Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
01/1998
01/28/1998EP0687190A4 A spatially distributed sma actuator film
01/28/1998CN1171839A Antireflection coating for temp. sensitive substrate
01/28/1998CN1171495A Compressor for refrigerator
01/27/1998US5712193 Method of treating metal nitride films to reduce silicon migration therein
01/27/1998US5711993 Radiation cured island coating system
01/27/1998US5711860 Method and apparatus for producing a substrate with low secondary electron emissions
01/27/1998US5711858 Process for depositing a conductive thin film upon an integrated circuit substrate
01/27/1998US5711812 Apparatus for obtaining dose uniformity in plasma doping (PLAD) ion implantation processes
01/27/1998US5711810 Apparatus for variable optical focusing for processing chambers
01/27/1998US5711773 Abrasive material for precision surface treatment and a method for the manufacturing thereof
01/23/1998CA2211149A1 Platinum aluminising single crystal superalloys
01/22/1998WO1998002597A1 Sputtering device and liquid-cooled target assembly therefor
01/22/1998WO1998002596A1 Vacuum coating system with a coating chamber and at least one source chamber
01/22/1998DE19653999C1 Cathode sputtering apparatus
01/21/1998EP0820088A2 Non-planar magnet tracking device for magnetron sputtering apparatus
01/21/1998EP0820087A2 RF plasma reactor with hybrid conductor and multi-radius dome ceiling
01/21/1998EP0819782A1 Process of forming a thin film by laser ablation
01/21/1998CN1170957A Method for forming metal wiring of semiconductor devices
01/21/1998CN1170774A Vacuum coating equipment for evaporating coating on optical base sheet
01/21/1998CN1170773A Base sheet rack of vacuum coating equipment
01/20/1998US5710486 Inductively and multi-capacitively coupled plasma reactor
01/20/1998US5710384 Mechanical strength
01/20/1998US5709957 Metallic body with vapor-deposited treatment layer(s) and adhesion-promoting layer
01/20/1998US5709951 Composite deposited film and production process thereof
01/20/1998US5709938 Improved sputter properties in reactive and inert atmospheres
01/20/1998US5709930 Coated substrate
01/20/1998US5709907 Method of making coated cutting tools
01/20/1998US5709785 Metallizing machine
01/20/1998US5709784 Process and apparatus for workpiece coating
01/20/1998US5709783 Preparation of sputtering targets
01/20/1998US5709519 Plasma processing apparatus
01/15/1998WO1998001599A1 Microwave applicator for an electron cyclotron resonance plasma source
01/15/1998WO1998001598A1 Aluminum or aluminum alloy sputtering target
01/15/1998WO1998001596A1 Production of nanometer particles by directed vapor deposition of electron beam evaporant
01/15/1998DE19727343A1 High current carrying capacity superconductive layer production
01/15/1998DE19641400C1 Application of thin layer containing boron by vacuum coating
01/15/1998DE19637450C1 Wear-resistant surface layer structure
01/15/1998DE19628102A1 Vakuumbeschichtungsanlage mit einer Beschichtungskammer und zumindest einer Quellenkammer Vacuum coating system with a coating chamber and at least a source chamber
01/15/1998DE19627533A1 Target for the sputter cathode of a vacuum coating installation
01/14/1998EP0818832A2 Method for the production of a superconductive layer
01/14/1998EP0818803A2 Electrically floating shield in a plasma reactor
01/14/1998EP0818622A1 Using a coated fuel injector and method of making
01/14/1998EP0818557A1 Method and apparatus for forming a coating on a substrate
01/14/1998EP0818556A1 A method for providing full-face high density plasma deposition
01/14/1998EP0818050A1 Boron nitride cold cathode
01/14/1998EP0707663A4 Sputtering device
01/14/1998CN1170441A In site getter pump system and method
01/14/1998CN1037037C Barium ferrite thin film for recording
01/13/1998US5707887 Method of manufacturing a non-volatile random accessible memory device
01/13/1998US5707748 Coated tool with increased service life
01/13/1998US5707706 Magnetic recording disk medium having a magnetic layer with uniform properties over the disk surface
01/13/1998US5707500 Vacuum processing equipment, film coating equipment and deposition method
01/13/1998US5707498 Avoiding contamination from induction coil in ionized sputtering
