Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
02/2007
02/14/2007CN1914352A Cleaning of chamber components
02/14/2007CN1914351A Selectable dual position magnetron
02/14/2007CN1914131A Method for cleaning a substrate
02/14/2007CN1913099A Chamber for vacuum processing device and device having the chamber
02/14/2007CN1912177A Method for quickly reaching to high vacuum of vacuum chamer of film coating machine
02/14/2007CN1912176A Sputtering target
02/14/2007CN1912175A Vacuum-coating machine with motor-driven rotary cathode
02/14/2007CN1912174A Method of manufacturing rod for painting device and painting rod
02/14/2007CN1912173A Vacuum film coating method and rotation device used by the method
02/14/2007CN1912172A Method for controlling large or small of grain of multielement oxide film
02/14/2007CN1911847A Technology for applying film on storied-building glass
02/14/2007CN1300376C A method of forming a nanocomposite coating
02/14/2007CN1300373C Flexible clamp in use for filming face of cavity of semiconductor laser
02/14/2007CN1300372C Method for processing milling cutter used for printed circuit board by ion implantation technology
02/14/2007CN1300371C Metal ion implantation machine
02/14/2007CN1300370C Deposition method for solar spectrum selective absorption coating
02/14/2007CN1300369C Method for preparing self-assenbling monomolecular film in vapor phase and vapor phase assembiling instrument
02/14/2007CN1300368C Composition material comprising substrate and barrier layer on substrate
02/14/2007CN1300358C Metal dusting corrosion resistant alloys
02/13/2007US7176474 Method and apparatus for measuring and monitoring coatings
02/13/2007US7176127 Method of manufacturing semiconductor device having through hole with adhesion layer thereon
02/13/2007US7175926 Dual-layer carbon-based protective overcoats for recording media by filtered cathodic ARC deposition
02/13/2007US7175878 Depositing layer of material having refractive index different from MgF2 without ionic assistance; good adherence and scratch resistance for ophthalmic lenses
02/13/2007US7175875 Method and apparatus for plasma processing
02/13/2007US7175802 Refurbishing spent sputtering targets
02/13/2007US7175735 Method and apparatus for manufacturing coated conductor
02/13/2007CA2186563C Antenna glazing multicontact
02/08/2007WO2007016688A1 A method and a device for depositing a film of material or otherwise processing or inspecting, a substrate as it passes through a vacuum environment guided by a plurality of opposing and balanced air bearing lands and sealed by differentially pumped groves and sealing lands in a non-contact manner
02/08/2007WO2007016013A2 Unique passivation technique for a cvd blocker plate to prevent particle formation
02/08/2007WO2007015948A1 Method for vaporizing material at a uniform rate
02/08/2007WO2007015933A2 Method and apparatus for sputtering onto large flat panels
02/08/2007WO2007015445A1 Plasma generator and film forming method employing same
02/08/2007WO2007015380A1 Transparent conductive fine particles, method for producing same, and electrooptical device
02/08/2007WO2007015361A1 Fastener
02/08/2007WO2006121561A3 High performance alloys with improved metal dusting corrosion resistance
02/08/2007WO2006085538A3 Light-emitting element, light-emitting device, and electronic appliance
02/08/2007WO2006075998A3 Means and method for a liquid metal evaporation source with integral level sensor and external reservoir
02/08/2007US20070032075 Deposition method for wiring thin film
02/08/2007US20070031741 EUVL reflection device, method of fabricating the same, and mask, projection optics system and EUVL apparatus using the EUVL reflection device
02/08/2007US20070031703 Barrier film and laminated material, container for wrapping and image display medium using the saw, and manufacturing method for barrier film
02/08/2007US20070031682 Heat treatment; sputter-deposition; windows
02/08/2007US20070031633 Sputtering target, optical thin film and manufacturing method thereof using the sputtering target, and optical recording medium
02/08/2007US20070031609 Chemical vapor deposition chamber with dual frequency bias and method for manufacturing a photomask using the same
02/08/2007US20070031584 Sputter depositing free standing thin film of nitinol metal material onto substrate comprising silicon dioxide over silicon
02/08/2007US20070030568 High-reflectance visible-light reflector member, liquid-crystal display backlight unit employing the same, and manufacture of the high-reflectance visible-light reflector member
02/08/2007US20070029700 Film forming mold, film forming method using mold, and film forming control system
02/08/2007US20070029194 Capacitive coupling plasma processing apparatus and method
02/08/2007US20070029193 Segmented biased peripheral electrode in plasma processing method and apparatus
