Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
08/2007
08/09/2007DE102006005765A1 Verbesserung der Reinigung von Lackapplikationsgeräten Improving the cleaning of paint application equipment
08/09/2007DE102006005401A1 Shaft milling tool, is formed by producing a blank from a hard metal, and applying a hard material layer
08/09/2007DE102006005120A1 Farbduktorwalze einer Rollendruckmaschine Ink fountain roller a web press
08/09/2007DE102006003847A1 Verfahren und Vorrichtung zum Herstellen eines polykristallinen Keramikfilms auf einem Substrat, Kondensatorstruktur mit dem Keramikfilm und Verwendung der Kondensatorstruktur Method and apparatus for producing a polycrystalline ceramic film on a substrate, the capacitor structure with the ceramic film, and use of the capacitor structure
08/08/2007EP1816489A2 Optical article and manufacturing method of the same
08/08/2007EP1816233A2 Method for manufacturing a layer with a predefined layer thickness profile
08/08/2007EP1816232A1 Method and device for all-round coating of objects
08/08/2007EP1816231A1 Fluorocarbon film and process for producing the same
08/08/2007EP1815040A1 Method for deposition of a layer on a razor blade edge and razor blade
08/08/2007EP1815039A2 Use of a titanium-copper-nickel-based alloy
08/08/2007EP1814724A2 Flame retardant metallized polyester films having anti-dripping properties
08/08/2007EP1461286B1 Differential stress reduction in thin films
08/08/2007EP1300692B1 Radiation detector and method of manufacture thereof
08/08/2007CN2931494Y Electron beam deflection device controlled by computer
08/08/2007CN2931493Y Building block type multipurpose vacuum coating machine
08/08/2007CN1331376C Conductive sheet, product using the same, and manufacturing method thereof
08/08/2007CN1331138C Semi-reflective film or reflective film, optical information recording medium, and sputtering target
08/08/2007CN1330790C Surface modified stainless steel
08/08/2007CN1330560C Method for the manufacture of a metal oxide or nitride powder or a semiconductor oxide or nitride powder, an oxide or nitride powder made thereby, and solids and uses thereof
08/08/2007CN101015234A Organic electroluminescent device and fabricating method thereof
08/08/2007CN101015041A Etch and deposition control for plasma implantation
08/08/2007CN101015002A Magnetic recording media and production method therefor
08/08/2007CN101014729A Systems and method for fabricating substrate surfaces for sers and apparatuses utilizing same
08/08/2007CN101014534A SiO deposition material, Si powder for SiO raw material, and method for producing SiO
08/08/2007CN101014435A Surface-coated cutware and process for producing the same
08/08/2007CN101013746A Patterning method and apparatus, film forming method and apparatus, electrooptics apparatus, and manufacturing method thereof
08/08/2007CN101013274A Mask film formation method and mask film formation apparatus
08/08/2007CN101013166A Optical article and manufacturing method of the same
08/08/2007CN101012546A Physical vapour deposition equipment and technology
08/08/2007CN101012545A Horniness protective film and forming method thereof
08/08/2007CN101012544A Thin film of nichrome-chromium-aluminium-yttrium-nitrogen-oxygen material
08/08/2007CN101012543A Method for forming a protective coating with enhanced adhesion between layers
08/08/2007CN101011875A Composite coat capable of replacing piston ring surface electroplating hard chrome and processing method thereof
08/08/2007CN101011653A Method for treating waste gas by using metal thin film adsorption and desorption
08/07/2007USRE39756 Vacuum processing operating method with wafers, substrates and/or semiconductors
08/07/2007US7253533 Divided shadow mask for fabricating organic light emitting diode displays
08/07/2007US7253421 Radiation image conversion panel and manufacturing method thereof
08/07/2007US7253120 Selectable area laser assisted processing of substrates
08/07/2007US7253109 Method of depositing a tantalum nitride/tantalum diffusion barrier layer system
08/07/2007US7252794 Electroconductive oxide sintered compact, sputtering target comprising the sintered compact and methods for producing them
08/07/2007US7252751 Methods for electrically forming materials
08/07/2007US7252745 Filtered cathodic arc deposition method and apparatus
08/07/2007US7252716 Gas injection apparatus for semiconductor processing system
08/07/2007US7252684 Ceramic in replacement components
08/07/2007US7251958 Method for transporting glazing through a coating-depositing plant
08/07/2007CA2327741C Means for controlling target erosion and sputtering in a magnetron
08/02/2007WO2007087213A2 Methods of implanting ions and ion sources used for same
08/02/2007WO2007087212A1 Methods of implanting ions and ion sources used for same
08/02/2007WO2007086977A1 Radiopaque coatings for polymer substrates
08/02/2007WO2007086560A1 Molecular beam cell having purge function
08/02/2007WO2007086280A1 Laminated structure, and electrode for electric circuit using the same
08/02/2007WO2007086276A1 Spattering device and film forming method
08/02/2007WO2007085549A2 Method and device for the production of a polycrystalline ceramic film on a substrate capacitive structure comprising said ceramic film and use of said capacitive structure
