| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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| 08/22/2007 | CN101022912A Portable arc-seeded microwave plasma torch |
| 08/22/2007 | CN101022141A Method for producing Mg Sb codoped p type Zno thin film |
| 08/22/2007 | CN101022014A 钌合金磁介质和溅射靶 Ruthenium alloy and magnetic media sputtering target |
| 08/22/2007 | CN101021004A Ion implantation process to raise anticorrosion performance of lumpy amorphous alloy |
| 08/22/2007 | CN101021003A Combined ion implantation technology capable of raising crystallization quality of material |
| 08/22/2007 | CN101021002A Magnetically controlled sputtering process for synthesizing superhard film |
| 08/22/2007 | CN101021001A Method of coating gas turbine components |
| 08/22/2007 | CN101020375A Improvement of metal plate |
| 08/21/2007 | USRE39776 Vacuum processing apparatus and operating method with wafers, substrates and/or semiconductors |
| 08/21/2007 | USRE39775 Vacuum processing operating method with wafers, substrates and/or semiconductors |
| 08/21/2007 | US7259409 Thin film device and its fabrication method |
| 08/21/2007 | US7259358 Encapsulated graphite heater and process |
| 08/21/2007 | US7259094 Apparatus and method for heat treating thin film |
| 08/21/2007 | US7258933 Coated cutting tool member |
| 08/21/2007 | US7258912 Hard laminated film, method of manufacturing the same and film-forming device |
| 08/21/2007 | US7258901 Charged particle beam is directed to location on the substrate where the catalyst is to be deposited, with a beam-activated precursor gas also being directed to the location. For example, a nickel dot can be selectively deposited onto a substrate by using a charged particle beam to decompose a nickel-con |
| 08/21/2007 | US7258768 Method of fabricating an EL display device, and apparatus for forming a thin film |
| 08/21/2007 | US7258746 Coating apparatus for segments of cylindrical substrates |
| 08/21/2007 | CA2374768C Protective layers for sputter coated article |
| 08/21/2007 | CA2328910C Zinc-tin alloy sputtering target |
| 08/21/2007 | CA2254650C Sputtering method and apparatus with optical monitoring |
| 08/16/2007 | WO2007092894A2 Drug delivery system and method of manufacturing thereof |
| 08/16/2007 | WO2007091682A1 Film forming method, plasma film forming apparatus and storage medium |
| 08/16/2007 | WO2007091351A1 Sputtering target, sputtering target material and process for producing these |
| 08/16/2007 | WO2007091139A1 Member for cavitation erosion resistance and method for manufacturing same |
| 08/16/2007 | WO2007090586A1 Process for producing partially metallized substrates |
| 08/16/2007 | US20070190796 Method and apparatus for manufacturing a functional layer consisting of at least two components |
| 08/16/2007 | US20070190779 Diffusion Barrier Layers and Methods Comprising for Depositing Metal Films by CVD or ALD Processes |
| 08/16/2007 | US20070190757 Vapor phase growth method |
| 08/16/2007 | US20070190364 Ruthenium alloy magnetic media and sputter targets |
| 08/16/2007 | US20070190351 Wear-resistant coating and a component having a wear-resistant coating |
| 08/16/2007 | US20070190328 Modification |
| 08/16/2007 | US20070187236 Co-cr-pt-b alloy sputtering target |
| 08/16/2007 | US20070187235 Substrate holder and sputtering apparatus having same |
| 08/16/2007 | US20070187234 Facing-targets type sputtering apparatus |
| 08/16/2007 | US20070187229 Lower plasma losses and higher output plasma current to input current efficiency; magnetic filter positioned to include the effects of at least three added magnetic coils located at the right angle bend of the filter path; fins and a magnetic cusp trap in the filter path achieve desirable flux paths |
| 08/16/2007 | US20070187228 Manufacturing Method and Apparatus of Phase Shift Mask Blank |
| 08/16/2007 | US20070187227 Method for making a perpendicular magnetic recording disk |
| 08/16/2007 | US20070186852 Manufacturing apparatus |
| 08/16/2007 | US20070186848 Coating system and coating method |
| 08/16/2007 | DE10223865B4 Verfahren zur Plasmabeschichtung von Werkstücken Process for the plasma coating of workpieces |
| 08/16/2007 | DE10222958B4 Verfahren zur Herstellung eines organischen elektro-optischen Elements und organisches elektro-optisches Element A method of manufacturing an organic electro-optical element and an organic electro-optical element |
| 08/16/2007 | DE102007003272A1 Hartstoffbeschichtungsschicht und Verfahren zu deren Bildung Hard material coating layer and methods for their formation |
| 08/16/2007 | DE102005036426B4 Verfahren zum Beschichten von Stahlprodukten A method of coating steel products |
| 08/16/2007 | DE102004028840B4 Verfahren und Vorrichtung zum Herstellen von Mehrschichtsystemen Method and apparatus for producing multilayer systems |
| 08/16/2007 | CA2638020A1 Drug delivery system and method of manufacturing thereof |
| 08/16/2007 | CA2573585A1 A component, an apparatus and a method for the manufacture of a layer system |
| 08/15/2007 | EP1818917A1 Ruthenium alloy magnetic media and sputter targets |
| 08/15/2007 | EP1818425A1 Method for making partially metallized substrates |
| 08/15/2007 | EP1817787A1 Dispensing system for alkali metals capable of releasing a high quantity of metals |
| 08/15/2007 | EP1817442A1 Machining tool |
