| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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| 01/12/1993 | US5178681 Suspension system for semiconductor reactors |
| 01/12/1993 | US5177878 Apparatus and method for treating flat substrate under reduced pressure in the manufacture of electronic devices |
| 01/07/1993 | WO1993000560A1 Composite article comprising oriented microstructures |
| 01/07/1993 | WO1993000454A1 Diamond-covered member and production thereof |
| 01/07/1993 | WO1993000204A1 Improvements in or relating to razor blades |
| 01/07/1993 | EP0521438A1 Sealing apparatus for continuous vacuum treating equipment |
| 01/07/1993 | EP0521163A1 Aluminum alloy wiring layer, manufacturing thereof, and aluminum alloy sputtering target |
| 01/07/1993 | EP0521045A1 Magnetron sputter ion plating |
| 01/07/1993 | EP0521017A1 Arc diverter. |
| 01/07/1993 | EP0267233B1 Modular semiconductor wafer transport and processing system |
| 01/07/1993 | DE4120910A1 Installation for continuous coating of strip substrata |
| 01/06/1993 | CN1067686A Apparatus and arrangement for coating truncated spheric substrate |
| 01/05/1993 | US5177366 Ion beam implanter for providing cross plane focusing |
| 01/05/1993 | US5176803 Method for making smooth substrate mandrels |
| 12/30/1992 | EP0520133A1 Apparatus for continuous coating of strip substrates |
| 12/30/1992 | EP0519949A1 Platinum or palladium/cobalt multilayer on a zinc oxide or indium oxide layer for magneto-optical recording. |
| 12/30/1992 | EP0470209B1 Metal-ion source and process for the generation of metal ions |
| 12/30/1992 | CN1067461A Direct aluminium-plating method for fabrics |
| 12/30/1992 | CN1067457A Coated molybdenum parts and process for their production |
| 12/30/1992 | CN1019642B Wear resistant titanium nitride coating and methods of application |
| 12/29/1992 | US5175608 Method of and apparatus for sputtering, and integrated circuit device |
| 12/29/1992 | US5175472 Power monitor of RF plasma |
| 12/29/1992 | US5175054 Metallized film structure and method |
| 12/29/1992 | US5174881 Apparatus for forming a thin film on surface of semiconductor substrate |
| 12/29/1992 | US5174880 Magnetron sputter gun target assembly with distributed magnetic field |
| 12/29/1992 | US5174875 Method of enhancing the performance of a magnetron sputtering target |
| 12/29/1992 | US5174827 Double chamber vacuum apparatus for thin layer deposition |
| 12/23/1992 | WO1992022921A2 PROCESS FOR MAKING SUPERCONDUCTING Tl-Pb-Sr-Ca-Cu OXIDE FILMS AND DEVICES |
| 12/23/1992 | WO1992022920A1 Device for processing substrates within a plasma |
| 12/23/1992 | EP0519769A2 A process for preparing a superconducting thin film of compound oxide |
| 12/23/1992 | EP0519215A1 Device and installation for coating dome-shaped substrates |
| 12/23/1992 | EP0519016A1 Method for diagnosis of lyme disease |
| 12/23/1992 | EP0518879A1 Physical vapor deposition of titanium nitride on a nonconductive substrate |
| 12/22/1992 | US5173761 Large breakdown voltage |
| 12/22/1992 | US5173441 Laser ablation deposition process for semiconductor manufacture |
| 12/22/1992 | CA1311779C Joints for high-alloy oil-well tubing with resistance to crevice corrosion |
| 12/18/1992 | CA2071254A1 Metallized wrapping film |
| 12/16/1992 | EP0518778A2 Laser ablation process for preparing a superconducting thin film formed of compound oxide superconductor material and apparatus for executing such process |
| 12/16/1992 | EP0518774A1 Process for cleaning oxidized metallic surfaces in the fabrication of interconnection networks and boards for such networks |
| 12/16/1992 | EP0518109A1 Apparatus for vacuum treatment |
| 12/16/1992 | CN1019513B Composition film forming device |
| 12/16/1992 | CN1019512B Production of reflecting decorating film by magnetic-controlling reaction sputtering nitriding aluminum |
| 12/15/1992 | US5171607 Method of depositing diamond-like carbon film onto a substrate having a low melting temperature |
| 12/15/1992 | US5171415 Cooling method and apparatus for magnetron sputtering |
| 12/15/1992 | US5171413 Electrochromic windows, rechargeable batteries; using lithium enriched layer to cure deficiency in another layer |
| 12/15/1992 | US5171412 Forming two layers by two steps, first step includes a collimated low temperature sputtering and second step utilizes high temperature/high power sputtering of aluminum to fill voids and grooves of substrate surface and planarize it |
| 12/15/1992 | US5171411 Sputtering thin film of aluminum and zinc alloy on substrate in reactive atmosphere; for solar control coatings, dielectrics |
| 12/15/1992 | US5171369 Device for glow potential processing, in particular ionic carburation |
| 12/10/1992 | WO1992021788A1 Device for electric arc application of coatings on articles under vacuum |
| 12/10/1992 | WO1992021787A1 Method and device for thermochemical treatment of articles |
