Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
01/2007
01/03/2007CN1293606C Method or growing N-Al co-blended p type ZnO transistor film by two step method
01/03/2007CN1293229C Hollow cathode target and methods of making same
01/02/2007US7157756 Field effect transistor
01/02/2007US7157733 Floating-gate field-effect transistors having doped aluminum oxide dielectrics
01/02/2007US7157187 Heat resistance; performance; ultrathin electrolyte/dielectric films
01/02/2007US7157135 Co-extruded high refractive index coated embossable film
01/02/2007US7157116 Method for the production of plane-parallel platelets by using organic separating agents
01/02/2007US7156964 Sputtering target for phase-change memory, film for phase change memory formed by using the target, and method for producing the target
01/02/2007US7156963 Tantalum sputtering target and method for preparation thereof
01/02/2007US7156961 Sputtering apparatus and film forming method
01/02/2007US7156960 Method and device for continuous cold plasma deposition of metal coatings
01/02/2007US7156945 A pattern is printed with a masking coating or an ink, on the substrate, the pattern being such that, the desired thin film structures will be formed in the areas where the printed masking coating is not present
01/02/2007US7156922 Multi-chamber installation for treating objects under vacuum, method for evacuating said installation and evacuation system therefor
01/02/2007US7156921 Method and apparatus for chemical vapor deposition capable of preventing contamination and enhancing film growth rate
01/02/2007CA2237280C Free-standing rotational rod-fed source
12/2006
12/28/2006WO2006137835A2 EPITAXIAL FERROMAGNETIC Ni3FeN
12/28/2006WO2006137405A1 Material for thin film formation, thin film formed therefrom and method of forming thin film
12/28/2006WO2006137199A1 Sputtering target and thin film for optical information recording medium
12/28/2006WO2006137192A1 Method of surface reconstruction for silicon carbide substrate
12/28/2006WO2006136310A2 Powder-fiber adhesive
12/28/2006WO2006136242A1 Metal-coated graphite film
12/28/2006WO2006136187A1 Device for the successive coating of a number of substrates
12/28/2006WO2006119403A3 Metering material to promote rapid vaporization
12/28/2006WO2006111618A8 Source, an arrangement for installing a source, and a method for installing and removing a source
12/28/2006WO2006086319A3 Sputtering target and method of fabrication
12/28/2006WO2006052576A3 Encapsulated wafer processing device and process for making thereof
12/28/2006WO2005094280A3 High-strength backing plates, target assemblies, and methods of forming high-strength backing plates and target assemblies
12/28/2006US20060292383 Metal-coated substrate and manufacturing method of the same
12/28/2006US20060292302 Apparatus and method for growing a synthetic diamond
12/28/2006US20060292028 High-purity ni-v alloy target therefrom high-purity ni-v alloy thin film and process for producing high-purity ni-v alloy
12/28/2006US20060289793 Method and apparatus for simultaneously depositing and observing materials on a target
12/28/2006US20060289306 Inclined carrier transferring apparatus
12/28/2006US20060289305 Centering mechanism for aligning sputtering target tiles
12/28/2006US20060289304 Sputtering target with slow-sputter layer under target material
12/28/2006US20060289303 Inhibiting generation of arcing in sputtering process of forming transparent electrode film, suppressing generation of defects caused by arcing, and reducing formation of nodules and abnormal discharge; density of 7.12 g/cm3 or greater; no particle having diameter of 10 nm or greater exposed on surface
12/28/2006US20060289296 Plasma processing method and high-rate plasma etching apparatus
12/28/2006US20060289295 Shape memory device having two-way cyclical shape memory effect due to compositional gradient and method of manufacture
12/28/2006US20060289294 Enhanced oxygen non-stoichiometry compensation for thin films
12/28/2006US20060289293 Composite mold and method for manufacturing the same
12/28/2006US20060289292 attaching a container to a plate through a first container fixing hole by screwing a first screw; less tightly attached through the second container fixing hole to the plate, and allow the sputtering apparatus expands by heat; semiconductor wafers or liquid crystal panels
12/28/2006US20060289291 Method for adjusting electromagnetic field across a front side of a sputtering target disposed inside a chamber
12/28/2006US20060288941 Evaporation source for evaporating an organic
12/28/2006US20060288940 Evaporation source for evaporating an organic electroluminescent layer
12/28/2006US20060288939 Evaporation source for evaporating an organic electroluminescent layer
12/28/2006DE112004001760T5 Behälter zum Verdampfen von Metall und Verfahren zu seiner Herstellung Container for evaporating metal and process for its preparation
