Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
09/1992
09/30/1992EP0506484A1 Ion beam generating apparatus, filmforming apparatus, and method for formation of film
09/30/1992EP0506376A1 Method of fabricating anisometric needles and birefringent suspension thereof in dielectric fluid
09/30/1992EP0263880B1 Continuous ion plating device for rapidly moving film
09/30/1992EP0261245B1 Process for producing transparent conductive film
09/29/1992US5151605 Method of irradiating an object by means of a charged particle beam, and device for performing the method
09/29/1992US5151334 Fuel cell utilizing solidous electrolyte
09/29/1992US5151304 Multilayer element with polyimide support, coating, crystallization, washing and conversion of polyimide to polyamide and polyamide to polyimide
09/29/1992US5151303 Method and apparatus for using evacuated, detachable web containers with high vacuum treating means
09/29/1992CA1308060C Cathode and target design for a sputter coating apparatus
09/24/1992DE4131520C1 Single or multilayer structured coatings core - with mask film passed over cylindrical body
09/23/1992EP0504960A1 Phosphorus-alloyed cubic boron nitride films
09/23/1992EP0504959A2 Carbon-alloyed cubic boron nitride films
09/23/1992EP0504706A1 Heptandionate compounds of alkaline earth metals
09/23/1992EP0504477A1 Substrate coating device
09/23/1992CN1064710A Method of depositing diamond-like carbon film onto substrate having low melting temperature
09/22/1992US5149415 Film forming apparatus
09/22/1992US5149409 Sputter-deposition of cobalt, chromium and platinum alloy in an inert gas atmosphere in presence of a hydrocarbon gas dopant; high signal-to-noise ratio of readback signal
09/22/1992CA1307759C Vacuum processing apparatus
09/19/1992WO1992016672A1 An evaporation system for gas jet deposition of thin film materials
09/17/1992WO1992016014A2 Method and apparatus for concave substrates
09/17/1992WO1992015723A1 Process for adhering metal to polyimide film
09/17/1992DE4115616A1 Titanium-aluminium nitride layered coating for machine tool - gives alternate layers differing in thickness and nitrogen content, and are applied using vacuum process
09/16/1992EP0503974A1 Multigrain abrasive particles
09/16/1992EP0503941A1 Sputtering method for forming superconducting films using water vapor addition
09/16/1992EP0503822A2 A diamond- and/or diamond-like carbon-coated hard material
09/16/1992EP0503577A1 Method for the production of thin films and apparatus therefor
09/16/1992EP0503138A1 Device for actuating a magnet arrangement of a planar magnetron for a sputtering facility
09/16/1992EP0502950A1 Process for sputtering multilayers for magneto-optical recording.
09/16/1992CN1064508A Alternating electric field vacuum ion sedimentation and equipment thereof
09/16/1992CN1018311B Method for film forming of bismuth system complex oxide superconductive film
09/15/1992US5148025 In situ composition analysis during growth vapor deposition
09/15/1992US5147731 Stabilized zirconia/CoCRAlY high temperature coating
09/15/1992US5147726 Aluminum deposited film and process for producing it
09/15/1992US5147521 Quick change sputter target assembly
09/15/1992US5147519 Sacraficial substrate
09/15/1992US5147518 Using an aminomercaptan compound as coupler
09/15/1992US5147498 Semiconductors
09/15/1992US5147490 Process for the production of a heat-mode recording material
09/15/1992US5147461 Molecular beam epitaxial growth device and molecular beam control method therein for exactly controlling thickness and composition of epitaxial film
09/15/1992US5147168 Loading and unloading airlock apparatus for a vacuum treatment chamber
09/15/1992CA2061936A1 Multigrain abrasive particles
09/10/1992DE4107711A1 Material doping by magnetron sputtering - using separate plasmas for different target portions
09/10/1992DE4106771A1 Flat glass coating - has gap between target and cathode in vapour deposition appts. to prevent pimple formation on the deposited layer
09/09/1992EP0502632A1 Process for producing a patterned metal surface
09/09/1992EP0502479A1 Digital recording medium
09/09/1992EP0502412A1 Processing system
09/09/1992EP0502385A1 Process for the double-sided coating of optical workpieces
09/09/1992EP0502242A2 Process and apparatus for reactive coating of a substrate
09/09/1992EP0345358B1 Target material for forming superconductive film
09/08/1992US5146137 Device for the generation of a plasma
