Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
04/2007
04/11/2007CN1944703A Free open type coil filter
04/11/2007CN1944687A Strong laser induced periodical micro nano method and its device for material surface
04/10/2007US7203003 Reflective Ag alloy film for reflectors and reflector provided with the same
04/10/2007US7202104 Co-sputter deposition of metal-doped chalcogenides
04/10/2007US7202007 Method of forming patterned films
04/10/2007US7202000 Capacity, charge/discharge efficiency, cycle performance; trilayer comprised of mostly carbon top layer, film allowing lithium component passage and lithium active material foil; fabrication method
04/10/2007US7201942 Vapor deposition; controlling temperature
04/10/2007US7201827 Providing, in a sputtering chamber having a base pressure, a substrate; forming on substrate, using an Ar/O2 mixture as a sputtering gas, a seed layer; forming antiferromagnetic pinning layer on seed layer; forming synthetic antiferromagnetic (SyAF) pinned layer, forming copper spacer layer
04/10/2007CA2175058C Method and apparatus for thin film coating an article
04/06/2007CA2562727A1 Metal composite diamond-like carbon (dlc) film, method and apparatus for forming the same, and slide member
04/05/2007WO2007038651A1 Inertial bonding method of forming a sputtering target assembly and assembly made therefrom
04/05/2007WO2007038368A1 Reactive dual magnetron sputtering device with synchronised gas supply
04/05/2007WO2007037796A2 Chalcogenide pvd components and methods of formation
04/05/2007WO2007037773A2 Thermal barrier coating with stabilized compliant microstructure
04/05/2007WO2007037268A1 Raw material feeder and vapor deposition apparatus
04/05/2007WO2007037191A1 Sputtering target, transparent conductive film, and transparent electrode for touch panel
04/05/2007WO2007037079A1 Magnet structure for magnetron sputtering and cathode electrode unit and magnetron sputtering equipment
04/05/2007WO2007036753A1 Method and target-substrate arrangement for building a homo- geneous coating of uniform thickness on the substrate from a plasma produced by a pulsed laser
04/05/2007WO2006118837A3 Method for feeding powdered or granular material
04/05/2007US20070078213 Fine particle hard molded bodies for abrasion-resistant polymer matrices
04/05/2007US20070077499 Method for depositing multi-layer film of mask blank for EUV lithography and method for producing mask blank for EUV lithography
04/05/2007US20070077368 Ion beam method for removing an organic light emitting material
04/05/2007US20070077366 Plasma doping method and plasma doping apparatus for performing the same
04/05/2007US20070077354 Thermal conditioning plate with gas gap leak
04/05/2007US20070076833 Attenuated phase shift mask blank and photomask
04/05/2007US20070074970 Device and method of manufacturing sputtering targets
04/05/2007US20070074969 Very long cylindrical sputtering target and method for manufacturing
04/05/2007US20070074968 ICP source for iPVD for uniform plasma in combination high pressure deposition and low pressure etch process
04/05/2007US20070074790 Nickel alloy sputtering target and nickel alloy thin film
04/05/2007DE19703848B4 Beschichteter Schneideinsatz oder Schneideinsatzrohling und Verfahren zur Herstellung von beschichteten Schneideinsätzen zum Zerspanen Coated cutting insert or cutting insert blank and method for producing coated cutting inserts for machining
04/05/2007DE102005046976A1 Process involving formation of contact hole in intermediate layer of dielectric material to obtain connection to contact region of switching element useful in semiconductor production, especially for deposition of thin barrier layer
04/05/2007DE102005045718A1 Träger für ein Substrat Support for a substrate
04/05/2007DE102004006530B4 Verfahren und Vorrichtung zum Einbringen von Gasen bei Vakuumbeschichtungsprozessen Method and apparatus for introducing gases in vacuum coating processes
04/04/2007EP1771041A1 Process for fabricating organic el element and method for cleaning system for fabricating organic el element
04/04/2007EP1770186A1 Evaporation source and vacuum deposition apparatus using the same
04/04/2007EP1769106A1 Phosphorus effusion cell arrangement and method for producing molecular phosphorus
04/04/2007EP1769100A1 Dlc hard material coatings on bearing materials containing copper
04/04/2007EP1691606B1 Antimicrobial composite material
04/04/2007CN1943053A Biaxially-textured film deposition for superconductor coated tapes
04/04/2007CN1942744A Substrate comprising Fabry-Perof filter and method for use of filter to said substrate
04/04/2007CN1942605A A hard, wear-resistant aluminum nitride based coating
04/04/2007CN1942602A Method and apparatus for producing metal wire coated with metal layer
04/04/2007CN1941284A 等离子体处理室 Plasma processing chamber
04/04/2007CN1940128A Lifting mechanism of physical gas-phase deposition
04/04/2007CN1940127A Method for sputtered-coated article from being deformed
04/04/2007CN1940126A Sputtering coating method for high-shielding thin-film against electromagnetic interference on plastic matrix
04/04/2007CN1940125A Method for coating EMI metal film layer and adhering plastic matrix at vacuum
04/04/2007CN1940124A Method and system for operating physical gas-phase deposition
