Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
05/2007
05/24/2007WO2007058318A1 Fired material and process for producing the same
05/24/2007WO2007058224A1 Process for producing carbon foil, carbon foil, stripper foil for charge conversion making use of the carbon foil, and carbon foil producing apparatus
05/24/2007WO2007057925A1 Device and method for controlling the power supplied to vacuum vaporization sources of metals and other
05/24/2007WO2007057478A1 Part having an outer polymer surface with a metallic finish, production method thereof and use of same
05/24/2007WO2007018757A3 Glazing system for vehicle tops and windows
05/24/2007WO2005067423A3 Disposition source using pellets for making oleds
05/24/2007US20070117237 Amorphous transparent conductive film, sputtering target as its raw material, amorphous transparent electrode substrate, process for producing the same and color filter for liquid crystal display
05/24/2007US20070116974 physical vapor deposition; magnetron cathode sputtering
05/24/2007US20070116893 Low-hydrogen photovoltaic cell
05/24/2007US20070116892 treating a photovoltaic precursor with a vaporous element, for example, selenium or sulfur, to produce thin film CIGS or CIGSS solar cells
05/24/2007US20070116860 High throughput continuous pulsed laser deposition process and apparatus
05/24/2007US20070116859 Method of manufacturing oxide superconductive wire
05/24/2007US20070115486 Film forming device, and production method for optical member
05/24/2007US20070114129 Sputtering target and manufacturing method therefor, and optical recording medium and manufacturing method therefor
05/24/2007US20070114124 Charge-free low-temperature method of forming thin film-based nanoscale materials and structures on a substrate
05/24/2007US20070114123 Deposition on charge sensitive materials with ion beam deposition
05/24/2007US20070114122 Sputtering method and sputtering device
05/24/2007US20070113784 Vacuum metallization device with means to create metal-free areas
05/24/2007US20070113395 Reference feature design for flare location monitor in perpendicular write pole process
05/24/2007DE202006019921U1 Metallisierte Kunststoff-Formteile Metallized molded plastic parts
05/24/2007DE102006051443A1 Prozessausrüstung und Zielobjekt für eine Substratverarbeitungskammer Process equipment and target for a substrate processing chamber
05/24/2007DE102005055035A1 Glass article coated with a hard material a glass or glass/ceramic substrate surface layer of hard material for coating domestic glass or glass/ceramic articles, surface layer contains metal of Ti, Cr group of a mixture of these metals
05/24/2007DE102005054704A1 Thrombozytenabweisende Schicht, Verfahren zu ihrer Herstellung und medizinisches Instrument oder Implantat Platelet-repellent layer, methods for their preparation and medical instrument or implant
05/24/2007DE102005054703A1 Thrombozytenanreichernde Schicht, Verfahren zu ihrer Herstellung, Trennmedium für Thrombozyten und Test-Kit Thrombozytenanreichernde layer, processes for their preparation, separation medium for platelets and test kit
05/23/2007EP1788114A2 Method for forming amorphous carbon film
05/23/2007EP1788113A1 Evaporator with a container for receiving the evaporation material
05/23/2007EP1788112A1 Vapour deposition apparatus
05/23/2007EP1788111A2 Resin product, production method for the same, and deposition method for a metallic coating
05/23/2007EP1788110A1 Tarnish-resistant silver coating, process for depositing and use
05/23/2007EP1787965A2 Heat treatable low-e coated articles and methods of making same
05/23/2007EP1787796A1 Gas barrier multilayer film and method for producing same
05/23/2007EP1787311A1 Cylindrical target obtained by hot isostatic pressing
05/23/2007EP1786954A1 Pvd coated ruthenium featured cutting tools
05/23/2007EP1786948A1 Coating system adapted to a clean room
05/23/2007EP1786947A2 Coater having interrupted conveyor system
05/23/2007EP1786946A2 Mixtures for evaporation of lithium and lithium dispensers
05/23/2007EP1786945A2 Method for producing a radiation-absorbing optical element and corresponding radiation-absorbing optical element
05/23/2007EP1786739A1 Coated article having low-e coating with ion beam treated ir relfecting layer and corresponding method
05/23/2007EP1200980B8 Adaptive gas cluster ion beam for smoothing surfaces
05/23/2007CN2904388Y Improvement of electric connector
05/23/2007CN2904370Y 电连接器 The electrical connector
05/23/2007CN2904369Y 连接器 Connector
05/23/2007CN2904341Y Electric connector assembly
05/23/2007CN2903094Y Furnace body of substituted electroplating equipment by bidirectional ion plating magnetic controlling sputtering
05/23/2007CN1969412A Substrate containing metal oxide and method for production thereof
05/23/2007CN1969057A Reel to reel vacuum sputtering apparatus
05/23/2007CN1969056A Continuous thermal vacuum deposition device and method
05/23/2007CN1969055A Vaporizing temperature sensitive materials
05/23/2007CN1968905A Photocatalytic substrate active under a visible light
05/23/2007CN1966759A Vacuum coating method and system