12/28/2006DE102005028729A1 Cooled target material for a magnetron system is produced with cross cuts to improve the functional stability
12/28/2006DE102004008598B4 Verfahren für den Betrieb einer Inline-Beschichtungsanlage A method of operating an in-line coating line
12/27/2006EP1737053A1 Thermoelectric conversion element and thermoelectric conversion module
12/27/2006EP1737044A1 Amorphous oxide and thin film transistor
12/27/2006EP1736566A1 Method of applying coatings with a metallic or ceramic finish
12/27/2006EP1736565A1 Composite coatings for finishing of hardened steels
12/27/2006EP1736559A1 Silver alloy with excellent reflectance-maintaining characteristics
12/27/2006EP1735847A2 Biaxially-textured film deposition for superconductor coated tapes
12/27/2006EP1735476A1 Textured-grain-powder metallurgy tantalum sputter target
12/27/2006EP1035553B1 Methods for producing a layered product
12/27/2006CN2851276Y Symmetrically-arranged vacuum retrieving system
12/27/2006CN2851275Y Target chamber cylinder door lifting system
12/27/2006CN1886533A Method for manufacturing diamond coatings
12/27/2006CN1886254A 气体阻挡膜 Gas barrier film
12/27/2006CN1885595A Integrated full-solid-state lithium ion thin film micro cell anode preparing method
12/27/2006CN1885493A Method for preparing ferromagnetic manganese silicon film on silicon substrate by magnetic control sputtering
12/27/2006CN1885491A Vacuum processing apparatus and method operation thereof
12/27/2006CN1885490A Structure for mounting loading table device, processing device, discharge prevention method between feeder lines
12/27/2006CN1885488A Top electrode, plasma processing device and method
12/27/2006CN1884613A Random pulsed DC power supply
12/27/2006CN1884612A Surface treating device of mirror
12/27/2006CN1884611A Enhanced oxygen non-stoichiometry compensation for thin films
12/27/2006CN1884610A Anode device with on-line cleaning function and its application method
12/27/2006CN1883855A Composite coatings for finishing of hardened steels
12/27/2006CN1292424C 一种反射器 A reflective device
12/27/2006CN1292402C Ultra-thin protective overcoats for magnetic materials
12/27/2006CN1292091C Sputtering machine table and its sputtering carrying table
12/27/2006CN1291809C Amorphous carbon coated tools and manufacture thereof
12/26/2006US7155115 Method and device for vacuum sputtering
12/26/2006US7154180 Electronic device, method of manufacture of the same, and sputtering target
12/26/2006US7153769 Methods of forming a reaction product and methods of forming a conductive metal silicide by reaction of metal with silicon
12/26/2006US7153586 Article with scandium compound decorative coating
12/26/2006US7153584 Hybrid film, antireflection film comprising it, optical product, and method for restoring the defogging property of hybrid film
12/26/2006US7153577 For use as insulating glass (IG) window units, architectural or residential monolithic window units, vehicle windows
12/26/2006US7153544 primary layer bonds the transparent electro-conductive thin film to the polymer film and provides good resistance to scuffing for the transparent electro-conductive film
12/26/2006US7153542 Assembly line processing method
12/26/2006US7153468 mixing selenium and silver or germanium solids, then melting to form an homogenous distribution throughout the liquid phase and cooling or solidifying to define composite target blanks
12/26/2006US7153453 Oxide sintered body, sputtering target, transparent conductive thin film and manufacturing method therefor
12/26/2006US7153441 Method for manufacturing thin-film magnetic recording medium
12/26/2006US7153399 Method and apparatus for producing uniform isotropic stresses in a sputtered film
12/26/2006US7153372 Method for removing particles from elements installed in a vacuum chamber
12/26/2006US7153367 Drive mechanism for a vacuum treatment apparatus
12/26/2006US7153180 Continuous manufacture of flat panel light emitting devices
12/26/2006US7152776 Friction stir welding using a superabrasive tool
12/26/2006US7152549 Vapor deposition system
12/21/2006WO2006135528A2 Adaptable fixation for cylindrical magnetrons
12/21/2006WO2006135140A1 Tungsten-including diamond-like carbon film and manufacturing method thereof, and dental device manufactured by the method
12/21/2006WO2006134908A1 Organic evaporation system and method
12/21/2006WO2006134818A1 Film forming device, thin-film manufacturing apparatus, and film forming method
12/21/2006WO2006134792A1 Silicon monoxide vapor deposition material and process for producing the same
12/21/2006WO2006134743A1 Ruthenium-alloy sputtering target
12/21/2006WO2006134694A1 Chromium oxide powder for spattering target and spattering target
12/21/2006WO2006134207A1 Method and apparatus for making a wear-resistant coating on a coating blade or equivalent
12/21/2006WO2006133779A2 Evaporator boat for a device for coating substrates
12/21/2006WO2006133710A1 A corrosion resistant object having an outer layer of a ceramic material