Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
10/2005
10/27/2005US20050237669 Manufacturing method of thin-film magnetic head, thin-film magnetic head, head gimbal assembly with thin-film magnetic head, and magnetic disk apparatus with head gimbal assembly
10/27/2005US20050237445 Display cell, in particular liquid crystal, or photovoltaic cell comprising means for connection to an electronic control circuit
10/27/2005US20050237261 Wave-transmitting cover, and method for producing it
10/27/2005US20050236970 Self-emitting display
10/27/2005US20050236710 Piezoelectric device comprising ultrahighly-orientated aluminum nitride thin film and its manufacturing method
10/27/2005US20050236276 Method for coating substrates in inline installations
10/27/2005US20050236270 Controlled cooling of sputter targets
10/27/2005US20050236267 Methods and apparatus for controlling rotating magnetic fields
10/27/2005US20050236266 Sputter target monitoring system
10/27/2005US20050236076 High integrity sputtering target material and method for producing bulk quantities of same
10/27/2005DE19830794B4 Schichtdickenmeßsystem und -verfahren Schichtdickenmeßsystem and procedures
10/27/2005DE102005015920A1 Vorrichtung und Verfahren für ein Hochleistungstarget mit geringem Gewicht An apparatus and method for a high-performance lightweight target
10/27/2005DE102004018435A1 Vorrichtung zum beidseitigen Beschichten von Substraten mit einer hydrophoben Schicht Apparatus for coating both sides of substrates with a hydrophobic layer
10/27/2005DE102004018079A1 Sputtering device includes rotation mechanism, sputtering cathode unit, movement mechanism, and sputtering mechanism which sputters when sputtering cathode moves over rotating substrate
10/27/2005DE102004017646A1 Process for coating aircraft engine components by sputtering, especially erosion protection by blade coatings of BLISK or BLISK drum configuration useful for coating jet engine turbine blades
10/26/2005EP1589531A2 Semi-reflective film and reflective film for optical information recording medium, and sputtering target
10/26/2005EP1589130A1 Guide arrangement with at least one guide roll for guiding webs in web treating apparatuses
10/26/2005EP1589129A1 Controlled cooling of sputter targets
10/26/2005EP1588992A1 Mixed metal oxide ceramic compositions for reduced conductivity thermal barrier coatings
10/26/2005EP1587894A1 Controlled sulfur species deposition process
10/26/2005EP1581666A3 Coating for a plastic substrate
10/26/2005EP1458901B1 Sputter deposition process for electroluminescent phosphors
10/26/2005EP1146138B1 Tungsten super fine particle and method for producing the same
10/26/2005CN2736369Y Cathode target structure of sputtering machine
10/26/2005CN2736368Y Optical coating apparatus
10/26/2005CN2736367Y High-temperature superconducting film double-side vaporization-coating device
10/26/2005CN1689133A Device for the treatment of a web-type material in a plasma-assisted process
10/26/2005CN1689094A Method for manufacturing optical recording medium and its manufacturing apparatus
10/26/2005CN1688904A Reducing the susceptibility of titanium nitride optical layers to crack
10/26/2005CN1688740A Monolithic sputtering target assembly
10/26/2005CN1688739A Method for obtaining a thin, stabilized fluorine-doped silica layer, resulting thin layer and use thereof in ophthalmic optics
10/26/2005CN1688738A Amorphous carbon film, process for producing the same and amorphous carbon film-coated material
10/26/2005CN1687481A Granule exposure on surface of aluminium based composite material enhanced by granules and post-processing method
10/26/2005CN1225004C Ion injection device and method thereof
10/26/2005CN1224996C Magnetron
10/26/2005CN1224733C Method and apparatus for applicating electromagnetic wave shielding coating
10/26/2005CN1224586C Method of making coated articles and coated articles made thereby
10/25/2005US6958260 Hydrogen gettering system
10/25/2005US6958257 Tantalum sputtering target and method of manufacture
10/25/2005US6958174 Solid material comprising a thin metal film on its surface and methods for producing the same
10/25/2005US6958172 Hybrid film, antireflection film comprising it, optical product, and method for restoring the defogging property of hybrid film
10/25/2005US6957993 Method of manufacturing a light filament from carbon nanotubes
10/20/2005WO2005098931A1 Submount and manufacturing method thereof
10/20/2005WO2005098898A1 A tubular magnet assembly
10/20/2005WO2005098203A1 Method for the protection of openings in a component during a machining process
10/20/2005WO2005098082A2 Device for coating both sides of a substrate with a hydrophobic layer
10/20/2005WO2005098081A1 Film forming apparatus and film forming method
10/20/2005WO2005098080A1 Indium oxide/cerium oxide sputtering target, transparent conductive film and process for producing transparent conductive film
10/20/2005WO2005098079A1 High thickness uniformity vaporization source