04/04/2007CN1940123A Evaporating source and vacuum evaporating apparatus using the same
04/04/2007CN1940122A Magnesium-alloy surface coating method
04/04/2007CN1940121A Physical coating pretreatment for coating metal-film on plastic matrix
04/04/2007CN1309002C Magnetron atomisation source and use thereof
04/04/2007CN1308755C Orientation film forming method, orientation film, substrate for electronic device, liquid crystal panel
04/04/2007CN1308484C Fixture three-dimensional motion control device
04/04/2007CN1308483C Thin film-forming apparatus
04/04/2007CN1308482C Process for preparing vanadium oxide film capable of regulating phase change temerature
04/04/2007CN1308481C Mask for vacuum evaporation
04/04/2007CN1308229C Nitrogen-containing carbonaceous material and process for production thereof
04/03/2007US7198773 Synthesis of ZnO nano-structured materials and its apparatus
04/03/2007US7198700 Thin film formation use sputtering target material, thin film formed using same, and optical recording medium
04/03/2007US7198699 For coating a substrate (e.g., glass substrate) on both major surfaces/sides
04/03/2007US7198678 Apparatus for performing at least one process on a substrate
04/03/2007US7197814 Method for fabricating a thin film magnetic head
03/2007
03/29/2007WO2007035227A2 Sputtering target with bonding layer of varying thickness under target material
03/29/2007WO2007034944A1 Zinc oxide transparent conductive multilayer body
03/29/2007WO2007034790A1 Film forming apparatus, evaporating jig and measuring method
03/29/2007WO2007034775A1 Clay thin film substrate, clay thin film substrate with electrode, and display using those
03/29/2007WO2007034749A1 Oxide material and sputtering target
03/29/2007WO2007034733A1 Sputtering target, transparent conductive film and transparent electrode
03/29/2007WO2007034541A1 Vacuum deposition apparatus and vacuum deposition method
03/29/2007WO2007034167A2 Antibacterial surface coatings
03/29/2007WO2007000795A3 Antistatic coating for surfaces made of metal materials and dielectric materials or of dielectric materials only and method of application
03/29/2007WO2006085994A3 Multi-component substances and apparatus for preparation thereof
03/29/2007WO2006083929A3 A physical vapor deposition plasma reactor with rf source power applied to the target
03/29/2007US20070072008 Metal strip product
03/29/2007US20070071993 Carbon film-coated article and method of producing the same
03/29/2007US20070071982 Thermoplastics; formed via solution of alkali metal ions, alkaline earth metal ions, and ammonium ions and originating from low-molecular-weight electrolyte; wrapping
03/29/2007US20070071906 Heating process of the light irradiation type
03/29/2007US20070071883 Method of fabricating organic light emitting display device with passivation structure
03/29/2007US20070068804 Pvd target with end of service life detection capability
03/29/2007US20070068803 Pvd target with end of service life detection capability
03/29/2007US20070068802 Substrate carrier
03/29/2007US20070068797 Method for providing an endpoint layer for ion milling of top of read sensor having top lead connection and sensor formed thereby
03/29/2007US20070068796 Method of using a target having end of service life detection capability
03/29/2007US20070068795 Hollow body plasma uniformity adjustment device and method
03/29/2007US20070068794 Anode reactive dual magnetron sputtering
03/29/2007DE202006018079U1 Targetanordnung Target assembly
03/29/2007DE102006040593A1 Einstellbare Elektrodenanordnung zur Verwendung bei der Behandlung von Substraten unterschiedlicher Breite in einem Plasma-Behandlungssystem Adjustable electrode assembly for use in the treatment of substrates of different widths in a plasma treatment system
03/29/2007DE102006027501A1 Wear-resistant, electrically insulating coating for machine parts subject to frictional wear, e.g. roller bearings, comprises metal-free amorphous hydrocarbon layer(s)
03/29/2007DE102005044246A1 Verfahren zur Herstellung von Aufdampfglasschichten und verfahrensgemäß hergestelltes Erzeugnis A process for preparing Aufdampfglasschichten and methods according to product produced
03/29/2007DE102005042754A1 Selective plasma treatment of semiconductor substrate, as pre-treatment prior to of coating or prior to bonding process useful for semiconductor involves dielectric, e.g. glass mask having surface coated with electrically conductive layer
03/29/2007DE102004051578B4 Verfahren und Vorrichtung zum Beschichten einer Folie Method and apparatus for coating a film
03/28/2007EP1768184A2 Organic light emitting full color display panel
03/28/2007EP1768163A1 Ion implantation apparatus
03/28/2007EP1767070A2 Method of fabricating an electrochemical device using ultrafast pulsed laser deposition
03/28/2007EP1766656A1 Device for carbon deposition
03/28/2007EP1766383A1 Thin film aluminium nitride ultrasound transducers integrated on the test components
03/28/2007EP1765540A2 Apparatus and method for fast arc extinction with early shunting of arc current in plasma
03/28/2007EP1641955A4 Biological laser printing via indirect photon-biomaterial interactions
03/28/2007EP1641571A4 Biological laser printing for tissue microdissection via indirect photon-biomaterial interactions