Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
09/2005
09/29/2005US20050211549 Method and system for target lifetime
09/29/2005US20050211548 Selectable dual position magnetron
09/29/2005US20050211547 Reactive sputter deposition plasma reactor and process using plural ion shower grids
09/29/2005US20050211546 applying a radio frequency power source to generate plasma gases from deposition precursor species sputtered from semiconductor targets, creating a flux of ions and providing gases into chemcial reactors for combining with semiconductor atoms to form molecules that deposit on the workpiece surfaces
09/29/2005US20050211545 Ionized physical vapor deposition (iPVD) process
09/29/2005US20050211544 Electrical biasing of gas introduction means of plasma apparatus
09/29/2005US20050211543 Generation of uniformly-distributed plasma
09/29/2005US20050211273 Method for operating vacuum installations under pressure changes
09/29/2005US20050211172 Elongated thermal physical vapor deposition source with plural apertures
09/29/2005US20050211170 Chemical vapor deposition plasma reactor having plural ion shower grids
09/29/2005US20050210684 Atomically sharp edged cutting blades and methods for making same
09/29/2005DE102004011178A1 Verfahren zur Oberflächenbehandlung von Substraten A process for the surface treatment of substrates
09/29/2005DE10056686B4 Verdampferzelle und ein Verfahren zur Herstellung von Aufdampfschichten The evaporator cell and a method for the preparation of vapor-deposition layers
09/29/2005CA2558831A1 Coated piston pin
09/28/2005EP1580789A2 Ion implantation method and apparatus
09/28/2005EP1580446A1 Method of operating a vacuum system with varying pressure
09/28/2005EP1580298A1 Process and apparatus for pulsed magnetron sputtering
09/28/2005EP1580297A2 Sheet material, especially for security elements
09/28/2005EP1580296A2 Reduced thermal conductivity TBC by EB-PVD process to incorporate porosity
09/28/2005EP1580295A1 Apparatus for reactive sputtering
09/28/2005EP1579908A1 The combinatorial synthesis of novel materials
09/28/2005EP1579471A2 Vacuum sputtering cathode
09/28/2005EP1579025A1 Coater having substrate cleaning device and coating deposition methods employing such coater
09/28/2005EP1579024A1 Flexible frame for mounting a deposition mask
09/28/2005EP1579019A2 High purity nickel/vanadium sputtering components; and methods of making sputtering components
09/28/2005EP1360549B1 Liquid crystal device and manufacturing method
09/28/2005CN2729091Y Vacuum reaction chamer of film coating machine
09/28/2005CN2729090Y Vacuum film coating equipment of electric tube with coating film on inwall
09/28/2005CN1675742A Transfer chamber for vacuum processing system
09/28/2005CN1675732A Accessory member for dispensers of alkali metals
09/28/2005CN1675400A Article coated with titanium compound film, process for producing the article and sputtering target for use in the film coating
09/28/2005CN1675399A Sputtering target, sintered body, conductive film formed by using them, organic EL device, and substrate used for the organic el device
09/28/2005CN1675059A Flexible electrically conductive film
09/28/2005CN1675036A A cutting member having a superlattice coating
09/28/2005CN1675015A Coated cutting tool member
09/28/2005CN1674730A Mask, method of manufacturing the same, method of forming thin film pattern, method of manufacturing electro-optical device
09/28/2005CN1674729A Method and apparatus for measuring thickness of deposited film and method and apparatus for forming material layer
09/28/2005CN1674230A Silicon substrate nano-zinc oxide and producing method and application thereof
09/28/2005CN1673409A Equipment for reacting sputtering
09/28/2005CN1673408A Hard coating and its formation method, and hard-coated tool
09/28/2005CN1673407A Technology for producing titanium nitride composite ceramic
09/28/2005CN1673145A Vacuum treatment installation with a variable pump arrangement
09/28/2005CN1672818A Method of operating a vacuum system with varying pressure
09/28/2005CN1221012C 掩模 Mask
09/27/2005US6949756 Shaped and low density focused ion beams
09/27/2005US6949478 Oxide film forming method
09/27/2005US6949301 Magnetic recording medium having a magnetic film on a non-magnetic substrate by intercalating an under layer, the proportion of functional groups/100 carbon atoms in a diamond like carbon protective coating composed of carbon exceeds 20%
09/27/2005US6949173 Continuous coating system
09/27/2005US6949170 Deposition methods and apparatus
09/27/2005US6949143 Dual substrate loadlock process equipment
09/27/2005US6948795 Ejection device, manufacturing device of color filter substrate, manufacturing device of electro-luminescent display device, manufacturing device of plasma display device, and ejection method
09/27/2005CA2283222C Photocatalytically-activated self-cleaning article and method of making same
09/22/2005WO2005089031A1 Plasma generator
09/22/2005WO2005087978A1 Plasma coating system for non-planar substrates
09/22/2005WO2005087973A1 Film-forming apparatus and firm-forming method thereof
09/22/2005WO2005087972A1 Film forming apparatus
09/22/2005WO2005087971A1 Method for gettering oxygen and water during vacuum deposition of sulfide films
09/22/2005WO2005087970A1 Vacuum deposition apparatus
09/22/2005WO2005087969A1 Alignment equipment and film forming equipment
