Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
06/2007
06/27/2007EP1801846A1 Target arrangement for mounting/dismouting and method of manufacturing
06/27/2007EP1801843A1 Arrangement and method for the treatment of substrates
06/27/2007EP1801621A2 Composition for vapor deposition, method for forming antireflection film using it, and optical element
06/27/2007EP1801360A2 Methods and apparatus for fabricating turbine engine components
06/27/2007EP1801259A2 Vacuum arc vapor deposition apparatus
06/27/2007EP1801258A1 Physical deposition system
06/27/2007EP1800331A2 Low temperature selective epitaxial growth of silicon germanium layers
06/27/2007EP1799878A2 Atmospheric pressure chemical vapor deposition
06/27/2007EP1799876A1 Flat end-block for carrying a rotatable sputtering target
06/27/2007EP1532292B1 Atomic deposition layer methods
06/27/2007EP1488458B1 Automatically adjusting serial connections of thick and thin layers and method for the production thereof
06/27/2007CN2915883Y Three targets magnetic sputtering film plating machine
06/27/2007CN2915882Y Rotary mask device for vacuum coating
06/27/2007CN1989269A Ion implanter operating in pulsed plasma mode
06/27/2007CN1989069A Hydrogen-containing carbon film
06/27/2007CN1988171A 半导体结构及其形成方法 And a method for forming a semiconductor structure
06/27/2007CN1987490A Method and device for detecting arcs
06/27/2007CN1986891A High strength ni-pt-al-hf bondcoat
06/27/2007CN1986889A Platinum modified nicocraly bondcoat for thermal barrier coating
06/27/2007CN1986875A Sputter apparatus with a pipe cathode and method for operating this sputter apparatus
06/27/2007CN1986874A Anode plate and its sputtering apparatus including it
06/27/2007CN1986873A Making process for cellphone window protecting screen
06/27/2007CN1986872A Machine for treating substrates and method
06/27/2007CN1986871A Method of raising coating adhesion in vacuum sputtering of plastic part
06/27/2007CN1986870A Preparing process of graphite target containing dopant element
06/27/2007CN1986869A Plastic surface vacuum plating process
06/27/2007CN1986213A Antiwear magnetic coating and its making process
06/27/2007CN1323409C Mfg. method of double-sided metallization film and metallization film capacitor using same
06/27/2007CN1323397C Silver alloy for reflective film of optical recording medium
06/27/2007CN1323045C Coated object
06/26/2007US7235854 Lanthanide doped TiOx dielectric films
06/26/2007US7235795 Semiconductor device manufacturing apparatus and a method of controlling a semiconductor device manufacturing process
06/26/2007US7235350 Alumina insulation for coating implantable components and other microminiature devices
06/26/2007US7235310 Hillock-free aluminum layer and method of forming the same
06/26/2007US7235162 Cathode for vacuum sputtering treatment machine
06/26/2007US7235160 Hollow cathode sputtering apparatus and related method
06/26/2007US7235159 Methods for producing and using catalytic substrates for carbon nanotube growth
06/26/2007US7235143 Fines particle sizes; low temperature recrystallization
06/26/2007US7234185 Apparatus for removing particles
06/26/2007CA2249276C Diamond wafer, method of estimating a diamond wafer and diamond surface acoustic wave device
06/21/2007WO2007070249A2 Sputtering and methods for depositing a film containing tin and niobium
06/21/2007WO2007070026A1 Process for deposition of amorphous carbon
06/21/2007WO2007069528A1 Apparatus for cluster film formation, method for cluster film formation, apparatus for cluster formation, and method for cluster formation
06/21/2007WO2007069415A1 Sintered body for vacuum vapor deposition
06/21/2007WO2007069291A1 Vacuum vapor deposition apparatus and method for cleaning the same
06/21/2007WO2007068768A1 Cathode evaporation machine
06/21/2007WO2007068133A1 Improved sputter target utilization
06/21/2007WO2000068451A3 Magnetron negative ion sputter source
06/21/2007US20070141857 Target designs and related methods for enhanced cooling and reduced deflection and deformation
06/21/2007US20070141400 Perpendicular magnetic recording disk with ultrathin nucleation film for improved corrosion resistance and method for making the disk
06/21/2007US20070141235 Method for forming multi-layer cathode in organic light-emitting devices
06/21/2007US20070141233 EB-PVD system with automatic melt pool height control
