| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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| 02/22/2007 | WO2007021520A2 Substrate support for increasing substrate temperature in plasma reactors |
| 02/22/2007 | WO2007020981A1 Mn CONTAINING COPPER ALLOY SPUTTERING TARGET WHICH GENERATES LESS PARTICLES |
| 02/22/2007 | WO2007020729A1 Process for producing zinc oxide thin-film and production apparatus |
| 02/22/2007 | WO2006135261A3 Nansoscale patterning and fabrication methods |
| 02/22/2007 | WO2006118455A3 Coating, substrate provided with a coating and method for the application of a corrosion-resistant coating |
| 02/22/2007 | WO2006052873B1 Physical vapor deposition chamber having an adjustable target |
| 02/22/2007 | WO2006036215A3 Superconductor fabrication processes |
| 02/22/2007 | WO2005116291B1 Apparatus for directing plasma flow to coat internal passageways |
| 02/22/2007 | US20070042205 Metal strip product |
| 02/22/2007 | US20070042204 Metal strip product |
| 02/22/2007 | US20070042195 Method and system for producing optically transparent noble metal films |
| 02/22/2007 | US20070042178 Pulverized organic semiconductors and method for vapor phase deposition onto a support |
| 02/22/2007 | US20070042155 Reflective or semi-reflective metal alloy coatings |
| 02/22/2007 | US20070042127 Film growth at low pressure mediated by liquid flux and induced by activated oxygen |
| 02/22/2007 | US20070041892 Synthesis of zno nano-structured materials and its apparatus |
| 02/22/2007 | US20070039818 Method for fabricating a sputtering target |
| 02/22/2007 | US20070039817 Copper-containing pvd targets and methods for their manufacture |
| 02/22/2007 | US20070039545 System and method for film formation |
| 02/22/2007 | DE10244438B4 Verbundkörper mit einer verschleißmindernden Oberflächenschicht, Verfahren zu seiner Herstellung sowie Verwendung des Verbundkörpers Composite body with a wear-reducing surface layer, a process for its production and use of the composite |
| 02/22/2007 | DE102005050374A1 Wear resistant sliding layer of silicon-containing aluminum alloy, e.g. for crankshaft bearings, is formed by gas phase deposition and heat treated to form macrocrystalline silicon deposits |
| 02/22/2007 | DE102005028730A1 Magnetron device, useful for coating substrates by sputtering, comprises magnet system in trough form, massive target and cooling body with coolant channels within trough of magnet system |
| 02/21/2007 | EP1755154A1 Method and apparatus for manufacturing a zinc oxide thin film at low temperatures |
| 02/21/2007 | EP1754799A2 Method for manufacturing of storage phosphor plates. |
| 02/21/2007 | EP1754691A1 Haze-resistant transparent film stacks |
| 02/21/2007 | EP1754533A2 The combinatorial synthesis of novel materials |
| 02/21/2007 | EP1753896A1 Method and system for selectively coating or etching surfaces |
| 02/21/2007 | EP1753892A1 Target material and its use in a sputter process |
| 02/21/2007 | EP1753891A2 Msvd coating process |
| 02/21/2007 | EP1753703A1 Coated article with oxidation graded layer proximate ir reflecting layer(s) and corresponding method |
| 02/21/2007 | EP1638701A4 Ion beam-assisted high-temperature superconductor (hts) deposition for thick film tape |
| 02/21/2007 | EP1550133B1 A method for making a ferroelectric memory cell in a ferroelectric memory device, and a ferroelectric memory device |
| 02/21/2007 | EP1305838B1 Low-temperature fabrication of thin-film energy-storage devices |
| 02/21/2007 | CN1918672A Thin-film transistor and thin-film transistor substrate and production methods for them and liquid crystal display unit using these and related device and method, and, sputtering target and transparen |
| 02/21/2007 | CN1918489A Optical filter and method of manufacturing optical filter |
| 02/21/2007 | CN1918321A Thin film forming apparatus |
| 02/21/2007 | CN1918320A Method to reduce thermal stresses in a sputter target |
| 02/21/2007 | CN1918319A Sputtering target, optical information recording medium and process for producing the same |
| 02/21/2007 | CN1918318A Sputtering target, optical information recording medium and process for producing the same |
| 02/21/2007 | CN1917152A Method for preparing good ohmic contact on thin film of cubic boron nitride |
| 02/21/2007 | CN1916238A Metal plating layer |
| 02/21/2007 | CN1916232A Target assembly and sputtering device with target assembly |
| 02/21/2007 | CN1916231A Sputtering electrode and sputtering device possessing sputtering electrode |
| 02/21/2007 | CN1916230A Method for preparing thick film of superfine crystal in pure aluminum through DC magnetism controlled sputtering |
| 02/21/2007 | CN1916229A Insulating target material, method of manufacturing insulating target material, conductive complex oxide film, and device |
| 02/21/2007 | CN1916228A Mask, mask manufacturing method, film forming method, electro-optic device manufacturing method, and electronic apparatus |
| 02/21/2007 | CN1916227A Method for manufacturing jet orifice piece |
| 02/21/2007 | CN1915898A Target for transparent electroconductive film, transparent electroconductive material, transparent electroconductive glass, and transparent electroconductive film |
| 02/21/2007 | CN1301341C PVD coated cutting tip |
