Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
05/2007
05/09/2007CN1958846A Method for protecting magnesium alloy
05/09/2007CN1958839A Method for preparing L10 ordered alloy film
05/09/2007CN1958838A Molecular beam source for use of thin-film accumulation and a method for controlling volume of molecular beam
05/09/2007CN1958837A Technique for vacuum coating bottle closure of rubber
05/09/2007CN1958836A Container for vaporizing metal and method for manufacturing the same
05/09/2007CN1958835A Quasi cobalt carbon diaphragm
05/09/2007CN1958643A Spectacle lenses made from resin, and preparing technique
05/09/2007CN1958170A Gas supplying unit and substrate processing apparatus
05/09/2007CN1315214C Method and device for making catalyst layer of fuel cell
05/09/2007CN1315150C Apparatus for plasma pulse injection
05/09/2007CN1315003C Electronic device and its making method, spattering target
05/09/2007CN1314832C Target of high-purity nickel or nickel alloy and its producing method
05/09/2007CN1314831C Cryogenic technique for preparing cube phase, wide forbidden band MgZnO crystal thin film
05/09/2007CN1314830C Flexible low radiation window film and real time control method for producing the same
05/09/2007CN1314611C Method for production of a glazed piece provided with a multi-layer coating
05/09/2007CN1314504C Process of mfg. Mo alloyed targeting materials
05/08/2007US7214903 Melting and vaporizing apparatus and method
05/08/2007US7214554 Monitoring the deposition properties of an OLED
05/08/2007US7214418 Structure having holes and method for producing the same
05/08/2007US7214295 Depositing a non-tantalum metal film resistive layer on a thin film resistor substrate; attaching a thin film resistor termination on each end of the metal film resistive layer; and depositing an outer moisture barrier consisting of tantalum pentoxide directly overlaying and contacting the metal film
05/08/2007CA2375783C Process for manufacturing an evaporation source
05/03/2007WO2007051105A2 Cathode incorporating fixed or rotating target in combination with a moving magnet assembly and applications thereof
05/03/2007WO2007050293A1 Delivering particulate material to a vaporization zone
05/03/2007WO2007050270A2 System and method for processing an organic memory cell
05/03/2007WO2007049454A1 Sheet-like plasma generator, and film deposition method and equipment employing such sheet-like plasma generator
05/03/2007WO2007048883A1 Method of producing a part with very high mechanical properties from a rolled coated sheet
05/03/2007WO2007030202A3 Preparation of membranes using solvent-less vapor deposition followed by in-situ polymerization
05/03/2007WO2007027798A3 Boron ion implantation using alternative fluorinated boron precursors, and formation of large boron hydrides for implantation
05/03/2007WO2007017175A3 Vacuum depositing with condensation removing
05/03/2007WO2006050094A3 Metal coated with a radiation curable outdoor durable coating
05/03/2007US20070099092 electrochemistry reaction; forming silicide oxide, silicide nitride, silicide oxynitride, silicide oxycarbide, silicide nitride carbide or silicide oxide nitride carbide; resistance to chemicals, especially to alkaline chemicals; for use in microfabrication of semiconductor integrated circuits
05/03/2007US20070099032 Deposition of enhanced seed layer using tantalum alloy based sputter target
05/03/2007US20070099028 Zr, Hf, N multicomponent films; oxidation and wear resistance; durability; good lubricity at high temperatures; for cutting tools and plastic working jigs
05/03/2007US20070098978 Surface-coated sealing material
05/03/2007US20070098977 Soft magnetic materials and methods of making
05/03/2007US20070098895 Method and Apparatus for Producing Uniform, Isotropic Stresses in a Sputtered Film
05/03/2007US20070098889 Vacuum film deposition method and system, and filter manufactured by using the same
05/03/2007US20070098626 High purity zinc oxide powder and method for production thereof, and high purity zinc oxide target and thin film of high purity zinc oxide
05/03/2007US20070098590 Ni-pt alloy and target comprising the alloy
05/03/2007US20070095664 Biosensor containing ruthenium, measurement using the same and application thereof
05/03/2007US20070095661 Method of making, and, analyte sensor
05/03/2007US20070095654 Controlled multi-step magnetron sputtering process
05/03/2007US20070095653 Method for manufacturing conductive complex oxide layer, and method for manufacturing laminated body having ferroelectric layer
05/03/2007US20070095652 Dendritic fiber material
05/03/2007US20070095651 Protective offset sputtering
05/03/2007US20070095650 Protective offset sputtering
05/03/2007DE4429892B4 Taktlineal oder Taktscheibe Timing rule or timing disk
05/03/2007DE112005001299T5 Magnetron-Sputterverfahren und Magnetron-Sputtervorrichtung Magnetron sputtering and magnetron sputtering apparatus