01/13/1998US5707452 Coaxial microwave applicator for an electron cyclotron resonance plasma source
01/13/1998US5707409 Abrasive article having a diamond-like coating layer and method for making same
01/08/1998WO1998000572A1 Magnetic disk substrates formed of ceramic-metal matrix composites with or without metal cladding
01/08/1998WO1998000432A1 Platinum source compositions for chemical vapor deposition of platinum
01/08/1998DE19641584C1 Vacuum coating device for application of substrate thin-film layers
01/08/1998DE19635735C1 Holder clamp for coating small components
01/08/1998DE19626732A1 Sputtering target production and recycling
01/08/1998DE19626440C1 Verfahren zur Herstellung eines Titan-Keramik-Haftverbundes für Zahnersatz und ein daraus hergestellter Titan-Keramik-Haftverbund A process for producing a titanium-ceramic adhesive bond for dentures and of derived titanium-ceramic adhesive composite
01/08/1998DE19625329A1 Stoffverbund und Verfahren zu dessen Herstellung Composite material and process for its preparation
01/08/1998CA2259483A1 Magnetic disk substrates formed of ceramic-metal matrix composites with or without metal cladding
01/07/1998EP0817238A1 Aluminium cast part and method for its fabrication
01/07/1998EP0816529A1 Vacuum treatment apparatus for coating of substrates
01/07/1998EP0816528A1 A method for depositing zirconium oxide on a substrate
01/07/1998EP0816466A1 Method of photocatalytically making the surface of base material ultrahydrophilic, base material having ultrahydrophilic and photocatalytic surface, and process for producing said material
01/07/1998EP0816123A2 Member for fishing or sport tool
01/07/1998EP0815953A2 Method for depositing substituted fluorocarbon polymeric layers
01/07/1998EP0815501A2 Apparatus and method for controlling high throughput sputtering
01/07/1998EP0815283A1 Plasma chamber
01/07/1998EP0815282A2 Industrial vapor conveyance and separation
01/07/1998EP0815281A1 Photoionic microhead device
01/07/1998EP0814853A1 Novel biocompatible prosthetic material, prostheses or prosthetic systems consisting of said material, and method for preparing same by dual calcium and phosphorus ion implantation
01/07/1998EP0741909A4 Methods for improving semiconductor processing
01/07/1998EP0662025B1 Coated grinding tools and methods for their preparation
01/07/1998EP0580837B1 Process for producing thin films by means of reactive cathode sputtering and device for implementing it
01/07/1998CN1169757A Method for depositing hard protective coating
01/07/1998CN1169756A Synthetic resin molded article and process for producing same
01/07/1998CN1169477A Method for evapourating coating-film on optical base-substrate
01/06/1998US5705277 Pane with transmission properties that vary with the angle of incidence
01/06/1998US5705267 Protective layer of silicon oxide
01/06/1998US5705234 Method for manufacturing magnetic hard disk
01/06/1998US5705226 Formation of magnesium vapor with high evaporation speed
01/06/1998US5705044 Modular sputtering machine having batch processing and serial thin film sputtering
01/06/1998US5705042 Sputter coating
01/06/1998US5705041 Method of minimizing surface effects in thin ferroelectrics
01/06/1998US5704980 Partially oxidized aluminum layer
01/02/1998DE19725404A1 Low-energy electron diffraction system for measurements on a sample prepared by physical vapour deposition
01/02/1998DE19624609A1 Vacuum processing installation for application of thin layers to substrates
12/1997
12/31/1997WO1997050108A1 Aluminium cast part, and process for the production thereof
12/31/1997WO1997049840A1 Composite material and method of manufacturing it
12/31/1997CN1169094A Plasma source
12/30/1997US5703436 Transparent contacts for organic devices
12/30/1997US5703375 Method and apparatus for ion beam neutralization
12/30/1997US5703372 For use in an ion implanter
12/30/1997US5702829 Multilayer material, anti-erosion and anti-abrasion coating incorporating said multilayer material
12/30/1997US5702770 Applying a barrier film to interior wall of plastic substrate
12/30/1997US5702764 Method for the preparation of pyrolytic boron nitride-clad double-coated article
12/30/1997US5702573 Method and apparatus for improved low pressure collimated magnetron sputter deposition of metal films