10/20/2005WO2005098078A1 Apparatus for coating functional thin film on the metal surface and its coating method
10/20/2005WO2005098077A2 Metalization method and plant
10/20/2005WO2005098076A1 Ultra-hydrophilic and antibacterial thin film coated metal product, and it’s manufacturing method
10/20/2005WO2005098075A1 Method for manufacturing ultra-hydrophilic thin film coated metal product, and ultra-hydrophilic thin film coated metal product
10/20/2005WO2005098074A1 Method for manufacturing ultra-hydrophilic thin film coated metal product, and ultra-hydrophilic thin film coated metal product
10/20/2005WO2005098066A1 Textured-grain-powder metallurgy tantalum sputter target
10/20/2005WO2005097450A1 Process for producing metal mold for optical device forming
10/20/2005WO2005070151A3 Electromagnetic energy distributions for electromagnetically induced mechanical cutting
10/20/2005WO2004020683A3 Silver selenide film stoichiometry and morphology control in sputter deposition
10/20/2005US20050233926 Etchants for removing titanium contaminant species from titanium substrates
10/20/2005US20050233899 Titanium dioxide is formed on surface of glass plate substrate (glass plate) through intermediary of monoclinic undercoat layer (zirconium oxide)
10/20/2005US20050233551 Method for depositing silicon by pulsed cathodic vacuum arc
10/20/2005US20050233503 Method for the production of structured layers on substrates
10/20/2005US20050233495 Novel technique to grow high quality ZnSe epitaxy layer on Si substrate
10/20/2005US20050233489 Method for manufacturing electroluminescence display panel and evaporation mask
10/20/2005US20050233172 Alumina insulation for coating implantable components and other microminiature devices
10/20/2005US20050233163 Titanium dioxide - Cobalt magnetic film and method of its manufacture
10/20/2005US20050233159 Method of making a tantalum layer and apparatus using a tantalum layer
10/20/2005US20050233089 Sputter method or device for the production of natural voltage optimized coatings
10/20/2005US20050233077 Method and device for plasma treating workpieces
10/20/2005US20050233076 Apparatus for supporting substrate
10/20/2005US20050233070 a method of depositing an antisoiling composition on an antireflective substrate comprising vaporizing an antisoiling composition and depositing the antisoiling composition onto an antireflective substrate eg ophthalmic lens
10/20/2005US20050230353 Method and array for processing carrier materials by means of heavy ion radiation and subsequent etching
10/20/2005US20050230244 Sputter target material and method of producing the same
10/20/2005US20050230242 Large area metallization pretreatment and surface activation system
10/20/2005US20050230013 Methods of making nickel/vanadium structures
10/20/2005US20050230011 High-purity aluminum sputter targets and method of manufacture
10/20/2005US20050229856 Means and method for a liquid metal evaporation source with integral level sensor and external reservoir
10/20/2005US20050229852 Plant for vacuum coating of objects treated in batches
10/20/2005US20050229847 Method and device for in situ layer thickness determination
10/20/2005EP1573081A3 Silver selenide film stoichiometry and morphology control in sputter deposition
10/20/2005CA2561976A1 Device for coating both sides of a substrate with a hydrophobic layer
10/19/2005EP1587348A1 Conductive base board
10/19/2005EP1587139A2 Method of making a tantalum layer and apparatus using a tantalum layer
10/19/2005EP1587131A2 Plasma reactor with high productivity
10/19/2005EP1586673A1 Component for film forming device and method of washing the component
10/19/2005EP1585846A1 Resistance-heated vaporizer boat
10/19/2005EP1585844A2 Powder metallurgy sputtering targets and methods of producing same
10/19/2005EP1585703A1 A process for the production of porous inorganic materials or a matrix material containing nanoparticles
10/19/2005EP1095378B1 Primary target for forming fission products
10/19/2005CN2734776Y Multi-way valve for vacuum coating machine
10/19/2005CN2734775Y Slide block reciprocating type target sputtering and heating transmission device
10/19/2005CN2734774Y Double-ion-beam co-sputtering deposition atomic-layer nano film device
10/19/2005CN2734773Y Double-chamber vacuum coating machine
10/19/2005CN1685507A Method for producing a component comprising a conductor structure that is suitable for use at high frequencies
10/19/2005CN1685481A Equipment and method for manufacturing semiconductor device
10/19/2005CN1685078A Fabrication of ductile intermetallic sputtering targets
10/19/2005CN1685077A 复合材料 Composites
10/19/2005CN1685076A Plasma treated metallized film
10/19/2005CN1683587A Guide arrangement with at least one guide roll for guiding webs in web treating apparatuses
10/19/2005CN1683586A Process for preparing tin oxide nan osensitive film
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