Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
10/2005
10/19/2005CN1224307C Light-penetrating electromagnetic wave filter and mfg. technology thereof
10/19/2005CN1223700C Method for producing optically effective system of layers
10/19/2005CN1223699C Sputtering target and its production method
10/19/2005CN1223697C Method and apparatus for low pressure sputtering
10/19/2005CN1223696C A solid electrolyte crystal material and process for preparing crystal film
10/19/2005CN1223613C Continuous processing apparatus by plasma polymerization with vertical chamber
10/19/2005CN1223514C Flaky carbon nano tube, preparation method and special equipment
10/19/2005CN1223411C Adhesive film recovery device and method
10/18/2005US6956012 Method of depositing an electrically conductive oxide buffer layer on a textured substrate and articles formed therefrom
10/18/2005US6955938 Tantalum sputtering target and method of manufacture
10/18/2005US6955928 Closed loop residual gas analyzer process control technique
10/18/2005US6955852 Method of manufacturing sputter targets with internal cooling channels
10/18/2005US6955835 depositing a buffer layer on the substrate and depositing a layer of compressive alpha-tantalum on the buffer layer with lattice matching between the layer of compressive alpha-tantalum and the buffer layer; semiconductors
10/18/2005US6955748 PVD target constructions comprising projections
10/18/2005US6955726 Mask and mask frame assembly for evaporation
10/13/2005WO2005096025A1 Optical part of alicyclic structure-containing polymer composition
10/13/2005WO2005095668A1 Method and apparatus for producing a metal wire coated with a layer of metal alloy
10/13/2005WO2005095667A1 Chromium plating
10/13/2005WO2005095666A2 Magnetically enhanced capacitive plasma source for ionized physical vapour deposition-ipvd
10/13/2005WO2005095662A1 High chromium ferritic steel with 0.5 atomic % hafnium, part of which is ion implanted
10/13/2005WO2005095296A2 Method of preparing a rare-earth-doped film
10/13/2005WO2005095263A2 Methods of forming alpha and beta tantalum films with controlled and new microstructures
10/13/2005WO2005094486A2 Radiopaque coating for biomedical devices
10/13/2005WO2005094280A2 High-strength backing plates, target assemblies, and methods of forming high-strength backing plates and target assemblies
10/13/2005WO2005047558A3 Process for manufacturing devices which require a non evaporable getter material for their working
10/13/2005WO2005000758A3 Dielectric-layer-coated substrate and installation for production thereof
10/13/2005US20050227487 Methods of forming a reaction product and methods of forming a conductive metal silicide by reaction of metal with silicon
10/13/2005US20050227408 Method for forming housings for electronic components and electronic components that are hermetically encapsulated thereby
10/13/2005US20050227122 Vertical magnetic recording medium, method for producing the same and magnetic recorder
10/13/2005US20050227118 Plasma resistant member
10/13/2005US20050227116 Hard coating layer of a physically vapor deposited nitride or carbonitride containing Ti, Al, and Zr; superior wear resistance during high speed cutting in which a significant amount of heat is generated and superior shipping resistance
10/13/2005US20050227062 Antistatic film, spacer using it and picture display unit
10/13/2005US20050227020 Method for carrying out homogeneous and heterogeneous chemical reactions using plasma
10/13/2005US20050227005 Method for gettering oxygen and water during vacuum deposition of sulfide films
10/13/2005US20050227004 Method and apparatus for coating a patterned thin film on a substrate from a fluid source with continuous feed capability
10/13/2005US20050227002 Method and device for the plasma treatment of workpieces
10/13/2005US20050226387 Apparatus and method for light weight high performance target
10/13/2005US20050225248 Honeycomb optical window deposition shield and method for a plasma processing system
10/13/2005US20050224766 Transparent conductive thin film, process for producing the same, sintered target for producing the same, and transparent, electroconductive substrate for display panel, and organic electroluminescence device
10/13/2005US20050224551 Guide arrangement with at least on guide roller for the guidance of webs in webs treatment installations
10/13/2005US20050224344 Plasma processing apparatus and method
10/13/2005US20050224343 Power coupling for high-power sputtering
10/13/2005US20050224342 Target support assembly
10/13/2005US20050224337 Plasma processing apparatus and method
10/13/2005US20050224336 Core insert for glass molding machine and method for making same
10/13/2005US20050223995 Vacuum treatment installation with a variable pump arrangement
10/13/2005US20050223994 Substrate susceptors for receiving semiconductor substrates to be deposited upon and methods of depositing materials over semiconductor substrates
10/13/2005US20050223988 Coating device comprising a conveying device
