Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
04/1998
04/08/1998EP0833957A1 Hard material coating with yttrium and method for its deposition
04/08/1998EP0833956A1 Solar selective surface coating
04/08/1998EP0833672A1 Treatments to reduce thrombogeneticity in heart valves made from titanium and its alloys
04/08/1998CA2217253A1 Manufacturing method of magnetic material for metallic thin film magnetic recording media and metallic thin film magnetic recording medium
04/07/1998US5736743 Method and apparatus for ion beam formation in an ion implanter
04/07/1998US5736657 Comprises antimony, silver, indium and tellurium intermetallics having chalcopyrite or zinc blende crystal structure
04/07/1998US5736464 Process and apparatus for producing a functional structure of a semiconductor component
04/07/1998US5736460 Forming insulation layer on semiconductor substrate, forming metal layer, forming photoresist, forming gold interconnectors, removing photoresist, removing metal layer, coating insulation layer over interconnectors
04/07/1998US5736267 Transparent conductive film and method for its production, and sputtering target
04/07/1998US5736207 Sequentially arranged barrier layers of polymer and inorganic oxides or oxynitrides
04/07/1998US5736192 Embedded electroconductive layer and method for formation thereof
04/07/1998US5736073 Positioning the substrate to a deposition chamber, impinging the evaporant source with electron beam to generate evaporant, entraining the evaporant in carrier gas stream, coating the substrate
04/07/1998US5736021 Electrically floating shield in a plasma reactor
04/07/1998US5736019 Sputtering cathode
04/07/1998US5736013 Method for forming an improved magnetic media including sputtering of selected oxides or nitrides in the magnetic layer, and apparatus for same
04/07/1998US5735961 For controlling native oxide layer within load-lock chamber
04/07/1998US5735339 Semiconductor processing apparatus for promoting heat transfer between isolated volumes
04/02/1998WO1998013532A1 A multiple target arrangement for decreasing the intensity and severity of arcing in dc sputtering
04/02/1998WO1998013531A1 Method and device to produce a heat insulating layer
04/02/1998WO1998013300A1 Ferroelectric material, method of manufacturing the same, semiconductor memory, and method of manufacturing the same
04/02/1998DE19708599C1 Resistance heated ceramic evaporator boat
04/02/1998DE19706532A1 Sputtering device for semiconductor component manufacture
04/02/1998DE19641397A1 Manufacturing process for heat conducting printed circuit boards
04/02/1998DE19640240A1 Halbleiteranordnung mit einer Schicht aus einem Edelmetall und Verfahren zum Herstellen derselben A semiconductor device comprising a layer of a noble metal and method of manufacturing the same
04/02/1998CA2186984A1 Coated chain saw nose sprocket
04/01/1998EP0832993A1 Layer system, process for manufacturing it and metal substrate with such a layer system
04/01/1998EP0832443A1 Optical multiplexing device and method
04/01/1998EP0832313A1 Superalloy component with a protective coating system
04/01/1998EP0832310A1 Electrically tunable coatings
04/01/1998EP0832309A1 Cathodic arc cathode
04/01/1998EP0677595B1 Device for the vacuum-plasma treatment of articles
04/01/1998CN1177652A Film, method and apparatus for making same, and electronic element including film thereof
04/01/1998CN1177577A Product with coating
03/1998
03/31/1998US5733669 Oxycarbides,-borides, and -nitrides; microelectronics
03/31/1998US5733609 Pulsed beams focused by reflector with aperture
03/31/1998US5733427 Metal silicide
03/31/1998US5733426 Semiconductor wafer clamp device and method
03/31/1998US5733419 Electrodes, counterelectrodes, plasma discharge
03/31/1998US5733418 Sputtering method and apparatus
03/31/1998US5733405 Plasma processing apparatus
03/26/1998WO1998003988A3 Cathode arc source and graphite target
03/26/1998DE19741961A1 Ceramic heat insulating coating of columnar structure
03/26/1998DE19741800A1 Wear and corrosion resistant decorative or tribological coating
03/26/1998DE19700825C1 High-temperature heater for sputtering installations
03/26/1998DE19652634A1 Internal coating of metal workpieces
03/25/1998EP0831521A2 Method for forming a silicide region
03/25/1998EP0831516A2 Device and method for processing a plasma to alter the surface of a substrate using neutrals
03/25/1998EP0831354A1 Deposition process of a ferromagnetic film on a wave guide, and magneto-optical component comprising a thin ferromagnetic film deposed by the process
03/25/1998EP0831155A1 Diffusion-bonded sputtering target assembly and method of manufacturing the same
