Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
07/2007
07/11/2007CN1325762C Heat-insulating coating material and gas turbine component and gas turbine
07/11/2007CN1325693C Process and apparatus for the localized deposition of release agents
07/11/2007CN1325692C Process for coating aluminium film and protective film for automobile reflector
07/11/2007CN1325604C MY(1-x)SiO4:Ax light-emitting film and its preparation method
07/11/2007CN1325212C Coated cutting tool member having hard coating layer and method for forming the hard coating layer on cutting tool
07/10/2007US7242013 Method for depositing a film using a charged particle beam, method for performing selective etching using the same, and charged particle beam equipment therefor
07/10/2007US7241688 Aperture masks for circuit fabrication
07/10/2007US7241492 Multilayered film having excellent wear resistance, heat resistance and adhesion to substrate and method for producing the same
07/10/2007US7241490 Enhanced adhesion between the intermediate layer and the film by including in the intermediate layer Mo, Cr, Ni, and/or Si dispersed to a depth of 20 nm or less from the surface; and a copper or copper alloy conductive layer formed on the intermediate layer
07/10/2007US7241472 Method for producing antireflection film-coated plastic lens, and antireflection film-coated plastic lens
07/10/2007US7241397 Honeycomb optical window deposition shield and method for a plasma processing system
07/10/2007US7241368 Forming mixed oxide of hafnium, silicon; dielectrics
07/10/2007US7241360 Method and apparatus for neutralization of ion beam using AC ion source
07/10/2007US7241346 Apparatus for vapor deposition
07/10/2007US7241339 Method and apparatus for applying a gel
07/05/2007WO2007075977A2 Eb-pvd system with automatic melt pool height control
07/05/2007WO2007075435A2 Apparatus for reactive sputtering
07/05/2007WO2007074895A1 TRANSLUCENT REFLECTIVE FILM AND REFLECTIVE FILM FOR OPTICAL RECORDING MEDIUM, AND Ag ALLOY SPUTTERING TARGET FOR FORMING SUCH TRANSLUCENT REFLECTIVE FILM AND REFLECTIVE FILM
07/05/2007WO2007074872A1 Sputtering target structure
07/05/2007WO2007074563A1 Film forming apparatus and process for producing light emitting element
07/05/2007WO2007017175B1 Vacuum depositing with condensation removing
07/05/2007US20070152233 Manufacture method for ZnO based compound semiconductor crystal and ZnO based compound semiconductor substrate
07/05/2007US20070152173 Ion implantation apparatus and ion implanting method
07/05/2007US20070151847 Magnetron
07/05/2007US20070151842 Apparatus for reactive sputtering
07/05/2007US20070151841 Flexible magnetron including partial rolling support and centering pins
07/05/2007DE19652741B4 Vorrichtung und Verfahren zur Erzeugung eines Oxidfilms eines Halbleiterbauelementes Apparatus and method for producing an oxide film of a semiconductor device
07/05/2007DE102006056973A1 Heizeinrichtung zum Ablagern einer Dünnschicht Heating means for depositing a thin film
07/05/2007DE102006041791A1 Reinigungsverfahren für eine Vorrichtung zum Abscheiden eines Al-aufweisenden Metallfilms und eines Al-aufweisenden Metallnitridfilms The cleaning method for an apparatus for depositing an Al-containing metal film and an Al-containing metal nitride
07/05/2007DE102005063143A1 Verfahren zur Herstellung eines Sputtertargets sowie Sputtertarget A process for producing a sputtering target and sputtering target
07/05/2007DE102004015230B4 Verfahren und Vorrichtung zum Intensivieren einer gepulsten Magnetronentladung Method and apparatus for intensifying a pulsed magnetron discharge
07/04/2007EP1804306A1 Plant for the production in continuous of a superconducting tape and related surface treatment process
07/04/2007EP1804275A1 Sputter device with a tubular cathode and process of operating the sputter device
07/04/2007EP1803836A1 Evaporation source and method of depositing thin film using the same
07/04/2007EP1803833A2 Method of manufacturing ceramic film and ceramic film manufacturing apparatus
07/04/2007EP1803514A2 Cutting tool insert
07/04/2007EP1802786A1 Device and method for cooling strip substrates
07/04/2007EP1802785A1 Pvd-coated cutting tool insert
07/04/2007EP1802452A2 Optical element with an opaque chrome coating having an aperture and method of making same
07/04/2007EP1601471A4 Gas gate for isolating regions of differing gaseous pressure
07/04/2007EP1422316A9 Method for cleaning reaction container and film deposition system
07/04/2007CN1994022A Method for fabricating organic EL element and method for cleaning equipment for fabricating organic EL element
07/04/2007CN1993492A Thin-film forming apparatus
07/04/2007CN1993491A Sputtering source, sputtering device, method for forming thin film
07/04/2007CN1993490A Apparatus for directing plasma flow to coat internal passageways
07/04/2007CN1991274A Film plating method of solar stove panel
07/04/2007CN1990907A Manufacture technique of seamless steel pipe units guide plate high-energy ion implantation WC gradient material
07/04/2007CN1990906A Manufacture technique of carrying roll and loop-rising roll high-energy ion implantation WC gradient material in stick and wire mill
07/04/2007CN1990905A Manufacture technique of perforation head high-energy ion implantation WC gradient material
07/04/2007CN1990904A Coating clamp and coating carrying disk thereof
07/04/2007CN1990903A Heater for depositing thin film
07/04/2007CN1990902A Evaporation source and method for thin film evaporation using the same