05/03/2007DE112004002810T5 Dünnschichterzeugungsverfahren und Dünnschichterzeugungsvorrichtung Thin film forming method and thin film forming apparatus
05/03/2007DE10234859B4 Einrichtung und Verfahren zum Beschichten von Substraten Apparatus and method for coating substrates
05/03/2007DE102005045717B3 Träger für ein Substrat Support for a substrate
05/03/2007CA2626915A1 Cathode incorporating fixed or rotating target in combination with a moving magnet assembly and applications thereof
05/02/2007EP1780301A2 Sputtering target and antiferromagnetic film and magneto-resistance effect element formed by using the same
05/02/2007EP1780300A2 Carbon containing sputter target alloy compositions
05/02/2007EP1780299A1 Sputtering target for thin film formation, dielectric thin film, optical disk, and process for producing the same
05/02/2007EP1778889A1 Coating system adapted to a clean room
05/02/2007EP1778888A1 Chromium plating
05/02/2007EP1595001B1 Surface-coating method
05/02/2007EP1442153A4 Gcib processing to improve interconnection vias and improved interconnection via
05/02/2007EP1147241A4 Diffusion bonded sputter target assembly and method of making same
05/02/2007CN2895436Y Production equipment for metal plate-band surface modification
05/02/2007CN1957107A Opposing target type sputter device
05/02/2007CN1957106A Film forming apparatus and film forming method
05/02/2007CN1957105A Transport system for nanoparticles and method for the operation thereof
05/02/2007CN1957104A Method and apparatus of plasma processing
05/02/2007CN1955840A Fabrication method of photomask-blank
05/02/2007CN1955336A Barrier mechanism
05/02/2007CN1955335A Preparation method and equipment of color carbon-base film
05/02/2007CN1955334A Substrate fixing clamp of magnetic sputtering instrument
05/02/2007CN1955333A Diamond film manufacturing method
05/02/2007CN1955332A Evaporator device with container for containing being evaporated material
05/02/2007CN1955331A Device for gas phase sedimentation on substrate
05/02/2007CN1314075C Shielding system for plasma chamber
05/02/2007CN1313673C Regression reflective fabric and its production method
05/02/2007CN1313637C Dynamic film thickness monitoring and controlling system and method
05/02/2007CN1313636C Process for compound ion coating film on final stage blade surface of steam turbine
05/02/2007CN1313198C Method for carrying out homogeneous and heterogeneous chemical reactions using plasma
05/01/2007US7212223 selectively applying focused energy to thermally conductive pads on the object to create a label; conductive pads are disposed adjacent to a thermochromic layer; inexpensive way to label an optical disk such as CD-R or DVD-R
05/01/2007US7211708 Exhaust processing method, plasma processing method and plasma processing apparatus
05/01/2007US7211462 Process for large-scale production of CdTe/CdS thin film solar cells
05/01/2007US7211461 Manufacturing apparatus
05/01/2007US7211338 Hard, ductile coating system
05/01/2007US7211326 Heat treating a carbonaceous material in a reaction mix of boron oxide or its precursors and ammonia-generating phases such as melamine in a nitrogen atmosphere to temperatures of 1600 to 2000 degrees C; oxidation resistant surface
05/01/2007US7211323 Wear properties under boundary lubricated sliding conditions
05/01/2007US7211300 Passing a donor compound suspended in a carrier gas, the donor compound including the one or more elements for deposition over substrate so as to form a film of the donor compound on the substrate; irradiating with optical radiation
05/01/2007US7211179 Dual anode AC supply for continuous deposition of a cathode material
05/01/2007US7211178 Fixture for electro-chemical machining
05/01/2007US7211138 Hard film, method of forming the same and target for hard film formation
05/01/2007CA2228402C A process for manufacturing ito alloy articles
04/2007
04/26/2007WO2007047511A2 Methods of making molybdenum titanium sputtering plates and targets
04/26/2007WO2007046623A1 Apparatus for continuous metal deposition for mass production
04/26/2007WO2007046281A1 Film forming material supplying apparatus
04/26/2007WO2007046244A1 Sputtering apparatus
04/26/2007WO2007046243A1 Sputtering apparatus and film forming method
04/26/2007WO2007046181A1 Semiconductor thin film and process for producing the same
04/26/2007WO2007045387A1 Sputtering target made of multi-component alloys and production method
04/26/2007WO2007045215A1 Method and apparatus for evaporating material for coatings
04/26/2007WO2007025641A3 Coating for parts made of titanium or the alloy thereof for preventing cold welding
04/26/2007WO2007003572A3 Method for deposition of a material in a hole in an electrically conducting workpiece
04/26/2007WO2006133779A3 Evaporator boat for a device for coating substrates