Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
02/2007
02/01/2007US20070023282 Deflection magnetic field type vacuum arc vapor deposition device
02/01/2007US20070023281 Tantalum sputtering target
02/01/2007US20070023276 Method and apparatus for cleaning a target of a sputtering apparatus
02/01/2007US20070023275 Controllable target cooling
02/01/2007US20070022958 Abatement of fluorine gas from effluent
02/01/2007US20070022952 Unique passivation technique for a cvd blocker plate to prevent particle formation
02/01/2007US20070022949 High-pressure processing apparatus
02/01/2007US20070022947 Process for preparing p-n junctions having a p-type ZnO film
02/01/2007DE102005035904A1 Vorrichtung zum Behandeln von Substraten Apparatus for processing substrates
02/01/2007DE102005004006B4 Haltevorrichtung und Transportvorrichtung zum Handhaben von Linsen sowie Verfahren zur Veredelung von Linsen Holding device and transport device for handling of lenses and to methods for processing of lenses
02/01/2007CA2634297A1 Article having patterned decorative coating
02/01/2007CA2553240A1 Method for restoring portion of turbine component
01/2007
01/31/2007EP1748090A1 Substrates heat treatment apparatus
01/31/2007EP1748035A1 Thin film coating having transparent base layer
01/31/2007EP1747301A1 Strip processing system
01/31/2007EP1221175B1 Electric supply unit and a method for reducing sparking during sputtering
01/31/2007CN1906324A Ion implantation method and ion implantation device
01/31/2007CN1906323A Protective layer for an aluminium-containing alloy for using at high temperatures, and method for producing one such protective layer
01/31/2007CN1906130A Indium oxide-tin oxide powder and sputtering target using the same
01/31/2007CN1906042A Write-onece-read-many optical recording medium and its sputtering target
01/31/2007CN1905974A Cutting tool made of surface-coated super hard alloy, and method for manufacture thereof
01/31/2007CN1905973A Surface-coated cutting tool having film with compressive stress intensity distribution
01/31/2007CN1905972A Surface coating cutting tool with coating film having intensity distribution of compression stress
01/31/2007CN1904653A High-reflectance visible-light reflector member, liquid-crystal display backlight unit employing the same
01/31/2007CN1904134A Hollow cathode ion metallic cementation device
01/31/2007CN1904133A 溅射装置和溅射方法 Sputtering apparatus and sputtering method
01/31/2007CN1904132A 溅射装置和溅射方法 Sputtering apparatus and sputtering method
01/31/2007CN1904131A Controllable target cooling
01/31/2007CN1904130A Vapor deposition device
01/31/2007CN1904129A Evaporator device
01/31/2007CN1904128A Air inlet regulating device of vacuum chamber and regulating method
01/31/2007CN1904127A Tungsten/iridium composite coating layer for carbon material antioxidation and its preparation method
01/31/2007CN1904126A Iridium coating layer for carbon material anti oxidation and its preparation method
01/31/2007CN1903562A Thermal barrier coating
01/31/2007CN1297997C Film capacitor and its production method
01/31/2007CN1297684C Sputtering target
01/31/2007CN1297397C Depositon film
01/30/2007US7169690 Method of producing crystalline semiconductor material and method of fabricating semiconductor device
01/30/2007US7169485 Multilayer coating excellent in wear resistance and heat resistance
01/30/2007US7169479 Grain-oriented magnetic steel sheet comprising an electrically insulating coating
01/30/2007US7169473 Carbon film-coated article and method of producing the same
01/30/2007US7169271 Magnetron executing planetary motion adjacent a sputtering target
01/30/2007US7169254 Plasma processing system and apparatus and a sample processing method
01/30/2007US7169232 Producing repetitive coatings on a flexible substrate
01/25/2007WO2007011894A1 Physical vapor deposited nano-composites for solid oxide fuel cell electrodes
01/25/2007WO2007011331A2 Water-soluble polymeric substrate having metallic nanoparticle coating
01/25/2007WO2007010935A1 Photo mask blank, photo mask, and their fabrication method
01/25/2007WO2007010798A1 Sputtering apparatus and method for manufacturing transparent conducting film
01/25/2007WO2007010702A1 In Sm OXIDE SPUTTERING TARGET
01/25/2007WO2007009634A1 Method and device for multi-cathode-pvd-coating and substrate having pvd-coating
01/25/2007WO2005108646A3 Rotary target locking ring assembly
01/25/2007US20070020477 Cemented carbide body
01/25/2007US20070020403 Process for producing extremely flat microcrystalline diamond thin film by laser ablation method
