Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
07/2007
07/26/2007WO2007084275A1 Two-dimensional aperture array for vapor deposition
07/26/2007WO2007083833A1 Absorption-type multilayer film nd filter and process for producing the same
07/26/2007WO2007083608A1 Sputtering apparatus and sputtering method
07/26/2007WO2007083590A1 Multilayer structure, electrode for electrical circuit using same, and method for producing same
07/26/2007WO2007083393A1 Film forming apparatus and deposition apparatus
07/26/2007WO2007083361A1 Surface treatment coating film with resistance to erosion by solid particle and rotary machine
07/26/2007WO2007082645A2 Object comprising a relatively soft carrier material and a relatively hard decorative layer, and method for the production thereof
07/26/2007WO2007082498A1 Method of coating a cemented carbide or cermet substrate body and coated cemented carbide or cermet body
07/26/2007WO2007082396A1 Apparatus for degassing a wafer-like substrate
07/26/2007US20070172738 Lithium ion conducting lithium sulphur oxynitride thin film, and a process for the preparation thereof
07/26/2007US20070172732 Anode active material, method of preparing the same, and anode and lithium battery containing the anode active material
07/26/2007US20070172706 non-magnetic substrate, soft magnetic layer, intermediate layer comprised chromium oxide, cobalt oxide, ruthenium oxide and tantalum oxide and perpendicular magnetic recording layer; high recording density and low medium noise
07/26/2007US20070172681 Energy conversion and storage films and devices by physical vapor deposition of titanium and titanium oxides and sub-oxides
07/26/2007US20070172676 Bond coat layer of oxides of chromium and aluminum with iron, nickel or cobalt disposed over a substrate; layer of ceramic oxide insulating material disposed over the thermally grown oxide layer; mixed oxides of zirconium and yttrium dispersed in an alumina matrix
07/26/2007US20070172625 Reflective or Semi-Reflective Metal Alloy Coatings
07/26/2007US20070172585 Method for applying an optical coating to a surface of an article
07/26/2007US20070170434 Thin film transistor, thin film transistor substrate, processes for producing the same, liquid crystal display using the same, and related devices and processes; and sputtering target, transparent electroconductive film formed by use of this,transparent electrode, and related devices and processes
07/26/2007US20070170088 Container, container producing method, substrate processing device, and semiconductor device producing method
07/26/2007US20070170053 obtaining a first powder by heat treating and pulverizing a mixture obtained by mixing an oxide of an element A (La, Ca) , an oxide of an element B (Ti), and an oxide of an element X (Nb), mixing solution of silicon alkoxide, forming second powder mixture, calcining and pulverizing second powder
07/26/2007US20070170052 Target for sputtering chamber
07/26/2007US20070170050 Method for the production of an ultra barrier layer system
07/26/2007US20070169890 Exhaust processing method, plasma processing method and plasma processing apparatus
07/26/2007US20070169696 Two-step post nitridation annealing for lower eot plasma nitrided gate dielectrics
07/26/2007US20070169695 Process and device for coating strips
07/26/2007US20070169337 Method for creating write element having high magnetic moment co-fe-o-n film with soft magnetic properties
07/26/2007DE19617155B4 Sputterbeschichtungsstation, Verfahren zur Herstellung sputterbeschichteter Werkstücke und Verwendung der Station oder des Verfahrens zur Beschichtung scheibenförmiger Substrate Sputterbeschichtungsstation, methods of making sputter-coated workpieces and use of the station or of the method for coating disk shaped substrates
07/26/2007DE102006003386A1 Vorrichtung und Verfahren zur Oberflächenbehandlung von Walzen in der Papierindustrie Apparatus and method for surface treatment of rollers in the paper industry
07/26/2007DE102005049328B4 Materialmischung, Sputtertarget, Verfahren zu seiner Herstellung sowie Verwendung der Materialmischung Material mixture, a sputtering target, a process for its production and use of the material mixture
07/26/2007DE10120383B4 Verfahren zur Metallisierung von Siliziumscheiben durch Aufsputtern Process for the metallization of silicon wafers by sputtering
07/26/2007CA2635020A1 Method of coating a cemented carbide or cermet substrate body and coated cemented carbide or cermet body
07/25/2007EP1811553A1 Apparatus and method for depositing fine particles
07/25/2007EP1811058A2 Method of manufacturing insulating target material
07/25/2007EP1811057A1 Sputtering target with high melting point phase
07/25/2007EP1811056A1 Method for producing film, and, film
07/25/2007EP1811050A2 Magnetic sputter targets manufactured using directional solidification
07/25/2007EP1809792A1 Common rack for electroplating and pvd coating operations
07/25/2007EP1809785A2 Vertical production of photovoltaic devices
07/25/2007EP1809784A2 Delivering particulate material to a vaporization source
07/25/2007EP1809783A1 Coated product and method of production thereof
07/25/2007EP1670967A4 Extended life sputter target
07/25/2007EP1392884A4 Recessed sputter target
07/25/2007CN1328932C Patterning method and device, film forming method and device and electro-optic device and its mfg. method
07/25/2007CN1328409C High purity niobium and products containing the same, and methods of making the same
07/25/2007CN1328408C Evaporation device
07/25/2007CN1328254C Metal bis-triflimide compounds and methods for synthesis of metal bis-triflimide compounds
07/25/2007CN101006751A Apparatus and method for levitation of an amount of conductive material
07/25/2007CN101006571A System and method of cleaning and etching a substrate