07/04/2007CN1990901A Application method
07/04/2007CN1990900A Built-in double warehouse vacuum coating system and application method thereof
07/04/2007CN1990899A Hydrophobic structure and preparation method thereof
07/04/2007CN1990898A Cleaning method of apparatus for depositing ai-containing metal film and ai-containing metal nitride film
07/04/2007CN1990422A Oxidate sintered body and method for making same, sputtering target and transparent conductive film
07/04/2007CN1324649C 真空容器 Vacuum vessel
07/04/2007CN1324641C Magnet array in conjunction with rotating magnetron for plasma sputtering
07/04/2007CN1324371C Inorganic orientation film forming method,inorganic orientation film,substrate for electronic device,liquid crystal panel and electronic apparatus
07/04/2007CN1324161C Preparation method of non-conductive plastic surface metal membrane
07/04/2007CN1323812C Metallized cutlery and tableware
07/03/2007US7238978 Ferroelectric memory device
07/03/2007US7238912 Wafer characteristics via reflectometry and wafer processing apparatus and method
07/03/2007US7238631 substrates are coated with ceramic titanium oxide layers which fulfil one or more protective effects and for example thus increase safety in everyday dealings with highly flammable and/or easily contaminated materials
07/03/2007US7238628 Energy conversion and storage films and devices by physical vapor deposition of titanium and titanium oxides and sub-oxides
07/03/2007US7238429 Ultra-hard low friction coating based on A1MgB14 for reduced wear of MEMS and other tribological components and system
07/03/2007US7238389 Directing a stream of metered fluidized powder onto a first member; heating the member to vaporize the powder; collecting the vapors in a manifold; providing a second member an aperture(s) to direct the vapors onto the surface to form a film; and interrupting the vaporization to reduce wall deposits
07/03/2007US7238383 compacting a mixture of sublimable organic powder and a thermally insulating and non-sublimable inorganic powder into a solid compacted pellet
07/03/2007US7238262 Forming a bulbous light emitting chamber intermediate tubular end portions from a lamp burner envelope; coating the chamber surface; and sealing the ends with a heat source while shielding the coated surface to prevent degradation to the performance of the coating.
07/03/2007CA2327031C Composite vapour deposited coatings and process therefor
07/03/2007CA2305938C Filtered cathodic arc deposition method and apparatus
07/03/2007CA2202430C Oxide film, laminate and methods for their production
07/03/2007CA2192299C Glass material variable in volume by irradiation with ultraviolet light
07/03/2007CA2183763C Porous metal composite body
06/2007
06/28/2007WO2007072877A1 Low emissivity glass
06/28/2007WO2007072867A1 Feedstock supply unit and vapor deposition equipment
06/28/2007WO2007072755A1 Raw powder mixture for ito sinter
06/28/2007WO2007072732A1 Polycrystalline aluminum thin film and optical recording medium
06/28/2007WO2007072658A1 Amorphous hard carbon coating
06/28/2007WO2007071719A1 Method of manufacturing at least one sputter-coated substrate and sputter source
06/28/2007WO2007044344A3 Method and apparatus for cylindrical magnetron sputtering using multiple electron drift paths
06/28/2007US20070148500 excellent signal to noise ration and can conduct high density recording, by providing fine particle diameter to the magnetic crystal grains without forming distortion of crystallinity and orientation of the magnetic crystal grains; grain boundary field includes titanium oxides, TiO, Ti2O3, and TiO2
06/28/2007US20070148499 Perpendicular magnetic recording disk and manufacturing method thereof
06/28/2007US20070148351 superior uniformity in electroluminescence( EL) layer film thickness, superior throughput, and improved utilization efficiency of EL materials
06/28/2007US20070144901 Pulsed cathodic arc plasma
06/28/2007US20070144900 Provide a high density sputtering target having a prolonged target life; forming thin film
06/28/2007US20070144899 Target arrangement for mounting / dismounting and method of manufacturing
06/28/2007US20070144892 Method for forming metal film or stacked layer including metal film with reduced surface roughness
06/28/2007US20070144891 Sputter apparatus with a pipe cathode and method for operating this sputter apparatus
06/28/2007US20070144890 Sputtering apparatus
06/28/2007US20070144889 Machine for treating substrates and method
06/28/2007US20070144888 Display element
06/28/2007US20070144666 Process for producing packaging laminate material
06/28/2007US20070144573 P-type and n-type thermoelectric thin films are selected from specific complex oxides with a positive Seebeck coefficient and specific complex oxides with a negative Seebeck coefficient, respectively; electrically connected onon a dielectric sibstrate; shapes; energy efficiency; waste heatconversion
06/28/2007DE102006021565A1 Magnetic field system for a cathode unit, is produced using one or more cluster magnetron cathodes
06/28/2007DE102005025935B4 Hochtemperatur-Verdampferzelle und Verfahren zur Verdampfung hochschmelzender Materialien High-temperature evaporator cell and method for vaporizing refractory materials
06/27/2007EP1802177A1 Organic electroluminescent device and manufacturing method thereof
06/27/2007EP1801898A2 Integrated circuit device and fabrication using metal-doped chalcogenide materials
06/27/2007EP1801895A2 MgO/Nife MTJ for high performance MRAM application