| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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| 01/24/2007 | CN1296517C Preparation for amorphous carbon thin-film hydrophobic material with rear surface fluorating process |
| 01/24/2007 | CN1296515C Self glow plasma based ion infusion or infusion and deposition device |
| 01/24/2007 | CN1296514C Magnetron sputtering target capable of improving the availability of target materials |
| 01/24/2007 | CN1296513C Tube target |
| 01/24/2007 | CN1296304C Titanium nitride based low radiation self-cleaned coated glass, and preparation |
| 01/24/2007 | CN1296210C Piezoelectric element and fluid discharge recording head structure and manufacture thereof |
| 01/23/2007 | US7166921 Consists of, by atom %, 0.2 to 1.5% of Ge, 0.2 to 2.5% of Ni and the balance essentially of Al, and the total amount of Ge and Ni is not more than 3.0%; has lower electrical resistance and high reliability, and is applicable to high definition TVs having a big size and various FPDs |
| 01/23/2007 | US7166480 Particle control device and particle control method for vacuum processing apparatus |
| 01/23/2007 | US7166470 Dissolving two or more reagents in solvent, mixing together in different ratios, dispensing on subtrate, heating for calcining |
| 01/23/2007 | US7166373 Ceramic compositions for thermal barrier coatings with improved mechanical properties |
| 01/23/2007 | US7166372 creep resistance and high strength overcoatings comprising alloys of chromium, aluminum, yttrium and nickel, cobalt, iron or hafnium having discrete nitride particles, used on substrates such as blades and vanes for gas turbine engines |
| 01/23/2007 | US7166353 Gas-barrier material |
| 01/23/2007 | US7166324 Metal surface being treated is subjected in the chamber in which there is a through flow of the surfacing material to an exhaust connection, and in which the surfacing material comprises compounds arising in dry distillation of deciduous-wood |
| 01/23/2007 | US7166200 Method and apparatus for an improved upper electrode plate in a plasma processing system |
| 01/23/2007 | US7166199 Magnetron sputtering systems including anodic gas distribution systems |
| 01/23/2007 | US7166169 Vaporization source with baffle |
| 01/23/2007 | US7166168 Substrate-coating system and an associated substrate-heating method |
| 01/23/2007 | US7166155 Hard film and hard film-coated tool |
| 01/23/2007 | US7166006 Method of manufacturing-OLED devices by deposition on curved substrates |
| 01/23/2007 | US7165890 Metal-to-metal spherical bearing |
| 01/18/2007 | WO2007008972A1 Fixture for use in a coating operation |
| 01/18/2007 | WO2007008606A1 Method and system for deposition tuning in an epitaxial film growth apparatus |
| 01/18/2007 | WO2007008468A1 Chalcogenide pvd targets with a composition adjusted by solid phase bond of particles with congruently melting compound |
| 01/18/2007 | WO2007008088A1 Nanoscale and microscale lithography methods and resultant devices |
| 01/18/2007 | WO2007007782A1 Multilayer structure and method for cleaning same |
| 01/18/2007 | WO2007007704A1 Sputtering target for the formation of phase-change films and process for the production of the target |
| 01/18/2007 | WO2007007498A1 High-purity hafnium, target and thin film comprising high-purity hafnium, and process for producing high-purity hafnium |
| 01/18/2007 | WO2007006850A2 Radiation arrangement |
| 01/18/2007 | WO2006111766A3 Methods and apparatus for the manufacture of microstructures |
| 01/18/2007 | WO2006097804A3 System and process for high-density,low-energy plasma enhanced vapor phase epitaxy |
| 01/18/2007 | WO2006048568A3 Use of a titanium-copper-nickel-based alloy |
| 01/18/2007 | US20070015065 Euv exposure mask blanks and their fabrication process, and euv exposure mask |
| 01/18/2007 | US20070015010 Magnetic disk, manufacturing method therefor and magnetic recording device |
| 01/18/2007 | US20070014996 compliant layer having an elastic modulus of between 30 and 130 GPa is provided between the silicon based substrate and a silicon metal containing oxygen gettering layer; does not adversely affect the mechanical behavior of the substrate such as reduction in the flexure or tensile strength |
| 01/18/2007 | US20070013284 Plasma accelerating apparatus and plasma processing system having the same |
| 01/18/2007 | US20070012923 Electronic circuit |
| 01/18/2007 | US20070012658 Pvd component and coil refurbishing methods |
| 01/18/2007 | US20070012563 Multi chamber plasma process system |
| 01/18/2007 | US20070012562 Method and apparatus for sputtering onto large flat panels |
| 01/18/2007 | US20070012561 Wafer clamp assembly for holding a wafer during a deposition process |
| 01/18/2007 | US20070012559 Method of improving magnetron sputtering of large-area substrates using a removable anode |
| 01/18/2007 | US20070012558 Magnetron sputtering system for large-area substrates |
| 01/18/2007 | US20070012557 Low voltage sputtering for large area substrates |
| 01/18/2007 | DE10205167C5 In-Line-Vakuumbeschichtungsanlage zur Zwischenbehandlung von Substraten In-line vacuum coating system for temporary treatment of substrates |
| 01/18/2007 | DE102006031783A1 Method for deposition of coatings onto smooth metal substrate in substrate holder from gas phase (PVD process) useful in production of bearings, e.g. antifriction bearings under reduced pressure |
| 01/18/2007 | DE102005033769A1 Verfahren und Vorrichtung zur Mehrkathoden-PVD-Beschichtung und Substrat mit PVD-Beschichtung Method and apparatus for multi-cathode PVD coating and substrate with PVD Coating |