| 08/15/2007 | EP1817265A2 Method of forming coated article using sputtering target(s) and ion source(s) and corresponding apparatus |
| 08/15/2007 | EP1721025B1 Vaporizing temperature sensitive materials for oled |
| 08/15/2007 | EP1322795B1 Porous getter devices with reduced particle loss and method for their manufacture |
| 08/15/2007 | EP1299571B1 Apparatus for performing at least one process on a substrate |
| 08/15/2007 | EP1090153B1 Method of producing high purity tantalum for sputtering targets |
| 08/15/2007 | CN2935709Y High voltage automatic discharge device for ion implantation apparatus |
| 08/15/2007 | CN2934268Y Metal plate belt vacuum film coating equipment |
| 08/15/2007 | CN1332063C Strip coating installation with a vacuum chamber and a coating cylinder |
| 08/15/2007 | CN1332062C Method for depositing thin oxide coating through oxygen ion beam in low energy and auxiliary impulse laser |
| 08/15/2007 | CN1332061C Quick steaming container |
| 08/15/2007 | CN1332060C Device and method for vacuum film formation |
| 08/15/2007 | CN1331975C Nano grain iron germanium particle film magnetic sensitive material |
| 08/15/2007 | CN1331794C Rutile phase based TiO2 low radiation filming glass capable of toughening and its technics |
| 08/15/2007 | CN1331740C Carbon nanotube composite material, magnetic material and production thereof |
| 08/15/2007 | CN101019255A Gas diffusion electrodes, membrane-electrode assemblies and method for the production thereof |
| 08/15/2007 | CN101018891A Cemented carbide insert for toughness demanding short hole drilling operations |
| 08/15/2007 | CN101018889A Cutting tool with oxide coating |
| 08/15/2007 | CN101018883A MgO deposition material |
| 08/15/2007 | CN101018882A Method for depositing photocatalytic titanium oxide layers |
| 08/15/2007 | CN101017776A Method for making the growth ZnO thin film material with the covariant underlay |
| 08/15/2007 | CN101017761A Metal gas mixing ion injector |
| 08/15/2007 | CN101016621A Multi-source metal ion implantation machine |
| 08/15/2007 | CN101016620A Evaporated device and method of changing evaporated source for the same |
| 08/15/2007 | CN101016619A Device and method of preparing nano titanium dioxide quartz sand |
| 08/15/2007 | CN101016618A Film forming apparatus, film forming method, and manufacturing method of light emitting element |
| 08/15/2007 | CN101016617A Multicenter coil filter ion composite film plating device and method |
| 08/15/2007 | CN101016616A Method of preparing nanometer scale twin crystal copper thin film |
| 08/14/2007 | US7256971 Process and structure to fabricate CPP spin valve heads for ultra-high recording density |
| 08/14/2007 | US7256425 Methods of producing plane-parallel structures of silicon suboxide, silicon dioxide and/or silicon carbide, plane-parallel structures obtainable by such methods, and the use thereof |
| 08/14/2007 | US7255898 Zirconia toughened ceramic components and coatings in semiconductor processing equipment and method of manufacture thereof |
| 08/14/2007 | US7255772 High pressure processing chamber for semiconductor substrate |
| 08/14/2007 | US7255083 Sliding structure for automotive engine |
| 08/14/2007 | CA2303029C Tool with protective layer system |
| 08/09/2007 | WO2007089216A1 Plasma vapor deposition method and apparatus utilizing bipolar bias controller |
| 08/09/2007 | WO2007088946A1 Recording layer for optical information recording medium, optical information recording medium, and spattering target |
| 08/09/2007 | WO2007088808A1 Magnet structure for magnetron sputtering apparatus, cathode electrode unit, magnetron sputtering apparatus and method for using magnet structure |
| 08/09/2007 | WO2007088792A1 Method for seed film formation, plasma film forming apparatus, and memory medium |
| 08/09/2007 | WO2007047511A3 Methods of making molybdenum titanium sputtering plates and targets |
| 08/09/2007 | US20070184286 Oxide sintered body and an oxide film obtained by using it, and a transparent base material containing it |
| 08/09/2007 | US20070184187 Process for the preparation of a composite material |
| 08/09/2007 | US20070184180 Cathodoluminescent screen with a columnar structure, and the method for its preparation |
| 08/09/2007 | US20070181422 Sputtering apparatus and anti-adhesion plate therefor |
| 08/09/2007 | US20070181421 Sputtering system providing large area sputtering and plasma-assisted reactive gas dissociation |
| 08/09/2007 | US20070181420 Wafer stage having an encapsulated central pedestal plate |
| 08/09/2007 | US20070181417 Plasma Source With Segmented Magnetron |
| 08/09/2007 | US20070181220 Method for making a nano-particulate medium |
| 08/09/2007 | US20070180991 Methods for providing thin hydrogen seperation membranes and associated uses |
| 08/09/2007 | US20070180953 Converting divalent copper ions contained in an aqueous solution of cobalt chloride to monovalent ions by injecting an inert gas and contacting the solution with elemental cobalt; adjusting the HCl concentration to 0.1 to 3 kmol/m3; and separating the monovalent copper ions using an anion exchange resin |
| 08/09/2007 | DE202007007709U1 Vakuumeinrichtung zur Behandlung von Substraten in mindestens einer Arbeitsstation Vacuum means for the treatment of substrates in at least one work station |