03/25/1998EP0830708A1 Plasma processing system with reduced particle contamination
03/25/1998EP0830218A1 Structures having enhanced biaxial texture and method of fabricating same
03/25/1998EP0818050A4 Boron nitride cold cathode
03/25/1998CN1177169A Method for forming patterned metallic layer in thin film magnetic head
03/24/1998US5731271 Method for preparing an oxide superconducting tape
03/24/1998US5731046 Fabrication of diamond and diamond-like carbon coatings
03/24/1998US5730847 Arc ion plating device and arc ion plating system
03/19/1998WO1998011272A1 Wear-resistant edge layer structure for titanium or its alloys which can be subjected to a high mechanical load and has a low coefficient of friction, and method of producing the same
03/19/1998WO1998011271A1 A method for manufacturing an absorbent layer for solar collectors, a device for performing the method and an absorbent layer for solar collectors
03/19/1998WO1998011270A1 Process and device for coating the internal face of metal buildings components
03/19/1998DE19739994A1 Verfahren zur Bearbeitung eines Werkstückes A method for machining a workpiece
03/19/1998DE19652633A1 Verfahren und Vorrichtung zum Innenbeschichten metallischer Bauteile Method and apparatus for coating the inside of metal components
03/19/1998DE19637220A1 Passivation of surface defects on diamond
03/19/1998CA2214482A1 Procedure for depositing a ferromagnetic film on a waveguide, and a magneto optical component comprising a thin ferromagnetic film deposited in accordance with the procedure
03/18/1998EP0829017A1 Process for producing a probe with a coated point
03/18/1998EP0828696A1 Mixed oxide high index optical coating material and method
03/18/1998EP0789671A4 The combinatorial synthesis of novel materials
03/18/1998CN1176486A Surface wave plasma processing apparatus
03/18/1998CN1037793C Method and apparatus for laser deposition of large area superconductive film
03/17/1998US5729409 Magnetic disk device having a corrosion resistant magnetoresistive head
03/17/1998US5729046 Superconducting device having pinning regions
03/17/1998US5729028 Ion accelerator for use in ion implanter
03/17/1998US5729027 Ion implanter
03/17/1998US5728465 Diamond-like nanocomposite corrosion resistant coatings
03/17/1998US5728280 Apparatus for coating substrates by cathode sputtering with a hollow target
03/17/1998US5728279 Cobalt base alloy target for a magnetron cathode sputtering system
03/17/1998US5728278 Plasma processing apparatus
03/17/1998US5728276 Treatment apparatus
03/17/1998US5728231 Precursor for semiconductor thin films and method for producing semiconductor thin films
03/12/1998WO1998010123A1 Electrode for electro-chemical applications and method for making the same
03/12/1998WO1998010120A1 Workpiece with wear-protective coating
03/12/1998WO1998010115A1 Silicon-doped diamond-like carbon coatings for magnetic transducers and for magnetic recording media
03/12/1998WO1998010114A1 Process and device for coating substrates by gas flow sputtering
03/12/1998DE19738965A1 Reflection type rotary optical coder
03/12/1998DE19738118A1 Semiconductor device mounting on circuit board
03/12/1998DE19634495A1 Metallising electronic ceramic device body ends
03/11/1998EP0827817A1 Coated chain saw nose sprocket
03/11/1998CN1175798A Method for mfg. superconductor film
03/11/1998CN1037701C Boron nitride crucible and process for producing same
03/10/1998US5726919 Method and apparatus for measuring electron beam effective focus
03/10/1998US5725958 Gas barrier film
03/10/1998US5725914 Process and apparatus for producing a functional structure of a semiconductor component
03/10/1998US5725913 Superhard composite materials including compounds of carbon and nitrogen deposited on metal and metal nitride carbide and carbonitride
03/10/1998US5725746 Shielding for arc suppression in rotating magnetron sputtering systems
03/10/1998US5725741 Method of forming recordable optical element using low absorption materials
03/10/1998US5725740 Eliminating free exposed titanium from an edge of a substrate having sequentially sputtered layers of titanium and titanium nitride thereon
03/10/1998US5725739 Sputtering for forming semiconductor integrated circuits
03/10/1998US5725706 Smooth pressure bonded layer, precious metals
03/10/1998US5725685 Soft magnetic alloy thin film with nitrogen-based amorphous phase
03/10/1998US5725673 Semiconductor wafer process chamber with susceptor back coating
03/10/1998US5725672 Apparatus for the high speed, low pressure gas jet deposition of conducting and dielectric thin sold films
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