01/25/2007US20070020396 Process for applying coatings with metallic or ceramic finish
01/25/2007US20070020138 Silver alloy excellent inreflectance maintenance property
01/25/2007US20070018351 Method of forming film on molded body, method of producing molded body with film formed thereon, mold for producing molded body with film formed thereon
01/25/2007US20070017804 Device for improving plasma activity PVD-reactors
01/25/2007US20070017803 Enhanced sputter target manufacturing method
01/25/2007US20070017802 Automatic in-line sputtering system with an integrated surface corona pretreatment
01/25/2007US20070017800 transmitting and propagating ultrasonic waves in multiple modes over entire surface of sputter target; receiving ultrasonic waves, processing signal received to monitor and determine the depth of erosion at different locations on sputtering target in real-time, controlling physical vapor deposition
01/25/2007US20070017799 Single-process-chamber deposition system
01/25/2007US20070017798 Evacuable magnetron chamber
01/25/2007US20070017444 Rotatable valve
01/25/2007CA2615235A1 Method and device for multi-cathode-pvd-coating and substrate having pvd-coating
01/24/2007EP1746590A2 Silver alloy reflective films for optical information recording media, silver alloy sputtering targets therefor, and optical
01/24/2007EP1746586A1 Enhanced sputter target alloy compositions
01/24/2007EP1746182A2 Hybrid pvd-cvd system
01/24/2007EP1746181A2 Improved magnetron sputtering system for large-area substrates
01/24/2007EP1746180A1 Optical information recording media and silver alloy reflective films for the same
01/24/2007EP1746179A2 Titanium part for internal combustion engine
01/24/2007EP1746178A2 Device for improving plasma activity in PVD-reactors
01/24/2007EP1746173A2 Enhanced sputter target manufacturing method
01/24/2007EP1746077A1 Metal-coated graphite foil
01/24/2007EP1662953B1 Easy-to-clean cooking surface and electric household appliance comprising same
01/24/2007EP1476900B1 Method for forming an oxide layer on a gaas-based semiconductor structure
01/24/2007EP1307600A4 Method for reducing the oxygen and oxide content in cobalt to procuce cobalt sputtering targets
01/24/2007EP0864537B1 Ferroelectric material, method of manufacturing the same, semiconductor memory, and method of manufacturing the same
01/24/2007CN2861180Y Sphere radiation local coating device
01/24/2007CN1902336A Elongate vacuum system for coating one or both sides of a flat substrate
01/24/2007CN1902335A Melting and vaporizing apparatus and method
01/24/2007CN1902058A Optical recording medium and process for producing the same, sputtering target, using process of optical recording medium, and optical recording apparatus
01/24/2007CN1901140A 真空控制系统 Vacuum control system
01/24/2007CN1901138A Mask, mask chip, manufacturing method of mask, manufacturing method of mask chip, and electronic device
01/24/2007CN1901054A Silver alloy reflective films for optical information recording media, silver alloy sputtering targets therefor, and optical information recording media
01/24/2007CN1901053A Silver alloy reflective films for optical information recording media, silver alloy sputtering targets therefor, and optical information recording media
01/24/2007CN1900819A Photomask blank, photomask and fabrication method thereof
01/24/2007CN1900359A Hybrid PVD-CVD system
01/24/2007CN1900355A Plating article holder of physical gas phase depositing steam plating machine
01/24/2007CN1900354A Device for improving plasma activity in PVD-reactors
01/24/2007CN1900353A Evacuable magnetron chamber
01/24/2007CN1900352A Enhanced sputter target manufacturing method
01/24/2007CN1900351A Single-process-chamber deposition system
01/24/2007CN1900350A Enhanced sputter target alloy compositions
01/24/2007CN1900349A Vacuum device assembly for applying coating onto substrate
01/24/2007CN1900348A Target pole for coating and its casting process for external sleeve
01/24/2007CN1899738A Target pole material soldering process for coating layer
01/24/2007CN1899736A Surface coated cemented carbide cutting tool
01/24/2007CN1296924C Sputtering target containing zinc sulfide as major component and its production method, optical recording medium on which phase change optical disk protective film containing zinc sulfide as major com
01/24/2007CN1296771C Method of passivating of low dielectric materials in wafer processing
01/24/2007CN1296603C Motor vehicle engine air-valve drive system spacer or jib and the comnbination with cam shaft