| 01/18/2007 | DE102005033515A1 Use of plasma-activated electron beam vaporization with diffuse cathodic vacuum arc for coating substrates, controls operational parameters affecting layer thickness and its distribution |
| 01/18/2007 | DE102005031989A1 Verbundrohr für die Hausinstallation Composite pipe for domestic installations |
| 01/17/2007 | EP1744347A1 Enhanced magnetron sputtering target |
| 01/17/2007 | EP1743956A2 Method of manufacturing a corrosion protected steel sheet |
| 01/17/2007 | EP1743949A1 Production of high-purity zirconium or hafnium metal and powder for target and film applications |
| 01/17/2007 | EP1743050A2 Thermal vacuum deposition method and device |
| 01/17/2007 | EP1743049A2 Continuous thermal vacuum deposition device and method |
| 01/17/2007 | EP1743048A2 Vacuum deposition method |
| 01/17/2007 | EP1743047A1 Support plate for sputter targets |
| 01/17/2007 | EP1743046A2 Vaporizing device and method for vaporizing coating material |
| 01/17/2007 | EP1266043B1 Cemented carbide tool and method of making |
| 01/17/2007 | EP1235945A4 Rotating magnet array and sputter source |
| 01/17/2007 | CN2859087Y Gearing device used in vacuum coating field |
| 01/17/2007 | CN1898408A A stainless steel strip coated with a decorative layer |
| 01/17/2007 | CN1898407A Method and apparatus for manufacturing a functional layer consisting of at least two components |
| 01/17/2007 | CN1898406A Tool with abrasive coating and its production method |
| 01/17/2007 | CN1896464A Process for treating the tip of a turbine blade and turbine blade treated by such a process |
| 01/17/2007 | CN1896305A Production of multifunctional gas-phase depositer and solid oxide fuel single cell |
| 01/17/2007 | CN1896302A System and method for controlling ion density and energy using modulated power signals |
| 01/17/2007 | CN1896301A Sputtering source, device comprising the sputtering source and method of producing flat panels |
| 01/17/2007 | CN1896300A Low voltage sputtering for large area substrates |
| 01/17/2007 | CN1896299A Improved magnetron sputtering system for large-area substrates possessing a removable anode |
| 01/17/2007 | CN1896298A Improved magnetron sputtering system for large-area substrates |
| 01/17/2007 | CN1896297A Enhanced magnetron sputtering target |
| 01/17/2007 | CN1896296A System and method for modulating power signals to control sputtering |
| 01/17/2007 | CN1896295A LCP substrate sputtering coating treatment against EMI coating |
| 01/17/2007 | CN1896294A Pretreatment of physical coating on PC/ABS plastic substrate |
| 01/17/2007 | CN1896293A Treatment of high-resistance metal semi-mirrow coloring mass on transparent plastic surface |
| 01/17/2007 | CN1896292A Treatment for plastic surface with color lustre and metal mass |
| 01/17/2007 | CN1896291A Metal semi-lens color and mass treatment for transparent rubber surface |
| 01/17/2007 | CN1295376C Process for treating milling cutter used for printed circuit board by ion implantation technology |
| 01/17/2007 | CN1295375C Sputtering target for forming phase change type optical disk protective film and optical recording medium with phase change type optical disk protective film formed thereon by using target |
| 01/17/2007 | CN1295374C Mask for vacuum vapour plating |
| 01/16/2007 | US7164459 Method for fabricating a liquid crystal display device having inorganic alignment film made of crystalline conductive film |
| 01/16/2007 | US7164191 Low relative permittivity SiOx film including a porous material for use with a semiconductor device |
| 01/16/2007 | US7164104 In-line heater for use in semiconductor wet chemical processing and method of manufacturing the same |
| 01/16/2007 | US7163901 Methods for forming thin film layers by simultaneous doping and sintering |
| 01/16/2007 | US7163608 Apparatus for synthesis of layers, coatings or films |
| 01/16/2007 | US7163607 Process kit for improved power coupling through a workpiece in a semiconductor wafer processing system |
| 01/16/2007 | CA2426155C Method of making coated articles and coated articles made thereby |
| 01/16/2007 | CA2161362C Vessel of plastic having a barrier coating and a method of producing the vessel |
| 01/11/2007 | WO2007005525A1 Coated article with transparent conductive oxide film doped to adjust fermi level, and method of making same |
| 01/11/2007 | WO2007005333A2 Process for applying a metallic coating, an intermediate coated product, and a finish coated product |
| 01/11/2007 | WO2007005008A1 Porous structure treatment system |
| 01/11/2007 | WO2007004473A1 Process for producing izo sputtering target |
| 01/11/2007 | WO2007004344A1 OPTICAL DISK, AND SPUTTERING TARGET FOR Cu ALLOY RECORDING LAYER |
| 01/11/2007 | WO2007003167A1 Initial wetting auxiliary material for a vaporiser body |
| 01/11/2007 | WO2006117145A3 Coating process for manufacture or reprocessing of sputter targets and x-ray anodes |
| 01/11/2007 | WO2005116291A3 Apparatus for directing plasma flow to coat internal passageways |
| 01/11/2007 | US20070010095 Surface treatment method using ion beam and surface treating device |
| 01/11/2007 | US20070009810 Halftone masking, phase shifter film is formed by using a reactive long throw sputtering |
| 01/11/2007 | US20070009802 Thin film buried anode battery |
| 01/11/2007 | US20070009672 Nanocomposite solution with complex-function and method for preparation thereof |
| 01/11/2007 | US20070009670 Sputter method or device for the production of natural voltage optimized coatings |