Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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05/09/2007 | CN1958846A Method for protecting magnesium alloy |
05/09/2007 | CN1958839A Method for preparing L10 ordered alloy film |
05/09/2007 | CN1958838A Molecular beam source for use of thin-film accumulation and a method for controlling volume of molecular beam |
05/09/2007 | CN1958837A Technique for vacuum coating bottle closure of rubber |
05/09/2007 | CN1958836A Container for vaporizing metal and method for manufacturing the same |
05/09/2007 | CN1958835A Quasi cobalt carbon diaphragm |
05/09/2007 | CN1958643A Spectacle lenses made from resin, and preparing technique |
05/09/2007 | CN1958170A Gas supplying unit and substrate processing apparatus |
05/09/2007 | CN1315214C Method and device for making catalyst layer of fuel cell |
05/09/2007 | CN1315150C Apparatus for plasma pulse injection |
05/09/2007 | CN1315003C Electronic device and its making method, spattering target |
05/09/2007 | CN1314832C Target of high-purity nickel or nickel alloy and its producing method |
05/09/2007 | CN1314831C Cryogenic technique for preparing cube phase, wide forbidden band MgZnO crystal thin film |
05/09/2007 | CN1314830C Flexible low radiation window film and real time control method for producing the same |
05/09/2007 | CN1314611C Method for production of a glazed piece provided with a multi-layer coating |
05/09/2007 | CN1314504C Process of mfg. Mo alloyed targeting materials |
05/08/2007 | US7214903 Melting and vaporizing apparatus and method |
05/08/2007 | US7214554 Monitoring the deposition properties of an OLED |
05/08/2007 | US7214418 Structure having holes and method for producing the same |
05/08/2007 | US7214295 Depositing a non-tantalum metal film resistive layer on a thin film resistor substrate; attaching a thin film resistor termination on each end of the metal film resistive layer; and depositing an outer moisture barrier consisting of tantalum pentoxide directly overlaying and contacting the metal film |
05/08/2007 | CA2375783C Process for manufacturing an evaporation source |
05/03/2007 | WO2007051105A2 Cathode incorporating fixed or rotating target in combination with a moving magnet assembly and applications thereof |
05/03/2007 | WO2007050293A1 Delivering particulate material to a vaporization zone |
05/03/2007 | WO2007050270A2 System and method for processing an organic memory cell |
05/03/2007 | WO2007049454A1 Sheet-like plasma generator, and film deposition method and equipment employing such sheet-like plasma generator |
05/03/2007 | WO2007048883A1 Method of producing a part with very high mechanical properties from a rolled coated sheet |
05/03/2007 | WO2007030202A3 Preparation of membranes using solvent-less vapor deposition followed by in-situ polymerization |
05/03/2007 | WO2007027798A3 Boron ion implantation using alternative fluorinated boron precursors, and formation of large boron hydrides for implantation |
05/03/2007 | WO2007017175A3 Vacuum depositing with condensation removing |
05/03/2007 | WO2006050094A3 Metal coated with a radiation curable outdoor durable coating |
05/03/2007 | US20070099092 electrochemistry reaction; forming silicide oxide, silicide nitride, silicide oxynitride, silicide oxycarbide, silicide nitride carbide or silicide oxide nitride carbide; resistance to chemicals, especially to alkaline chemicals; for use in microfabrication of semiconductor integrated circuits |
05/03/2007 | US20070099032 Deposition of enhanced seed layer using tantalum alloy based sputter target |
05/03/2007 | US20070099028 Zr, Hf, N multicomponent films; oxidation and wear resistance; durability; good lubricity at high temperatures; for cutting tools and plastic working jigs |
05/03/2007 | US20070098978 Surface-coated sealing material |
05/03/2007 | US20070098977 Soft magnetic materials and methods of making |
05/03/2007 | US20070098895 Method and Apparatus for Producing Uniform, Isotropic Stresses in a Sputtered Film |
05/03/2007 | US20070098889 Vacuum film deposition method and system, and filter manufactured by using the same |
05/03/2007 | US20070098626 High purity zinc oxide powder and method for production thereof, and high purity zinc oxide target and thin film of high purity zinc oxide |
05/03/2007 | US20070098590 Ni-pt alloy and target comprising the alloy |
05/03/2007 | US20070095664 Biosensor containing ruthenium, measurement using the same and application thereof |
05/03/2007 | US20070095661 Method of making, and, analyte sensor |
05/03/2007 | US20070095654 Controlled multi-step magnetron sputtering process |
05/03/2007 | US20070095653 Method for manufacturing conductive complex oxide layer, and method for manufacturing laminated body having ferroelectric layer |
05/03/2007 | US20070095652 Dendritic fiber material |
05/03/2007 | US20070095651 Protective offset sputtering |
05/03/2007 | US20070095650 Protective offset sputtering |
05/03/2007 | DE4429892B4 Taktlineal oder Taktscheibe Timing rule or timing disk |
05/03/2007 | DE112005001299T5 Magnetron-Sputterverfahren und Magnetron-Sputtervorrichtung Magnetron sputtering and magnetron sputtering apparatus |
