Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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09/30/1992 | EP0506484A1 Ion beam generating apparatus, filmforming apparatus, and method for formation of film |
09/30/1992 | EP0506376A1 Method of fabricating anisometric needles and birefringent suspension thereof in dielectric fluid |
09/30/1992 | EP0263880B1 Continuous ion plating device for rapidly moving film |
09/30/1992 | EP0261245B1 Process for producing transparent conductive film |
09/29/1992 | US5151605 Method of irradiating an object by means of a charged particle beam, and device for performing the method |
09/29/1992 | US5151334 Fuel cell utilizing solidous electrolyte |
09/29/1992 | US5151304 Multilayer element with polyimide support, coating, crystallization, washing and conversion of polyimide to polyamide and polyamide to polyimide |
09/29/1992 | US5151303 Method and apparatus for using evacuated, detachable web containers with high vacuum treating means |
09/29/1992 | CA1308060C Cathode and target design for a sputter coating apparatus |
09/24/1992 | DE4131520C1 Single or multilayer structured coatings core - with mask film passed over cylindrical body |
09/23/1992 | EP0504960A1 Phosphorus-alloyed cubic boron nitride films |
09/23/1992 | EP0504959A2 Carbon-alloyed cubic boron nitride films |
09/23/1992 | EP0504706A1 Heptandionate compounds of alkaline earth metals |
09/23/1992 | EP0504477A1 Substrate coating device |
09/23/1992 | CN1064710A Method of depositing diamond-like carbon film onto substrate having low melting temperature |
09/22/1992 | US5149415 Film forming apparatus |
09/22/1992 | US5149409 Sputter-deposition of cobalt, chromium and platinum alloy in an inert gas atmosphere in presence of a hydrocarbon gas dopant; high signal-to-noise ratio of readback signal |
09/22/1992 | CA1307759C Vacuum processing apparatus |
09/19/1992 | WO1992016672A1 An evaporation system for gas jet deposition of thin film materials |
09/17/1992 | WO1992016014A2 Method and apparatus for concave substrates |
09/17/1992 | WO1992015723A1 Process for adhering metal to polyimide film |
09/17/1992 | DE4115616A1 Titanium-aluminium nitride layered coating for machine tool - gives alternate layers differing in thickness and nitrogen content, and are applied using vacuum process |
09/16/1992 | EP0503974A1 Multigrain abrasive particles |
09/16/1992 | EP0503941A1 Sputtering method for forming superconducting films using water vapor addition |
09/16/1992 | EP0503822A2 A diamond- and/or diamond-like carbon-coated hard material |
09/16/1992 | EP0503577A1 Method for the production of thin films and apparatus therefor |
09/16/1992 | EP0503138A1 Device for actuating a magnet arrangement of a planar magnetron for a sputtering facility |
09/16/1992 | EP0502950A1 Process for sputtering multilayers for magneto-optical recording. |
09/16/1992 | CN1064508A Alternating electric field vacuum ion sedimentation and equipment thereof |
09/16/1992 | CN1018311B Method for film forming of bismuth system complex oxide superconductive film |
09/15/1992 | US5148025 In situ composition analysis during growth vapor deposition |
09/15/1992 | US5147731 Stabilized zirconia/CoCRAlY high temperature coating |
09/15/1992 | US5147726 Aluminum deposited film and process for producing it |
09/15/1992 | US5147521 Quick change sputter target assembly |
09/15/1992 | US5147519 Sacraficial substrate |
09/15/1992 | US5147518 Using an aminomercaptan compound as coupler |
09/15/1992 | US5147498 Semiconductors |
09/15/1992 | US5147490 Process for the production of a heat-mode recording material |
09/15/1992 | US5147461 Molecular beam epitaxial growth device and molecular beam control method therein for exactly controlling thickness and composition of epitaxial film |
09/15/1992 | US5147168 Loading and unloading airlock apparatus for a vacuum treatment chamber |
09/15/1992 | CA2061936A1 Multigrain abrasive particles |
09/10/1992 | DE4107711A1 Material doping by magnetron sputtering - using separate plasmas for different target portions |
09/10/1992 | DE4106771A1 Flat glass coating - has gap between target and cathode in vapour deposition appts. to prevent pimple formation on the deposited layer |
09/09/1992 | EP0502632A1 Process for producing a patterned metal surface |
09/09/1992 | EP0502479A1 Digital recording medium |
09/09/1992 | EP0502412A1 Processing system |
09/09/1992 | EP0502385A1 Process for the double-sided coating of optical workpieces |
09/09/1992 | EP0502242A2 Process and apparatus for reactive coating of a substrate |
09/09/1992 | EP0345358B1 Target material for forming superconductive film |
