Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
08/2005
08/31/2005CN1662298A Method for carrying out homogeneous and heterogeneous chemical reactions using plasma
08/31/2005CN1661763A Ion implantation method and apparatus
08/31/2005CN1661251A Rolling sliding member and rolling apparatus
08/31/2005CN1661129A Filming device and clamps
08/31/2005CN1660526A Process of mfg. Mo alloyed targeting materials
08/31/2005CN1660510A Method for manufacturing metallic products and production
08/31/2005CN1217344C Transparent conductive iaminate, its manufacturing method, and display comprising transparent conductive laminate
08/31/2005CN1217028C Sputtering target material
08/31/2005CN1217027C Central multiple arc source type ion plating method
08/30/2005US6936906 atomic layer deposition barrier chamber for depositing a barrier layer comprising tantalum nitride;
08/30/2005US6936528 Method of forming cobalt silicide film and method of manufacturing semiconductor device having cobalt silicide film
08/30/2005US6936482 Method of fabricating substrates and substrates obtained by this method
08/30/2005US6936481 Method of depositing dielectric
08/30/2005US6936311 Using a source of laser energy, a receiving substrate, and a target substrate
08/30/2005US6936304 Comprises luminophores/phosphors; vapor phase deposition
08/30/2005US6936299 Determined in situ during coating process using a sensor which has an electrical property which, as a result of the coating process, changes in a manner which is representative of the layer thickness
08/30/2005US6936145 Coating method and apparatus
08/30/2005US6936141 Decreasing the surface tension of the elastomer and photolithographically processing
08/30/2005US6935014 inhibits creation of polymer debris through etching process for intermediate layer and deterioration of photoresist frame at formation of intermediate layer; usable for fabricating a writing magnetic pole portion of a thin film magnetic head
08/25/2005WO2005079117A1 Cylindrical microwave chamber
08/25/2005WO2005078812A1 METHOD FOR CONTROLLING CONDUCTIVITY OF Ga2O3 SINGLE CRYSTAL
08/25/2005WO2005078780A1 Vapor-phase deposition method
08/25/2005WO2005078739A1 Aluminum alloy wiring material having high resistance to heat and target material
08/25/2005WO2005078153A1 Sputtering target, optical information recording medium and process for producing the same
08/25/2005WO2005078152A1 Sputtering target, optical information recording medium and process for producing the same
08/25/2005WO2005077677A1 Physical vapor deposition components, and methods of treating components
08/25/2005WO2005077525A1 Crystalline thin film and method for producing same
08/25/2005WO2005047202A3 Method for application of a thermal barrier coating and resultant structure thereof
08/25/2005WO2005013337A3 Rapid generation of nanoparticles from bulk solids at room temperature
08/25/2005US20050186767 Semiconductor device, apparatus and method for manufacturing the same
08/25/2005US20050186688 Chemical vapor deposition methods and physical vapor deposition methods
08/25/2005US20050186485 Forming layer of metal and silicon-containing compound film on transparent substrate by co-sputtering; photoresists; semiconductors; integrated circuits
08/25/2005US20050186469 Chemical protection of a lithium surface
08/25/2005US20050186448 Hard film for cutting tools, cutting tool coated with hard film, process for forming hard film and target used to form hard film
08/25/2005US20050186424 Carbon film-coated article and method of producing the same
08/25/2005US20050186412 Forming thin films on substrates using a porous carrier
08/25/2005US20050186346 Method for operating an in-line coating installation
08/25/2005US20050186344 Placing a pair of closely spaced electrodes, at least one of which is formed from a composite carbon material, producing a spark between the two electrodes, to cause the carbon to sublime and deposit; carbonization of polymer mixed with carbon powder
08/25/2005US20050186343 Method of making a stick resistant multi-layer ceramic coating
08/25/2005US20050186340 Device and method for vaporizing temperature sensitive materials
08/25/2005US20050185518 Decorative article, method of manufacturing same, and timepiece
08/25/2005US20050184669 Methods and Apparatus for Generating Strongly-Ionized Plasmas with Ionizational Instabilities
08/25/2005US20050184395 Electronic device, method of manufacture of the same, and sputtering target
08/25/2005US20050184254 Ion implantation method and apparatus
08/25/2005US20050183959 Automatic process control; using facility for automatically selecting and refining electrical parameters for processing a microelectronic workpiece
08/25/2005US20050183946 Mode size converter for a planar waveguide
08/25/2005US20050183945 creating a magnetic field so that the film-forming surface portion is placed in the magnetic field with the magnetic field induced normal to the substrate surface portion; back-biasing the back portion of the substrate; sputtering alloyed thin film
08/25/2005US20050183944 Reducing stress in coatings produced by physical vapour deposition