05/23/2007CN1966758A Process for preparing vanadium oxide film
05/23/2007CN1966757A Method of operating vacuum deposition apparatus and vacuum deposition apparatus
05/23/2007CN1966756A Coating clamp
05/23/2007CN1966264A Surface coated cutting tool made of cermet
05/23/2007CN1966260A Tarnish-resistant silver coating, process for depositing and use
05/23/2007CN1317773C Laminated photoelectric element and its manufacturing method
05/23/2007CN1317421C Coatings with low permeation of gases and vapors
05/23/2007CN1317420C Silicon monoxide vapor deposition material, process for producing the same, raw material for producing the same, and production apparatus
05/23/2007CN1317419C Process for preparing TiNiPd shape memory alloy free film
05/22/2007US7221038 Method of fabricating substrates and substrates obtained by this method
05/22/2007US7220609 Method of manufacturing a semiconductor structure comprising clusters and/or nanocrystal of silicon and a semiconductor structure of this kind
05/22/2007US7220517 Electroconductive metal oxides formed by sputtering, electrodeposition, ionization or chemical vapor deposition, used as anolytes or catholytes in batteries, having high density charging and discharge; power sources
05/22/2007US7220460 Thin film forming method, optical film, polarizing film and image display method
05/22/2007US7220458 selecting an article, creating undercut grooves on the article, and then applying a coating on the article; stress relief and mechanical locking of a thick thermal sprayed coating
05/22/2007US7220450 Process for coating substrates using vapour deposition
05/22/2007US7220448 Providing a used glass molding die, removing the passivation film and partially removing the third noble metal layer using oxygen plasma;grinding and polishing, cleaning, forming noble metal layer, forming a second passivation film
05/22/2007US7220320 Systems for producing semiconductors and members therefor
05/22/2007US7220315 Method of producing polycrystalline thin film and method of producing an oxide superconducting element
05/22/2007CA2331564C Magnetron sputter source for mbe apparatus
05/18/2007WO2007055744A2 Methods for growing and harvesting carbon nanotubes
05/18/2007WO2007055401A1 Method for depositing reflective multilayer film of reflective mask blank for euv lithography and method for producing reflective mask blank for euv lithography
05/18/2007WO2007055304A1 Method for manufacturing plasma display panel
05/18/2007WO2007055231A1 SnO2 SPUTTERING TARGET AND PROCESS FOR PRODUCING SAME
05/18/2007WO2007054439A1 Method for preheating a part, and coating method
05/18/2007WO2007054369A2 Sputtering target and method of its fabrication
05/18/2007WO2007054256A1 Coated sanitaryware item
05/18/2007WO2007054229A1 Carrier with porous vacuum coating
05/18/2007WO2007054048A1 Method and device for coating and/or treating surfaces
05/18/2007WO2007031317A3 Method for applying a porous glass layer
05/18/2007WO2007006850A3 Radiation arrangement
05/18/2007WO2005095666A3 Magnetically enhanced capacitive plasma source for ionized physical vapour deposition-ipvd
05/17/2007US20070111894 Target for sputtering
05/17/2007US20070111549 Laser irradiation apparatus
05/17/2007US20070111335 Ferroelectric memory device
05/17/2007US20070111032 Surface-coated article, production method therefor, machine tool, and machine tool apparatus
05/17/2007US20070110968 Silver alloy, sputtering target material thereof, and thin film thereof
05/17/2007US20070110899 Evaporating cesium, rubinium, tungsten or gallium through a shadow mask onto a surface to define an area of coverage, then depositing a covering material greater than the area of the reactive material, to enclose the reactive material coated on the substrate
05/17/2007US20070108973 Systems & methods for flaw detection and monitoring at elevated temperatures with wireless communication using surface embedded, monolithically integrated, thin-film, magnetically actuated sensors, and methods for fabricating the sensors
05/17/2007US20070108046 Sputtering target and method for finishing surface of such target
05/17/2007US20070108043 Sputtering target including titanium silicon oxide and method of making coated article using the same
05/17/2007US20070108042 Method for shaping a magnetic field in a magnetic field-enhanced plasma reactor
05/17/2007US20070108041 Magnetron source having increased usage life
05/17/2007US20070107781 Lock valve in particular for a strip processing unit
05/17/2007US20070107657 Device for spin-coating substrates
05/17/2007US20070107656 Substrate treatment apparatus and substrate treatment method
05/17/2007US20070107185 Sputtering target assembly having low conductivity backing plate and method of making same
05/16/2007EP1785505A1 Barrier film for flexible copper substrate and sputtering target for forming barrier film
05/16/2007EP1785504A2 Surface-coated article, production method therefor, machine tool, and machine tool apparatus
05/16/2007EP1785449A2 Aliphatic polyester film and gas barrier film
05/16/2007EP1785230A2 Apparatus and method for slurry cleaning of etch chambers