09/08/1992 | US5146137 Device for the generation of a plasma |
09/08/1992 | US5145713 Stoichiometric growth of compounds with volatile components |
09/08/1992 | CA2061490A1 Process for producing a patterned metal surface |
09/05/1992 | CA2061969A1 Digital recording medium |
09/03/1992 | WO1992015122A1 Solid state fuel cell and process for the production thereof |
09/03/1992 | WO1992015114A1 Semiconductor manufacturing equipment |
09/03/1992 | WO1992014942A1 Bearings |
09/03/1992 | WO1992014860A1 Matrix-coated reinforcement for production of metal matrix composites |
09/03/1992 | WO1992014859A1 Process and device for reducing droplets during coating of surfaces with hard substances by a pvd process |
09/03/1992 | WO1992014852A1 Titanium-based alloy produced by vapour quenching |
09/02/1992 | EP0501016A1 Method for controlling a reactive sputtering process and apparatus for carrying out the method |
09/02/1992 | EP0500928A1 Endocurietherapy |
09/02/1992 | CN1018113B Superconductive material and method mfg. thereof |
09/01/1992 | US5144147 Ion implantation apparatus and method of cleaning the same |
09/01/1992 | US5144143 Device for the ionization of metals having a high melting point, which may be used on ion implanters of the type using ion sources of freeman or similar type |
09/01/1992 | US5143747 Coating with organosilicon compound, doping with inert gas to transform to silicon carbide; wear resistance |
09/01/1992 | US5143590 A backing, positioning and machining the interior walls |
09/01/1992 | CA1306972C Electric arc vapor deposition method and apparatus |
08/26/1992 | EP0500454A1 Brazing method for binding two workpieces, in particular a ceramic one and a metallic one, and product therefore |
08/26/1992 | EP0500346A2 Process for producing plastic lens |
08/26/1992 | EP0500031A1 Method of manufacturing a sputtering target |
08/26/1992 | EP0499805A1 Method for depositing a thin layer consisting of several materials by photo-ablation |
08/26/1992 | EP0499770A2 Indirectly cooled target with quick-change system |
08/26/1992 | EP0310656B1 Surface treatment of polymers |
08/26/1992 | CN1063907A Preparation process of drop-form condensed metal material |
08/26/1992 | CN1018021B Solar energy selective absorption film and preparation method thereof |
08/25/1992 | US5141919 Thallium, barium, calcium and copper oxide |
08/25/1992 | US5141613 Silicon carbide coatings |
08/25/1992 | US5141595 Method and apparatus for carbon coating and boron-doped carbon coating |
08/25/1992 | US5140939 Apparatus and crucible for vapor deposition |
08/20/1992 | WO1992014258A1 High density plasma deposition and etching apparatus |
08/20/1992 | WO1992013980A1 Vapour deposition |
08/20/1992 | DE4201001A1 Prodn. of stoichiometric metal or non-metal cpds. by sputter coating - avoiding irregular distribution of coating on substrate by regulating sputter pressure |
08/20/1992 | DE4105014A1 Vapour deposition - has closed tunnels of magnetic field lines over molten material in crucible with electron beam guns for ionisation |
08/20/1992 | DE4104592A1 Epitaxial deposition of high temp. ceramic superconductor on silicon@ - using an intermediate layer of which the first part is deposited by sputtering in an oxygen-free high pressure ambient |
08/19/1992 | EP0499357A2 Ion beam potential detection probe |
08/19/1992 | EP0499294A1 Method of molecular epitaxial growth of single crystal layers of compound semiconductors |
08/19/1992 | EP0499241A1 Sputtering process for forming aluminum layer over stepped semiconductor wafer |
08/19/1992 | EP0499215A2 Evaluation of the extent of wear of articles |
08/19/1992 | EP0499197A2 Improved die tooling for metal working and method for its production |
08/19/1992 | EP0499124A2 Line evaporator |
08/19/1992 | EP0499052A2 Process for the production of articles with good surface properties |
08/19/1992 | EP0487656A4 Charge neutralization apparatus for ion implantation system |
08/19/1992 | EP0471005A4 High hardness/high compressive stress multilayer coated tool |
08/18/1992 | USRE34035 Carbon containing layer |
08/18/1992 | US5139998 Controlled thallous oxide evaporation for thallium superconductor films and reactor design |
08/18/1992 | US5139813 Exposing coated surface to active plasma, then exposure to controlled-wave length light for detection of pinholes |
08/18/1992 | US5139633 Film-forming on substrate by sputtering |
08/18/1992 | US5139537 Depositing titanium nitride on preheated cubic boron nitride wheel in arc evaporator chamber in nitrogen atmosphere at low pressure |
08/18/1992 | US5139459 Clean transfer method and system therefor |
08/18/1992 | US5138974 Vacuum apparatus for coating an optical substrate |