| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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| 06/11/1997 | CN1151620A Multicontact for antenna window |
| 06/11/1997 | CN1151611A Process for forming electrodes of electronic components and apparatus for use in process |
| 06/10/1997 | US5638197 Inorganic thin film compensator for improved gray scale performance in twisted nematic liquid crystal displays and method of making |
| 06/10/1997 | US5637353 Vapor electrodepositing a protective coatings |
| 06/10/1997 | US5637200 Compact disk locking apparatus |
| 06/10/1997 | US5637199 Sputtering shields and method of manufacture |
| 06/10/1997 | US5637180 Plasma processing method and plasma generator |
| 06/10/1997 | US5636963 Method of handling wafers in a vacuum processing apparatus |
| 06/05/1997 | WO1997020179A1 Dispersion type multi-temperature control system and fluid temperature control device applicable to the system |
| 06/05/1997 | WO1997019939A1 Process for hydrogenating dihydrofuranes to tetrahydrofuranes |
| 06/05/1997 | DE19649640A1 Vorrichtung und Verfahren zum Erfassen von Partikeln in einer Prozesskammer einer Ionenimplantationsanlage Apparatus and method for detecting particles in a process chamber of an ion implanter |
| 06/05/1997 | DE19648749A1 Magnetic thin-film recording medium manufacturing method |
| 06/05/1997 | DE19647478C1 Tin sputtering target joined to back plate |
| 06/05/1997 | DE19544405A1 Verfahren zur Hydrierung von Dihydrofuranen zu Tetrahydrofuranen A process for the hydrogenation of dihydrofurans to tetrahydrofurans |
| 06/04/1997 | EP0777262A1 Wafer heater assembly |
| 06/04/1997 | EP0777256A2 Deceleration after mass selection for ion implantation. |
| 06/04/1997 | EP0777252A1 Electron beam evaporation apparatus and method |
| 06/04/1997 | EP0776990A1 Substrate support apparatus for a deposition chamber |
| 06/04/1997 | EP0776988A2 Temperature regulation apparatus |
| 06/04/1997 | EP0776987A1 Vacuum coating apparatus with a crucible located in the vacuum chamber to receive the evaporation material |
| 06/04/1997 | EP0776383A1 Electrochromic materials and devices, and method |
| 06/04/1997 | EP0776221A1 Ion beam modification of bioactive ceramics to accelerate biointegration of said ceramics |
| 06/04/1997 | CN2255434Y Multi-arc type ion film-coating machine |
| 06/04/1997 | CN1035087C Method of manufacturing superconducting circuitous pattern |
| 06/04/1997 | CN1035071C Method of pretreating metallic works |
| 06/03/1997 | US5636092 Magnetic head having chromium nitride protective film for use in magnetic recording and/or reproducing apparatus and method of manufacturing the same |
| 06/03/1997 | US5635730 Superconducting oxide thin film device |
| 06/03/1997 | US5635255 Thermal spraying or cladding-by-welding of worn surfaces coated with an alloy of iron, chromium, boron, manganese, vanadium, niobium, phosphorus and carbon; hardness; toughness; protective coatings; powder metallurgy |
| 06/03/1997 | US5635247 Depositing alumina coating on substrate, wet blasting, heat treating to convert to alpha-alumina |
| 06/03/1997 | US5635245 Vapor deposition of an optically transparent interlayer which bonds to glass substrate followed by deposition of an outer diamond-like carbon layer |
| 06/03/1997 | US5635244 Clamping a wafer edge using a clamp having an overhang separated from the wafer surface a distance such as to prevent contacting the deposited material |
| 06/03/1997 | US5635243 Forming a coating on a substrate by radiating to immobilize, diffuse, vaporize and react constiuent elements or alter its physical structure (carbide to diamond on steel); cutting tool inserts |
| 06/03/1997 | US5635241 Method for producing thin film and apparatus therefor |
| 06/03/1997 | US5635144 Generating plasma within vessel made of material which becomes part of thin film, introducing gas which reacts with vessel to produce reaction product that reacts at surface to form thin film |
| 06/03/1997 | US5635087 Apparatus for plasma-assisted high rate electron beam vaporization |
| 06/03/1997 | US5635036 Sputter coating using magnetron sputter source, collimating filter |
| 06/03/1997 | US5635008 High precision replication system |
| 06/03/1997 | US5634973 Semiconductor having substrate selectively coated with epitaxial layer patterned by masking with group iiib oxide layer wherein epitaxial growth does not occur on mask |
| 06/03/1997 | CA2059094C High ratio planetary drive system for vacuum chamber |
| 05/31/1997 | CA2185640A1 Electron beam evaporation apparatus and method |
| 05/29/1997 | WO1997019303A1 Temperature controlled chuck for vacuum processing |
| 05/29/1997 | WO1997019208A1 Method of encapsulating a material in a carbon nanotube |
| 05/28/1997 | EP0776037A2 Low temperature integrated metallization process and apparatus |
| 05/28/1997 | EP0776033A2 Method for forming aluminium contacts by sputtering |
| 05/28/1997 | EP0776026A1 Semiconductor device manufacturing apparatus employing vacuum system |
| 05/28/1997 | EP0775758A1 Vacuum coating apparatus with a crucible located in the vacuum chamber to receive the evaporation material |