08/02/2007WO2007085328A2 Nanocomposite materials in a layer of a sliding bearing
08/02/2007WO2007054229B1 Carrier with porous vacuum coating
08/02/2007WO2007037773A3 Thermal barrier coating with stabilized compliant microstructure
08/02/2007US20070178229 Systems and methods for forming magnetic nanocomposite materials
08/02/2007US20070176534 Film formation source, vacuum film formation apparatus, method of manufacturing organic EL device, and organic EL device
08/02/2007US20070175753 high frequency melting raw materials containing Al-Ru intermetallic in a vacuum to form a melt, an ingot was obtained after dissolving and casting the above, then pulverized to obtain powder, mixing Ru powder having same particle size as Al-Ru intermetallic, sintering the mxiture with hot pressing
08/02/2007US20070175749 Sputter target utilization
08/02/2007US20070175748 Method of manufacturing at least one sputter-coated substrate and sputter source
08/02/2007DE112005001994T5 Verfahren zum Verbessern eines Brennstoffzellenwassermanagements A method for improving a fuel cell water management
08/02/2007DE10392142B4 Silver alloy sputtering target has stable reflection rate and high heat conductivity
08/02/2007DE10208319B4 Substrathalter für Vakuumbeschichtungsanlagen Substrate holder for vacuum coating systems
08/02/2007DE102006047414A1 Harter Beschichtungsfilm Hard coating film
08/02/2007DE102006003279A1 Sputtertarget mit hochschmelzender Phase Sputtering target with high melting phase
08/02/2007DE102005020946B4 Verfahren und Verdampferschiffchen zum Beschichten von Substraten mit Kupfer oder Silber A method and evaporation for coating substrates with copper or silver
08/02/2007DE102004057234B4 Substrathalter sowie Substrathalteeinrichtung Substrate holder and substrate holder
08/02/2007DE102004046279B4 Dampfquelle und Beschichtungsteil einer Anlage zur Herstellung dünner Schichten unter Vakuumbedingungen aus mindestens zwei sich hinsichtlich ihres Dampfdruckes unterscheidenden Beschichtungskomponenten Steam source and coating part of a plant for the production of thin films under vacuum conditions of at least two that differ with regard to their vapor pressure coating components
08/02/2007DE102004041846B4 Verdampfungseinrichtung und Verfahren zum Verdampfen von Beschichtungsmaterial Evaporation device and method for vaporizing coating material
08/02/2007DE10122310B4 Längserstreckte Vakuumbeschichtungsanlage Elongate vacuum coating system
08/01/2007EP1813695A1 Tubular sputtering target with improved stiffness
08/01/2007EP1813694A1 Sputtering target for production of metallic glass film and process for producing the same
08/01/2007EP1813693A1 Sputtering target, sputtering target backing plate assembly and film deposition system
08/01/2007EP1813344A1 Hydrogen separation membrane, sputtering target for forming of hydrogen separation membrane, and process for producing the same
08/01/2007EP1812948A1 Material deposition apparatus and method
08/01/2007EP1812617A2 Method of making coated article having ir reflecting layer with predetermined target-substrate distance
08/01/2007CN2929958Y Improved semiconductor machine
08/01/2007CN2928872Y Winding type vacuum film coating device of improved structure
08/01/2007CN1329747C Method for producing optical element with antireflection film
08/01/2007CN1329746C Display device and reflction preventing substrate
08/01/2007CN1329552C Sputtering target and production method therefor
08/01/2007CN1329551C Novel heat barrier coating material
08/01/2007CN1329285C Method for producing a product having a structured surface
08/01/2007CN1329158C Friction stir welding using a superabrasive tool
08/01/2007CN101010601A Transparent conductive film and touch panel
08/01/2007CN101010445A Layered composite including cubic boron nitride
08/01/2007CN101010444A SiO deposition material, raw material si powder, and method for producing siO deposition material
08/01/2007CN101010443A Metal based coating composition and related coated substrates
08/01/2007CN101010442A Wear-resistant coating and method for producing same
08/01/2007CN101010441A Coated piston pin
08/01/2007CN101008078A Method for precipitating large area amorphous, nanocrystalline alloy layer using magnesium alloy surface glow plasma
08/01/2007CN101008077A Method for precipitating large area amorphous, nanocrystalline alloy layer using single cathode plasma
08/01/2007CN101008076A Sputtering target having high fusion phase
08/01/2007CN101008075A Magnetic sputter targets manufactured using directional solidification
08/01/2007CN101008074A Heating apparatus and vacuum film coating equipment using the heating apparatus
08/01/2007CN101008073A Metal material surface treatment method and workpieces processed using the method
08/01/2007CN101008072A Apparatus and method to confine plasma and to enhance flow conductance
08/01/2007CN101008055A Siler alloy for reflection or half-reflection layer
07/2007
07/31/2007US7250196 Positioning a substrate within a vacuum chamber, positioning a depositant in a filament , reducing the pressure in the vacuum chamber, introducing a gas into the vacuum chamber at a rate to raise the pressure in the vacuum chamber, applying direct current, applying radio frequency signal, heating