Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
10/2005
10/06/2005WO2005093123A1 Process for forming thin film and system for forming thin film
10/06/2005WO2005093122A1 Process for forming thin film and system for forming thin film
10/06/2005WO2005093121A1 Method of applying coatings with a metallic or ceramic finish
10/06/2005WO2005093120A1 Film-forming apparatus and film-forming method
10/06/2005WO2005093119A1 Silicon film forming equipment
10/06/2005WO2005093118A1 Method for producing high heat resistant conductive thin film, high heat resistant conductive thin film produced by that method, multilayer film, and device having multilayer film
10/06/2005WO2005093117A2 Vaporizing fluidized organic materials
10/06/2005WO2005093116A2 Replacing chamber components in a vacuum environment
10/06/2005WO2005092420A1 A matrix assisted pulsed-laser evaporation technique for coating a medical device and associated system and medical device
10/06/2005WO2004079764B1 Coil constructions configured for utilization in physical vapor deposition chambers, and methods of forming coil constructions
10/06/2005US20050221707 Functional fiber sheet
10/06/2005US20050221623 Article comprising an oxide layer on a GaAs-based semiconductor structure and method of forming same
10/06/2005US20050221609 Mask, method for manufacturing a mask, method for manufacturing an electro-optical device, and electronic equipment
10/06/2005US20050221104 Sheet for packaging food and method for manufacturing it
10/06/2005US20050221097 Application of multi-layer antistatic/antireflective coating to video display screen by sputtering
10/06/2005US20050221079 Overcoating metal oxide with organosilicon compound
10/06/2005US20050221057 selecting an article, creating undercut grooves on the article, and then applying a coating on the article; stress relief and mechanical locking of a thick thermal sprayed coating
10/06/2005US20050221022 Ionizing a sputtered material; applyingbias voltage to substrate of a micro-electromechanical system (MEMS) to form a first and a second layer of a first and a second film stack of a first and a second film bulk acoustic resonators filter
10/06/2005US20050220999 Needle-shaped x-ray fluorescent material and method for vapor-deposition thereof on a substrate
10/06/2005US20050220991 Magnetic film forming method, magnetic pattern forming method and magnetic recording medium manufacturing method
10/06/2005US20050220990 Can process a magnetic film including a recording portion and a non-recording portion in accordance with a recording pattern; has at least one of Fe and Co and at least one of Pd and Pt
10/06/2005US20050220986 Superconductor fabrication processes
10/06/2005US20050220381 Metal-to-metal spherical bearing
10/06/2005US20050218603 Piston ring comprising a pvd coating
10/06/2005US20050218345 Ion implantation apparatus and method
10/06/2005US20050218116 Process for reducing particle formation during etching
10/06/2005US20050217993 Lock chamber device for vacuum treatment unit and procedures for its operation
10/06/2005US20050217992 Magnetron sputtering source and chamber therefor
10/06/2005US20050217988 Halftones; translucence; semiconductors, integrated circuits
10/06/2005US20050217705 Methods for removing silicon and silicon-nitride contamination layers from deposition tubes
10/06/2005US20050217695 Apparatus for applying disparate etching solutions to interior and exterior surfaces
10/06/2005US20050217584 Film formation source, film formation apparatus, film formation method, organic EL panel, and method of manufacturing organic EL panel
10/06/2005US20050217567 Covering assembly for crucible used for evaporation of raw materials
10/06/2005US20050217110 Deposition repair of hollow items
10/06/2005DE202005008165U1 Device for vapor deposition of a coating, especially a hydrophobic and/or oleophobic top coat on the sides of flat substrates, useful for coating of optical items such as spectacles and lenses
10/06/2005DE10239066B4 Verfahren zum Abscheiden einer Metallbarrierenschicht A method of depositing a metal barrier layer
10/06/2005DE102004012663A1 Anlage zum Beschichten von Hohlkörpern, insbesondere von Kunststoffflaschen, mit einem Hochvakuumbereich und einer Schleuse Installation for coating hollow bodies, especially plastic bottles, with a high vacuum region and a lock
10/06/2005CA2503800A1 Deposition repair of hollow items
10/05/2005EP1583400A2 Mask, method for manufacturing a mask, method for manufacturing an electro-optical device, and electronic equipment
10/05/2005EP1583161A1 Structurally gradient material and functional element including the same
10/05/2005EP1582921A2 Film-depositing target and preparation of phase shift mask blank
10/05/2005EP1582832A1 Vacuum treatment apparatus having detachable valve
10/05/2005EP1582756A2 A metal-to-metal spherical bearing
10/05/2005EP1582694A1 Method for protecting openings in a component during processing
10/05/2005EP1582607A1 Loadlock arrangement for a vacuum treatment apparatus and method of operating it
10/05/2005EP1582606A1 Vacuum treating apparatus with variable pumping arrangement.