| 05/28/1997 | EP0521163B1 Aluminum alloy wiring layer, manufacturing thereof, and aluminum alloy sputtering target |
| 05/27/1997 | US5633506 Method and apparatus for in situ removal of contaminants from ion beam neutralization and implantation apparatuses |
| 05/27/1997 | US5633200 Process for manufacturing a large grain tungsten nitride film and process for manufacturing a lightly nitrided titanium salicide diffusion barrier with a large grain tungsten nitride cover layer |
| 05/27/1997 | US5633195 Depositing metallic film having columnar morphology and textured surface, heating to melt |
| 05/27/1997 | US5633194 Cleaning; applying vacuum; heating; growing thin epitaxial film |
| 05/27/1997 | US5633043 Process for fabricating thin films |
| 05/27/1997 | US5632879 Process for forming inorganic skin film |
| 05/27/1997 | US5632873 Two piece anti-stick clamp ring |
| 05/27/1997 | US5632869 Method of pretexturing a cathode sputtering target and sputter coating an article therewith |
| 05/22/1997 | WO1997018556A1 Magnetic recording medium and production method thereof |
| 05/22/1997 | WO1997018342A1 Coating process and suitable substrate holder |
| 05/22/1997 | WO1997013003A3 Transparent heat protection foil and process for producing the same |
| 05/22/1997 | DE19646700A1 Vacuum treatment chamber |
| 05/22/1997 | DE19614596C1 Compact disc transfer assembly |
| 05/22/1997 | DE19543375A1 Apparatus for coating substrates by magnetron sputtering |
| 05/21/1997 | EP0774886A1 Method and apparatus for generating a plasma |
| 05/21/1997 | EP0683826B1 Diffusion barrier layers |
| 05/21/1997 | EP0650465A4 Conversion of fullerenes to diamond. |
| 05/21/1997 | EP0646221B1 Magnetostrictive transducer |
| 05/21/1997 | EP0411079B1 Method for the deposition of at least one thickness of at least one decorative material to an object, and decorative object obtained by such method |
| 05/21/1997 | CN2254448Y Multiarc-magnetic control sputter vacuum ion goldplating equipment |
| 05/21/1997 | CN1150180A Plasma immersion ion implantation apparatus for material surface modifying |
| 05/20/1997 | US5631498 Thin film metallization process for improved metal to substrate adhesion |
| 05/20/1997 | US5631090 Catalyst support, heater |
| 05/20/1997 | US5631066 Biodegradable polylactone film having coating of alumnum, gold, silver, platinum, copper, nickel, titanium or tantalum |
| 05/20/1997 | US5631058 High throughput manufacturing of thin film data recording disks |
| 05/20/1997 | US5631050 Vapor deposition from plasma |
| 05/20/1997 | US5630918 Containing indium oxide and tin oxide and having controlled surface roughness and density, for nodule suppression |
| 05/20/1997 | US5630917 Cleaning of a PVD chamber containing a collimator |
| 05/20/1997 | US5630916 Magnetic orienting device for thin film deposition and method of use |
| 05/20/1997 | US5630886 Corrosion-resistant film for protecting surfaces of Ag and corrosion-resist composite structures |
| 05/20/1997 | US5630880 Method and apparatus for a large volume plasma processor that can utilize any feedstock material |
| 05/20/1997 | US5630879 Method and apparatus for the partial coating of sets of structural components |
| 05/20/1997 | US5630314 Zirconium dioxide inorganic coatings; protective coatings for gas turbine |
| 05/15/1997 | WO1997017542A1 Substrate processing apparatus with neg pump |
| 05/15/1997 | WO1997001653A3 Sputtering shield |
| 05/15/1997 | CA2236833A1 Substrate processing apparatus with neg pump |
| 05/14/1997 | EP0773710A1 Flexible printed wiring board |
| 05/14/1997 | EP0773308A1 System for and method of providing a controlled deposition on wafers |
| 05/14/1997 | EP0772698A1 Selected processing for non-equilibrium light alloys and products |
| 05/14/1997 | EP0681616A4 Cylindrical magnetron shield structure. |
| 05/14/1997 | EP0660885B1 Crucible and method for its use |
| 05/14/1997 | EP0584076B1 Semiconductor wafer processing module |
| 05/14/1997 | CN1149854A Composite barrier film and process for producing the same |
| 05/13/1997 | US5629267 Superconducting element having an intermediate layer with multiple fluorite blocks |
| 05/13/1997 | US5629086 Substrate is stainless steel, nickel, aluminum or alloy of ni or al; intermediate layer is mainly composed of carbon, ruthenium, silicon or germanium or is layer of ru, si or ge mixed with carbon, nitrogen and/or oxygen with gradient |
| 05/13/1997 | US5628882 Chromium target and argon/hexafluoroethane plasma, optically transparent |
| 05/13/1997 | US5628881 High temperature reaction method |
| 05/13/1997 | US5628839 Components of apparatus for film making and method for manufacturing the same |
| 05/13/1997 | US5628807 Using glass forming mold of stainless steel coated with alloy containing nickel and/or cobalt, tungsten, transition metal, phosphorus and/or boron |
| 05/09/1997 | WO1997016826A1 Sputtered thermally cycled texture layers formed of high melting point materials |
| 05/09/1997 | WO1997016692A1 Modification of metal surfaces |
| 05/09/1997 | WO1997016580A1 Method of forming diamond-like carbon film (dlc), dlc film formed thereby, use of the same, field emitter array and field emitter cathodes |
| 05/09/1997 | WO1997016246A1 Unibody gas plasma source technology |