Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
10/1997
10/22/1997EP0728224A4 Apparatus for a thin film manufacturing
10/22/1997EP0700571A4 Memory material and method for its manufacture
10/22/1997CN1162655A Evaporator for substrate coating apparatus
10/22/1997CN1162654A Metal coating on thermoplastic
10/22/1997CN1162527A Laminate and method for preparing same
10/22/1997CA2203214A1 Sliding parts and process for producing same
10/21/1997US5679983 Semiconductors; packages; chips; titanium, zirconium, hafnium with low level of impurities
10/21/1997US5679625 Method of making an oxide superconducting thin film
10/21/1997US5679431 Sputtered carbon overcoat in a thin-film medium and sputtering method
10/21/1997US5679410 Continuous fabrication of thin film magnetic recording medium with vacuum deposition
10/16/1997WO1997038151A1 Substrate with a superhard coating containing boron and nitrogen and method of making the same
10/16/1997WO1997038150A1 Boron and nitrogen containing coating and method for making
10/16/1997WO1997038149A1 Cathodic arc cathode
10/16/1997WO1997037844A1 Hybrid polymer film
10/16/1997WO1997037801A1 Single phase tungsten-titanium sputter targets and method of producing same
10/16/1997DE19614598A1 Vorrichtung zur Kathodenzerstäubung Apparatus for sputtering
10/16/1997CA2248701A1 Boron and nitrogen containing coating and method for making
10/16/1997CA2248692A1 Substrate with a superhard coating containing boron and nitrogen and method of making the same
10/15/1997EP0801419A1 Process of making a thin semiconductor film comprising electronic devices
10/15/1997EP0801416A1 Plasma processing chamber with epicyclic magnet source assembly
10/15/1997EP0801415A2 A magnetron for low pressure, full face erosion
10/15/1997EP0801414A2 Gas-controlled arc vapor deposition apparatus and process
10/15/1997EP0801413A1 Inductively coupled plasma reactor with faraday-sputter shield
10/15/1997EP0801147A1 Apparatus for transporting substrates
10/15/1997EP0801146A1 Method for deposition of mixed organic-inorganic film
10/15/1997EP0801145A1 Oxide film, laminate and methods for their production
10/15/1997EP0801144A1 Element with a wear resistant layer, and process for the manufacture of such an element
10/15/1997EP0801143A1 Apparatus for masking or covering of substrates
10/15/1997EP0800453A1 Biaxially oriented multilayer heat sealable packaging film
10/15/1997EP0800438A1 Process equipment for razor blades with simultaneous or sequential deposition and etching capabilities
10/15/1997EP0765531A4 ELECTROCHEMICAL HYDROGEN STORAGE ALLOYS AND BATTERIES FABRICATED FROM Mg CONTAINING BASE ALLOYS
10/15/1997EP0606263B1 Pinching gate valve
10/15/1997CN1162025A Ion-sputtering metallic cementation technology
10/15/1997CN1162024A Equipment with two sputter-plating cathodes for coating flat substrate with film
10/15/1997CN1161894A Sunface treatment method using discharging in liquid
10/14/1997US5677240 Method for forming a semiconductor device
10/14/1997US5677003 Increasing the cohesive strength by vapor electrodepositing silicon monooxide layer from silicon monooxide cathode and titanium layer from titanium cathode
10/14/1997US5676998 Thin film magnet, cylindrical ferromagnetic thin film and production method thereof
10/14/1997US5676810 Target mounting-demounting arrangement
10/14/1997US5676804 Method for fabricating fresnel lenses by selective application and removal of films on lens surfaces
10/14/1997US5676803 Vacuum chamber comprising a magnetron and a insulating barrier positioning between magnetron and backing of target
10/14/1997US5676759 Plasma dry cleaning of semiconductor processing chambers
10/14/1997US5676757 Decompression container
10/14/1997CA2017082C Method of and apparatus for fabricating oxide superconducting wire
10/12/1997CA2201810A1 Gas-controlled arc apparatus and process
10/09/1997WO1997037052A1 Method and device for applying porous coatings and cathode film of an electrolytic condenser
10/09/1997WO1997037051A1 Method of manufacturing substrate with thin film, and manufacturing apparatus
10/09/1997WO1997036693A1 Process to modify work functions using ion implantation
10/09/1997DE19613683A1 Low temperature deposited photoelectric semiconductor thin film
10/09/1997DE19610253A1 Sputtering apparatus for coating glass, packaging material, tools etc.