10/05/2005EP1581963A1 Mid span support for a magnetic array of a cylindrical magnetron sputter device
10/05/2005EP1581666A2 Coating for a plastic substrate
10/05/2005EP1580446B1 Method of operating a vacuum system with varying pressure
10/05/2005EP1518006B1 Target support assembly
10/05/2005EP1404763B1 Method for the production of plane-parallel platelets by using organic separating agents
10/05/2005EP1080522A4 Reliable modular production quality narrow-band high rep rate f 2? laser
10/05/2005CN2730991Y Stainless steel pipe with vacuum planted zirconium nitride
10/05/2005CN2730984Y Stainless steel decoration board with vacuum planted zirconium nitride
10/05/2005CN2730887Y Slide track reciprocative pair target sputtering heating driving device
10/05/2005CN1679375A Fabrication system, light-emitting device and fabricating method of organic compound-containing layer
10/05/2005CN1679137A Cathode for vacuum sputtering treatment machine
10/05/2005CN1678145A Mask, method for manufacturing a mask, method for manufacturing an electro-optical device, and electronic equipment
10/05/2005CN1678143A Film formation source, film formation apparatus, film formation method, organic EL panel, and method of manufacturing organic EL panel
10/05/2005CN1676959A Metal-to-metal spherical bearing
10/05/2005CN1676678A ZnO nano crystal column/nano crystal filament composite structure product and its preparing process
10/05/2005CN1676665A Vacuum working apparatus and method for preventing vacuometer corrosion
10/05/2005CN1676663A Single MEVVA ion source diffusion coating composite treating process
10/05/2005CN1676662A Two dimensional magnetron scanning for planar sputtering
10/05/2005CN1676661A Sputter target material and method of producing the same
10/05/2005CN1676660A Nozzle evaporating source for steam plating
10/05/2005CN1676659A Straight-line organic electroluminescence mfg. device
10/05/2005CN1676485A Lock chamber device for vacuum treatment unit and procedures for its operation
10/05/2005CN1676477A Manufacturing method of die for optical element molding
10/05/2005CN1676445A Substrate moving device
10/05/2005CN1676438A Sheet for packaging food and method for manufacturing it
10/05/2005CN1222197C Ion beam radiation device and method for choking basis charge accumulation
10/05/2005CN1221684C Rejuvenation of refractory metal products
10/05/2005CN1221683C Method and product of sputtering and depositing bioactive gradient hydroxyapatite(HA)/(Ti) layer on Ti alloy surface
09/2005
09/29/2005WO2005091683A1 Substrate depositing method and organic material depositing apparatus
09/29/2005WO2005091329A2 Sputtering device for manufacturing thin films
09/29/2005WO2005091283A1 Method and apparatus for separating disc-shaped substrates
09/29/2005WO2005091039A1 Optical lens holder
09/29/2005WO2005090633A1 Process for producing material film and material film production apparatus
09/29/2005WO2005090632A1 Deposition by magnetron cathodic pulverization in a pulsed mode with preionization
09/29/2005WO2005090631A1 Method to reduce thermal stresses in a sputter target
09/29/2005WO2005090630A1 Fine particle
09/29/2005WO2005090629A2 Refurbishment of sputtering targets
09/29/2005WO2005089272A2 Pulsed cathodic arc plasma source
09/29/2005WO2005089142A2 Coated piston pin
09/29/2005WO2005089107A2 Apparatus and method for applying coatings onto the interior surfaces of components and related structures produced therefrom
09/29/2005WO2005089092A2 Growth of in-situ thin films by reactive evaporation
09/29/2005WO2004108982A3 Adaptable processing element for a processing system and a method of making the same
09/29/2005US20050215686 Process of masking cooling holes of a gas turbine component
09/29/2005US20050214589 Magnetic recording disk, magnetic recording disk manufacturing method and magnetic recording disk manufacturing system
09/29/2005US20050214551 Enhanced adhesion between the intermediate layer and the film by including in the intermediate layer Mo, Cr, Ni, and/or Si dispersed to a depth of 20 nm or less from the surface; and a copper or copper alloy conductive layer formed on the intermediate layer
09/29/2005US20050214540 Low friction, high durability ringless piston and piston sleeve
09/29/2005US20050214475 Floor tile coating system
09/29/2005US20050214102 Loading and unloading apparatus for a coating device
09/29/2005US20050212450 Method and system for detecting electrical arcing in a plasma process powered by an AC source
09/29/2005US20050211981 Mask, method of manufacturing the same, method of forming thin film pattern, method of manufacturing electro-optical device and electronic equipment
09/29/2005US20050211970 Metal nano-objects, formed on semiconductor surfaces, and method for making said nano-objects
09/29/2005US20050211924 Ion implantation apparatus and ion implanting method
09/29/2005US20050211663 Process for producing structure, process for producing magnetic recording medium, and process for producing molded product
09/29/2005US20050211550 cathodes to which a discharge voltage is applied for a plasma, working gas and reactive gas in a sputter chamber, valves for controlling gas flow and partial pressure of the gases, and controllers circuits;