05/03/2007 | DE112004002810T5 Dünnschichterzeugungsverfahren und Dünnschichterzeugungsvorrichtung Thin film forming method and thin film forming apparatus |
05/03/2007 | DE10234859B4 Einrichtung und Verfahren zum Beschichten von Substraten Apparatus and method for coating substrates |
05/03/2007 | DE102005045717B3 Träger für ein Substrat Support for a substrate |
05/03/2007 | CA2626915A1 Cathode incorporating fixed or rotating target in combination with a moving magnet assembly and applications thereof |
05/02/2007 | EP1780301A2 Sputtering target and antiferromagnetic film and magneto-resistance effect element formed by using the same |
05/02/2007 | EP1780300A2 Carbon containing sputter target alloy compositions |
05/02/2007 | EP1780299A1 Sputtering target for thin film formation, dielectric thin film, optical disk, and process for producing the same |
05/02/2007 | EP1778889A1 Coating system adapted to a clean room |
05/02/2007 | EP1778888A1 Chromium plating |
05/02/2007 | EP1595001B1 Surface-coating method |
05/02/2007 | EP1442153A4 Gcib processing to improve interconnection vias and improved interconnection via |
05/02/2007 | EP1147241A4 Diffusion bonded sputter target assembly and method of making same |
05/02/2007 | CN2895436Y Production equipment for metal plate-band surface modification |
05/02/2007 | CN1957107A Opposing target type sputter device |
05/02/2007 | CN1957106A Film forming apparatus and film forming method |
05/02/2007 | CN1957105A Transport system for nanoparticles and method for the operation thereof |
05/02/2007 | CN1957104A Method and apparatus of plasma processing |
05/02/2007 | CN1955840A Fabrication method of photomask-blank |
05/02/2007 | CN1955336A Barrier mechanism |
05/02/2007 | CN1955335A Preparation method and equipment of color carbon-base film |
05/02/2007 | CN1955334A Substrate fixing clamp of magnetic sputtering instrument |
05/02/2007 | CN1955333A Diamond film manufacturing method |
05/02/2007 | CN1955332A Evaporator device with container for containing being evaporated material |
05/02/2007 | CN1955331A Device for gas phase sedimentation on substrate |
05/02/2007 | CN1314075C Shielding system for plasma chamber |
05/02/2007 | CN1313673C Regression reflective fabric and its production method |
05/02/2007 | CN1313637C Dynamic film thickness monitoring and controlling system and method |
05/02/2007 | CN1313636C Process for compound ion coating film on final stage blade surface of steam turbine |
05/02/2007 | CN1313198C Method for carrying out homogeneous and heterogeneous chemical reactions using plasma |
05/01/2007 | US7212223 selectively applying focused energy to thermally conductive pads on the object to create a label; conductive pads are disposed adjacent to a thermochromic layer; inexpensive way to label an optical disk such as CD-R or DVD-R |
05/01/2007 | US7211708 Exhaust processing method, plasma processing method and plasma processing apparatus |
05/01/2007 | US7211462 Process for large-scale production of CdTe/CdS thin film solar cells |
05/01/2007 | US7211461 Manufacturing apparatus |
05/01/2007 | US7211338 Hard, ductile coating system |
05/01/2007 | US7211326 Heat treating a carbonaceous material in a reaction mix of boron oxide or its precursors and ammonia-generating phases such as melamine in a nitrogen atmosphere to temperatures of 1600 to 2000 degrees C; oxidation resistant surface |
05/01/2007 | US7211323 Wear properties under boundary lubricated sliding conditions |
05/01/2007 | US7211300 Passing a donor compound suspended in a carrier gas, the donor compound including the one or more elements for deposition over substrate so as to form a film of the donor compound on the substrate; irradiating with optical radiation |
05/01/2007 | US7211179 Dual anode AC supply for continuous deposition of a cathode material |
05/01/2007 | US7211178 Fixture for electro-chemical machining |
05/01/2007 | US7211138 Hard film, method of forming the same and target for hard film formation |
05/01/2007 | CA2228402C A process for manufacturing ito alloy articles |
04/26/2007 | WO2007047511A2 Methods of making molybdenum titanium sputtering plates and targets |
04/26/2007 | WO2007046623A1 Apparatus for continuous metal deposition for mass production |
04/26/2007 | WO2007046281A1 Film forming material supplying apparatus |
04/26/2007 | WO2007046244A1 Sputtering apparatus |
04/26/2007 | WO2007046243A1 Sputtering apparatus and film forming method |
04/26/2007 | WO2007046181A1 Semiconductor thin film and process for producing the same |
04/26/2007 | WO2007045387A1 Sputtering target made of multi-component alloys and production method |
04/26/2007 | WO2007045215A1 Method and apparatus for evaporating material for coatings |
04/26/2007 | WO2007025641A3 Coating for parts made of titanium or the alloy thereof for preventing cold welding |
04/26/2007 | WO2007003572A3 Method for deposition of a material in a hole in an electrically conducting workpiece |
04/26/2007 | WO2006133779A3 Evaporator boat for a device for coating substrates |