Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
04/2007
04/18/2007EP1774571A2 In-line heater for use in semiconductor wet chemical processing and method of manufacturing the same
04/18/2007EP1774055A2 Ion implanter operating in pulsed plasma mode
04/18/2007EP1774054A1 Variable quadruple electromagnet array, particularly used in a multi-step process for forming a metal barrier in a sputter reactor
04/18/2007EP1774053A1 Method for producing a coat on a piston ring and piston ring
04/18/2007EP1773734A1 Boron-containing layer system comprising a boron carbide layer, a b-c-n layer, and a carbon-modified hexahedral boron nitride layer, and method for the production of such a layer system
04/18/2007EP1670968A4 Apparatus for low temperature semiconductor fabrication
04/18/2007EP1540047A4 Oh and h resistant silicon material
04/18/2007EP1390557A4 System and method for making thin-film structures using a stepped profile mask
04/18/2007CN2890082Y Wafer chip positioning and controlling system
04/18/2007CN2890081Y Wafer platform scanning device
04/18/2007CN2890080Y Wide range current detection automatic gearshift device of ion implantation machine
04/18/2007CN2890079Y Magnetron sputtering device
04/18/2007CN2890078Y Multistage planetary work rest for vacuum coating machine
04/18/2007CN1950922A Apparatus for metal plasma vapor deposition and re-sputter with source and bias power frequencies applied through the workpiece
04/18/2007CN1950541A Method and apparatus for vacuum deposition by vaporizing metals and metal alloys
04/18/2007CN1950540A Vacuum deposition method
04/18/2007CN1950539A Method and device for the continuous coating of flat substrates with optically active layer systems
04/18/2007CN1950538A Variable quadruple electromagnet array, particularly used in a multi-step process for forming a metal barrier in a sputter reactor
04/18/2007CN1950537A Evaporator, vapor deposition apparatus, and method of switching evaporator in vapor deposition apparatus
04/18/2007CN1950536A Organic material evaporation source and organic vapor deposition device
04/18/2007CN1950535A Thermal vacuum deposition method and device
04/18/2007CN1950534A MSVD coating process
04/18/2007CN1950165A Tool of surface-coated cubic boron nitride sintered compact and process for producing the same
04/18/2007CN1949459A Method for directly preparing Cr-Si silicide resistance film on surface of monocrystalline silicon substrate
04/18/2007CN1948549A Capping technology for electron beam physical gaseous phase deposition coating using strong flow pulse ionic beam
04/18/2007CN1948548A Magnetic mirror field constrained bitarget non balancing magnetron sputtering method
04/18/2007CN1948547A Power source method for ultra high power pulse non balancing megnetron sputtering
04/18/2007CN1948546A Medium frequency twin magnetron sputtering device for cooling metal gallium target
04/18/2007CN1948545A Single target sputter method for preparing bismuth telluride thin film using powder target material
04/18/2007CN1311570C Combined mask, method and equipment for producing organic electroluminescent device using said mask
04/18/2007CN1311508C Extraction and deceleration of low energy beam with low beam divergence
04/18/2007CN1311286C Functional film improved optical property and electrical property
04/18/2007CN1311096C Manganese alloy sputtering target and method for producing the same
04/18/2007CN1310772C Laser thermal transfer donor contg separated adulterant coating
04/17/2007US7205662 Dielectric barrier layer films
04/17/2007US7205620 Highly reliable amorphous high-k gate dielectric ZrOxNy
04/17/2007US7205552 Monatomic boron ion source and method
04/17/2007US7205240 HDP-CVD multistep gapfill process
04/17/2007US7205056 First crystal layer having a Bi-based perovskite structure is intermittently formed in a surface direction of the ceramic film, and second crystal layer having a lower melting point composed of ABO-type oxides in which Bi is in an A-site and Si or Ge is in a B-site is between the first crystals
04/17/2007US7205020 Multilayer; nonmagnetic undercoating, magnetism layer containing ferromagnetic grains and protective coatings
04/17/2007US7204921 Vacuum apparatus and vacuum processing method
04/17/2007US7204915 Patterned medium, method for fabricating same and method for evaluating same
04/17/2007US7204013 Method of manufacturing a magnetoresistive sensor
04/12/2007WO2007041705A1 Effect materials
04/12/2007WO2007041425A2 Very long cylindrical sputtering target and method for manufacturing
04/12/2007WO2007041081A1 Sputtering target, low resistivity, transparent conductive film, method for producing such film and composition for use therein
04/12/2007WO2007040763A1 Reflector with non-uniform metal oxide layer surface
04/12/2007WO2007040161A1 Electrode for electric discharge surface treatment, method of electric discharge surface treatment, and coating
04/12/2007WO2007040141A1 Photogravure engraving roll and production method thereof
04/12/2007WO2007040014A1 Sputtering target
04/12/2007WO2007039180A1 Method for the production of a reflective membrane, and membrane produced therewith