06/21/2007US20070138492 Nitride semiconductor light emitting device and method of fabricating nitride semiconductor laser device
06/21/2007US20070138132 Nanopore with resonant tunneling electrodes
06/21/2007US20070138009 Sputtering apparatus
06/21/2007US20070138003 Lamination and conversion process and apparatus
06/21/2007US20070138002 End point detection for direct ion milling to induce magnetic anisotropy in a magnetic layer
06/21/2007US20070138001 Method of forming an inductor on a semiconductor substrate
06/21/2007US20070138000 Concentration-modulated coatings
06/21/2007US20070137999 Method to reduce thermal stresses in a sputter target
06/21/2007US20070137566 Modular device for coating surfaces
06/21/2007CA2628343A1 Sputtering and methods for depositing a film containing tin and niobium
06/20/2007EP1798310A2 Cemented carbide inserts for wear demanding parting and grooving in heat resistant super alloys (HRSA) and stainless steels
06/20/2007EP1798308A2 Cemented carbide inserts for notch and wear demanding turning in heat resistant super alloys (HRSA) and stainless steels
06/20/2007EP1798306A1 Method of vapour deposition
06/20/2007EP1798305A1 Hard carbon film, production method thereof, and sliding member
06/20/2007EP1797610A1 Gas diffusion electrodes, membrane-electrode assemblies and method for the production thereof
06/20/2007EP1797215A1 Component comprising a coating and method for producing said coating
06/20/2007EP1797214A1 Component comprising a coating and method for producing a coating
06/20/2007EP1797213A2 Method of making vapour deposited oxygen-scavenging particles
06/20/2007EP1796573A1 Orthodontic curved brace consisting of a sputtered shape-memory alloy
06/20/2007EP1296819B1 Coated article with polymeric basecoat having the appearance of stainless steel
06/20/2007CN2914113Y Fiber connection system applied to ion implantation apparatus
06/20/2007CN2913387Y One-dimensional machinery scanning device of ion implantation apparatus
06/20/2007CN2913386Y 离子束传输控制系统 Ion beam transmission control system
06/20/2007CN1985345A Cylindrical target obtained by hot isostatic pressing
06/20/2007CN1985028A Common rack for electroplating and pvd coating operations
06/20/2007CN1985022A Pulse type magnetron sputtering deposition with preionization
06/20/2007CN1985021A High integrity sputtering target material and method for producing bulk quantities of same
06/20/2007CN1985020A MgO deposition material
06/20/2007CN1985014A Material for conductor tracks made of copper alloy
06/20/2007CN1984855A Method for manufacturing target material for sputtering target
06/20/2007CN1984839A Methods of forming alpha and beta tantalum films with controlled and new microstructures
06/20/2007CN1983748A Nitride semiconductor light emitting device and method of fabricating nitride semiconductor laser device
06/20/2007CN1983560A Mask and method of manufacturing display device using the same
06/20/2007CN1982502A 溅射靶 Sputtering target
06/20/2007CN1982501A Target and process kit components for sputtering chamber
06/20/2007CN1982500A Method of forming indicator
06/20/2007CN1982499A Method and apparatus for growing and forming gas-phase depositing materials
06/20/2007CN1982498A Thick plate capable of consuming material and physical gas phase sedimentation target material
06/20/2007CN1982497A System and method of detecting life of comsumed material thick plate used for processing tool
06/20/2007CN1982051A Hard carbon film, production method thereof, and sliding member
06/20/2007CN1982050A Cemented carbide inserts for notch and wear demanding turning in heat resistant super alloys (HRSA) and stainless steels
06/20/2007CN1982049A Cemented carbide inserts for notch and wear demanding turning in heat resistant super alloys (HRSA) and stainless steels
06/20/2007CN1982020A Mould core and its production
06/20/2007CN1981981A Modified welding torch cathode for use in roughening a surface and related method
06/20/2007CN1322534C MgO pellet for protective layer of plasma display panel, and plasma display panel using the same
06/20/2007CN1322176C Preparation for single-crystal thin film covering layer substrate with r-LiALO2
06/20/2007CN1322163C Plasma injection method and apparatus for insulation material spare parts
06/20/2007CN1322162C Vacuum evaporator
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