Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
04/2007
04/26/2007WO2006132382A3 Method of manufacturing a film
04/26/2007WO2006094821A3 Method for producing a thin magnesium oxide layer
04/26/2007WO2006019565A3 Method and system for coating internal surfaces of prefabricated process piping in the field
04/26/2007US20070092717 Gas-barrier material
04/26/2007US20070092651 Substrate processing apparatus and substrate processing method
04/26/2007US20070092431 On a flat surface such as silicon wafer; transferring to polymer film to harvest
04/26/2007US20070092233 Evaporation device with receptacle for receiving material to be evaporated
04/26/2007US20070091421 Multilayer reflective film coated substrate, manufacturing method thereof, reflective mask blank, and reflective mask
04/26/2007US20070089986 Sputtering target and method/apparatus for cooling the target
04/26/2007US20070089985 Sputtering target and method/apparatus for cooling the target
04/26/2007US20070089984 blending the molybdenum and titanium powders to produce a blended powder, optionally, consolidating the blended powder, encapsulating the consolidated powder, compacting while heating to produce a MoTi target plate; no beta (Ti, Mo) phase
04/26/2007US20070089983 Cathode incorporating fixed or rotating target in combination with a moving magnet assembly and applications thereof
04/26/2007US20070089982 Sputtering target and method/apparatus for cooling the target
04/26/2007US20070089852 Heating and cooling apparatus, and vacuum processing apparatus equipped with this apparatus
04/26/2007US20070089676 Arrangement for the vapor deposition on substrates
04/26/2007US20070089672 Substrate placing mechanism
04/26/2007US20070089670 Substrate-supporting device
04/26/2007US20070089385 Film deposition apparatus having hole-like rotary filter plate for capturing fine particles and film deposition method
04/26/2007US20070089288 Method for repairing photoresist layer defects using index matching overcoat
04/26/2007DE102005050424A1 Sputtertarget aus mehrkomponentigen Legierungen und Herstellverfahren Sputtering target multicomponent alloys and manufacturing
04/25/2007EP1777324A1 Thin film material and method for manufacturing the same
04/25/2007EP1777321A1 Sputtering target, transparent conductive oxide, and process for producing the sputtering target
04/25/2007EP1777320A2 Apparatus and method for depositing thin films
04/25/2007EP1777319A1 MgO DEPOSITION MATERIAL
04/25/2007EP1777318A1 MgO DEPOSITION MATERIAL
04/25/2007EP1777250A1 Process for preventing or reducing biofilms on a substrate
04/25/2007EP1777203A1 Ceramic film and method of manufacturing the same, ferroelectric capacitor, semiconductor device, and other element
04/25/2007EP1776488A1 Method for producing a metal wire coated with a layer of brass.
04/25/2007EP1776229A2 Metallic coatings on silicon substrates, and methods of forming metallic coatings on silicon substrates
04/25/2007EP1513964B1 Composite material for producing an electric contact surface, in addition a method for creating a lubricated, corrosion-free electric contact surface
04/25/2007EP1503966B1 Components having crystalline coatings of the aluminum oxide/silicon oxide system and method for the production thereof
04/25/2007EP1372897A4 Bipolar plasma source, plasma sheet source, and effusion cell utilizing a bipolar plasma source
04/25/2007CN2892882Y 真空锁系统 Vacuum lock system
04/25/2007CN1954093A Methods and apparatuses for transferring articles through a load lock chamber under vacuum
04/25/2007CN1954092A Vacuum treatment device and method of manufacturing optical disk
04/25/2007CN1954091A Vacuum processing apparatus
04/25/2007CN1953640A A glueless soft circuit substrate
04/25/2007CN1953229A Germanium-titanium base memory material for phase transition memory and its manufacture method
04/25/2007CN1952209A Copper and nickel preprocessing technology in ion implantation before polymer surface chemical plating
04/25/2007CN1952208A Process for processing low-melting metal and back board for use in magnetron sputtering coating
04/25/2007CN1952207A Enhanced multi-component oxide-containing sputter target alloy compositions
04/25/2007CN1952206A Apparatus and method for depositing thin films
04/25/2007CN1952205A Arc ion plating apparatus
04/25/2007CN1952204A Preprocessed optical coating materials and preprocessed method thereof
04/25/2007CN1952203A Device for cleaning and air-drying solar heat collecting pipe
04/25/2007CN1312782C Position mask part of combine mask provided for producing organic luminous diode
04/25/2007CN1312734C Method for preparing beta-FeSi2 semiconductor film by femtosecond pulsed laser
04/25/2007CN1312325C Method for developping monocrystalline iron nanometer thread on silicon substrate
04/25/2007CN1312318C Method of manufacturing inorganic nanotube
04/25/2007CN1312317C Vacuum ionic film coater with gas ionic source arrangement
04/24/2007US7208878 Method of manufacturing a rotation-magnetron-in-magnetron (RMIM) electrode
04/24/2007US7208787 Semiconductor device and a process for manufacturing a complex oxide film