04/12/2007WO2007038967A1 Down-stream plasma etching with deflectable plasma beam
04/12/2007WO2007011331A3 Water-soluble polymeric substrate having metallic nanoparticle coating
04/12/2007WO2006132806A3 Multiple scanning magnetrons
04/12/2007WO2006130817A3 Deposition of uniform layer of desired material
04/12/2007WO2006119367A3 Target assemblies, targets backing plates, and methods of target cooling
04/12/2007WO2006118851A3 Method of making scratch resistant coated glass article including layer(s) resistant to fluoride-based etchant(s)
04/12/2007WO2006083363A3 Pentaborane(9) storage and delivery
04/12/2007WO2006022997A3 Method and system for substrate temperature profile control
04/12/2007US20070083269 Method of producing endosseous implants or medical prostheses by means of ion implantation and endosseous implant or medical prosthesis thus obtained
04/12/2007US20070082224 consists of titanium oxide, ytterbium oxide, and gadolinium oxide and/or dysprosium oxide; for eyeglasses, lenses, cameras
04/12/2007US20070082222 Corrosion and abrasion resistant decorative coating
04/12/2007US20070082214 Stainless steel strip coated with aluminium
04/12/2007US20070082133 Method of metallizing a silicone rubber substrate
04/12/2007US20070082129 Metal composite diamond-like carbon (DLC) film, method and apparatus for forming the same, and slide member
04/12/2007US20070080059 Sputtering device
04/12/2007US20070080056 Method and apparatus for cylindrical magnetron sputtering using multiple electron drift paths
04/12/2007US20070080055 Reagent suitable for use as a catalyst comprises a first metal species substrate having a second reduced metal species coated thereon, the second reduced metal species being less electropositive than the first; for use at lower temperatures and under atmospheric pressure; cost effective
04/12/2007US20070080053 Method and apparatus for deposition of films of coating materials, in particular of superconductive oxides
04/12/2007DE102005048482A1 Method for coating electrically insulating surfaces by CVD or PVD e.g. for materials research, involves forming micro-heating elements on ceramic substrate
04/12/2007CA2624484A1 Method for the production of a reflective membrane, and membrane produced therewith
04/12/2007CA2623404A1 Sputtering target, low resistivity, transparent conductive film, method for producing such film and composition for use therein
04/11/2007EP1772594A1 Method of masking holes of a component in a process and a ceramic composition containing polysiloxane
04/11/2007EP1772532A1 Metal composite diamond-like carbon (DLC) film. Method and apparatus for forming the same and slide member making use of it.
04/11/2007EP1772531A1 Method and apparatus for internal coating.
04/11/2007EP1772529A1 Dry chemical composition, use thereof to form a layer system and method for coating
04/11/2007EP1772512A2 Sliding structure and sliding method
04/11/2007EP1772216A1 Surface coating cutting tool with coating film having intensity distribution of compression stress
04/11/2007EP1771674A1 Method for the production of wear-resistant edges for a keystone ring for internal combustion engines
04/11/2007EP1771602A2 Highly oxidation resistant hard coating materials for cutting tools
04/11/2007EP1771600A2 Vacuum-coating installation and method
04/11/2007EP1771592A1 Method and apparatus of plasma processing.
04/11/2007EP1592823B1 A method of manufacturing a sputter target
04/11/2007CN2888786Y Novel planar linear array radiation heater which can resist active oxygen corrosion
04/11/2007CN2887889Y Omnidirectional ion implantation and deposition surface treatment device with multi-arc plasma
04/11/2007CN2887888Y Vacuum vaporization coating device
04/11/2007CN1946874A Plasma coating system for non-planar substrates
04/11/2007CN1946873A Substrate dome rotating mechanism
04/11/2007CN1946872A Vaporizing device and method for vaporizing coating material
04/11/2007CN1946871A Device equipped with cooling means and cooling method
04/11/2007CN1946870A 中和器 Neutralizer
04/11/2007CN1946869A Vacuum device where power supply mechanism is mounted and power supply method
04/11/2007CN1946868A Vacuum deposition method and sealed-type evaporation source apparatus for vacuum deposition
04/11/2007CN1946507A Method of making sputtering target
04/11/2007CN1945807A Apparatus for controlling temperature of a substrate
04/11/2007CN1945793A Apparatus and method for treating a substrate with plasma, and facility for manufacturing semiconductor devices
04/11/2007CN1944707A Permanent magnet gun target device for magnetic control sputtering film coating machine
04/11/2007CN1944706A Method for preparing Fe-6.5 wt% Si thin plate using continuous magnetic control sputtering physical gas phase depositing
04/11/2007CN1944705A Method for preparing ZnO:Al transparent conductive film by direct magnetic control co-sputtering method
04/11/2007CN1944704A Method to coat insulation film on aluminum body of electrolytic capacitor
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