| 02/20/2007 | US7180163 Support with integrated deposit of gas absorbing material for manufacturing microelectronic, microoptoelectronic or micromechanical devices |
| 02/20/2007 | US7179545 Halftone phase shift mask blank, and method of manufacture |
| 02/20/2007 | US7179500 Sub-micron electrolyte thin film on nano-porous substrate by oxidation of metal film |
| 02/20/2007 | US7179352 Vacuum treatment system and process for manufacturing workpieces |
| 02/20/2007 | US7179351 Methods and apparatus for magnetron sputtering |
| 02/20/2007 | US7179350 Reactive sputtering of silicon nitride films by RF supported DC magnetron |
| 02/20/2007 | US7179335 In situ adaptive masks |
| 02/20/2007 | US7178584 Plasma polymerization enhancement of surface of metal for use in refrigerating and air conditioning |
| 02/15/2007 | WO2007018216A1 ZnO CRYSTAL, METHOD FOR GROWING THE CRYSTAL, AND METHOD FOR MANUFACTURE OF LIGHT-EMITTING ELEMENT |
| 02/15/2007 | WO2007017528A1 Cathodic arc evaporation device and method of igniting said arc |
| 02/15/2007 | WO2006097804B1 System and process for high-density,low-energy plasma enhanced vapor phase epitaxy |
| 02/15/2007 | WO2006091598A3 Effusion cell valve |
| 02/15/2007 | WO2006079494A3 Holder and transport device for handling lenses and method for finishing lenses |
| 02/15/2007 | WO2006063956B1 Device for the tempered storage of a container |
| 02/15/2007 | WO2005113851A3 Fusion cast articles and methods of manufacture |
| 02/15/2007 | US20070037367 Apparatus for plasma doping |
| 02/15/2007 | US20070037073 Providing a target containing a metal and silicon, and carrying out reactive sputtering in an atmosphere containing a reactive gas ( nitrogen, oxygen, fluorine) to form half-tone film on said transparent substrate |
| 02/15/2007 | US20070037071 Method for removing defect material of a lithography mask |
| 02/15/2007 | US20070037015 Laminated magnetic media using Ta containing magnetic alloy as the upper magnetic layer |
| 02/15/2007 | US20070037007 Multilayer getter structures and methods for making same |
| 02/15/2007 | US20070036990 Coated article with low-E coating including IR reflecting layer(s) and corresponding method |
| 02/15/2007 | US20070036986 Coated article with low-E coating including zirconium silicon oxynitride and methods of making same |
| 02/15/2007 | US20070035062 Method and facility for the production of a layer-like part |
| 02/15/2007 | US20070034918 Ferroelectric film, semiconductor device, ferroelectric film manufacturing method, and ferroelectric film manufacturing apparatus |
| 02/15/2007 | US20070034818 Prestrained thin-film shape memory actuator using polymeric substrates |
| 02/15/2007 | US20070034509 Magnetic filter for physical vapor deposition equipment |
| 02/15/2007 | US20070034508 Self-adjustable and cross-chamber transmission system |
| 02/15/2007 | US20070034501 Cathode-arc source of metal/carbon plasma with filtration |
| 02/15/2007 | US20070034500 SiOx:Si sputtering targets and method of making and using such targets |
| 02/15/2007 | US20070034499 Phase shift mask blank, photo mask blank, and manufacturing apparatus and method of blanks |
| 02/15/2007 | US20070034498 Pulsed magnetron sputtering deposition with preionization |
| 02/15/2007 | US20070034497 High-density plasma source |
| 02/15/2007 | US20070034158 Substrate processing apparatus and semiconductor device producing method |
| 02/15/2007 | US20070034156 Method and apparatus for precision coating of molecules on the surfaces of materials and devices |
| 02/15/2007 | US20070034148 Sample holder for physical vapor deposition equipment |
| 02/15/2007 | DE102005037822A1 Vakuumbeschichtung mit Kondensatentfernung Vacuum coating with condensate removal |
| 02/15/2007 | DE10048210B4 Vorrichtung und Verfahren zum Einschleusen eines Werkstücks über eine Vorvakuumkammer in eine Hochvakuumkammer und deren Verwendung Apparatus and method for introducing a workpiece through a pre-vacuum chamber in a high vacuum chamber and their use |
| 02/14/2007 | EP1753020A1 Semiconductor device and method for fabricating the same |
| 02/14/2007 | EP1752558A1 Film forming apparatus |
| 02/14/2007 | EP1752557A1 Vacuum coating apparatus with powered rotating cathode |
| 02/14/2007 | EP1752556A1 Tubular cathode for use in sputtering. |
| 02/14/2007 | EP1752555A1 Vaporizing device |
| 02/14/2007 | EP1752554A1 Vaporizing device |
| 02/14/2007 | EP1752430A1 Sputtering target, transparent conductive oxide, and process for producing the sputtering target |
| 02/14/2007 | EP1751454A1 Lock valve in particular for a strip processing unit |
| 02/14/2007 | EP1751324A1 Sputter targets and methods of forming same by rotary axial forging |
| 02/14/2007 | EP1751073A2 Coating stack comprising a layer of barrier coating |
| 02/14/2007 | EP1751071A2 NANO GLASS POWDER AND USE THEREOF, PARTICULARLY MULTICOMPONENT GLASS POWDER WITH A MEAN PARTICLE SIZE OF LESS THAN 1 µM |
| 02/14/2007 | EP1750919A2 Coating with hard wear and non-stick characteristics |
| 02/14/2007 | EP1155816B1 Layered product |
| 02/14/2007 | EP0914496A4 Microwave applicator for an electron cyclotron resonance plasma source |
| 02/14/2007 | CN2869034Y Sputter coating apparatus for pipeline internal wall surface |