| 12/10/1992 | DE4118973A1 Vorrichtung zur plasmaunterstuetzten bearbeitung von substraten A plasma assisted processing of substrates |
| 12/09/1992 | EP0517560A2 Method of manufacturing a superconducting microwave component substrate |
| 12/09/1992 | EP0517411A1 Magnetic recording medium |
| 12/09/1992 | EP0517148A1 Method of making a thin film insulating layer with Bi-W-Oxygen |
| 12/09/1992 | CN1066892A Method and equipment for continuous ion composite permeating metal |
| 12/08/1992 | US5169509 Pair of magnetron cathodes and evacuable chamber connected to ungrounded A.C. power supply; discharge voltage measured; gas flow controlled; for depositing dielectrics |
| 12/08/1992 | US5169504 Method for preparing a magneto optic memory |
| 12/08/1992 | US5169451 Vacuum vapor deposition apparatus |
| 12/08/1992 | CA1311214C Dual plasma microwave apparatus and method for treating a surface |
| 12/03/1992 | DE4117368A1 Sputtering device with rotating magnetron cathode target - concentrates cooling medium pref. water onto target surface heated by plasma |
| 12/03/1992 | DE4117367A1 Modifying magnetic field in sputter equipment with rotating target - results in a box-shaped profile of material removal on the target surface which improves the efficiency and reduced penetration danger |
| 12/03/1992 | DE4117258A1 Optically active layer for high anti-reflecting substrates - having layer contg. titanium nitride, on reverse side of substrate |
| 12/03/1992 | DE4117257A1 Antireflective optical coating for glass substrates - comprising titanium nitride layer with over-stoichiometric nitrogen content |
| 12/02/1992 | EP0516480A2 Method for surface treatment with extra-low-speed ion beam |
| 12/02/1992 | EP0516436A2 Sputtering device |
| 12/02/1992 | EP0516425A1 Cathodic arc deposition system and a method of controlling same |
| 12/02/1992 | EP0516344A1 Method to fill a cavity in a substrate |
| 12/02/1992 | EP0516248A2 Multilayered film |
| 12/02/1992 | EP0516244A1 Improved label for use in antitheft surveillance system |
| 12/02/1992 | CN1019319B Durable splashing film of metal alloy oxide |
| 12/01/1992 | US5168543 For a high vacuum deposition chamber |
| 12/01/1992 | US5168197 Ion beam generating apparatus, film-forming apparatus, and method for formation of film |
| 12/01/1992 | US5168097 Vapor deposition of superconductive films |
| 12/01/1992 | US5167984 Vacuum deposition process |
| 12/01/1992 | US5167789 Apparatus for coating a substrate |
| 12/01/1992 | US5167725 Titanium alloy blade coupler coated with nickel-chrome for ultrasonic scalpel |
| 12/01/1992 | CA1310822C Surface treatment/deposit reactor |
| 11/26/1992 | WO1992020831A1 Improved quick change sputter target assembly |
| 11/25/1992 | EP0514658A1 Method and apparatus for continuous sputter coating of fibers |
| 11/25/1992 | EP0514384A1 Device for treating substrates in a gas-based plasma produced by microwaves. |
| 11/25/1992 | CN1019251B Method of mfg. superconducting oxide ceramic material film |
| 11/24/1992 | US5165954 Images and masking, then scanning with an ion beam |
| 11/22/1992 | WO1992020832A1 Zinc alloy rotating sputter target |
| 11/21/1992 | CA2063780A1 Method and apparatus for continuous sputter coating of fibers |
| 11/19/1992 | EP0513662A1 Work piece coated with a hard layer and process for coating with the layer |
| 11/19/1992 | DE4216330A1 Ion plasma processing of products - using plasma stream in vacuum chamber with arc discharges and with an electric field directed inwards from the edge of the plasma reservoir |
| 11/19/1992 | DE4115663A1 Target mfr. for a sputtering device - by plasma-spraying a metal, alloy or cpd. on to a target substrate |
| 11/19/1992 | DE4115612A1 Improving edge stability of honing and grinding elements - by physical deposition of coating e.g. oxide(s), nitride(s), carbide(s) and/or boride(s) and/or carbon@ having a diamond structure |
| 11/18/1992 | WO1992021143A1 Semiconductor wafer processing module |
| 11/18/1992 | CN2122147U Integral vaporing source electrode |
| 11/18/1992 | CN1066332A Damp-proof film for potassium chloride diamond |
| 11/18/1992 | CN1019098B Low reflectance highly saturated colored coating for monolithic glazing |
| 11/18/1992 | CA2102202A1 Semiconductor wafer processing module |
| 11/17/1992 | US5164599 Ion beam neutralization means generating diffuse secondary emission electron shower |
| 11/17/1992 | US5164349 Electromagnetic effect material |
| 11/17/1992 | US5164270 Nickel and/or zirconium implanted on surface of alloy |
| 11/17/1992 | US5164238 Masking member |
| 11/17/1992 | US5164230 Bonding strength |
| 11/17/1992 | US5164063 Sputtering cathode arrangement according to the magnetron principle for coating a flat annular surface |
| 11/17/1992 | CA1310297C System and method for depositing plural thin film layers on a substrate |