02/08/2007US20070029192 Tube cathode for use in sputter processes
02/08/2007US20070029188 Rectangular filtered vapor plasma source and method of controlling vapor plasma flow
02/08/2007US20070029187 Method of making thermally tempered coated article with transparent conductive oxide (TCO) coating and product made using same
02/08/2007US20070029186 Method of thermally tempering coated article with transparent conductive oxide (TCO) coating using inorganic protective layer during tempering and product made using same
02/08/2007US20070028841 Method and apparatus for depositing material on a substrate
02/08/2007US20070028838 Gas manifold valve cluster
02/08/2007US20070028441 Method of partial depth material removal for fabrication of CPP read sensor
02/08/2007DE4412902B4 Verfahren zur plasmaunterstützten, chemischen Dampfabscheidung und Vakuumplasmakammer A method for plasma-enhanced, chemical vapor deposition and vacuum plasma chamber
02/07/2007EP1749898A2 Article having patterned decorative coating
02/07/2007EP1749118A1 A hard, wear-resistant aluminum nitride based coating
02/07/2007EP1749116A1 Methods and apparatuses for transferring articles through a load lock chamber under vacuum
02/07/2007EP1749115A2 Apparatus for directing plasma flow to coat internal passageways
02/07/2007EP1663887A4 Coated article with silicon oxynitride adjacent glass
02/07/2007CN2866522Y Vacuum lock differential air extraction system
02/07/2007CN2866521Y Rotary column magnetic control sputtering target
02/07/2007CN1910304A Physical vapor deposition target constructions
02/07/2007CN1910040A Gas barrier film and gas barrier laminate
02/07/2007CN1908702A Euvl reflection device, method of fabricating the same
02/07/2007CN1908227A Magnetic filtration apparatus for physical gas phase deposition evaporator
02/07/2007CN1908226A Tubular cathode for use in sputtering
02/07/2007CN1908225A Method of carrying nano assembly using laser sputtering deposition technology in liquid environment and application thereof
02/07/2007CN1908224A Evaporator for coating of substrates
02/07/2007CN1299324C A method for repairing film electric crystal circuit on display panel
02/07/2007CN1299285C Optical recording medium, method for manufacturing the same and target used for sputtering process
02/07/2007CN1298886C Film coating method for improving optical thin-film laser injure threshold
02/07/2007CN1298885C Vacuum deposition equipment
02/07/2007CN1298884C Computer control device for plating clamp
02/07/2007CN1298883C Ag/TiO2 composite film with adjustable contact angle and preparation method thereof
02/07/2007CN1298882C Automatic changing-over device for correcting baffle plate in vacuum coating film machine
02/07/2007CN1298748C Plasma polymerization treatment equipment with porous hollow electrode
02/06/2007US7173369 Transparent contacts for organic devices
02/06/2007US7172956 Substrate for semiconductor light-emitting element, semiconductor light-emitting element and semiconductor light-emitting element fabrication method
02/06/2007US7172681 Process for producing rubber-based composite material
02/06/2007US7172343 Rolling sliding member and rolling apparatus
02/06/2007CA2361633C Method for producing a cutting tool and a cutting tool
02/06/2007CA2283386C Bendable mirrors and method of manufacture
02/06/2007CA2242790C Method for improving the osteointegration of osseous fixing implants
02/06/2007CA2165641C A method of applying a thermal barrier coating to a superalloy article and a thermal barrier coating
02/01/2007WO2007013933A1 Real-time monitoring and controlling sputter target erosion
02/01/2007WO2007013703A1 Injection type plasma treatment apparatus and method
02/01/2007WO2007013424A1 Vacuum processing apparatus, semiconductor device manufacturing method and semiconductor device manufacturing system
02/01/2007WO2007013392A1 Edge replacing cutting tip and method for producing the same
02/01/2007WO2007013387A1 Sputtering target, method for manufacturing such sputtering target, and transparent conducting film
02/01/2007WO2007013363A1 Vacuum treatment apparatus
02/01/2007WO2007013261A1 Sputtering target, method for producing same, sputtering thin film formed by using such sputtering target, and organic el device using such thin film
02/01/2007WO2007013220A1 Transparent electrically conductive film, transparent electrically conductive sheet, and touch panel
02/01/2007WO2007012342A1 Device for clamping and positioning an evaporator boat
02/01/2007WO2006127221A3 Sputtering target tiles having structured edges separated by a gap
02/01/2007US20070026232 Transparent conductive film for flat panel displays
02/01/2007US20070026161 Magnetic mirror plasma source and method using same
02/01/2007US20070026136 Process for improvement of IBAD texturing on substrates in a continuous mode
02/01/2007US20070026134 Method for in situ photoresist thickness characterization