10/13/2005US20050223848 Co alloy target and its production method, soft magnetic film for perpendicular magnetic recording and perpendicular magnetic recording medium
10/13/2005DE202005011974U1 Sputter target for target base plate in vacuum coating unit has oval shape with central aperture and inner and outer peripheral grooves in which locking strips are positioned, bores above groove allowing base plate to be bolted to it
10/13/2005CA2567032A1 Methods of forming alpha and beta tantalum films with controlled and new microstructures
10/13/2005CA2561425A1 High chromium ferritic steel with 0.5 atomic % hafnium, part of which is ion implanted
10/13/2005CA2560232A1 Radiopaque coating for biomedical devices
10/12/2005EP1585159A1 Alkali metal generating agent, alkali metal generator, photoelectric surface, secondary electron emission surface, electron tube, method for manufacturing photoelectric surface, method for manufacturing secondary electron emission surface, and method for manufacturing electron tube
10/12/2005EP1584707A1 Power coupling for high-power sputtering
10/12/2005EP1584706A1 Copper alloy sputtering target and semiconductor element wiring
10/12/2005EP1584705A1 Vapor source for film formation apparatus
10/12/2005EP1584704A1 Method for protecting articles, and related compositions
10/12/2005EP1584703A1 Mask, method of manufacturing the same, method of forming thin film pattern, method of manufacturing electro-optical device and electronic equipment
10/12/2005EP1584702A1 Deposition repair of hollow items
10/12/2005EP1584464A1 Sheet for packaging food and method for manufacturing it
10/12/2005EP1583871A2 Security film and method for the production thereof
10/12/2005EP1583852A2 Target designs and related methods for enhanced cooling and reduced deflection and deformation
10/12/2005EP1235948B1 Sputtering target and methods of making same
10/12/2005CN2732757Y Continuous coating device for coating capable of selectively absorbing solar spectrum
10/12/2005CN2732756Y Target material structure for sputtering type film plating machine
10/12/2005CN1682570A Silicon oxynitride passivated rare earth activated thioaluminate phosphors for electroluminescent displays
10/12/2005CN1682569A Fabrication system and manufacturing method of light emitting device
10/12/2005CN1682393A Anode compositions having an elastomeric binder and an adhesion promoter
10/12/2005CN1682356A Organic siloxane copolymer film, method and deposition apparatus for producing same, and semiconductor device using such copolymer film
10/12/2005CN1681966A Coating method of a metal material, apparatus therefor and product thereby
10/12/2005CN1681962A Installation for the vacuum treatment in particular of substrates
10/12/2005CN1681961A Methods of treating PVD target and PVD target
10/12/2005CN1681960A Copper sputtering targets and methods of forming copper sputtering targets
10/12/2005CN1681959A 溅射靶及光记录介质 Sputter targets and optical recording media
10/12/2005CN1681958A 溅射靶及光记录介质 Sputter targets and optical recording media
10/12/2005CN1681745A Method for manufacturing layers and layer systems, and coating substrates
10/12/2005CN1681744A Coated object
10/12/2005CN1681743A Coated object
10/12/2005CN1681593A Photocatalyst material and process for producing the same
10/12/2005CN1681363A Self-emitting display
10/12/2005CN1681092A Plasma processing apparatus and method
10/12/2005CN1681077A Preparation of nano-junction
10/12/2005CN1680620A Thin film forming method, optical film, polarizing film and image display
10/12/2005CN1680619A Power coupling for high-power sputtering
10/12/2005CN1680618A Method for impulsive bias arc ion plating multi-player super-hard nano films of titanium/titanium nitrate
10/12/2005CN1680617A Production of bathing products with surface antibacterial membrane and products thereof
10/12/2005CN1680189A Diameter thinning method of one-dimensional micro-nanometer structural material of metal organic complex
10/12/2005CN1680068A Deposition repair of hollow items
10/12/2005CN1223010C Substrate for solar cells, solar cells with the same substrate and manufacturing process of the solar cells
10/12/2005CN1222635C Banded high purity pair-cathodes
10/11/2005US6954350 Ceramic layered product and method for manufacturing the same
10/11/2005US6953730 Low-temperature grown high quality ultra-thin CoTiO3 gate dielectrics
10/11/2005CA2300166C Apparatus and method for in-situ thickness and stoichiometry measurement of thin films
10/06/2005WO2005093875A1 Monitoring the deposition properties of an oled
10/06/2005WO2005093864A1 Thermoelectric conversion element and thermoelectric conversion module
10/06/2005WO2005093798A1 Method and apparatus for forming silicon dots
10/06/2005WO2005093797A1 Method and equipment for forming crystalline silicon thin film
10/06/2005WO2005093781A1 Method and arrangement for production of gradient layers or layer sequences by means of physical vacuum atomisation
10/06/2005WO2005093124A1 Co-Cr-Pt-B BASED ALLOY SPUTTERING TARGET
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