10/08/1997EP0799905A1 High-purity cobalt sputtering targets and method of manufacturing the same
10/08/1997EP0799904A1 Method of producing a graded coating with a top ceramic layer
10/08/1997EP0799903A2 Methods of sputtering a metal onto a substrate and semiconductor processing apparatus
10/08/1997EP0799835A2 Anti-fibroblast growth factor-8 monoclonal antibody
10/08/1997EP0698006B1 Pyrotechnic material
10/08/1997CN1161563A Method and apparatus for ion beam transport
10/08/1997CN1161385A Stabilized vapour-deposition materials based on titanium oxide
10/08/1997CN1161384A Tech. for surface modification to easy-wear parts of machines for drilling or oil prodn. used in oil field
10/07/1997US5674813 Process for preparing layered structure including oxide super conductor thin film
10/07/1997US5674786 Method of heating and cooling large area glass substrates
10/07/1997US5674599 Coating of inorganic buffer layer on plastic substrate, the stress of buffer layer is maintained at a preferential range; switching element for flat panel display for office automation equipments and television; high reliability
10/07/1997US5674368 Film forming apparatus
10/07/1997US5674367 Sputtering target having a shrink fit mounting ring
10/07/1997US5674366 Method and apparatus for fabrication of dielectric thin film
10/07/1997US5674293 Platinum alloy protective inorganic coatings for friction, wear resistance
10/07/1997US5673750 Vacuum processing method and apparatus
10/02/1997WO1997036021A1 Apparatus for matrix coating fibres with metal vapour
10/02/1997WO1997036020A1 Ceramic target for thin film deposition
10/02/1997WO1997035912A2 Process for producing an adhesive coating on polymethyl methacrylate (pmma) substrate surfaces
10/02/1997WO1997035678A2 Channel fabrication in metal objects
10/02/1997WO1997035671A1 Permeable solar control film
10/02/1997DE19613745A1 Production of anamorphic micro optic arrays
10/02/1997DE19612329A1 Metal master production for CD manufacture
10/02/1997DE19612225A1 Electrically conductive yarns
10/02/1997DE19611936A1 Verfahren zur Erzeugung einer haftfesten Beschichtung auf Polymethylmetacrylat (PMMA)-Substratoberflächen A process for producing a strongly adherent coating on polymethyl methacrylate (PMMA) substrate surfaces
10/01/1997EP0798572A1 Coatings
10/01/1997EP0798571A2 Method of forming striped pattern of thin film material on board and masking apparatus used in the method
10/01/1997EP0798401A2 Laminate and method for preparing same
10/01/1997EP0798400A2 Article having a metal layer and method of producing the same
10/01/1997EP0798399A1 Method of coating metallic and ceramic substrates
10/01/1997EP0797687A1 Cross flow metalizing of compact discs
10/01/1997CN1160775A Non-ideal barrier coating sequence composition
09/1997
09/30/1997US5673167 Support platen with removable insert useful in semiconductor processing apparatus
09/30/1997US5672436 Titanium article having oxidation resistant surface consisting of titanium aluminide layer formed by vapor deposition of aluminum followed by oxidation
09/30/1997US5672386 Vapor deposition of chromium onto substrate, then reacting it with continuously decreasing amounts of nitrogen yields coating with increasing concentrations of chromium toward surface
09/30/1997US5672255 Sputtering device
09/30/1997US5672252 Alternating depositing and stabilizing steps
09/30/1997US5672251 Dopes, tantalum
09/30/1997US5672211 Apparatus for depositing a thin layer on a substrate by laser pulse vapor deposition
09/30/1997US5672210 Method and apparatus for manufacturing superconducting components via laser ablation followed by laser material processing
09/30/1997CA2044439C Process for preparing superconducting oxide thin films
09/27/1997CA2201036A1 Electrochemical device
09/25/1997WO1997035044A1 Method and apparatus for rf diode sputtering
09/25/1997WO1997035043A1 Target, magnetron source with said target, and process for producing said target
09/25/1997WO1997035042A1 Reduction of scatter in thick sputtered coatings
09/25/1997DE19611433A1 Sputter target production method
09/24/1997EP0797249A1 Single step process for blanket-selective CVD metal deposition
09/24/1997EP0796930A1 Use of a layer containing elementary carbon on cutting tools
09/24/1997EP0796447A1 Durable visible/laser/medium wave infrared composite window
09/24/1997EP0796355A1 Apparatus for generating plasma by plasma-guided microwave power