09/22/2005WO2005087968A1 Al COMPOSITE MATERIAL BEING CRUMBLED WITH WATER, Al FILM AND Al POWDER COMPRISING THE MATERIAL AND METHODS FOR PREPARATION THEREOF, CONSTITUTIONAL MEMBER FOR FILM-FORMING CHAMBER METHOD FOR RECOVERING FILM-FORMING MATERIAL
09/22/2005WO2005087677A2 Coated article with zinc oxide over ir reflecting layer and corresponding method
09/22/2005WO2005086645A2 Coated article with low-e coating including ir reflecting layer(s) and corresponding method
09/22/2005WO2005003402A3 Hydrogen sulfide injection method for phosphor deposition
09/22/2005US20050208767 Method of depositing a tantalum nitride / tantalum diffusion barrier layer system
09/22/2005US20050208713 Liquid crystal display device and method for fabricating the same
09/22/2005US20050208698 Monitoring the deposition properties of an oled
09/22/2005US20050208337 Reduced thermal conductivity TBC by EB-PVD process to incorporate porosity
09/22/2005US20050208325 Substrate having a surface of Ti and/or stainless steel, a first coating of titanium carbonitride, and an overcoating containing at least 90% Ti, Pt, Pd, or In; a superior aesthetic appearance can be maintained over a long period of time
09/22/2005US20050208281 Method for production of a glazed piece provided with a multi-layer coating
09/22/2005US20050208220 Directing a stream of metered fluidized powder onto a first member; heating the member to vaporize the powder; collecting the vapors in a manifold; and providing a second member an aperture(s) to direct the vapors onto the surface to form a film
09/22/2005US20050208219 Composite oxide dielectric; sputtering using various pressure; overcoating semiconductor substrate
09/22/2005US20050208218 Method for depositing boron-rich coatings
09/22/2005US20050208216 Manifold; chamber for receiving organic material, an aperture plate for heating the organic material, emitting vaporized organics; coating an organic layer on a substrate of an OLED device; electrical insulator for concentrating heat in the unsupported region of the aperture plate
09/22/2005US20050208211 Component comprising submicron hollow spaces
09/22/2005US20050208205 For making organic light emitting full color display panel by angled evaporation; comprises ribs defining slots in which individual pixels are built, overcoating substrate; red, blue, green dopes; shadow masking
09/22/2005US20050208204 Apparatus for consecutive deposition of high-temperature superconducting (HTS) buffer layers
09/22/2005US20050207874 Device for coating hollow bodies, in particular plastic bottles, that has a high vaccum region and sluice
09/22/2005US20050207831 Coated piston pin
09/22/2005US20050207033 Optical lens holder
09/22/2005US20050206271 Potassium niobate deposited body, method for manufacturing the same, piezoelectric thin film resonator, frequency filter, frequency oscillator, electronic circuit, and electronic apparatus
09/22/2005US20050206018 gas driers, rotating coaters, vacuum treatment apparatus, heat treatment apparatus, charged particle flow irradiating apparatus, plasma treatment apparatus, electrostatic absorbers, interatomic force microscope, X-ray irradiating apparatus and cleaners
09/22/2005US20050205998 Multilayer film-coated substrate and process for its production
09/22/2005US20050205421 Sputtering apparatus
09/22/2005US20050205417 Filling the sputtering chamber with argon, adjusting the radio frequency operating power, maintaining for 10 to 20 minutes, powering down and discharging the gas; complete removal of oxidative contaminants
09/22/2005US20050205415 Multi-component deposition
09/22/2005US20050205414 Method and apparatus for improving sidewall coverage during sputtering in a chamber having an inductively coupled plasma
09/22/2005US20050205413 Reactive sputtering method and device
09/22/2005US20050205412 Deposition station with a cathode, two opposing targets defining the plasma field, permanent magnets or coils to generate a magnetic field, yokes to direct the magnetic field and two independent power supplies connected to each target; magnets can be repositioned without losing functionality
09/22/2005US20050205411 An electromagnet magnetron positioned above and outside the reaction chamber reverses the magnetic dipoles in situ to improve uniformity and symmetry of deposited thim films on the walls of the opening; semiconductors
09/22/2005US20050205209 Replacing chamber components in a vacuum environment
09/22/2005US20050205205 Method and apparatus for separating disc-shaped substrates
09/22/2005CA2554835A1 Coated article with zinc oxide over ir reflecting layer and corresponding method
09/22/2005CA2554817A1 Method for gettering oxygen and water during vacuum deposition of sulfide films
09/22/2005CA2554516A1 Coated article with low-e coating including ir reflecting layer(s) and corresponding method
09/21/2005EP1577499A2 Turbine components with thermal barrier coatings
09/21/2005EP1577419A1 System for coating hollow bodies such as plastic bottles with an high vacuum chamber and a lock
09/21/2005EP1577418A1 Polygonal barrel spattering device, polygonal barrel spattering method, coated particle formed by the device and method, microcapsule, and method of manufacturing the microcapsule
09/21/2005EP1577417A1 Multi-component deposition
09/21/2005EP1577416A1 Decorative article and timepiece
09/21/2005EP1576202A2 Methods for producing coated metal wire