08/25/2005US20050183943 Energy and media connection for a coating installation comprising several chambers
08/25/2005US20050183797 Melt alloys in a vacuum or under a low partial pressure of inert gas; thinned by deform between two flat dies; use molds having high melting point and high thermal conductivity can be used many time gives; fine and columnar grains; alloy sputtering targets have pass through flux of sixty five percent
08/25/2005US20050183671 Fixing member for evaporation apparatus
08/25/2005US20050183670 Patterned thin-film deposition using collimating heated masked assembly
08/25/2005DE102004004844A1 Vorrichtung zum Beschichten eines Substrats mit einer Absorberanordnung Apparatus for coating a substrate with an absorber assembly
08/25/2005CA2556824A1 Vapor phase growth method
08/25/2005CA2555032A1 Cylindrical microwave chamber
08/24/2005EP1566827A1 Magnetron sputtering apparatus
08/24/2005EP1566463A1 Anti-abrasion coating for tools
08/24/2005EP1565935A1 Method for producing a chalcogenide semi-conductive layer for controlling in situ an optical process and device for carrying out said method
08/24/2005EP1565929A2 Method for the production of a substrate and unit for the same
08/24/2005EP1565591A2 Method for vapor-depositing strip-shaped substrates with a transparent barrier layer made of aluminum oxide
08/24/2005CN2720624Y Large-area double-side supercnoductive film base-piece clamp
08/24/2005CN2719866Y large-size column hollow sputtering cathode
08/24/2005CN1659936A Flexible printed circuit board and process for producing the same
08/24/2005CN1659720A Hermetic encapsulation of organic electro-optical elements
08/24/2005CN1659711A Semiconductor device and method for fabricating the same
08/24/2005CN1659306A Fabrication of B/C/N/O/Si doped sputtering targets
08/24/2005CN1659305A Tantalum sputtering target and method for preparation thereof
08/24/2005CN1659304A Thin films and methods for forming thin films utilizing ECAE-targets
08/24/2005CN1659303A Method for forming organic thin film
08/24/2005CN1659302A High-tensile, plastically deformable moulded body consisting of titanium alloys
08/24/2005CN1657647A Method for operating an in-line coating installation
08/24/2005CN1657646A Sputter arrangement with a magnetron and a target
08/24/2005CN1657645A Method for modifying surface of polymer microffow chip by sputtering TiO2
08/24/2005CN1657644A High-temp superconducting film two-sided evaporation wating technology and its device
08/24/2005CN1216415C Method of depositing metal film and metal deposition cluster including supercritical drying/cleaning module
08/24/2005CN1216404C Manufacturing method of semiconductor device
08/24/2005CN1216180C Equipment for in-line exchange of substrate in vacuum chamber
08/23/2005US6933460 Method and device for plasma treatment of moving metal substrates
08/23/2005US6933065 Substrate overcoated with smooth oxide composite
08/23/2005US6933060 Thermal barrier coating resistant to sintering
08/23/2005US6933051 Flexible electrically conductive film
08/23/2005US6933041 Method for producing high surface area foil electrodes
08/23/2005US6933013 Vacuum deposition of dielectric coatings on volatile material
08/23/2005US6933004 Control of stress in metal films by controlling the temperature during film deposition
08/23/2005US6933001 Optical filter and method of manufacturing the same
08/23/2005US6931701 Method for manufacturing a thin film
08/18/2005WO2005075701A1 Thin film forming apparatus
08/18/2005WO2005075371A1 Method for cleaning a substrate
08/18/2005WO2005075212A1 Phase-change information recording medium and process for producing the same, sputtering target, method for using phase-change information recording medium and optical recorder
08/18/2005WO2005075077A1 Method of producing a layer of material on a support
08/18/2005WO2005074640A2 Physical vapor deposition target constructions
08/18/2005WO2005074587A2 Treatment process for improving the mechanical , catalytic, chemical and biological activity of surfaces and articles treated therewith
08/18/2005WO2005050750A3 Manufacture of flat panel light emitting devices
08/18/2005WO2005044317A3 Method and device for supplying at least one machining station for a workpiece
08/18/2005WO2005036601A3 Wafer characteristics via reflectomeytry and wafer processing apparatus and method
08/18/2005WO2005031027A3 Container for evaporation of emtal and method for manufacture thereof
08/18/2005WO2005026404A3 Thermography test method and apparatus for evaluating a bond interface of a sputtering target/backing plate assembly
08/18/2005US20050181955 preventing oxidation of manganese during alloying by adding deoxidation stabilizers; low contents of impurity such as oxygen and carbon and a controlled crystal conformation; thin film having excellent antiferromagnetism; inhibite abnormal discharge or dust
08/18/2005US20050181240 Magnetic disk, method of manufacturing the magnetic disk and method of evaluating the magnetic disk
08/18/2005US20050181238 Dual-layer carbon-based protective overcoats for recording media by filtered cathodic ARC deposition