Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
03/1997
03/05/1997EP0760020A1 Device having a switch comprising a chromium layer and method for depositing chromium layers by sputtering
03/05/1997EP0759893A1 Coating of substrates
03/05/1997CN1144398A Rotary type apparatus for processing semiconductor wafers and method of processing semiconductor wafers
03/04/1997US5608223 Ion implantation device
03/04/1997US5607783 Nonmagnetic base plates, magnetic layer on base and carbon protective film
03/04/1997US5607781 Oxide film with preferred crystal orientation, method of manufacturing the same, and magneto-optical recording medium
03/04/1997US5607780 Target for magneto-optical recording medium and process for production thereof
03/04/1997US5607776 Article formed by in-situ cleaning a Ti target in a Ti+TiN coating process
03/04/1997US5607775 Article for use under high vacuum at high temperature
03/04/1997US5607564 Method of producing a microporous, gas permeable electrode structure and a microporous, gas permeable electrode structure
03/04/1997US5607560 Diamond crystal forming method
03/04/1997US5607559 Method of forming thin film on substrate by reactive DC sputtering
03/04/1997US5607509 High impedance plasma ion implantation apparatus
03/04/1997US5607009 Method of heating and cooling large area substrates and apparatus therefor
02/1997
02/27/1997WO1997007534A1 A process for fabricating semiconductor devices with shallowly doped regions using dopant compounds containing elements of high solid solubility
02/27/1997WO1997007258A1 Sputter target/backing plate assembly and method of making same
02/27/1997WO1997007257A1 Preparation of structural materials by physical vapour deposition process
02/27/1997WO1997007252A1 Product used to guide a hot oxidizing gas
02/26/1997EP0759642A1 Thin-film multilayered electrode and method of fabricating same
02/26/1997EP0759155A1 METHOD AND DEVICE FOR $i(IN SITU) STRESS MEASUREMENT WITHIN A THIN FILM UPON ITS DEPOSITION ON A SUBSTRATE
02/26/1997EP0759095A1 Silicon carbide sputtering target
02/26/1997EP0662161B1 Tool for working the surfaces of components, and a substrate material for such a tool
02/26/1997EP0632849A4 Abrasion-resistant overcoat for coated substrates.
02/26/1997CN1143983A Process for producing layers of cubic boron nitride
02/26/1997CN1143690A Spattering filming device
02/25/1997US5606146 Layers of exothermic reaction producing reactive material separated by buffer layers
02/25/1997US5605866 Clamp with wafer release for semiconductor wafer processing equipment
02/25/1997US5605759 Physical vapor deposition of diamond-like carbon films
02/25/1997US5605724 Method of forming a metal conductor and diffusion layer
02/25/1997US5605714 Treatments to reduce thrombogeneticity in heart valves made from titanium and its alloys
02/25/1997US5605610 Method of fabricating transparent conductive ito films
02/25/1997US5605609 Method for forming low refractive index film comprising silicon dioxide
02/25/1997US5605608 Electron emission microtips of flat display screen; vaporization of conductive material on a cathode
02/25/1997US5605576 High frequency magnetron plasma apparatus
02/20/1997WO1997006287A1 A modular deposition system having batch processing and serial thin film deposition
02/20/1997WO1997006017A1 Multilayer material, in particular transfer strip
02/20/1997WO1996039547A3 Multiple source deposition of shape-memory alloy thin films
02/20/1997DE19623359A1 Device for coating a substrate by vaporisation of a rotary tubular target
02/20/1997CA2202036A1 Multilayer material, in particular transfer strip
02/19/1997EP0758687A1 Method and apparatus for gaseous treatment
02/19/1997EP0758408A1 Rectangular vacuum-arc plasma source
02/18/1997US5604003 Substrate having first reflective layer, first dielectric layer, recording layer of germanium tellurium selenium alloy, second dielectric layer, second reflective layer; can be inscribed, read and erased with laser beam
02/18/1997US5603816 Sputtering device and target with cover to hold cooling fluid
02/18/1997US5603778 Sputtering under discharge of mixture of argon and oxygen gases using metal oxide target having specified specific resistance and crystal particle size
02/18/1997US5603766 Simultaneously depositing a first, second and third metal on a nonreactive substrate
02/18/1997CA1338918C Hollow cathode type magnetron apparatus construction
02/13/1997WO1997005665A1 Electrically erasable, directly overwritable, multibit single cell memory elements and arrays fabricated therefrom
02/13/1997WO1997005647A1 Metal strip, especially steel strip, for making screens, especially for fitting in low-pressure discharge lamps