07/25/2007CN101006199A Method of forming film, film forming apparatus and storage medium
07/25/2007CN101006193A Metal product, method of manufacturing a metal product and use thereof
07/25/2007CN101005812A Metallic implantable grafts and method of making same
07/25/2007CN101005114A Integrated circuit device and fabrication using metal-doped chalcogenide materials
07/25/2007CN101005013A Pressure reduction vessel and pressure reduction processing apparatus
07/25/2007CN101004532A Micro Nano silicon based optical amplifier, and method for preparing gain medium of the amplifier
07/25/2007CN101004297A Selective absorbing composite membrane coated absorber plate core of solar energy
07/25/2007CN101004142A Cmas resistant thermal barrier coating
07/25/2007CN101003893A Method for preparing polycystalline thin film material of ferroferric oxide
07/25/2007CN101003892A Power supply system of sputter equipment, system and method of forming voltage control signal
07/25/2007CN101003891A Deposition film making system of pulse laser with added electric field
07/25/2007CN101003890A Deposition film making system of pulse laser with controllable magnetic field
07/25/2007CN101003889A Surface process technique for artificial joint, bone lamella, and bone nail coated by Nano diamond
07/25/2007CN101003888A Equipment of coating by vaporization
07/25/2007CN101003887A Manufacturing method of vacuum coating o surface of wood
07/25/2007CN101003196A Hard coating film
07/24/2007US7247817 Ceramic heater having a resistance heater element
07/24/2007US7247561 Method of removing residual contaminants from an environment
07/24/2007US7247504 Ferroelectric capacitor, process for production thereof and semiconductor device using the same
07/24/2007US7247221 System and apparatus for control of sputter deposition process
07/24/2007CA2182452C Shadow sculpted thin films
07/19/2007WO2007082031A2 Methods and apparatus for purging a substrate carrier
07/19/2007WO2007081298A1 Method for producing a carbon-containing material by carbon electron-beam vaporisation in a vacuum and a subsequent condensation thereof on a substrate and a device for carrying out said method
07/19/2007WO2007080906A1 Sputtering apparatus
07/19/2007WO2007080905A1 Sputtering method and sputtering system
07/19/2007WO2007080781A1 Nonmagnetic material particle dispersed ferromagnetic material sputtering target
07/19/2007WO2007080750A1 Process for production of titanium material for sputtering
07/19/2007WO2007080738A1 Transparent electroconductive film and process for producing transparent electroconductive film
07/19/2007WO2007079727A1 Evaporator member and method for the production thereof
07/19/2007WO2007079721A2 Wear-resistant coating
07/19/2007US20070167314 Process for production of conductive catalyst particles, process for production of catalyst electrode capable of gas diffusion, apparatus for production of conductive catalyst particles, and vibrating apparatus
07/19/2007US20070166967 Method for controlling conductivity of ga2o3 single crystal
07/19/2007US20070166945 Semiconductor thin film forming system
07/19/2007US20070166612 Method of fabricating thin film battery with annealed substrate
07/19/2007US20070166520 Glass material for use at high frequencies
07/19/2007US20070166219 Silicon monoxide vapor deposition material, and process, raw material and apparatus for producing the same
07/19/2007US20070164398 Co-sputter deposition of metal-doped chalcogenides
07/19/2007US20070163879 Method of manufacturing insulating target material
07/19/2007US20070163878 forged texture; improved cracking resistance and low rupture strength; for forming thin film with high corrosion resistance; low sulfur, low oxygen
07/19/2007US20070163873 Target material and its use in a sputter process
07/19/2007US20070163872 to form an infrared (IR) reflecting layer comprising silver oxide; argon; mechanical durability (pre-heat treatment scratch resistance; thermal stability; better adherence to adjacent contact layer comprising an oxide on NiCr alloy; windows; windshields
07/19/2007US20070163502 Substrate processing apparatus
07/19/2007US20070163120 Cooling Plate and Manufacturing Method Thereof, and Sputtering Target and Manufacturing Method Thereof
07/19/2007DE19605595B4 Verfahren zum örtlich begrenzten Aufbringen einer Schicht auf ein Substrat A method of localized deposition of a layer on a substrate
07/19/2007DE102006002371A1 Verfahren zur Beschichtung eines Hartmetall- oder Cermetsubstratkörpers und beschichteter Hartmetall- oder Cermetkörper Method for coating a carbide or carbide or cermet Cermetsubstratkörpers and coated
07/19/2007DE102006002333A1 Verfahren und Vorrichtung zum Löschen von Bogenentladungen Method and device for extinguishing arc discharges
07/19/2007DE102006002034A1 Gegenstand, der ein relativ weiches Trägermaterial und eine relativ harte dekorative Schicht aufweist, sowie Verfahren zu dessen Herstellung An article comprising a relatively soft support material and a relatively hard decorative layer as well as methods for its preparation
07/19/2007DE102006001855A1 Verdampferkörper und Verfahren zum Bereitstellen eines Verdampferkörpers Evaporator body and method of providing a vaporizer body
07/19/2007DE102005061563A1 Anlage zur Behandlung von Substraten und Verfahren Plant for the treatment of substrates and methods
07/19/2007DE102005020250B4 Sputtertarget Sputtering target
07/19/2007DE102004042650B4 Verfahren zum Abscheiden von photokatalytischen Titanoxid-Schichten A method of depositing the photocatalytic titanium oxide layers
07/19/2007CA2636608A1 Wear-resistant coating
07/18/2007EP1808881A1 Plasma display panel-use protection film and production method for the protection film, plasma display panel and production method therefor