09/08/1992US5145713 Stoichiometric growth of compounds with volatile components
09/08/1992CA2061490A1 Process for producing a patterned metal surface
09/05/1992CA2061969A1 Digital recording medium
09/03/1992WO1992015122A1 Solid state fuel cell and process for the production thereof
09/03/1992WO1992015114A1 Semiconductor manufacturing equipment
09/03/1992WO1992014942A1 Bearings
09/03/1992WO1992014860A1 Matrix-coated reinforcement for production of metal matrix composites
09/03/1992WO1992014859A1 Process and device for reducing droplets during coating of surfaces with hard substances by a pvd process
09/03/1992WO1992014852A1 Titanium-based alloy produced by vapour quenching
09/02/1992EP0501016A1 Method for controlling a reactive sputtering process and apparatus for carrying out the method
09/02/1992EP0500928A1 Endocurietherapy
09/02/1992CN1018113B Superconductive material and method mfg. thereof
09/01/1992US5144147 Ion implantation apparatus and method of cleaning the same
09/01/1992US5144143 Device for the ionization of metals having a high melting point, which may be used on ion implanters of the type using ion sources of freeman or similar type
09/01/1992US5143747 Coating with organosilicon compound, doping with inert gas to transform to silicon carbide; wear resistance
09/01/1992US5143590 A backing, positioning and machining the interior walls
09/01/1992CA1306972C Electric arc vapor deposition method and apparatus
08/1992
08/26/1992EP0500454A1 Brazing method for binding two workpieces, in particular a ceramic one and a metallic one, and product therefore
08/26/1992EP0500346A2 Process for producing plastic lens
08/26/1992EP0500031A1 Method of manufacturing a sputtering target
08/26/1992EP0499805A1 Method for depositing a thin layer consisting of several materials by photo-ablation
08/26/1992EP0499770A2 Indirectly cooled target with quick-change system
08/26/1992EP0310656B1 Surface treatment of polymers
08/26/1992CN1063907A Preparation process of drop-form condensed metal material
08/26/1992CN1018021B Solar energy selective absorption film and preparation method thereof
08/25/1992US5141919 Thallium, barium, calcium and copper oxide
08/25/1992US5141613 Silicon carbide coatings
08/25/1992US5141595 Method and apparatus for carbon coating and boron-doped carbon coating
08/25/1992US5140939 Apparatus and crucible for vapor deposition
08/20/1992WO1992014258A1 High density plasma deposition and etching apparatus
08/20/1992WO1992013980A1 Vapour deposition
08/20/1992DE4201001A1 Prodn. of stoichiometric metal or non-metal cpds. by sputter coating - avoiding irregular distribution of coating on substrate by regulating sputter pressure
08/20/1992DE4105014A1 Vapour deposition - has closed tunnels of magnetic field lines over molten material in crucible with electron beam guns for ionisation
08/20/1992DE4104592A1 Epitaxial deposition of high temp. ceramic superconductor on silicon@ - using an intermediate layer of which the first part is deposited by sputtering in an oxygen-free high pressure ambient
08/19/1992EP0499357A2 Ion beam potential detection probe
08/19/1992EP0499294A1 Method of molecular epitaxial growth of single crystal layers of compound semiconductors
08/19/1992EP0499241A1 Sputtering process for forming aluminum layer over stepped semiconductor wafer
08/19/1992EP0499215A2 Evaluation of the extent of wear of articles
08/19/1992EP0499197A2 Improved die tooling for metal working and method for its production
08/19/1992EP0499124A2 Line evaporator
08/19/1992EP0499052A2 Process for the production of articles with good surface properties
08/19/1992EP0487656A4 Charge neutralization apparatus for ion implantation system
08/19/1992EP0471005A4 High hardness/high compressive stress multilayer coated tool
08/18/1992USRE34035 Carbon containing layer
08/18/1992US5139998 Controlled thallous oxide evaporation for thallium superconductor films and reactor design
08/18/1992US5139813 Exposing coated surface to active plasma, then exposure to controlled-wave length light for detection of pinholes
08/18/1992US5139633 Film-forming on substrate by sputtering
08/18/1992US5139537 Depositing titanium nitride on preheated cubic boron nitride wheel in arc evaporator chamber in nitrogen atmosphere at low pressure
08/18/1992US5139459 Clean transfer method and system therefor
08/18/1992US5138974 Vacuum apparatus for coating an optical substrate