02/13/1997WO1997004906A1 Method of producing metal quantum dots
02/13/1997WO1997004885A1 Vacuum flash evaporated polymer composites
02/13/1997DE19529171A1 Transferband Transfer belt
02/12/1997EP0758148A2 Method and apparatus for forming electrical contacts in multi-layer integrated circuits
02/12/1997EP0757615A1 Amorphous diamond coating of blades
02/12/1997EP0757598A1 Pulsed ion beam assisted deposition
02/12/1997EP0724652A4 Method and apparatus for sputtering magnetic target materials
02/12/1997EP0591375B1 Composite article comprising oriented microstructures and method of making such a composite article
02/12/1997CN1142469A Heat treatable, durable, IR-reflecting sputter-coated glasses and method of making same
02/11/1997US5602791 Memory material and method of its manufacture
02/11/1997US5601695 Etchant for aluminum alloys
02/11/1997US5601654 Flow-through ion beam source
02/11/1997US5601652 Apparatus for applying ceramic coatings
02/11/1997US5601649 Oxide superconducting film manufacturing apparatus
02/11/1997US5601293 Sliding member with hard ternery film
02/06/1997WO1997004146A1 ALLOYS OF Ti, Ru, Fe AND O AND USE THEREOF FOR THE MANUFACTURE OF CATHODES FOR THE ELECTROCHEMICAL SYNTHESIS OF SODIUM CHLORATE
02/06/1997WO1997004142A1 Methods for deposition of molybdenum sulphide
02/06/1997WO1997003777A1 Cutting tool
02/06/1997WO1997003563A1 Synergistic fungicidal composition including a strobilurine analogue compound
02/06/1997DE19528390A1 Metallband, insbesondere Stahlband, zur Herstellung von Schilden für den Einbau in insbesondere Niederdruck-Entladungslampen Metal strip, especially steel strip, for the manufacture of shields for installation in particular low pressure discharge lamps
02/05/1997EP0757373A2 In situ removal of contaminants from the interior surfaces of an ion beam implanter
02/05/1997EP0757291A2 Processing method and processing apparatus using fast atom beam
02/05/1997EP0757116A1 Sputtering titanium target and method for producing the same
02/05/1997EP0757115A1 Pivot thrust bearing system
02/04/1997US5599654 Process for forming patterned layer of fluorinated resin and devices containing same
02/04/1997US5599590 Forming oxidation catalyst metal on surface; heating
02/04/1997US5599585 Vapor deposition or sputtering of metals onto non-woven fibrous webs while cooling
02/04/1997US5599404 Stability
02/04/1997US5599397 Semiconductor wafer process chamber with suspector back coating
02/04/1997US5599385 High temperature-resistant corrosion protection coating for a component, in particular a gas turbine component
02/04/1997US5598622 Temperature clamping method for anti-contamination and collimating devices for thin film processes
01/1997
01/30/1997WO1997003221A1 Magnetron cathode apparatus and method for sputtering
01/30/1997WO1997003220A1 Permanent magnet array apparatus and method
01/30/1997WO1997003219A1 Laminated material
01/30/1997WO1996040425A3 Improved uniformly plated microsphere catalyst
01/30/1997DE19630149A1 Gleitbauteil und Verfahren zu dessen Herstellung Sliding member and method of producing the
01/29/1997EP0756022A2 Steel sheet protected against corrosion and process for its production
01/29/1997EP0756021A2 Thin film of potassium niobate, process for producing the thin film, and optical device using the thin film
01/29/1997EP0756020A1 Method and device for the manufacture of metal-free sheets using a procedure of metal evaporation
01/29/1997EP0756019A2 Hard material coating formed by PVD
01/29/1997EP0755461A1 Process and device for ion-supported vacuum coating
01/29/1997EP0755460A1 Process to produce diamond films
01/29/1997CN1141602A Using laser for fabricating coatings substrate
01/29/1997CN1141353A Sputtering apparatus for depositing materials on substrate
01/29/1997CN1033921C Damp-proof film polassium chloride crystal
01/28/1997US5598260 Apparatus and method for optical-based flux monitoring of an effusion cell adjacent the output orifice
01/28/1997US5597745 Method for forming TiN film and TiN film/thin TiSi2 film, and method for fabricating semiconductor element utilizing the same
01/28/1997US5597665 Three-dimensional network with interconnecting pores, comprising metallic skeleton parts
01/28/1997US5597622 Concurrent vaporization and irradiation of silicon monoxide and dioxide layers; wear resistance
01/28/1997US5597609 Process and apparatus for the continuous or semi-continuous coating of eyeglass lenses
01/28/1997US5597458 Method for producing alloy films using cold sputter deposition process
01/28/1997US5597064 Electric contact materials, production methods thereof and electric contacts used these