating the surface of workpieces by means of a plasma torch |
10/05/1993 | US5250779 Method and apparatus for heating-up a substrate by means of a low voltage arc discharge and variable magnetic field |
10/05/1993 | US5250511 Laser evaporation method for preparing a superconducting oxide thin film |
10/05/1993 | US5250367 Toughness, wear resistance, shock resistance |
10/05/1993 | US5250137 Plasma treating apparatus |
10/05/1993 | CA1322698C Nonwoven insulating webs |
09/30/1993 | WO1993019571A1 System for characterizing ac properties of a processing plasma |