04/24/2007US7208411 A transfer module, a supercritical processing module, a vacuum module, and a metal deposition module; electrodeposition of metals for semiconductors with a desorb step at nonexcessive temperatures, and a preclean method that uses a chelation compound and an acid or amine
04/24/2007US7208396 Permanent adherence of the back end of a wafer to an electrical component or sub-assembly
04/24/2007US7208204 Generating magnetic nanoclusters in gas phase;heating the magnetic nanoclusters;crystallizing the magnetic nanoclusters; anddepositing the magnetic nanoclusters onto a substrate to form a thin film of magnetic particles
04/24/2007US7208196 Oxidation of silicon nitride; overcoating metal substrate; high temperature superconductivity
04/24/2007US7208195 Providing a vapor including at least one selected vapor phase component into evacuated chamber; condensing vapor onto a heated substrate to form a liquid phase deposit, cooling liquid deposit to form a solid phase film
04/24/2007US7208067 Method and system for monitoring RF impedance to determine conditions of a wafer on an electrostatic chuck
04/24/2007CA2413649C High temperature corrosion resistant alloy, thermal barrier coating material, and gas turbine using high temperature corrosion resistant alloy
04/19/2007WO2007044814A1 Methods and equipment for depositing high quality reflective coatings
04/19/2007WO2007044344A2 Method and apparatus for cylindrical magnetron sputtering using multiple electron drift paths
04/19/2007WO2007043488A1 Method for depositing multilayer film of mask blank for euv lithography and method for producing mask blank for euv lithography
04/19/2007WO2007043476A1 Magnetron sputtering apparatus
04/19/2007WO2007043471A1 Gravure printing roll and method for manufacture thereof
04/19/2007WO2007043215A1 HIGH-PURITY Ru ALLOY TARGET, PROCESS FOR PRODUCING THE SAME AND SPUTTERED FILM
04/19/2007WO2007043102A1 Electrode for discharge surface treatment, discharge surface treatment method, and film
04/19/2007WO2007042394A1 A method to deposit a coating by sputtering
04/19/2007WO2007042392A1 Dry composition, use of its layer system and coating process
04/19/2007WO2007041983A1 Heat insulating layer
04/19/2007WO2007041730A1 Tube target
04/19/2007WO2006136310A3 Powder-fiber adhesive
04/19/2007WO2006114228A3 Process and device for coating substrates
04/19/2007WO2006111400A3 Method and device for producing electronic components
04/19/2007WO2006069921A3 Device for the vaporisation of condensed materials
04/19/2007WO2005047369A3 Fine particle hard molded bodies for abrasion-resistant polymer matrices
04/19/2007US20070087576 Substrate susceptor for receiving semiconductor substrates to be deposited upon
04/19/2007US20070087541 Method and apparatus for deposition & formation of metal silicides
04/19/2007US20070087230 Method and apparatus for integrated-circuit battery devices
04/19/2007US20070087227 Granular magnetic recording media with improved corrosion resistance by cap layer + pre-covercoat etching
04/19/2007US20070087224 Hard film and hard film-coated tool
04/19/2007US20070087034 Drug delivery system and method of manufacturing thereof
04/19/2007US20070086881 Dual substrate loadlock process equipment
04/19/2007US20070085470 Electroluminescent material and electroluminescent element using the same
04/19/2007US20070084720 Magnetron sputtering system for large-area substrates having removable anodes
04/19/2007US20070084719 Inertial bonding method of forming a sputtering target assembly and assembly made therefrom
04/19/2007US20070084717 Back-biased face target sputtering based high density non-volatile caching data storage
04/19/2007US20070084716 Back-biased face target sputtering based high density non-volatile data storage
04/19/2007US20070084715 Method for the production of a substrate
04/19/2007US20070084546 Method and apparatus for colorant transfer
04/19/2007US20070084401 Device for carrying out a surface treatment of substrates under vacuum
04/19/2007DE112005001190T5 Verfahren und Vorrichtung zur Vakuumbeschichtung durch Metall- und Legierungsverdampfung Method and apparatus for vacuum coating metal and alloy by evaporation
04/19/2007DE102006048609A1 Electron discharge window manufacturing method, involves applying vapor depositing layer by vapor depositing process on substrate, and removing substrate with upper surface that is made up of flexible polymer material
04/19/2007DE102005049906A1 Verfahren und Vorrichtung zur Verdampfung von Verdampfungsmaterial Method and apparatus for the vaporization of the evaporation material
04/19/2007DE102005049328A1 Materialmischung, Sputtertarget, Verfahren zu seiner Herstellung sowie Verwendung der Materialmischung Material mixture, a sputtering target, a process for its production and use of the material mixture
04/19/2007DE102005049266A1 Vorrichtung und Verfahren zur Plasmabehandlung von Objekten Apparatus and method for plasma treatment of objects
04/19/2007CA2624692A1 Methods and equipment for depositing high quality reflective coatings
04/19/2007CA2624542A1 Method and apparatus for cylindrical magnetron sputtering using multiple electron drift paths
04/18/2007EP1775353A1 Coating apparatus and method for operating a coating apparatus
04/18/2007EP1775352A2 Arc ion plating apparatus
04/18/2007EP1775262A1 Hydrogen-containing carbon film